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    • 3. 发明申请
    • Closed loop control for intrastromal wavefront-guided ablation with fractionated treatment program
    • 闭环控制用于分级处理程序的基质内波前引导消融
    • US20050149005A1
    • 2005-07-07
    • US11033967
    • 2005-01-12
    • Josef Bille
    • Josef Bille
    • A61F9/007A61B17/00A61F9/01A61B18/20
    • A61F9/008A61B3/1015A61B3/107A61B2017/00017A61B2017/00022A61F9/00829A61F2009/00848A61F2009/00872A61F2009/0088
    • A closed-loop control system for altering the optical characteristics of a patient's cornea includes an algorithm for predicting the shape of the cornea after one or more gas bubbles resulting from intrastromal photoablation have collapsed. Patient data can be used as an input for the algorithm, which is then run to prepare an initial treatment plan for a corneal alteration. The initial plan typically includes a plurality of intrastromal photoablation locations and corresponding ablation energies. After photoablation of plan location(s) and before the resulting bubbles collapse, a real-time wavefront shape for light passing through the cornea is measured. The wavefront is then used in the algorithm to predict a post bubble collapse cornea shape and to generate an updated treatment plan. The procedure then continues by ablating location(s) identified in the updated treatment plan. Wavefront measurement and plan updating can be repeated as many times as desired.
    • 用于改变患者角膜的光学特性的闭环控制系统包括用于预测由脉管内光消融引起的一个或多个气泡之后的角膜的形状的算法。 患者数据可用作算法的输入,然后运行该输入以准备角膜改变的初始治疗计划。 初始方案通常包括多个基质内光消融位置和相应的消融能量。 在计划位置的光消融之后,并且在所得气泡崩溃之前,测量通过角膜的光的实时波前形状。 然后在算法中使用波前预测后气泡折叠角膜形状并生成更新的治疗计划。 然后通过消除更新的治疗计划中确定的位置来继续该程序。 可以根据需要重复波前测量和计划更新次数。
    • 4. 发明授权
    • Defocus and astigmatism compensation in a wavefront aberration measurement system
    • 波前像差测量系统中的散焦和像散补偿
    • US06746121B2
    • 2004-06-08
    • US09844930
    • 2001-04-27
    • Denwood F. RossMichael SchottnerBjorne BaschekJosef Bille
    • Denwood F. RossMichael SchottnerBjorne BaschekJosef Bille
    • A61B310
    • A61B3/1015A61B3/103G02B27/0025
    • Defocus and astigmatism compensation methods and apparatuses for use in an aberration measurement system. The apparatuses including reflectors for altering the optical distance between a pair of lenses passing a wavefront without changing the physical distance between the lenses, thereby compensating for defocus in the wavefront; and cylindrical mirrors for adding and removing curvature from a curved wavefront, thereby compensating for astigmatism in the wavefront. The methods including passing a wavefront having defocus through a first lens on a first path, reflecting the wavefront from the first path to a second path, reflecting the wavefront from the second path to a third path, and passing the wavefront through a second lens as a defocus compensated wavefront; and passing a wavefront through first and second cylindrical lens, and orienting the first and second cylindrical lenses with respect to the wavefront and to one another to compensate for astigmatism in the wavefront.
    • 用于像差测量系统的散焦和像散补偿方法和装置。 这些装置包括用于改变通过波前的一对透镜之间的光学距离的反射器,而不改变透镜之间的物理距离,从而补偿波前的散焦; 以及用于从弯曲波前添加和去除曲率的圆柱形反射镜,从而补偿波前的散光。 所述方法包括将具有散焦的波前通过第一透镜穿过第一路径,将波前从第一路径反射到第二路径,将波前从第二路径反射到第三路径,并将波前通过第二透镜,如 散焦补偿波前; 并且使波前通过第一和第二柱面透镜,并且使第一和第二柱面透镜相对于波前和彼此定向以补偿波前的像散。
    • 5. 发明授权
    • Aberration-free imaging of the fundus of the human eye
    • 眼睛的眼底无畸形成像
    • US06361170B1
    • 2002-03-26
    • US09783479
    • 2001-02-14
    • Josef Bille
    • Josef Bille
    • A61B310
    • A61B3/1015A61B3/1225
    • A device and method for aberration-free imaging of the fundus of the human eye includes a light source, an active mirror for directing light from the light source to and from the fundus and imaging units for viewing the fundus. A sensor compares the wavefront reflected from the eye with an aberration-free wavefront to establish an error signal, and the error signal is used to program the active mirror to remove aberrations from the reflected light. Importantly, all of this is done by focusing the light to a focal spot on the fundus which has three dimensional volumetric measurements, i.e. point spread function (PSF), of as small as approximately 2 &mgr;m×2 &mgr;m×20 &mgr;m. The imaging units include an ellipsometer and a fluoroscope, and the light source can be a laser diode or an AP-diode.
    • 用于人眼的无像差成像的装置和方法包括光源,用于将来自光源的光引导到眼底和用于观察眼底的成像单元的主动镜。 传感器将从眼睛反射的波面与无像差波前进行比较以建立误差信号,并且使用误差信号来编程主动反射镜以从反射光中去除像差。 重要的是,所有这些都是通过将光聚焦到具有小至大约2mumx2 mumx20mum的三维体积测量(即点扩散函数(PSF))的眼底上的焦点。 成像单元包括椭圆计和荧光镜,并且光源可以是激光二极管或AP二极管。
    • 6. 发明授权
    • Appartus for, and methods of, inscribing patterns on semiconductor wafers
    • Appartus以及在半导体晶圆上印刷图案的方法
    • US4727381A
    • 1988-02-23
    • US758061
    • 1985-07-23
    • Josef BilleSiegfried Hunklinger
    • Josef BilleSiegfried Hunklinger
    • G02B26/10G02B7/28G02B26/06G03F7/20G03F7/207G03F9/02H01L21/027G01D9/42G11B7/00
    • G03F7/704H01L21/0275
    • An energy (i.e. laser) beam directed to a photoresist layer is scanned in a first direction through lines progressively displaced in a second coordinate direction. In this way, stripe areas of a wafer are exposed sequentially in a first direction with a thickness dependent upon the size of the laser spot focussed on the beam. The beam scanning rate is adjustable to obtain a time coincidence between the occurrence of markers in a computer and the scanning of a particular position in each line. The beam is modulated during the scan to inscribe a pattern on the layer. The beam is focussed on, and reflected from, the photoresist layer. The reflection is used to maintain the focussing of the beam on the layer by adjusting individual elements in an active mirror in accordance with the reflected beam characteristics. The beam may be split into a plurality of beams displaced from one another in the first direction by providing associated pairs of spherical facets in a lens system and directing portions of the beam between the facets in each pair. Such beams are synchronously scanned to increase the scanning frequency. A second beam with different characteristics than the first beam may be scanned asynchronously (e.g. a reduced speed) relative to the first beam and may be focussed on the photoresist layer in a manner similar to that described above. Light reflected in the second beam from the layer is used to adjust the characteristics of the individual elements in the active mirror so as to maintain the beam focussed on the photoresist layer.
    • 被引导到光致抗蚀剂层的能量(即,激光)束沿第一方向通过在第二坐标方向上逐渐移位的线扫描。 以这种方式,晶片的条纹区域在第一方向依次曝光,其厚度取决于聚焦在光束上的激光光斑的尺寸。 光束扫描速率是可调节的,以获得计算机中的标记的出现与每行中特定位置的扫描之间的时间一致性。 在扫描期间,光束被调制以在图层上刻上图案。 光束被聚焦并且从光致抗蚀剂层反射。 反射用于通过根据反射光束特性调节有源反射镜中的各个元件来保持光束在层上的聚焦。 通过在透镜系统中提供相关的一对球形面并将光束的各部分引导到每一对的小平面之间,可将光束分成多个沿第一方向彼此偏移的光束。 这样的光束被同步扫描以增加扫描频率。 具有不同于第一光束的特性的第二光束可以相对于第一光束异步扫描(例如降低的速度),并且可以以与上述类似的方式聚焦在光致抗蚀剂层上。 在来自层的第二光束中反射的光用于调节有源反射镜中的各个元件的特性,以便将光束保持在光致抗蚀剂层上。
    • 7. 发明申请
    • Diagnostic Imaging for Age-Related Macular Degeneration (AMD) Using Second Harmonic Generation (SHG) Techniques
    • 使用二次谐波生成(SHG)技术的年龄相关性黄斑变性(AMD)的诊断成像
    • US20120083691A1
    • 2012-04-05
    • US13278012
    • 2011-10-20
    • Josef Bille
    • Josef Bille
    • A61B6/00A61N5/06
    • A61F9/00825A61B3/1225A61B3/152A61F2009/00863A61N5/062
    • A system for treating age-related macular degeneration includes an agent with non-centro symmetric molecules_for marking a region of diseased tissue. An optical assembly focuses the laser beam to a plurality of focal points in the region of diseased tissue, each focal point having a volumetric measurement of about 2 μm×2 μm×20 μm. Due to an increased concentration of photons in the relatively small volume of each focal point, two photons interact with a single molecule of the marking agent, within a very short interval of time (e.g. 10−13 sec). The resultant excited electron state (e.g. 3 eV) is sufficient to induce the marking agent to convert oxygen in a manner that causes the oxygen to kill the diseased tissue. Also, an interaction between photons and a non-centro symmetric molecule in the marking agent will cause a Second Harmonic Generation (SHG) response that can be used for imaging purposes.
    • 用于治疗年龄相关性黄斑变性的系统包括用于标记患病组织区域的具有非中心对称分子的试剂。 光学组件将激光束聚焦到患病组织区域中的多个焦点,每个焦点具有约2μm×2μm×20μm的体积测量。 由于在每个焦点的相对较小的体积中光子的浓度增加,两个光子在非常短的时间间隔(例如10-13秒)内与标记剂的单分子相互作用。 所产生的激发的电子态(例如3eV)足以诱导标记剂以使氧气杀死患病组织的方式转化氧。 此外,光子和标记剂中的非中心对称分子之间的相互作用将导致可用于成像目的的第二谐波产生(SHG)响应。
    • 8. 发明授权
    • Closed loop control for intrastromal wavefront-guided ablation with fractionated treatment program
    • 闭环控制用于分级处理程序的基质内波前引导消融
    • US07232436B2
    • 2007-06-19
    • US11033967
    • 2005-01-12
    • Josef Bille
    • Josef Bille
    • A61B18/20
    • A61F9/008A61B3/1015A61B3/107A61B2017/00017A61B2017/00022A61F9/00829A61F2009/00848A61F2009/00872A61F2009/0088
    • A closed-loop control system for altering the optical characteristics of a patient's cornea includes an algorithm for predicting the shape of the cornea after one or more gas bubbles resulting from intrastromal photoablation have collapsed. Patient data can be used as an input for the algorithm, which is then run to prepare an initial treatment plan for a corneal alteration. The initial plan typically includes a plurality of intrastromal photoablation locations and corresponding ablation energies. After photoablation of plan location(s) and before the resulting bubbles collapse, a real-time wavefront shape for light passing through the cornea is measured. The wavefront is then used in the algorithm to predict a post bubble collapse cornea shape and to generate an updated treatment plan. The procedure then continues by ablating location(s) identified in the updated treatment plan. Wavefront measurement and plan updating can be repeated as many times as desired.
    • 用于改变患者角膜的光学特性的闭环控制系统包括用于预测由脉管内光消融引起的一个或多个气泡之后的角膜的形状的算法。 患者数据可用作算法的输入,然后运行该输入以准备角膜改变的初始治疗计划。 初始方案通常包括多个基质内光消融位置和相应的消融能量。 在计划位置的光消融之后,并且在所得气泡崩溃之前,测量通过角膜的光的实时波前形状。 然后在算法中使用波前预测后气泡折叠角膜形状并生成更新的治疗计划。 然后通过消除更新的治疗计划中确定的位置来继续该程序。 可以根据需要重复波前测量和计划更新次数。
    • 9. 发明授权
    • Closed loop control for intrastromal wavefront-guided ablation
    • 用于肿瘤内波前引导消融的闭环控制
    • US06887232B2
    • 2005-05-03
    • US10293226
    • 2002-11-13
    • Josef Bille
    • Josef Bille
    • A61F9/007A61B17/00A61F9/01A61B18/18
    • A61F9/008A61B2017/00017A61F9/00829A61F2009/00848A61F2009/00872A61F2009/0088
    • A closed-loop control system for the intrastromal photoablation of tissue includes an active mirror for individually directing the component beams of a diagnostic laser beam to a focal point on the retina of an eye. The reflected beam is analyzed to identify a distorted wavefront indicative of required corneal corrections, and an induced wavefront indicative of optical aberrations introduced by bubbles formed during tissue ablation. A comparator alters the induced wavefront with a desired wavefront to create a rectified wavefront, and a comparator compares the rectified wavefront with the distorted wavefront to create error signals. The error signals are then used to operate the active mirror and to control an ablation laser until the absence of error signals indicate the required stromal tissue has been photoablated.
    • 用于组织的内部光消融的闭环控制系统包括用于将诊断激光束的分量光束单独地引导到眼睛的视网膜上的焦点的主动镜。 分析反射光束以识别指示所需角膜校正的失真波前,以及指示由组织消融期间形成的气泡引入的光学像差的感应波前。 比较器使用期望的波阵面改变感应波前,以产生经整流的波阵面,并且比较器将经整波的波阵面与失真的波阵面进行比较,以产生误差信号。 然后,误差信号用于操作有源反射镜并控制消融激光,直到不存在误差信号表明所需的基质组织已经被光刻。
    • 10. 发明授权
    • Ophthalmic wavefront measuring devices
    • 眼科波前测量装置
    • US06827442B2
    • 2004-12-07
    • US09950916
    • 2001-09-12
    • Denwood F. RossJosef BilleMichael SchottnerFrank Mueller
    • Denwood F. RossJosef BilleMichael SchottnerFrank Mueller
    • A61B300
    • A61B3/103
    • Apparatuses and methods for improving aberration determination capabilities, providing corrective prescription verification, and allowing binocular vision correction in ophthalmic wavefront measuring devices. (1) Improved aberration determination capabilities are achieved through input beam modification which includes sensing an image in a wavefront emanating from an eye in response to an input beam with a sensor and then modifying the input beam with an adaptive optical device based on the sensed information. (2) Corrective prescription verification includes modifying an image with an adaptive optical element to produce a corrected image at the patients eye. (3) Binocular vision correction for a pair of eyes includes measuring the aberrations of one eye with a first ophthalmic wavefront measuring device and measuring the aberration produced by the other eye with a second ophthalmic wavefront measuring device substantially simultaneously.
    • 用于改善像差确定能力的装置和方法,提供校正处方验证,并允许眼科波前测量装置中的双目视觉矫正。 (1)通过输入光束修改实现改进的像差确定能力,其包括响应于具有传感器的输入光束感测从眼睛发出的波前的图像,然后基于所感测的信息,用自适应光学装置修改输入光束 。 (2)纠正处方验证包括用自适应光学元件修改图像以在患者眼睛处产生校正图像。 (3)一对眼睛的双眼视力矫正包括用第一眼科波前测量装置测量一只眼睛的像差,并且基本上同时用第二眼科波前测量装置测量由另一只眼睛产生的像差。