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    • 4. 发明申请
    • LED Including Photonic Crystal Structure
    • 包括光子晶体结构的LED
    • US20080070334A1
    • 2008-03-20
    • US11868854
    • 2007-10-08
    • Michael KramesMihail SigalasJonathan Wierer
    • Michael KramesMihail SigalasJonathan Wierer
    • H01L21/00
    • H01L33/20H01L33/08H01L2224/48091H01L2933/0083Y10S438/943H01L2924/00014
    • A photonic crystal light emitting diode (“PXLED”) is provided. The PXLED includes a periodic structure, such as a lattice of holes, formed in the semiconductor layers of an LED. The parameters of the periodic structure are such that the energy of the photons, emitted by the PXLED, lies close to a band edge of the band structure of the periodic structure. Metal electrode layers have a strong influence on the efficiency of the PXLEDs. Also, PXLEDs formed from GaN have a low surface recombination velocity and hence a high efficiency. The PXLEDs are formed with novel fabrication techniques, such as the epitaxial lateral overgrowth technique over a patterned masking layer, yielding semiconductor layers with low defect density. Inverting the PXLED to expose the pattern of the masking layer or using the Talbot effect to create an aligned second patterned masking layer allows the formation of PXLEDs with low defect density.
    • 提供了一种光子晶体发光二极管(“PXLED”)。 PXLED包括在LED的半导体层中形成的诸如孔格的周期性结构。 周期性结构的参数使得由PXLED发射的光子的能量靠近周期性结构的带结构的带边。 金属电极层对PXLED的效率有很大的影响。 此外,由GaN形成的PXLED具有低表面复合速度,因此具有高效率。 PXLED由新颖的制造技术形成,例如在图案化掩模层上的外延横向过度生长技术,产生具有低缺陷密度的半导体层。 将PXLED反转以露出掩模层的图案或使用Talbot效应创建对准的第二图案化掩模层允许形成具有低缺陷密度的PXLED。