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1. 发明申请

US20110224956A1 Methods and Systems for Parameter-Sensitive and Orthogonal Gauge Design for Lithography Calibration 有权
标题翻译：用于光刻校准的参数敏感和正交仪表设计方法和系统
公开(公告)号：US20110224956A1
公开(公告)日：2011-09-15
申请号：US13128630
申请日：2009-11-10
申请人： Jun Ye , Yu Cao , Hanying Feng , Wenjin Shao
发明人： Jun Ye , Yu Cao , Hanying Feng , Wenjin Shao
IPC分类号： G06F17/50
CPC分类号： G06F17/50 , G03F1/14 , G03F1/44 , G03F1/68 , G03F7/70433 , G03F7/705 , G06F17/10 , G06F17/5009
摘要： Methods according to the present invention provide computationally efficient techniques for designing gauge patterns for calibrating a model for use in a simulation process, and which minimize degeneracy between model parameters, and thus maximize pattern coverage for parameter calibration. More specifically, the present invention relates to methods of designing gauge patterns that achieve complete coverage of parameter variations with minimum number of gauges and corresponding measurements in the calibration of a lithographic process utilized to image a target design having a plurality of features. According to some aspects, a method according to the invention includes transforming the space of model parametric space (based on CD sensitivity or Delta TCCs), then iteratively identifying the direction that is most orthogonal to existing gauges' CD sensitivities in this new space, and determining most sensitive line width/pitch combination with optimal assist feature placement which leads to most sensitive CD changes along that direction in model parametric space.
摘要翻译：根据本发明的方法提供用于设计用于校准用于模拟过程中的模型的计量模式的计算有效的技术，并且使模型参数之间的简并性最小化，并且因此使参数校准的模式覆盖最大化。更具体地说，本发明涉及设计规格图案的方法，该图形模式可以用最小数量的量规完成覆盖参数变化，并且在用于对具有多个特征的目标设计进行成像的光刻处理的校准中的对应测量。根据一些方面，根据本发明的方法包括改变模型参数空间的空间（基于CD灵敏度或Delta TCC），然后迭代地识别在该新空间中与现有计量器的CD灵敏度最正交的方向，以及确定最敏感的线宽/间距组合与最佳辅助功能放置，导致在模型参数空间中沿着该方向的最敏感的CD变化。

2. 发明授权

US08930172B2 Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration 有权
标题翻译：用于光刻校准的参数敏感和正交仪表设计的方法和系统
公开(公告)号：US08930172B2
公开(公告)日：2015-01-06
申请号：US13128630
申请日：2009-11-10
申请人： Jun Ye , Yu Cao , Hanying Feng , Wenjin Shao
发明人： Jun Ye , Yu Cao , Hanying Feng , Wenjin Shao
IPC分类号： G06F17/50 , G03F1/00 , G03F7/20 , G03F1/44
CPC分类号： G06F17/50 , G03F1/14 , G03F1/44 , G03F1/68 , G03F7/70433 , G03F7/705 , G06F17/10 , G06F17/5009
摘要： Methods according to the present invention provide computationally efficient techniques for designing gauge patterns for calibrating a model for use in a simulation process, and which minimize degeneracy between model parameters, and thus maximize pattern coverage for parameter calibration. More specifically, the present invention relates to methods of designing gauge patterns that achieve complete coverage of parameter variations with minimum number of gauges and corresponding measurements in the calibration of a lithographic process utilized to image a target design having a plurality of features. According to some aspects, a method according to the invention includes transforming the space of model parametric space (based on CD sensitivity or Delta TCCs), then iteratively identifying the direction that is most orthogonal to existing gauges' CD sensitivities in this new space, and determining most sensitive line width/pitch combination with optimal assist feature placement which leads to most sensitive CD changes along that direction in model parametric space.
摘要翻译：根据本发明的方法提供用于设计用于校准用于模拟过程中的模型的计量模式的计算有效的技术，并且使模型参数之间的简并性最小化，并且因此使参数校准的模式覆盖最大化。更具体地说，本发明涉及设计规格图案的方法，该图形模式可以用最小数量的量规完成覆盖参数变化，并且在用于对具有多个特征的目标设计进行成像的光刻处理的校准中的对应测量。根据一些方面，根据本发明的方法包括改变模型参数空间的空间（基于CD灵敏度或Delta TCC），然后迭代地识别在该新空间中与现有计量器的CD灵敏度最正交的方向，以及确定最敏感的线宽/间距组合与最佳辅助功能放置，导致在模型参数空间中沿着该方向的最敏感的CD变化。

3. 发明授权

US08806387B2 Model-based process simulation systems and methods 有权
标题翻译：基于模型的过程仿真系统和方法
公开(公告)号：US08806387B2
公开(公告)日：2014-08-12
申请号：US12475095
申请日：2009-05-29
申请人： Yu Cao , Wenjin Shao , Ronaldus Johannes Gijsbertus Goossens , Jun Ye , James Patrick Koonmen
发明人： Yu Cao , Wenjin Shao , Ronaldus Johannes Gijsbertus Goossens , Jun Ye , James Patrick Koonmen
IPC分类号： G06F17/50
CPC分类号： B29C67/0088 , B29C64/386 , G03F7/70091 , G03F7/70458 , G03F7/705 , G03F7/70516 , G03F7/70525 , G06F17/50 , G06F17/5009 , G06F17/5081
摘要： Systems and methods for process simulation are described. The methods may use a reference model identifying sensitivity of a reference scanner to a set of tunable parameters. Chip fabrication from a chip design may be simulated using the reference model, wherein the chip design is expressed as one or more masks. An iterative retuning and simulation process may be used to optimize critical dimension in the simulated chip and to obtain convergence of the simulated chip with an expected chip. Additionally, a designer may be provided with a set of results from which an updated chip design is created.
摘要翻译：描述了过程仿真的系统和方法。这些方法可以使用标识参考扫描仪对一组可调谐参数的灵敏度的参考模型。可以使用参考模型来模拟来自芯片设计的芯片制造，其中芯片设计被表示为一个或多个掩模。可以使用迭代重调和仿真过程来优化模拟芯片中的关键尺寸，并获得模拟芯片与预期芯片的收敛。此外，可以向设计者提供一组结果，从中创建更新的芯片设计。

4. 发明申请

US20100010784A1 MODEL-BASED SCANNER TUNING SYSTEMS AND METHODS 有权
标题翻译：基于模型的扫描仪调谐系统和方法
公开(公告)号：US20100010784A1
公开(公告)日：2010-01-14
申请号：US12475080
申请日：2009-05-29
申请人： Yu Cao , Wenjin Shao , Ronaldus Johannes,Gljsbertus Goossens , Jun Ye , James Patrick Koonmen
发明人： Yu Cao , Wenjin Shao , Ronaldus Johannes,Gljsbertus Goossens , Jun Ye , James Patrick Koonmen
IPC分类号： G06F17/50
CPC分类号： B29C67/0088 , B29C64/386 , G03F7/70091 , G03F7/70458 , G03F7/705 , G03F7/70516 , G03F7/70525 , G06F17/50 , G06F17/5009 , G06F17/5081
摘要： Systems and methods for tuning photolithographic processes are described. A model of a target scanner is maintained defining sensitivity of the target scanner with reference to a set of tunable parameters. A differential model represents deviations of the target scanner from the reference. The target scanner may be tuned based on the settings of the reference scanner and the differential model. Performance of a family of related scanners may be characterized relative to the performance of a reference scanner. Differential models may include information such as parametric offsets and other differences that may be used to simulate the difference in imaging behavior.
摘要翻译：描述用于调整光刻工艺的系统和方法。保持目标扫描仪的型号，参考一组可调谐参数来定义目标扫描仪的灵敏度。差分模型表示目标扫描器与参考值的偏差。可以基于参考扫描仪和差分模型的设置来调整目标扫描仪。可以相对于参考扫描仪的性能来表征相关扫描仪系列的性能。差分模型可能包括诸如参数偏移和可能用于模拟成像行为差异的其他差异的信息。

5. 发明授权

US08694928B2 Pattern selection for lithographic model calibration 有权
标题翻译：光刻模型校准的图案选择
公开(公告)号：US08694928B2
公开(公告)日：2014-04-08
申请号：US12613244
申请日：2009-11-05
申请人： Yu Cao , Wenjin Shao , Jun Ye , Ronaldus Johannes Gljsbertus Goossens
发明人： Yu Cao , Wenjin Shao , Jun Ye , Ronaldus Johannes Gljsbertus Goossens
IPC分类号： G06F17/50
CPC分类号： G06F17/50 , G03F1/14 , G03F1/44 , G03F1/68 , G03F7/70433 , G03F7/705 , G06F17/10 , G06F17/5009
摘要： The present invention relates generally to methods and apparatuses for test pattern selection for computational lithography model calibration. According to some aspects, the pattern selection algorithms of the present invention can be applied to any existing pool of candidate test patterns. According to some aspects, the present invention automatically selects those test patterns that are most effective in determining the optimal model parameter values from an existing pool of candidate test patterns, as opposed to designing optimal patterns. According to additional aspects, the selected set of test patterns according to the invention is able to excite all the known physics and chemistry in the model formulation, making sure that the wafer data for the test patterns can drive the model calibration to the optimal parameter values that realize the upper bound of prediction accuracy imposed by the model formulation.
摘要翻译：本发明一般涉及用于计算光刻模型校准的测试图案选择的方法和装置。根据一些方面，本发明的模式选择算法可以应用于任何现有的候选测试模式池。根据一些方面，与设计最佳图案相反，本发明自动选择从现有的候选测试图案池中确定最佳模型参数值最有效的测试图案。根据另外的方面，根据本发明的所选择的一组测试图案能够激发模型配方中的所有已知物理和化学，确保用于测试图案的晶片数据可以将模型校准驱动到最佳参数值实现了模型公式对预测精度的上限。

6. 发明授权

US08379991B2 Delta TCC for fast sensitivity model computation 有权
标题翻译： Delta TCC用于快速灵敏度模型计算
公开(公告)号：US08379991B2
公开(公告)日：2013-02-19
申请号：US12614180
申请日：2009-11-06
申请人： Yu Cao , Jun Ye , Wenjin Shao , Hua Cao
发明人： Yu Cao , Jun Ye , Wenjin Shao , Hua Cao
IPC分类号： G06K9/68
CPC分类号： G06F17/5081 , G03F1/144 , G03F1/36 , G03F1/70 , G03F7/70483 , G03F7/705 , G03F7/70525 , G03F7/70991 , G06F17/5068
摘要： A method for determining a difference between a reference image and a further image of a pattern, the method including determining a reference imaging function; determining parameters of a difference function representative of a difference between the reference imaging function and a further imaging function; calculating a difference between the reference image and the further image of the pattern based on the difference function and the determined parameters.
摘要翻译：一种用于确定参考图像与图案的另一图像之间的差异的方法，所述方法包括确定参考成像功能; 确定代表参考成像功能和另外的成像功能之间的差异的差分函数的参数; 基于差分函数和确定的参数来计算参考图像和图像的另外图像之间的差。

7. 发明申请

US20100122225A1 PATTERN SELECTION FOR LITHOGRAPHIC MODEL CALIBRATION 有权
标题翻译：图形模型校准的图案选择
公开(公告)号：US20100122225A1
公开(公告)日：2010-05-13
申请号：US12613244
申请日：2009-11-05
申请人： Yu Cao , Wenjin Shao , Jun Ye , Ronaldus Johannes Gljsbertus Goossens
发明人： Yu Cao , Wenjin Shao , Jun Ye , Ronaldus Johannes Gljsbertus Goossens
IPC分类号： G06F17/50
CPC分类号： G06F17/50 , G03F1/14 , G03F1/44 , G03F1/68 , G03F7/70433 , G03F7/705 , G06F17/10 , G06F17/5009
摘要： The present invention relates generally to methods and apparatuses for test pattern selection for computational lithography model calibration. According to some aspects, the pattern selection algorithms of the present invention can be applied to any existing pool of candidate test patterns. According to some aspects, the present invention automatically selects those test patterns that are most effective in determining the optimal model parameter values from an existing pool of candidate test patterns, as opposed to designing optimal patterns. According to additional aspects, the selected set of test patterns according to the invention is able to excite all the known physics and chemistry in the model formulation, making sure that the wafer data for the test patterns can drive the model calibration to the optimal parameter values that realize the upper bound of prediction accuracy imposed by the model formulation.
摘要翻译：本发明一般涉及用于计算光刻模型校准的测试图案选择的方法和装置。根据一些方面，本发明的模式选择算法可以应用于任何现有的候选测试模式池。根据一些方面，与设计最佳图案相反，本发明自动选择从现有的候选测试图案池中确定最佳模型参数值最有效的测试图案。根据另外的方面，根据本发明的所选择的一组测试图案能够激发模型配方中的所有已知物理和化学，确保用于测试图案的晶片数据可以将模型校准驱动到最佳参数值实现了模型公式对预测精度的上限。

8. 发明申请

US20090300573A1 MODEL-BASED PROCESS SIMULATION SYSTEMS AND METHODS 有权
标题翻译：基于模型的过程模拟系统和方法
公开(公告)号：US20090300573A1
公开(公告)日：2009-12-03
申请号：US12475095
申请日：2009-05-29
申请人： Yu Cao , Wenjin Shao , Ronaldus Johannes Gijsbertus Goossens , Jun Ye , James Patrick Koonmen
发明人： Yu Cao , Wenjin Shao , Ronaldus Johannes Gijsbertus Goossens , Jun Ye , James Patrick Koonmen
IPC分类号： G06F17/50
CPC分类号： B29C67/0088 , B29C64/386 , G03F7/70091 , G03F7/70458 , G03F7/705 , G03F7/70516 , G03F7/70525 , G06F17/50 , G06F17/5009 , G06F17/5081
摘要： Systems and methods for process simulation are described. The methods may use a reference model identifying sensitivity of a reference scanner to a set of tunable parameters. Chip fabrication from a chip design may be simulated using the reference model, wherein the chip design is expressed as one or more masks. An iterative retuning and simulation process may be used to optimize critical dimension in the simulated chip and to obtain convergence of the simulated chip with an expected chip. Additionally, a designer may be provided with a set of results from which an updated chip design is created.
摘要翻译：描述了过程仿真的系统和方法。这些方法可以使用标识参考扫描仪对一组可调谐参数的灵敏度的参考模型。可以使用参考模型来模拟来自芯片设计的芯片制造，其中芯片设计被表示为一个或多个掩模。可以使用迭代重调和仿真过程来优化模拟芯片中的关键尺寸，并获得模拟芯片与预期芯片的收敛。此外，可以向设计者提供一组结果，从中创建更新的芯片设计。

9. 发明授权

US08732625B2 Methods for performing model-based lithography guided layout design 有权
标题翻译：执行基于模型的光刻引导布局设计的方法
公开(公告)号：US08732625B2
公开(公告)日：2014-05-20
申请号：US12663121
申请日：2008-06-03
申请人： Jun Ye , Yu Cao , Hanying Feng
发明人： Jun Ye , Yu Cao , Hanying Feng
IPC分类号： G06F17/50
CPC分类号： G06F17/5009 , G03F1/36 , G03F7/70433 , G03F7/70441 , G03F7/70666
摘要： Methods are disclosed to create efficient model-based Sub-Resolution Assist Features (MB-SRAF). An SRAF guidance map is created, where each design target edge location votes for a given field point on whether a single-pixel SRAF placed on this field point would improve or degrade the aerial image over the process window. In one embodiment, the SRAF guidance map is used to determine SRAF placement rules and/or to fine-tune already-placed SRAFs. The SRAF guidance map can be used directly to place SRAFs in a mask layout. Mask layout data including SRAFs may be generated, wherein the SRAFs are placed according to the SRAF guidance map. The SRAF guidance map can comprise an image in which each pixel value indicates whether the pixel would contribute positively to edge behavior of features in the mask layout if the pixel is included as part of a sub-resolution assist feature.
摘要翻译：公开了创建有效的基于模型的子分辨率辅助特征（MB-SRAF）的方法。创建SRAF指南图，其中每个设计目标边缘位置对于给定的场点投票，放置在该场点上的单像素SRAF是否将改善或降级过程窗口上的空中图像。在一个实施例中，SRAF引导图用于确定SRAF放置规则和/或微调已经放置的SRAF。 SRAF引导图可以直接用于将SRAF放置在掩码布局中。可以生成包括SRAF的掩模布局数据，其中根据SRAF引导图放置SRAF。 SRAF引导图可以包括图像，其中每个像素值指示如果像素被包括为子分辨率辅助特征的一部分，则像素是否将对掩模布局中的特征的边缘行为贡献积极。

10. 发明申请

US20140012671A1 CONTENT-BASED TARGETED ONLINE ADVERTISEMENT 审中-公开
标题翻译：基于内容的目标在线广告
公开(公告)号：US20140012671A1
公开(公告)日：2014-01-09
申请号：US13543705
申请日：2012-07-06
申请人： Jun Ye , Yu Cao , Luoqi Chen , Ya Luo , Wei Zhuang , Hanying Feng , Hong Chen
发明人： Jun Ye , Yu Cao , Luoqi Chen , Ya Luo , Wei Zhuang , Hanying Feng , Hong Chen
IPC分类号： G06Q30/02
CPC分类号： G06Q30/0251
摘要： A method of providing targeted online advertisement includes receiving a request for an ad impression to be provided to a user in a network environment. The request includes a first content and a second content. The method also includes, using a processor, determining a context of the first content and a context of the second content, determining a correlation between the context of the first content and the context of the second content, and identifying a plurality of ads as candidates for consideration. The method further includes, using the processor, ranking the plurality of identified ads, selecting an ad among the plurality of identified ads based at least in part on a result of the ranking, and providing the selected ad as the ad impression to be displayed to the user in response to receiving the request.
摘要翻译：提供目标在线广告的方法包括在网络环境中接收要向用户提供的广告印象的请求。该请求包括第一内容和第二内容。该方法还包括使用处理器确定第一内容的上下文和第二内容的上下文，确定第一内容的上下文与第二内容的上下文之间的相关性，以及将多个广告标识为候选审议。所述方法还包括：使用所述处理器对所述多个识别的广告进行排名，至少部分地基于所述排名的结果来选择所述多个识别的广告中的广告，并且将所选择的广告提供为要显示的广告展示用户响应于接收到请求。

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