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1. 发明授权

US07538564B2 Methods and apparatus for utilizing an optical reference 有权
标题翻译：用于使用光学参考的方法和装置
公开(公告)号：US07538564B2
公开(公告)日：2009-05-26
申请号：US11582829
申请日：2006-10-18
申请人： Jonathan S. Ehrmann , Patrick S. Duffy , Markus M. Weber , Gregg A. Metzger , Joseph V. Lento , Pierre-Yves Mabboux , Jens Zink , Yun Fee Chu
发明人： Jonathan S. Ehrmann , Patrick S. Duffy , Markus M. Weber , Gregg A. Metzger , Joseph V. Lento , Pierre-Yves Mabboux , Jens Zink , Yun Fee Chu
IPC分类号： G01R31/302 , G01R31/28
CPC分类号： G01R31/2891 , B23K26/032 , B23K26/042 , B23K26/0861 , B23K26/351 , B23K26/705
摘要： A laser processing system implements a method for aligning a probe element (e.g., a probe pin) with a device interface element (e.g., a contact pad of a circuit substrate). First, the laser processing system generates an optical reference beam at one or more predetermined positions to calibrate a reference field. The laser processing system then detects a position of the probe element in the reference field. The laser processing system also determines a relative position of the device interface element in the reference field. Based on the position of the probe element and the device interface element, the laser processing system then initiates alignment of the probe element and the device interface element. In one application, alignment of the probe element and the device interface element further includes contacting the probe element to the device interface element to make an electrical connection.
摘要翻译：激光处理系统实现将探针元件（例如，探针）与装置接口元件（例如，电路基板的接触焊盘）对准的方法。首先，激光处理系统在一个或多个预定位置处产生光学参考光束，以校准参考场。激光处理系统然后在参考场中检测探针元件的位置。激光处理系统还确定设备接口元件在参考场中的相对位置。基于探针元件和器件接口元件的位置，激光加工系统然后启动探针元件和器件接口元件的对准。在一个应用中，探针元件和器件接口元件的对准还包括将探针元件接触到器件接口元件以进行电连接。

2. 发明授权

US07903336B2 Optical metrological scale and laser-based manufacturing method therefor 有权
标题翻译：光学计量尺度和激光制造方法
公开(公告)号：US07903336B2
公开(公告)日：2011-03-08
申请号：US11546024
申请日：2006-10-11
申请人： Kurt Pelsue , Stuart A. Dodson, II , Bradley L. Hunter , Donald V. Smart , Pierre-Yves Mabboux , Jonathan S. Ehrmann
发明人： Kurt Pelsue , Stuart A. Dodson, II , Bradley L. Hunter , Donald V. Smart , Pierre-Yves Mabboux , Jonathan S. Ehrmann
IPC分类号： G02B27/44 , G02F1/295 , H03M1/22 , G01B11/02
CPC分类号： B41M5/24 , B23K26/364 , G01D5/34707
摘要： A reflective metrological scale has a metal tape substrate and a scale pattern of elongated side-by-side marks surrounded by reflective surface areas of the substrate. Each mark has a furrowed cross section and may have a depth in the range of 0.5 to 2 microns. The central region of each mark may be rippled and darkened to provide an enhanced optical reflection ratio with respect to surrounding surface areas. A manufacturing method includes the repeated steps of (1) creating a scale mark by irradiating the substrate surface at a mark location with overlapped pulses from a laser, each pulse having an energy density of less than about 1 joule per cm2, and (2) changing the relative position of the laser and the substrate by a displacement amount defining a next mark location on the substrate at which a next mark of the scale is to be created.
摘要翻译：反射计量标尺具有金属带基板和由基板的反射表面区域包围的细长的并排标记的刻度图案。每个标记具有沟槽的横截面并且可以具有在0.5至2微米范围内的深度。每个标记的中心区域可能波纹和变暗，以提供相对于周围表面区域的增强的光反射率。一种制造方法包括以下重复步骤：（1）通过在来自激光器的重叠脉冲的标记位置处照射基板表面来产生刻度标记，每个脉冲具有小于约1焦耳/ cm 2的能量密度，以及（2）改变激光器和衬底的相对位置一个位移量，该位移量限定了要在其上产生刻度的下一个标记的衬底上的下一个标记位置。

3. 发明申请

US20070096763A1 Methods and apparatus for utilizing an optical reference 有权
标题翻译：用于使用光学参考的方法和装置
公开(公告)号：US20070096763A1
公开(公告)日：2007-05-03
申请号：US11582829
申请日：2006-10-18
申请人： Jonathan Ehrmann , Patrick Duffy , Markus Weber , Gregg Metzger , Joseph Lento , Pierre-Yves Mabboux , Jens Zink , Yun Chu
发明人： Jonathan Ehrmann , Patrick Duffy , Markus Weber , Gregg Metzger , Joseph Lento , Pierre-Yves Mabboux , Jens Zink , Yun Chu
IPC分类号： G01R31/26
CPC分类号： G01R31/2891 , B23K26/032 , B23K26/042 , B23K26/0861 , B23K26/351 , B23K26/705
摘要： A laser processing system implements a method for aligning a probe element (e.g., a probe pin) with a device interface element (e.g., a contact pad of a circuit substrate). First, the laser processing system generates an optical reference beam at one or more predetermined positions to calibrate a reference field. The laser processing system then detects a position of the probe element in the reference field. The laser processing system also determines a relative position of the device interface element in the reference field. Based on the position of the probe element and the device interface element, the laser processing system then initiates alignment of the probe element and the device interface element. In one application, alignment of the probe element and the device interface element further includes contacting the probe element to the device interface element to make an electrical connection.
摘要翻译：激光处理系统实现将探针元件（例如，探针）与装置接口元件（例如，电路基板的接触焊盘）对准的方法。首先，激光处理系统在一个或多个预定位置处产生光学参考光束，以校准参考场。激光处理系统然后在参考场中检测探针元件的位置。激光处理系统还确定设备接口元件在参考场中的相对位置。基于探针元件和器件接口元件的位置，激光加工系统然后启动探针元件和器件接口元件的对准。在一个应用中，探针元件和器件接口元件的对准还包括将探针元件接触到器件接口元件以进行电连接。

4. 发明申请

US20070240325A1 Optical metrological scale and laser-based manufacturing method therefor 有权
标题翻译：光学计量尺度和激光制造方法
公开(公告)号：US20070240325A1
公开(公告)日：2007-10-18
申请号：US11546024
申请日：2006-10-11
申请人： Kurt Pelsue , Stuart Dodson , Bradley Hunter , Donald Smart , Pierre-Yves Mabboux , Jonathan Ehrmann
发明人： Kurt Pelsue , Stuart Dodson , Bradley Hunter , Donald Smart , Pierre-Yves Mabboux , Jonathan Ehrmann
IPC分类号： B23K26/00 , A45B3/08
CPC分类号： B41M5/24 , B23K26/364 , G01D5/34707
摘要： A reflective metrological scale has a scale pattern of elongated side-by-side marks surrounded by reflective surface areas of a substrate, which may be a nickel-based metal alloy such as Invar® or Inconel® and may be a thin and elongated flexible tape. Each mark has a furrowed cross section and may have a depth in the range of 0.5 to 2 microns. The central region of each mark may be rippled or ridged and may be darkened to provide an enhanced optical reflection ratio with respect to surrounding reflective surface areas. A manufacturing method includes the repeated steps of (1) creating a scale mark by irradiating a surface of the substrate at a mark location with a series of overlapped pulses from a laser, each pulse having an energy density of less than about 1 joule per cm2, and (2) changing the relative position of the laser and the substrate by a displacement amount defining a next mark location on the substrate at which a next mark of the scale is to be created.
摘要翻译：反射计量尺度具有由基底的反射表面区域包围的细长的并排标记的刻度图形，其可以是诸如Invar或Inconel的镍基金属合金，并且可以是薄的和细长的柔性胶带。每个标记具有沟槽的横截面并且可以具有在0.5至2微米范围内的深度。每个标记的中心区域可以是波纹或脊状的，并且可以变暗，以提供相对于周围的反射表面区域的增强的光反射率。一种制造方法包括以下重复步骤：（1）通过在来自激光的一系列重叠脉冲的标记位置处照射基板的表面来产生刻度标记，每个脉冲的能量密度小于约1焦耳/厘米＆lt; SUP＆gt; 2＆gt;和（2）通过在衬底上限定下一标记位置的位移量来改变激光和衬底的相对位置，在该衬底上将要生成刻度的下一个标记。

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