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    • 4. 发明授权
    • Patterning process and resist composition
    • 图案化过程和抗蚀剂组成
    • US08507175B2
    • 2013-08-13
    • US12905426
    • 2010-10-15
    • Jun HatakeyamaMasaki OhashiYouichi OhsawaKazuhiro Katayama
    • Jun HatakeyamaMasaki OhashiYouichi OhsawaKazuhiro Katayama
    • G03F7/00G03F7/004G03F7/20G03F7/028
    • G03F7/0045G03F7/0397G03F7/095
    • The process forms a pattern by applying a resist composition onto a substrate to form a resist film, baking, exposure, post-exposure baking, and development. The resist composition comprises a polymer comprising recurring units having an acid labile group and substantially insoluble in alkaline developer, a PAG, a PBG capable of generating an amino group, a quencher for neutralizing the acid from PAG for inactivation, and an organic solvent. A total amount of amino groups from the quencher and PBG is greater than an amount of acid from PAG. An unexposed region and an over-exposed region are not dissolved in developer whereas only an intermediate exposure dose region is dissolved in developer. Resolution is doubled by splitting a single line into two through single exposure and development.
    • 该方法通过将抗蚀剂组合物施加到基底上以形成抗蚀剂膜,烘烤,曝光,曝光后烘烤和显影来形成图案。 抗蚀剂组合物包含聚合物,其包含具有酸不稳定基团并且基本上不溶于碱性显影剂的重复单元,PAG,能够产生氨基的PBG,用于中和PAG酸失活的猝灭剂和有机溶剂。 来自猝灭剂和PBG的氨基的总量大于来自PAG的酸的量。 未曝光区域和过度曝光区域不溶解在显影剂中,而只有中间曝光剂量区域溶解在显影剂中。 通过单次曝光和开发将单线分成两组,分辨率翻了一番。