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    • 1. 发明授权
    • Atomic memory access hardware implementations
    • 原子存储器访问硬件实现
    • US08959292B1
    • 2015-02-17
    • US11643026
    • 2006-12-20
    • Jung Ho AhnMattan ErezWilliam J. Dally
    • Jung Ho AhnMattan ErezWilliam J. Dally
    • G06F12/00G06F9/38G06F3/06
    • G06F3/067G06F9/3895G06F12/0802
    • Atomic memory access requests are handled using a variety of systems and methods. According to one example method, a data-processing circuit having an address-request generator that issues requests to a common memory implements a method of processing the requests using a memory-access intervention circuit coupled between the generator and the common memory. The method identifies a current atomic-memory access request from a plurality of memory access requests. A data set is stored that corresponds to the current atomic-memory access request in a data storage circuit within the intervention circuit. It is determined whether the current atomic-memory access request corresponds to at least one previously-stored atomic-memory access request. In response to determining correspondence, the current request is implemented by retrieving data from the common memory. The data is modified in response to the current request and at least one other access request in the memory-access intervention circuit.
    • 使用各种系统和方法来处理原子存储器访问请求。 根据一个示例性方法,具有向公共存储器发出请求的地址请求生成器的数据处理电路实现使用耦合在发生器和公共存储器之间的存储器访问干预电路来处理请求的方法。 该方法从多个存储器访问请求中识别当前的原子存储器访问请求。 存储对应于干预电路内的数据存储电路中的当前原子存储器访问请求的数据集。 确定当前的原子存储器访问请求是否对应于至少一个先前存储的原子存储器访问请求。 响应于确定对应关系,通过从公共存储器检索数据来实现当前请求。 响应于当前请求和存储器访问干预电路中的至少一个其他访问请求修改数据。
    • 7. 发明授权
    • Narrow width metal oxide semiconductor transistor
    • 窄宽度的金属氧化物半导体晶体管
    • US07528455B2
    • 2009-05-05
    • US11646727
    • 2006-12-27
    • Jung Ho Ahn
    • Jung Ho Ahn
    • H01L29/76H01L29/94H01L31/062H01L31/113H01L31/119H01L27/10H01L29/739H01L29/73
    • H01L29/41758H01L29/78
    • Disclosed is a semiconductor transistor for enhancing performance of PMOS and NMOS transistors, particularly current driving performance, while reducing a narrow width effect. A narrow width MOS transistor includes: a channel of which width is W0 and length is L0; an active area including source and drain areas formed at both sides with the channel as a center; a gate insulating layer formed on the channel; a gate conductor formed on the gate insulating layer and intersecting the active area; a first additional active area of width is larger than that W0 of the channel as an active area added to the source area; and a second additional active area of width is larger than that W0 of the channel as an active area added to the drain area. When the structure of the transistor having the additional active areas is applied to NMOS and PMOS transistors, a driving current is represented as 107.27% and 103.31%, respectively. Accordingly, the driving currents of both PMOS and NMOS transistors are enhanced.
    • 公开了一种用于增强PMOS和NMOS晶体管的性能的半导体晶体管,特别是电流驱动性能,同时减小窄宽度效应。 窄宽度的MOS晶体管包括:宽度为W0且长度为L0的沟道; 一个有效区域,包括以通道为中心形成在两侧的源区和漏区; 形成在所述通道上的栅极绝缘层; 栅极导体,形成在栅极绝缘层上并与有源区相交; 宽度的第一附加有效区域大于作为添加到源区域的活动区域的信道的W0; 并且宽度的第二附加有源区域大于作为添加到漏极区域的有源区域的沟道的W0。 当具有附加有源区的晶体管的结构被施加到NMOS和PMOS晶体管时,驱动电流分别表示为107.27%和103.31%。 因此,增加了PMOS和NMOS晶体管的驱动电流。
    • 10. 发明申请
    • NARROW WIDTH METAL OXIDE SEMICONDUCTOR TRANSISTOR HAVING A SUPPLEMENTAL GATE CONDUCTOR PATTERN
    • 具有补充栅极导体图案的纳米宽金属氧化物半导体晶体管
    • US20070152281A1
    • 2007-07-05
    • US11616255
    • 2006-12-26
    • Jung Ho Ahn
    • Jung Ho Ahn
    • H01L29/76
    • H01L29/4238H01L29/78
    • A MOS transistor may include at least one of: a channel having a width W0 and a length L0; an active area with a channel between a source area and a drain area; a gate insulating layer formed over a channel; and/or a gate conductor formed over a gate insulating layer and intersecting the active area. In embodiments, a gate conductor may include at least one of: a connection pattern formed with a gate contact hole which electrically connects the gate conductor to the outside; an additional pattern connected to a connection pattern and positioned in parallel with both source and drain areas while being spaced apart from the active area at a certain distance; and a channel pattern connected to an additional pattern in the shape of a T and defining the length of a channel.
    • MOS晶体管可以包括以下至少一个:具有宽度W 0和长度L 0的沟道; 具有在源区域和漏极区域之间的通道的有源区域; 形成在通道上的栅极绝缘层; 和/或形成在栅极绝缘层上并与有源区相交的栅极导体。 在实施例中,栅极导体可以包括以下中的至少一个:形成有栅极接触孔的连接图案,其将栅极导体电连接到外部; 连接到连接图案并且与源极和漏极区域平行定位的附加图案,同时在一定距离处与有源区域间隔开; 以及连接到T形状的附加图案并定义通道的长度的通道图案。