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1. 发明授权

US08228455B2 Exposing device, methods for forming pattern, channel, and hole by using the same, and liquid crystal display device therewith and method for fabricating the same 有权
标题翻译：曝光装置，通过使用它们形成图案，通道和孔的方法，以及液晶显示装置及其制造方法
公开(公告)号：US08228455B2
公开(公告)日：2012-07-24
申请号：US12256840
申请日：2008-10-23
申请人： Joon Young Yang , Jung Il Lee , Jeong Oh Kim , Yu Kyeong Ahn , Young Kwon Kang , Sang Jin Lee , Jung Ho Bang
发明人： Joon Young Yang , Jung Il Lee , Jeong Oh Kim , Yu Kyeong Ahn , Young Kwon Kang , Sang Jin Lee , Jung Ho Bang
IPC分类号： G02F1/136 , G02F1/13 , G03F1/00 , G03F7/00
CPC分类号： H01L27/1288 , G03F1/36 , G03F1/44 , G03F1/50 , G03F7/0005 , H01L27/1214 , H01L27/124
摘要： The present invention relates a method for forming a pattern includes the steps of forming a thin film on a substrate, coating a photoresist film on the thin film, aligning a mask over the photoresist film, the mask formed on a base material, including a light shielding portion having a linear supporting portion and an uneven portion at a boundary of the supporting portion, and a transmission portion defined at regions excluding the light shielding portion, exposing the photoresist film with the mask thereon to a UV beam of a wavelength greater than 300nm to cause refraction in the vicinity of the uneven portion, and developing the photoresist film exposed thus to form a photoresist film pattern, and patterning the thin film by using the photoresist film pattern thus formed.
摘要翻译：本发明涉及一种用于形成图案的方法，包括以下步骤：在基底上形成薄膜，在薄膜上涂覆光致抗蚀剂膜，对准光致抗蚀剂膜上的掩模，形成在基材上的掩模，包括光屏蔽部分在支撑部分的边界处具有线性支撑部分和不平坦部分，以及限定在除了遮光部分之外的区域处的透射部分，将具有掩模的光致抗蚀剂膜暴露于波长大于300nm的UV光束在不均匀部分附近引起折射，并使曝光的光致抗蚀剂膜显影以形成光致抗蚀剂图案，并且通过使用由此形成的光致抗蚀剂膜图案来图案化薄膜。

2. 发明申请

US20090109364A1 EXPOSING DEVICE, METHODS FOR FORMING PATTERN, CHANNEL, AND HOLE BY USING THE SAME, AND LIQUID CRYSTAL DISPLAY DEVICE THEREWITH AND METHOD FOR FABRICATING THE SAME 有权
标题翻译：曝光装置，通过使用它们形成图案，通道和孔的方法和液晶显示装置及其制造方法
公开(公告)号：US20090109364A1
公开(公告)日：2009-04-30
申请号：US12256840
申请日：2008-10-23
申请人： Joo Young Yang , Jung II Lee , Jeong Oh Kim , Yu Kyeong Ahn , Young Kwon Kang , Sang Jin Lee , Jung Ho Bang
发明人： Joo Young Yang , Jung II Lee , Jeong Oh Kim , Yu Kyeong Ahn , Young Kwon Kang , Sang Jin Lee , Jung Ho Bang
IPC分类号： G02F1/136 , G03F7/20 , G03F7/00 , G03B27/72 , G03F1/00
CPC分类号： H01L27/1288 , G03F1/36 , G03F1/44 , G03F1/50 , G03F7/0005 , H01L27/1214 , H01L27/124
摘要： The present invention relates to an exposing device which can form a micron pattern even with an exposing device having a low resolving power by changing a mask pattern, methods for forming a pattern, a channel, and a hole respectively, and a liquid crystal display device therewith and a method for fabricating the same. A method for forming a pattern includes the steps of forming a thin film on a substrate, coating a photoresist film on the thin film, aligning a mask over the photoresist film, the mask formed on a base material, including a light shielding portion having a linear supporting portion and an uneven portion at a boundary of the supporting portion, and a transmission portion defined at regions excluding the light shielding portion, exposing the photoresist film with the mask thereon to a UV beam of a wavelength greater than 300 nm to cause refraction in the vicinity of the uneven portion, and developing the photoresist film exposed thus to form a photoresist film pattern, and patterning the thin film by using the photoresist film pattern thus formed.
摘要翻译：本发明涉及即使通过改变掩模图案具有低分辨率的曝光装置，也可分别形成图案，通道和孔的方法，以及液晶显示装置，能够形成微米图案的曝光装置及其制造方法。形成图案的方法包括以下步骤：在基板上形成薄膜，在薄膜上涂覆光致抗蚀剂膜，在光致抗蚀剂膜上对准掩模，形成在基材上的掩模，包括具有线性支撑部分和在支撑部分的边界处的不平坦部分，以及限定在除了遮光部分之外的区域的透射部分，使其上具有掩模的光致抗蚀剂膜暴露于波长大于300nm的UV光束以引起折射在不平坦部分附近，并且使曝光的光致抗蚀剂膜显影以形成光致抗蚀剂图案，并且通过使用由此形成的光致抗蚀剂膜图案来图案化薄膜。

3. 发明授权

US08461054B2 Method of manufacturing liquid crystal display device 有权
公开(公告)号：US08461054B2
公开(公告)日：2013-06-11
申请号：US12285509
申请日：2008-10-07
申请人： Kye-Chan Song , Jeong Oh Kim , Young Kwon Kang
发明人： Kye-Chan Song , Jeong Oh Kim , Young Kwon Kang
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： G02F1/134363 , G02F2001/136231 , G02F2201/124 , G02F2201/40
摘要： A method of manufacturing a liquid crystal display device which includes pixel electrodes and common electrodes which are alternatively arranged in each pixel defined on a substrate, including the steps of: forming a conductive film on the substrate; forming a mask layer, of which etching selection ratio is different from the conductive layer, on the conductive layer; forming a photo-resist pattern of a fixed pattern on the mask layer; forming a mask pattern, which has an undercut shape to the photo-resist pattern, by etching the mask layer by use of the photo-resist pattern as an etching mask; removing the photo-resist pattern; and etching the conductive film by use of the mask pattern as an etching mask, to provide at least any one of the common electrode and the pixel electrode.

4. 发明申请

US20090104724A1 Method of manufacturing liquid crystal display device 有权
标题翻译：制造液晶显示装置的方法
公开(公告)号：US20090104724A1
公开(公告)日：2009-04-23
申请号：US12285509
申请日：2008-10-07
申请人： Kye-Chan Song , Jeong Oh Kim , Young Kwon Kang
发明人： Kye-Chan Song , Jeong Oh Kim , Young Kwon Kang
IPC分类号： G02F1/1333
CPC分类号： G02F1/134363 , G02F2001/136231 , G02F2201/124 , G02F2201/40
摘要： A method of manufacturing a liquid crystal display device which includes pixel electrodes and common electrodes which are alternatively arranged in each pixel defined on a substrate, including the steps of: forming a conductive film on the substrate; forming a mask layer, of which etching selection ratio is different from the conductive layer, on the conductive layer; forming a photo-resist pattern of a fixed pattern on the mask layer; forming a mask pattern, which has an undercut shape to the photo-resist pattern, by etching the mask layer by use of the photo-resist pattern as an etching mask; removing the photo-resist pattern; and etching the conductive film by use of the mask pattern as an etching mask, to provide at least any one of the common electrode and the pixel electrode.
摘要翻译：一种制造液晶显示装置的方法，该液晶显示装置包括在基板上限定的每个像素中交替布置的像素电极和公共电极，包括以下步骤：在基板上形成导电膜; 在导电层上形成蚀刻选择比不同于导电层的掩模层; 在掩模层上形成固定图案的光刻胶图案; 通过使用光刻胶图案作为蚀刻掩模蚀刻掩模层，形成具有底切形状的光刻胶图案的掩模图案; 去除光刻胶图案; 并且通过使用掩模图案作为蚀刻掩模蚀刻导电膜，以提供公共电极和像素电极中的至少任一个。

5. 发明申请

US20080123044A1 Method for fabricating a liquid crystal display device and an LCD device thereby 有权
标题翻译：由此制造液晶显示装置和LCD装置的方法
公开(公告)号：US20080123044A1
公开(公告)日：2008-05-29
申请号：US11812949
申请日：2007-06-22
申请人： Jae Young Oh , Young Seung Jee , Jeong Oh Kim , Soopool Kim
发明人： Jae Young Oh , Young Seung Jee , Jeong Oh Kim , Soopool Kim
IPC分类号： G02F1/13
CPC分类号： G02F1/136227 , G02F1/134363 , G02F2001/134372 , G02F2201/40
摘要： A method for fabricating a LCD having enhanced aperture ratio and brightness includes: forming a gate line, a gate electrode, a common electrode and a common line in a first mask process; depositing a gate insulating layer covering the gate line, the gate electrode and the common electrode; forming an active layer on the gate insulating layer, and an ohmic contact layer on the active layer in a second mask process; forming a data line, a source electrode, and a drain electrode facing the source electrode in a third mask process; depositing a protective layer over the data line, the source electrode and the drain electrode; forming a pixel contact hole in a fourth mask process; and forming a pixel electrode, wherein the pixel electrode is connected to the drain electrode through the pixel contact hole in a fifth mask process using a reverse tapered photo-resist pattern.
摘要翻译：一种制造具有增强的开口率和亮度的LCD的方法包括：在第一掩模处理中形成栅极线，栅电极，公共电极和公共线; 沉积覆盖栅极线，栅电极和公共电极的栅极绝缘层; 在栅极绝缘层上形成有源层，在第二掩模工艺中在有源层上形成欧姆接触层; 在第三掩模工艺中形成面对源电极的数据线，源电极和漏电极; 在数据线，源电极和漏电极上沉积保护层; 在第四掩模处理中形成像素接触孔; 以及形成像素电极，其中，在使用倒锥形光刻胶图案的第五掩模工艺中，像素电极通过像素接触孔连接到漏电极。

6. 发明申请

US20100159623A1 Method for fabricating a liquid crystal display device and an LCD device thereby 有权
公开(公告)号：US20100159623A1
公开(公告)日：2010-06-24
申请号：US12656893
申请日：2010-02-18
申请人： Jae Young Oh , Young Seung Jee , Jeong Oh Kim , Soopool Kim
发明人： Jae Young Oh , Young Seung Jee , Jeong Oh Kim , Soopool Kim
IPC分类号： H01L21/28
CPC分类号： G02F1/136227 , G02F1/134363 , G02F2001/134372 , G02F2201/40
摘要： A method for fabricating a LCD having enhanced aperture ratio and brightness includes: forming a gate line, a gate electrode, a common electrode and a common line in a first mask process; depositing a gate insulating layer covering the gate line, the gate electrode and the common electrode; forming an active layer on the gate insulating layer, and an ohmic contact layer on the active layer in a second mask process; forming a data line, a source electrode, and a drain electrode facing the source electrode in a third mask process; depositing a protective layer over the data line, the source electrode and the drain electrode; forming a pixel contact hole in a fourth mask process; and forming a pixel electrode, wherein the pixel electrode is connected to the drain electrode through the pixel contact hole in a fifth mask process using a reverse tapered photo-resist pattern.

7. 发明授权

US07494835B2 Method for manufacturing thin film transistor substrate using maskless exposing device 有权
标题翻译：使用无掩模曝光装置制造薄膜晶体管基板的方法
公开(公告)号：US07494835B2
公开(公告)日：2009-02-24
申请号：US11646482
申请日：2006-12-28
申请人： Young Seung Jee , Suhyuk Kang , Jeong Oh Kim
发明人： Young Seung Jee , Suhyuk Kang , Jeong Oh Kim
IPC分类号： H01L21/84
CPC分类号： H01L27/1288 , H01L27/1214
摘要： A method for manufacturing a thin film transistor substrate using a maskless exposing device includes forming a data metal layer on a substrate having a gate pattern and common electrodes along with gate insulation layers, active layers, and ohmic contact layers for a thin film transistors; forming a photoresist on the data metal layer; exposing a first amount of light onto the photoresist at first regions, excluding a second region where data lines and thin film transistors are to be formed, by using a maskless exposing device; exposing a second amount of light onto the photoresist at third regions, where channels of the thin film transistors are to be formed, wherein the second amount of light is smaller than the first amount of light; and developing the first, second and third regions of the photoresist.
摘要翻译：使用无掩模曝光装置制造薄膜晶体管基板的方法包括在具有栅极图案和公共电极的基板上形成数据金属层以及用于薄膜晶体管的栅极绝缘层，有源层和欧姆接触层; 在数据金属层上形成光致抗蚀剂; 通过使用无掩模曝光装置，在除了要形成数据线和薄膜晶体管的第二区域之外的第一区域将第一量的光暴露在光致抗蚀剂上; 在要形成薄膜晶体管的通道的第三区域，在光致抗蚀剂上暴露第二量的光，其中第二量的光小于第一光量; 以及显影光致抗蚀剂的第一，第二和第三区域。

8. 发明申请

US20110237149A1 METHOD FOR FABRICATING A LIQUID CRYSTAL DISPLAY DEVICE AND AN LCD DEVICE THEREBY 有权
标题翻译：制造液晶显示装置的方法及其液晶显示装置
公开(公告)号：US20110237149A1
公开(公告)日：2011-09-29
申请号：US13153996
申请日：2011-06-06
申请人： Jae Young OH , Young Seung Jee , Jeong Oh Kim , Soopool Kim
发明人： Jae Young OH , Young Seung Jee , Jeong Oh Kim , Soopool Kim
IPC分类号： H01J9/00
CPC分类号： G02F1/136227 , G02F1/134363 , G02F2001/134372 , G02F2201/40
摘要： A method for fabricating a LCD having enhanced aperture ratio and brightness includes: forming a gate line, a gate electrode, a common electrode and a common line in a first mask process; depositing a gate insulating layer covering the gate line, the gate electrode and the common electrode; forming an active layer on the gate insulating layer, and an ohmic contact layer on the active layer in a second mask process; forming a data line, a source electrode, and a drain electrode facing the source electrode in a third mask process; depositing a protective layer over the data line, the source electrode and the drain electrode; forming a pixel contact hole in a fourth mask process; and forming a pixel electrode, wherein the pixel electrode is connected to the drain electrode through the pixel contact hole in a fifth mask process using a reverse tapered photo-resist pattern.
摘要翻译：一种制造具有增强的开口率和亮度的LCD的方法包括：在第一掩模处理中形成栅极线，栅电极，公共电极和公共线; 沉积覆盖栅极线，栅电极和公共电极的栅极绝缘层; 在栅极绝缘层上形成有源层，在第二掩模工艺中在有源层上形成欧姆接触层; 在第三掩模工艺中形成面对源电极的数据线，源电极和漏电极; 在数据线，源电极和漏电极上沉积保护层; 在第四掩模处理中形成像素接触孔; 以及形成像素电极，其中，在使用倒锥形光刻胶图案的第五掩模工艺中，像素电极通过像素接触孔连接到漏电极。

9. 发明授权

US07808607B2 Liquid crystal display device and method of fabricating the same 有权
标题翻译：液晶显示装置及其制造方法
公开(公告)号：US07808607B2
公开(公告)日：2010-10-05
申请号：US12503667
申请日：2009-07-15
申请人： Joon Suk Lee , Young Seung Jee , Jeong Oh Kim
发明人： Joon Suk Lee , Young Seung Jee , Jeong Oh Kim
IPC分类号： G02F1/13
CPC分类号： G02F1/13394
摘要： A liquid crystal display device includes: a first substrate having a plurality of gate lines and a plurality of data lines crossing each other; a second substrate facing the first substrate; a first pattern spacer having an inverse tapered shape on an inner surface of the first substrate; a second pattern spacer having an inverse tapered shape on an inner surface of the second substrate; a seal pattern on a peripheral edge of the first and second substrates; and a liquid crystal layer between the first and second substrates.
摘要翻译：液晶显示装置包括：第一基板，具有多条栅极线和多条彼此交叉的数据线; 面对所述第一基板的第二基板; 在所述第一基板的内表面上具有倒锥形的第一图案间隔物; 在所述第二基板的内表面上具有倒锥形的第二图案间隔物; 密封图案在第一和第二基板的周边边缘上; 以及在第一和第二基板之间的液晶层。

10. 发明授权

US07576827B2 Liquid crystal display device and method of fabricating the same 有权
标题翻译：液晶显示装置及其制造方法
公开(公告)号：US07576827B2
公开(公告)日：2009-08-18
申请号：US11372082
申请日：2006-03-10
申请人： Joon Suk Lee , Young Seung Jee , Jeong Oh Kim
发明人： Joon Suk Lee , Young Seung Jee , Jeong Oh Kim
IPC分类号： G02F1/1339
CPC分类号： G02F1/13394
摘要： A liquid crystal display device includes: a first substrate having a plurality of gate lines and a plurality of data lines crossing each other; a second substrate facing the first substrate; a first pattern spacer having an inverse tapered shape on an inner surface of the first substrate; a second pattern spacer having an inverse tapered shape on an inner surface of the second substrate; a seal pattern on a peripheral edge of the first and second substrates; and a liquid crystal layer between the first and second substrates.
摘要翻译：液晶显示装置包括：第一基板，具有多条栅极线和多条彼此交叉的数据线; 面对所述第一基板的第二基板; 在所述第一基板的内表面上具有倒锥形的第一图案间隔物; 在所述第二基板的内表面上具有倒锥形的第二图案间隔物; 密封图案在第一和第二基板的周边边缘上; 以及在第一和第二基板之间的液晶层。

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