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1. 发明授权

US06239218B1 Hydrogenated block copolymer and composition of the same 失效
标题翻译：氢化嵌段共聚物及其组成
公开(公告)号：US06239218B1
公开(公告)日：2001-05-29
申请号：US09057404
申请日：1998-04-09
申请人： Jun Yonezawa , Kiyoo Kato , Eiji Sasaya , Takashi Sato
发明人： Jun Yonezawa , Kiyoo Kato , Eiji Sasaya , Takashi Sato
IPC分类号： C08L5302
CPC分类号： C08L53/00 , C08F297/04 , C08L23/10 , C08L53/005 , C08L53/025 , C08L2205/02 , C08L2205/03 , C08L2308/00 , G03F7/0002 , C08L2666/02 , C08L2666/24 , C08L2666/04
摘要： A hydrogenated block copolymer comprising: at least two polymer blocks A mainly comprising vinylaromatic hydrocarbon compound monomer units; and at least two polymer blocks B mainly comprising hydrogenated conjugated diene compound monomer units, in which at least 90% of the olefinically unsaturated double bonds contained in the unhydrogenated polymer block mainly comprising the conjugated diene compound monomer units is hydrogenated, wherein at least one of the terminal blocks is a polymer block B, the proportion of the terminal polymer block B in the hydrogenated block copolymer being 0.1% by weight or higher and lower than 9.1% by weight, and wherein the content of the vinylaromatic hydrocarbon compound units in the hydrogenated block copolymer is 12% by weight or higher and lower than 25% by weight. Also disclosed are a resin composition containing the hydrogenated block copolymer, and a molded article of the resin composition.
摘要翻译：一种氢化嵌段共聚物，其包含：至少两个主要包含乙烯基芳族烃化合物单体单元的聚合物嵌段A; 以及主要包含氢化共轭二烯化合物单体单元的至少两个聚合物嵌段B，其中主要包含共轭二烯化合物单体单元的未氢化聚合物嵌段中包含的至少90％的烯属不饱和双键被氢化，其中至少一个端基是聚合物嵌段B，氢化嵌段共聚物中的末端聚合物嵌段B的比例为0.1重量％以上且低于9.1重量％，其中氢化的乙烯基芳烃化合物单元的含量嵌段共聚物为12重量％以上且低于25重量％。还公开了含有氢化嵌段共聚物的树脂组合物和树脂组合物的模塑制品。

2. 发明授权

US06455635B1 Hydrogenated block copolymer 有权
标题翻译：氢化嵌段共聚物
公开(公告)号：US06455635B1
公开(公告)日：2002-09-24
申请号：US09554310
申请日：2000-05-12
申请人： Jun Yonezawa , Shinichi Sekikawa , Hiromi Nakafutami , Takashi Sato
发明人： Jun Yonezawa , Shinichi Sekikawa , Hiromi Nakafutami , Takashi Sato
IPC分类号： C08F29700
CPC分类号： C08L23/10 , C08F297/04 , C08L53/00 , C08L53/02 , C08L53/025 , C08L2666/24 , C08L2666/04
摘要： A hydrogenated block copolymer which comprises at least two polymer blocks A each mainly comprising an aromatic vinyl hydrocarbon compound monomer unit and at least two hydrogenated polymer blocks B each mainly comprising a butadiene monomer unit, at least 90% of the olefinically unsaturated double bonds in said polymer block mainly comprising a butadiene monomer unit before hydrogenation having been hydrogenated, wherein at least one of the block at the terminal of the hydrogenated block copolymer is the polymer block B, wherein the proportion of the terminal polymer blocks B in the hydrogenated block copolymer is at least 0.1 wt % but less than 9.1 wt %, wherein the proportion of the aromatic vinyl hydrocarbon compound in the hydrogenated block copolymer exceeds 10 wt % but less than 25 wt %, wherein the 1,2-bond content of the polymer blocks mainly comprising a butadiene monomer unit before hydrogenation is, on average, at least 62 mole % but less than 99 mol %, and wherein the difference &Dgr;Tc (Tc1−Tc2) between the crystallization initiating temperature (Tc1) of the isotactic homopolypropylene and the crystallization initiating temperature (Tc2) of a mixture thereof with the hydrogenated block copolymer is at least 1.5° C.
摘要翻译：一种氢化嵌段共聚物，其包含至少两个主要包含芳族乙烯基烃化合物单体单元的聚合物嵌段A和至少两个主要包含丁二烯单体单元的氢化聚合物嵌段B，所述氢化聚合物嵌段B中所述的至少90％的所述烯属不饱和双键氢化前主要包含丁二烯单体单元的聚合物嵌段被氢化，其中氢化嵌段共聚物末端的至少一个嵌段是聚合物嵌段B，其中氢化嵌段共聚物中末端聚合物嵌段B的比例为至少0.1重量％但小于9.1重量％，其中氢化嵌段共聚物中芳族乙烯基烃化合物的比例超过10重量％但小于25重量％，其中聚合物的1,2-键含量主要氢化前的丁二烯单体单元平均为至少62摩尔％但小于99摩尔％，其中，全同立构均聚丙烯的结晶起始温度（Tc1）与其与氢化嵌段共聚物的混合物的结晶起始温度（Tc2）之间的差值DELTATc（Tc1-Tc2）为至少1.5℃

3. 发明申请

US20090215247A1 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE 有权
标题翻译：半导体器件的制造方法
公开(公告)号：US20090215247A1
公开(公告)日：2009-08-27
申请号：US12434637
申请日：2009-05-02
申请人： Takashi Sato , Junichi Takano , Takashi Sato , Tokuo Naitou
发明人： Takashi Sato , Junichi Takano , Takashi Sato , Tokuo Naitou
IPC分类号： H01L21/304
CPC分类号： H01L21/67092 , H01L21/78 , H01L2224/06181 , H01L2224/32245 , H01L2224/45144 , H01L2224/48091 , H01L2224/48247 , H01L2224/73265 , H01L2924/181 , H01L2924/00012 , H01L2924/00
摘要： Illumination devices (7a) and (7b) which irradiate light having a wavelength of 1.1 μm or less are arranged on a front surface and a rear surface of a cover (8) of a dicing device (1). After a wafer is placed on a dicing stage (3), when the wafer is diced by a blade (4a) attached to a spindle (5), light is irradiated on an entire surface of an upper surface (element forming surface) of the wafer by the illumination devices (7a) and (7b). At this time, an illuminance of light on the wafer is set at 70 lux or more and 2000 lux or less. By this means, during a dicing operation, an area to be a light-shielded area by the spindle (5) or the like is not present on the wafer.
摘要翻译：在扫描装置（1）的盖（8）的前表面和后表面上布置照射波长为1.1μm以下的光的照明装置（7a）和（7b）。在将晶片放置在切割台（3）上之后，当通过安装在主轴（5）上的刀片（4a）切割晶片时，将光照射在上表面（元件形成表面）的整个表面上晶片通过照明装置（7a）和（7b）。此时，晶片上的光的照度设定为70勒克司以上且2000lux以下。通过这种方式，在切割操作期间，晶片上不存在由主轴（5）等构成遮光区域的区域。

4. 发明授权

US07998793B2 Light illumination during wafer dicing to prevent aluminum corrosion 有权
标题翻译：晶圆切割时的光照，防止铝腐蚀
公开(公告)号：US07998793B2
公开(公告)日：2011-08-16
申请号：US12434637
申请日：2009-05-02
申请人： Takashi Sato , Junichi Takano , Takashi Sato , Tokuo Naitou
发明人： Takashi Sato , Junichi Takano , Takashi Sato , Tokuo Naitou
IPC分类号： H01L21/00
CPC分类号： H01L21/67092 , H01L21/78 , H01L2224/06181 , H01L2224/32245 , H01L2224/45144 , H01L2224/48091 , H01L2224/48247 , H01L2224/73265 , H01L2924/181 , H01L2924/00012 , H01L2924/00
摘要： Illumination devices (7a) and (7b) which irradiate light having a wavelength of 1.1 μm or less are arranged on a front surface and a rear surface of a cover (8) of a dicing device (1). After a wafer is placed on a dicing stage (3), when the wafer is diced by a blade (4a) attached to a spindle (5), light is irradiated on an entire surface of an upper surface (element forming surface) of the wafer by the illumination devices (7a) and (7b). At this time, an illuminance of light on the wafer is set at 70 lux or more and 2000 lux or less. By this means, during a dicing operation, an area to be a light-shielded area by the spindle (5) or the like is not present on the wafer.
摘要翻译：在切割装置（1）的盖（8）的前表面和后表面上布置照射波长为1.1μm以下的光的照明装置（7a）和（7b）。在将晶片放置在切割台（3）上之后，当通过安装在主轴（5）上的刀片（4a）切割晶片时，将光照射在上表面（元件形成表面）的整个表面上晶片通过照明装置（7a）和（7b）。此时，晶片上的光的照度设定为70勒克司以上且2000lux以下。通过这种方式，在切割操作期间，晶片上不存在由主轴（5）等构成遮光区域的区域。

5. 发明申请

US20080138962A1 Manufacturing Method of Semiconductor Device 审中-公开
标题翻译：半导体器件的制造方法
公开(公告)号：US20080138962A1
公开(公告)日：2008-06-12
申请号：US11632993
申请日：2004-07-22
申请人： Takashi Sato , Junichi Takano , Takashi Sato , Tokuo Naitou
发明人： Takashi Sato , Junichi Takano , Takashi Sato , Tokuo Naitou
IPC分类号： H01L21/304
CPC分类号： H01L21/67092 , H01L21/78 , H01L2224/06181 , H01L2224/32245 , H01L2224/45144 , H01L2224/48091 , H01L2224/48247 , H01L2224/73265 , H01L2924/181 , H01L2924/00012 , H01L2924/00
摘要： Illumination devices (7a) and (7b) which irradiate light having a wavelength of 1.1 μm or less are arranged on a front surface and a rear surface of a cover (8) of a dicing device (1). After a wafer is placed on a dicing stage (3), when the wafer is diced by a blade (4a) attached to a spindle (5), light is irradiated on an entire surface of an upper surface (element forming surface) of the wafer by the illumination devices (7a) and (7b). At this time, an illuminance of light on the wafer is set at 70 lux or more and 2000 lux or less. By this means, during a dicing operation, an area to be a light-shielded area by the spindle (5) or the like is not present on the wafer.
摘要翻译：在切割装置（1）的盖（8）的前表面和后表面上布置照射具有1.1μm或更小的波长的光的照明装置（7a）和（7b）。在将晶片放置在切割台（3）上之后，当通过安装在主轴（5）上的刀片（4a）切割晶片时，将光照射在上表面（元件形成表面）的整个表面上通过照明装置（7a）和（7b）的晶片。此时，晶片上的光的照度设定为70勒克司以上且2000lux以下。通过这种方式，在切割操作期间，晶片上不存在由主轴（5）等构成遮光区域的区域。

6. 发明授权

US10026968B2 Method for producing fuel cell electrode catalyst 有权
公开(公告)号：US10026968B2
公开(公告)日：2018-07-17
申请号：US14000569
申请日：2012-01-04
申请人： Masaki Horikita , Kunchan Lee , Yasuaki Wakizaka , Takashi Sato
发明人： Masaki Horikita , Kunchan Lee , Yasuaki Wakizaka , Takashi Sato
IPC分类号： H01M4/88 , H01M4/90 , H01M8/1018
CPC分类号： H01M4/8882 , H01M4/8825 , H01M4/9008 , H01M4/9016 , H01M4/9083 , H01M2008/1095
摘要： A method for producing a fuel cell electrode catalyst, including a step (I) of bringing an aqueous solution of a transition metal compound (1) into contact with ammonia and/or ammonia water to generate a precipitate (A) containing an atom of the transition metal, a step (II) of mixing at least the precipitate (A), an organic compound (B), and a liquid medium (C) to obtain a catalyst precursor liquid, and a step (IV) of subjecting the solid in the catalyst precursor liquid to heat treatment at a temperature of 500 to 1200° C. to obtain an electrode catalyst; a portion or the entirety of the transition metal compound (1) being a compound containing a transition metal element of group 4 or group 5 of the periodic table; and the organic compound (B) being at least one selected from sugars and the like.

7. 发明授权

US09818495B2 Containment vessel and nuclear power plant 有权
公开(公告)号：US09818495B2
公开(公告)日：2017-11-14
申请号：US13988966
申请日：2011-09-14
申请人： Takashi Sato
发明人： Takashi Sato
IPC分类号： G21C13/10 , G21C13/00 , G21C9/004 , G21C9/008 , G21C9/06 , G21C15/18 , G21F9/02
CPC分类号： G21C13/00 , G21C9/004 , G21C9/008 , G21C9/06 , G21C13/10 , G21C15/18 , G21F9/02 , Y02E30/40
摘要： A containment vessel has an inner shell covering a reactor pressure vessel and an outer shell forming an outer well which is a gas-tight space covering the horizontal outer periphery of the inner shell. The inner shell has a first cylindrical side wall surrounding the horizontal periphery of the reactor pressure vessel, a containment vessel head which covers the upper part of the reactor pressure vessel, and a first top slab connecting in a gas-tight manner the periphery of the containment vessel head and the upper end of the first cylindrical side wall. The outer shell has a second cylindrical side wall surrounding the outer periphery of the first cylindrical side wall, and also has a second to slab connecting in a gas-tight manner the vicinity of the upper end of the second cylindrical side wall and the first cylindrical side wall.

8. 发明授权

US09653994B2 Power supply circuit and apparatus including the circuit 有权
公开(公告)号：US09653994B2
公开(公告)日：2017-05-16
申请号：US13215035
申请日：2011-08-22
申请人： Katsumi Taguchi , Takashi Sato
发明人： Katsumi Taguchi , Takashi Sato
IPC分类号： G01R31/00 , H02M3/158 , H02M1/36
CPC分类号： H02M3/158 , H02M1/36
摘要： A power supply device supplying power to a device via a power line is provided, where the power supply device includes a first voltage generation unit configured to generate and supply a first direct voltage to the power line, a second voltage generation unit configured to generate and supply a second direct voltage lower than the first direct voltage to the power line, a measurement unit configured to measure a voltage of the power line, a control unit configured to control supply of the first direct voltage with the first voltage generation unit after starting supply of the second direct voltage with the second voltage generation unit, and a determination unit configured to determine a state of the power supply device based on the measured voltage and a first threshold value after starting the supply of the second direct voltage.

9. 发明授权

US09350025B2 Method for producing fuel cell electrode catalyst, fuel cell electrode catalyst, and uses thereof 有权
标题翻译：燃料电池用电极催化剂的制造方法，燃料电池用电极催化剂及其用途
公开(公告)号：US09350025B2
公开(公告)日：2016-05-24
申请号：US13979305
申请日：2011-08-09
申请人： Ryuji Monden , Takuya Imai , Yasuaki Wakizaka , Kunchan Lee , Takashi Sato
发明人： Ryuji Monden , Takuya Imai , Yasuaki Wakizaka , Kunchan Lee , Takashi Sato
IPC分类号： H01M4/90 , H01M4/88 , B01J31/16 , B01J31/18
CPC分类号： H01M4/9008 , B01J31/1658 , B01J31/1815 , B01J2231/324 , B01J2231/4205 , B01J2231/46 , B01J2231/70 , B01J2531/821 , B01J2531/827 , H01M4/88 , H01M4/9041 , H01M4/9083 , Y02E60/50
摘要： A method for producing a fuel cell electrode catalyst including a metal element selected from aluminum, chromium, manganese, iron, cobalt, nickel, copper, strontium, yttrium, tin, tungsten, and cerium and having high catalytic activity through heat treatment at comparatively low temperature. The method including: a step (1) of mixing at least a certain metal compound (1), a nitrogen-containing organic compound (2), and a solvent to obtain a catalyst precursor solution, a step (2) of removing the solvent from the catalyst precursor solution, and a step (3) of heat-treating a solid residue, obtained in the step (2), at a temperature of 500 to 1100° C. to obtain an electrode catalyst; a portion or the entirety of the metal compound (1) being a compound containing, as the metal element, a metal element M1 selected from aluminum, chromium, manganese, iron, cobalt, nickel, copper, strontium, yttrium, tin, tungsten, and cerium.
摘要翻译：一种生产包括选自铝，铬，锰，铁，钴，镍，铜，锶，钇，锡，钨和铈的金属元素的燃料电池电极催化剂的方法，并且通过相对较低的热处理具有高催化活性温度。该方法包括：将至少一种金属化合物（1），含氮有机化合物（2）和溶剂混合以获得催化剂前体溶液的步骤（1），除去溶剂的步骤（2）和催化剂前体溶液的步骤（3）和步骤（2）中获得的固体残渣热处理步骤（3），在500〜1100℃的温度下进行，得到电极催化剂; 金属化合物（1）的一部分或全部是含有选自铝，铬，锰，铁，钴，镍，铜，锶，钇，锡，钨中的金属元素M1作为金属元素的化合物，和铈。

10. 发明授权

US09336810B2 Method for manufacturing glass blank for magnetic disk, method for manufacturing glass substrate for magnetic disk 有权
标题翻译：磁盘用玻璃坯料的制造方法，磁盘用玻璃基板的制造方法
公开(公告)号：US09336810B2
公开(公告)日：2016-05-10
申请号：US13982877
申请日：2012-04-27
申请人： Hideki Isono , Hidekazu Tanino , Akira Murakami , Takashi Sato , Masamune Sato , Masaru Onishi
发明人： Hideki Isono , Hidekazu Tanino , Akira Murakami , Takashi Sato , Masamune Sato , Masaru Onishi
IPC分类号： C03B11/12 , G11B5/84 , C03B11/08
CPC分类号： G11B5/8404 , C03B11/088 , C03B11/122 , C03B11/125 , C03B2215/07 , C03B2215/70 , Y02P40/57
摘要： A method for manufacturing a glass substrate for magnetic disk is provided in which a glass is kept from being fused to a mold during press forming and shape processing to achieve a good circularity is efficiently performed. The method includes: a forming process of forming a disk-shaped glass blank by direct-pressing a molten glass by a pair of dies; and a shape processing process of performing at least one of inner hole formation and outer shape formation for forming a disk-shaped glass substrate by forming a cutting line on the principal face of the glass blank, followed by growing the cutting line to perform cutting. In the forming process, press forming is performed while the temperature of the pair of dies, over a period of time until a molten glass is separated from the die after coming into contact with the die, is set at a temperature lower than a glass transition point (Tg) and a mold release material is not attached to the surfaces of the pair of dies.
摘要翻译：提供一种用于制造用于磁盘的玻璃基板的方法，其中在压制成形期间保持玻璃不熔化到模具，并且有效地执行形状处理以实现良好的圆形度。该方法包括：通过一对模具直接压制熔融玻璃来形成盘状玻璃坯料的成形过程; 以及通过在玻璃坯料的主面上形成切割线，进行用于形成圆盘状的玻璃基板的内孔形成和外形形成中的至少一种的形状加工工序，然后使切割线成长进行切削。在成形过程中，一边进行压制成形，一边在与模具接触的熔融玻璃与模具分离一段时间的一段时间内，将其设定为低于玻璃化转变温度点（Tg）和脱模材料未附接到该对模具的表面。

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