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1. 发明申请

US20090275694A1 Spin-on-Glass Anti-Reflective Coatings for Photolithography 审中-公开
标题翻译：旋光玻璃防反射涂层用于光刻
公开(公告)号：US20090275694A1
公开(公告)日：2009-11-05
申请号：US10495687
申请日：2001-11-16
申请人： Teresa Baldwin-Hendricks , Joseph T. Kennedy , Mary E. Richey
发明人： Teresa Baldwin-Hendricks , Joseph T. Kennedy , Mary E. Richey
IPC分类号： C08L83/04 , C08G77/12 , G02B5/22
CPC分类号： G03F7/091 , C08G77/04 , C08G77/20 , C09D183/04
摘要： The present invention provides a siloxane polymer family comprising siloxane polymer made from: (a) a strongly absorbing compound; (b) at least one silane having good leaving groups; and (c) at least one silane having good leaving groups that is different than (b); wherein the siloxane polymer family exhibits a relationship that is concave/convex or is located in the region enclosed by a concave/convex relationship for the ratio of (a) to (b) to (c) and the siloxane polymer's extinction coefficient k value. These siloxane polymers are preferably used as spin-on glass compositions for films in the microelectronics applications.
摘要翻译：本发明提供一种含硅氧烷聚合物的硅氧烷聚合物，该硅氧烷聚合物由以下物质制成：（a）强吸收性化合物; （b）至少一种具有良好离去基团的硅烷; 和（c）至少一种具有不同于（b）的离去基团的硅烷; 其中所述硅氧烷聚合物族表现出与（a）至（b）至（c）的比率和所述硅氧烷聚合物的消光系数k值之间的凹/凸的关系或位于由凹/凸关系包围的区域中的关系。这些硅氧烷聚合物优选用作微电子应用中的薄膜的旋涂玻璃组合物。

2. 发明授权

US08344088B2 Spin-on anti-reflective coatings for photolithography 有权
标题翻译：用于光刻的旋转抗反射涂层
公开(公告)号：US08344088B2
公开(公告)日：2013-01-01
申请号：US10495688
申请日：2001-11-15
申请人： Joseph T. Kennedy , Teresa Baldwin-Hendricks
发明人： Joseph T. Kennedy , Teresa Baldwin-Hendricks
IPC分类号： C08G77/06 , C08G77/00
CPC分类号： G03F7/091 , C08G77/04 , C09D5/006 , C09D183/04 , Y10T428/31663
摘要： Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions.
摘要翻译：用于紫外光刻的抗反射涂层材料包括至少一种吸收化合物和至少一种掺入旋涂材料中的pH调节剂。合适的吸收化合物是可以在光刻中使用的波长如365nm，248nm，193nm和157nm的那些吸收化合物。合适的pH调节剂不仅调节最终旋涂组合物的pH，而且还影响作为层状材料，电子部件或半导体的一部分的最终旋涂组合物的化学性能和特性，机械性能和结构组成使得最终的旋涂组合物与与其偶联的抗蚀剂材料更相容。制备吸收和pH调节旋涂材料的方法包括在合成旋涂材料和组合物期间将至少一种有机吸收化合物和至少一种pH调节剂与至少一种硅烷反应物组合。

3. 发明申请

US20050058929A1 Spin-on anti-reflective coatings for photolithography 有权
标题翻译：用于光刻的旋转抗反射涂层
公开(公告)号：US20050058929A1
公开(公告)日：2005-03-17
申请号：US10495688
申请日：2004-11-17
申请人： Joseph Kennedy , Teresa Baldwin-Hendricks
发明人： Joseph Kennedy , Teresa Baldwin-Hendricks
IPC分类号： G03F7/11 , C08G77/00 , C08G77/04 , C09D1/00 , C09D5/32 , C09D7/12 , C09D183/04 , C09K3/00 , G03C1/492 , G03F7/09 , H01L21/027 , B32B9/04
CPC分类号： G03F7/091 , C08G77/04 , C09D5/006 , C09D183/04 , Y10T428/31663
摘要： Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. More specifically, the pH tuning agent strong influences the polymeric characteristics, the structural makeup and the spatial orientation that results in increasing the surface properties of the anti-reflective coating for optimal resist performance. In other words, a pH tuning agent that merely adjusts the pH of the spin-on material without influencing the mechanical properties and structural makeup of the spin-on composition or the coupled resist material is not contemplated herein. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions.

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