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    • 2. 发明授权
    • Manufacturing method of image sensor of vertical type
    • 垂直型图像传感器的制造方法
    • US07883913B2
    • 2011-02-08
    • US12638121
    • 2009-12-15
    • Jong Man Kim
    • Jong Man Kim
    • H01L21/00
    • H01L27/1469H01L27/14621H01L27/1463H01L27/14634H01L27/14636
    • A manufacturing method of an image sensor of vertical type is provided that includes: forming an insulation layer with a metal wiring and a contact plug therein on a first substrate; bonding a second substrate having an image sensing unit over the insulation layer; forming a trench in the second substrate to divide the image sensing unit for each pixel; forming a PTI by gap-filling the trench with insulating material; forming a first material layer over the PTI, the image sensing unit, and the insulation layer; and forming a second material layer over the first material layer and performing a deuterium annealing process thereon. The crystal defects of the substrate generated when performing the trench etching on the donor substrate to define unit pixels are cured by performing the deuterium annealing process, making it possible to improve the sensitivity and illumination characteristics of the image sensor of vertical type.
    • 提供垂直型图像传感器的制造方法,其包括:在第一基板上形成具有金属布线的绝缘层和接触插塞; 将具有图像感测单元的第二基板结合在所述绝缘层上; 在所述第二基板中形成沟槽,以分割每个像素的图像感测单元; 通过用绝缘材料间隙填充沟槽来形成PTI; 在PTI,图像感测单元和绝缘层上形成第一材料层; 以及在所述第一材料层上形成第二材料层并在其上进行氘退火处理。 通过执行氘退火处理来使通过施主衬底进行沟槽蚀刻而形成单位像素而产生的衬底的晶体缺陷被固化,从而可以提高垂直型图像传感器的灵敏度和照明特性。
    • 5. 发明授权
    • Image sensor and method for manufacturing the same
    • 图像传感器及其制造方法
    • US07875917B2
    • 2011-01-25
    • US12326797
    • 2008-12-02
    • Jong Man Kim
    • Jong Man Kim
    • H01L31/062
    • H01L27/14636
    • An image sensor and a method for manufacturing the same are provided. In the image sensor, a semiconductor substrate has a pixel region and a peripheral region defined by a first device isolation layer. First and second photodiode patterns are formed on the pixel region and are connected to lower metal lines to first and second readout circuitries. The first photodiode pattern performs as an active photodiode and the second photodiode pattern functions as a dummy pixel. The dummy pixel can measure leakage current.
    • 提供了图像传感器及其制造方法。 在图像传感器中,半导体衬底具有由第一器件隔离层限定的像素区域和外围区域。 第一和第二光电二极管图案形成在像素区域上并且连接到下金属线到第一和第二读出电路。 第一光电二极管图案作为有源光电二极管执行,第二光电二极管图案用作虚拟像素。 虚拟像素可以测量泄漏电流。
    • 6. 发明申请
    • MICROLENS MASK OF IMAGE SENSOR AND METHOD FOR FORMING MICROLENS USING THE SAME
    • 图像传感器的MICROLENS掩模和使用其的形成微孔的方法
    • US20100159696A1
    • 2010-06-24
    • US12644702
    • 2009-12-22
    • Jong Man Kim
    • Jong Man Kim
    • H01L21/3205G03F1/00
    • G03F7/0005G02B3/0018G02B3/0056
    • Provided are a microlens mask of an image sensor and a method for forming a microlens using the same. In the method, an insulating layer is formed on a semiconductor substrate comprising a photodiode and a transistor. A passivation layer is formed on the insulating layer. A color filter layer is formed on the insulating layer vertically corresponding to the photodiode through the passivation layer. A microlens photoresist layer is formed over an entire surface of the semiconductor substrate. A microlens mask is formed on the microlens photoresist corresponding to the color filter layer. A one-time exposure process is performed at a light intensity of about 450/0 to about 550/0 dose/focus. The microlens photoresist layer is patterned to form a patterned microlens photoresist layer by removing the photoresist subjected to the exposure process. The patterned microlens photoresist layer is reflowed to form the microlens.
    • 提供了图像传感器的微透镜掩模和使用其的微透镜的形成方法。 在该方法中,在包括光电二极管和晶体管的半导体衬底上形成绝缘层。 在绝缘层上形成钝化层。 通过钝化层在与光电二极管垂直相对的绝缘层上形成滤色器层。 在半导体衬底的整个表面上形成微透镜光致抗蚀剂层。 在对应于滤色器层的微透镜光致抗蚀剂上形成微透镜掩模。 在约450/0至约550/0剂量/焦点的光强度下进行一次曝光过程。 图案化微透镜光致抗蚀剂层以通过去除经受曝光处理的光致抗蚀剂层来形成图案化的微透镜光致抗蚀剂层。 图案化的微透镜光致抗蚀剂层被回流以形成微透镜。
    • 10. 发明授权
    • Image sensor and manufacturing method of image sensor
    • 图像传感器和图像传感器的制造方法
    • US08080840B2
    • 2011-12-20
    • US12563276
    • 2009-09-21
    • Jong Man Kim
    • Jong Man Kim
    • H01L31/03
    • H01L27/14665H01L27/14634
    • Disclosed are an image sensor and a method for manufacturing the same. The image sensor can include a readout circuitry on a first substrate; an interlayer dielectric layer including at least one metal and contact plug electrically connected to the readout circuitry; and an image sensing device formed on a second substrate, bonded to the interlayer dielectric layer, and provided with a first conductive type conduction layer and a second conductive type conduction layer. An uppermost contact plug in the interlayer dielectric layer has a wall structure extending from an uppermost metal in the interlayer dielectric layer. The top surface of the uppermost contact plug makes contact with the image sensing device and is connected to an image sensing device and an uppermost metal of an adjacent pixel.
    • 公开了一种图像传感器及其制造方法。 图像传感器可以包括在第一基板上的读出电路; 层间电介质层,包括电连接到所述读出电路的至少一个金属和接触插塞; 以及形成在第二基板上的图像感测装置,其接合到所述层间电介质层,并且设置有第一导电类型导电层和第二导电类型导电层。 层间电介质层中的最上面的接触插塞具有从层间介质层中的最上面的金属延伸的壁结构。 最上面的接触插塞的顶表面与图像感测装置接触并且连接到图像感测装置和相邻像素的最上面的金属。