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    • 3. 发明授权
    • Apparatus for forming thin film using microwave and method therefor
    • 使用微波形成薄膜的设备及其方法
    • US06384390B1
    • 2002-05-07
    • US09663418
    • 2000-09-15
    • Sun-tae JungDong-wook ShinHyoun-soo Kim
    • Sun-tae JungDong-wook ShinHyoun-soo Kim
    • H05B664
    • H01L21/67248C23C16/453C23C16/56H01L21/02164H01L21/02271H01L21/02345H01L21/02356H01L21/316H01L21/31612H01L21/67115
    • An apparatus for forming a thin film using microwave and a method therefor are provided. The apparatus for forming a thin film on a wafer by densifying predetermined soot on a wafer, when the wafer and the soot form a sample, includes a microwave sintering furnace for sealing the sample and exposing the sample to microwave, thus sintering the sample, a sintering furnace atmosphere maker for controlling the state, being the atmosphere of air inside the microwave sintering furnace, a temperature sensor/controller for sensing a temperature inside the microwave sintering furnace, comparing the temperature with a predetermined reference temperature, and outputting an error temperature, and a microwave power source for generating microwave of a predetermined temperature with reference to the error temperature output from the temperature sensor/controller and applying the microwave to the microwave sintering furnace. It is possible to rapidly form a film of a fine and uniform structure by densification using microwave.
    • 提供一种使用微波形成薄膜的装置及其方法。 当晶片和烟灰形成样品时,通过致密化晶片上的预定烟灰来在晶片上形成薄膜的装置包括用于密封样品并将样品暴露于微波的微波烧结炉,从而烧结样品, 用于控制状态的烧结炉气氛制造商,微波烧结炉内的空气气氛,用于感测微波烧结炉内的温度的温度传感器/控制器,将温度与预定的参考温度进行比较,并输出误差温度, 以及微波电源,用于根据从温度传感器/控制器输出的误差温度产生预定温度的微波,并将微波施加到微波烧结炉。 可以通过使用微波的致密化快速形成精细且均匀结构的膜。
    • 4. 发明授权
    • Apparatus for manufacturing silica film
    • 二氧化硅膜制造装置
    • US06280525B1
    • 2001-08-28
    • US09104984
    • 1998-06-26
    • Dong-wook ShinSun-tae Jung
    • Dong-wook ShinSun-tae Jung
    • C23C1600
    • C23C16/56C23C16/402C23C16/453
    • An apparatus for manufacturing a silica film is provided. The apparatus includes a conveyor including a mounting unit where a plurality of wafers are loaded. The conveyor is used for moving and transferring the mounting wafers. The apparatus also includes a deposition part for generating flames to deposit silica soot on the plurality of wafers, the deposition part being located above the conveyor, and a calcination part, adjacent to the deposition part, removing water from the silica soot, and a sintering part, adjacent to the calcination part, for deifying the calcined silica soot to form a silica film. The process of manufacturing the silica film can be continuously performed, enhancing productivity.
    • 提供一种二氧化硅膜的制造装置。 该装置包括一个输送机,该输送机包括多个晶片被装载的安装单元。 输送机用于移动和转移安装晶片。 该设备还包括用于产生火焰以沉积在多个晶片上的二氧化硅烟灰的沉积部分,沉积部分位于输送机上方,以及与沉积部分相邻的煅烧部分,从二氧化硅烟灰中除去水,以及烧结 部分,与煅烧部分相邻,用于使煅烧的二氧化硅烟灰脱气以形成二氧化硅膜。 可以连续地进行二氧化硅膜的制造工序,提高生产率。