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    • 4. 发明申请
    • SEMICONDUCTOR MEMORY DEVICE INCLUDING DOUBLE SPACERS ON SIDEWALL OF FLATING GATE, ELECTRONIC DEVICE INCLUDING THE SAME
    • 半导体存储器件,其中包括在平板门,包括它们的电子器件上的双重间隔
    • US20090096005A1
    • 2009-04-16
    • US12133587
    • 2008-06-05
    • Joon-Sung LIMJong-Ho PARKHyun-Chul BACKSung-Hun LEE
    • Joon-Sung LIMJong-Ho PARKHyun-Chul BACKSung-Hun LEE
    • H01L27/088
    • H01L27/11521H01L27/115H01L27/11524
    • A semiconductor memory device includes a device isolation layer formed in a semiconductor substrate to define a plurality of active regions. Floating gates are disposed on the active regions. A control gate line overlaps top surfaces of the floating gates and crosses over the active regions. The control gate line has an extending portion disposed in a gap between adjacent floating gates and overlapping sidewalls of the adjacent floating gates. First spacers are disposed on the sidewalls of the adjacent floating gates. Each of the first spacers extends along a sidewall of the active region and along a sidewall of the device isolation layer. Second spacers are disposed between outer sidewalls of the first spacers and the extending portion and are disposed above the device isolation layer. An electronic device including a semiconductor memory device and a method of fabricating a semiconductor memory device are also disclosed.
    • 半导体存储器件包括形成在半导体衬底中以限定多个有源区的器件隔离层。 浮动门设置在活动区域​​上。 控制栅极线与浮动栅极的顶表面重叠,并在有源区域上交叉。 控制栅极线具有设置在相邻浮动栅极之间的间隙中的延伸部分和相邻浮动栅极的重叠侧壁之间。 第一间隔件设置在相邻浮动门的侧壁上。 每个第一间隔件沿着有源区的侧壁并且沿着器件隔离层的侧壁延伸。 第二间隔件设置在第一间隔件的外侧壁和延伸部分之间,并且设置在装置隔离层的上方。 还公开了一种包括半导体存储器件和制造半导体存储器件的方法的电子器件。
    • 6. 发明申请
    • NON-VOLATILE MEMORY DEVICE AND METHOD FOR FABRICATING THE DEVICE
    • 非易失性存储器件和用于制造器件的方法
    • US20130181278A1
    • 2013-07-18
    • US13608796
    • 2012-09-10
    • Sung-Hun LEESung-Hoi HurJong-Ho Park
    • Sung-Hun LEESung-Hoi HurJong-Ho Park
    • H01L29/792
    • H01L27/1157H01L21/764H01L27/11524H01L29/40114H01L29/40117H01L29/42324H01L29/4234
    • Provided is a non-volatile memory device that includes a substrate including a plurality of active regions extending in a first direction and a plurality of element isolation trenches disposed between the active regions, a plurality of tunnel insulating layer patterns and a plurality of storage layer patterns sequentially disposed on the substrate, a plurality of blocking insulating layers and a plurality of gate electrodes disposed on the storage layer patterns and extending in a second direction perpendicular to the first direction, and first insulating layers including air gaps disposed between the active regions on the element isolation trenches and extending in the first direction, wherein the active regions include first active regions and second active regions adjacent to the first active regions, wherein a width of first air gaps is different from a width of second air gaps.
    • 提供了一种非易失性存储器件,其包括:衬底,其包括在第一方向上延伸的多个有源区和设置在有源区之间的多个元件隔离沟槽;多个隧道绝缘层图案和多个存储层图案 顺序地设置在基板上,多个阻挡绝缘层和多个栅电极,其设置在存储层图案上并沿垂直于第一方向的第二方向延伸,并且第一绝缘层包括设置在第一方向上的有源区之间的气隙 元件隔离沟槽并沿第一方向延伸,其中有源区包括与第一有源区相邻的第一有源区和第二有源区,其中第一气隙的宽度不同于第二气隙的宽度。