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1. 发明授权

US6149365A Support frame for substrates 有权
公开(公告)号：US6149365A
公开(公告)日：2000-11-21
申请号：US399900
申请日：1999-09-21
申请人： John M. White , Larry Chang , Emanuel Beer
发明人： John M. White , Larry Chang , Emanuel Beer
IPC分类号： C23C16/44 , C23C16/458 , C30B25/12 , C30B31/14 , F27D5/00 , H01L21/205 , H01L21/68 , H01L21/683
CPC分类号： C30B31/14 , C23C16/4583 , C30B25/12 , F27D5/00
摘要： The present invention generally provides a system and method for supporting a substrate having a support frame that minimizes deflection encountered during thermal expansion in a processing chamber. In one embodiment, the support frame comprises one or more longitudinal members coupled to one or more transverse members. The transverse members preferably define a supporting surface on which a heated susceptor is mounted. The longitudinal member is preferably disposed below the heated susceptor, thus minimizing thermal expansion of the longitudinal member. Spacers made of thermally conductive material may be disposed at appropriate locations along the members to provide more uniform distribution of heat within the members.

2. 发明授权

US06371712B1 Support frame for substrates 失效
标题翻译：基板支撑架
公开(公告)号：US06371712B1
公开(公告)日：2002-04-16
申请号：US09693613
申请日：2000-10-20
申请人： John M. White , Larry Chang , Emanuel Beer
发明人： John M. White , Larry Chang , Emanuel Beer
IPC分类号： F27D500
CPC分类号： C30B31/14 , C23C16/4583 , C30B25/12 , F27D5/00
摘要： The present invention generally provides a system and method for supporting a substrate having a support frame that minimizes deflection encountered during thermal expansion in a processing chamber. In one embodiment, the support frame comprises one or more longitudinal members coupled to one or more transverse members. The transverse members preferably define a supporting surface on which a heated susceptor is mounted. The longitudinal member is preferably disposed below the heated susceptor, thus minimizing thermal expansion of the longitudinal member. Spacers made of thermally conductive material may be disposed at appropriate locations along the members to provide more uniform distribution of heat within the members.
摘要翻译：本发明通常提供一种用于支撑具有支撑框架的基板的系统和方法，该支撑框架最小化在处理室中热膨胀期间遇到的挠曲。在一个实施例中，支撑框架包括联接到一个或多个横向构件的一个或多个纵向构件。横向构件优选地限定了其上安装有加热的基座的支撑表面。纵向构件优选地设置在加热的基座下方，从而最小化纵向构件的热膨胀。由导热材料制成的隔板可以沿着构件设置在适当的位置，以在构件内提供更均匀的热分布。

3. 发明申请

US20090122099A1 METHODS AND SYSTEMS FOR CALIBRATION OF INKJET DROP POSITIONING 审中-公开
标题翻译：用于校准喷墨定位的方法和系统
公开(公告)号：US20090122099A1
公开(公告)日：2009-05-14
申请号：US12354759
申请日：2009-01-15
申请人： John M. White , Emanuel Beer , Hongbin Ji , Chang-Tsung Lin , Shinichi Kurita
发明人： John M. White , Emanuel Beer , Hongbin Ji , Chang-Tsung Lin , Shinichi Kurita
IPC分类号： B41J29/393
CPC分类号： B41J29/393
摘要： Methods and apparatus for inkjet drop positioning are provided. A first method includes determining an intended deposition location of an ink drop on a substrate, depositing the ink drop on the substrate using an inkjet printing system, detecting a deposited location of the deposited ink drop on the substrate, comparing the deposited location to the intended location, determining a difference between the deposited location and the intended location, and compensating for the difference between the deposited location and the intended location by adjusting a parameter of an inkjet printing system. Numerous other aspects are provided.
摘要翻译：提供了用于喷墨滴定位的方法和装置。第一种方法包括确定墨滴在基底上的预期沉积位置，使用喷墨印刷系统将墨滴沉积在基底上，检测沉积的墨滴在基底上的沉积位置，将沉积位置与预期的位置进行比较确定存放位置与预期位置之间的差异，以及通过调整喷墨打印系统的参数来补偿存放位置与预期位置之间的差异。提供了许多其他方面。

4. 发明授权

US06847730B1 Automated substrate processing system 失效
标题翻译：自动基板处理系统
公开(公告)号：US06847730B1
公开(公告)日：2005-01-25
申请号：US09677530
申请日：2000-10-02
申请人： Emanuel Beer , John M. White
发明人： Emanuel Beer , John M. White
IPC分类号： B25J9/16 , B65G49/06 , H01L21/02 , H01L21/677 , H01L21/68 , G06K9/00
CPC分类号： H01L21/681 , G05B2219/37555 , G05B2219/37575 , G05B2219/37576 , G05B2219/40622 , G05B2219/45031
摘要： A substrate handling apparatus includes a transfer arm having a substrate support. The apparatus includes at least one image acquisition sensor configured to acquire images of a substrate supported by the substrate support. In addition, the apparatus includes a controller coupled to the image acquisition sensor and configured to control the image acquisition sensor to acquire at least one image of the substrate supported on the substrate support. The controller is further configured to receive the images acquired by the image acquisition sensor and to determine an initial position of the substrate based on the acquired images. The controller is further coupled to the substrate support to control movement thereof to move the substrate to a new position based on the substrate's initial position. The apparatus also can be used to determine a substrate identification and to detect certain substrate defects either before or after processing the substrate in a thermal processing chamber. A method of positioning a substrate on a transfer arm also is disclosed.
摘要翻译：基板处理装置包括具有基板支撑件的输送臂。该装置包括至少一个图像采集传感器，被配置为获取由基板支撑件支撑的基板的图像。另外，该装置包括耦合到图像采集传感器并被配置为控制图像采集传感器以获取支撑在基板支撑件上的基板的至少一个图像的控制器。控制器还被配置为接收由图像采集传感器获取的图像，并且基于所获取的图像来确定基板的初始位置。控制器还耦合到衬底支撑件以控制其移动，以基于衬底的初始位置将衬底移动到新的位置。该装置还可以用于确定衬底识别并且在热处理室中处理衬底之前或之后检测某些衬底缺陷。公开了一种将衬底定位在转移臂上的方法。

5. 发明授权

US06215897B1 Automated substrate processing system 失效
标题翻译：一种自动化的基板处理系统
公开(公告)号：US06215897B1
公开(公告)日：2001-04-10
申请号：US09082413
申请日：1998-05-20
申请人： Emanuel Beer , John M. White
发明人： Emanuel Beer , John M. White
IPC分类号： G06K900
CPC分类号： H01L21/681 , G05B2219/37555 , G05B2219/37575 , G05B2219/37576 , G05B2219/40622 , G05B2219/45031
摘要： A substrate handling apparatus includes a transfer arm having a substrate support. The apparatus includes at least one image acquisition sensor configured to acquire images of a substrate supported by the substrate support. In addition, the apparatus includes a controller coupled to the image acquisition sensor and configured to control the image acquisition sensor to acquire at least one image of the substrate supported on the substrate support. The controller is further configured to receive the images acquired by the image acquisition sensor and to determine an initial position of the substrate based on the acquired images. The controller is further coupled to the substrate support to control movement thereof to move the substrate to a new position based on the substrate's initial position. The apparatus also can be used to determine a substrate identification and to detect certain substrate defects either before or after processing the substrate in a thermal processing chamber. A method of positioning a substrate on a transfer arm also is disclosed.
摘要翻译：基板处理装置包括具有基板支撑件的输送臂。该装置包括至少一个图像采集传感器，被配置为获取由基板支撑件支撑的基板的图像。另外，该装置包括耦合到图像采集传感器并被配置为控制图像采集传感器以获取支撑在基板支撑件上的基板的至少一个图像的控制器。控制器还被配置为接收由图像采集传感器获取的图像，并且基于所获取的图像来确定基板的初始位置。控制器还耦合到衬底支撑件以控制其移动，以基于衬底的初始位置将衬底移动到新的位置。该装置还可以用于确定衬底识别并且在热处理室中处理衬底之前或之后检测某些衬底缺陷。公开了一种将衬底定位在转移臂上的方法。

6. 发明申请

US20080291228A1 METHODS AND APPARATUS FOR INKJET PRINTING WITH MULTIPLE ROWS OF PRINT HEADS 审中-公开
标题翻译：用于打印头多个打印头的方法和装置
公开(公告)号：US20080291228A1
公开(公告)日：2008-11-27
申请号：US11751231
申请日：2007-05-21
申请人： JOHN M. WHITE , Fan-Cheung Sze , Quanyuan Shang , Shinichi Kurita , Hongbin Ji , Janusz Jozwiak , Inchen Huang , Emanuel Beer
发明人： JOHN M. WHITE , Fan-Cheung Sze , Quanyuan Shang , Shinichi Kurita , Hongbin Ji , Janusz Jozwiak , Inchen Huang , Emanuel Beer
IPC分类号： B41J29/38 , B41J2/145
CPC分类号： B41J2/145 , B41J2/515 , B41J25/003 , B41J2202/09 , H01L51/0005
摘要： According to the present invention, multiple rows of nozzles within a print head may be arranged proximal to and offset from each other to facilitate inkjet printing. Print heads may comprise a single row of nozzles or may comprise a plurality of rows of nozzles. Each row of nozzles may be situated such that the immediately adjacent row of nozzles may be offset by a predetermined distance. In some embodiments, adjacent rows of nozzles may each print with the same color. In this way, adjacent offset rows of nozzles may be used in combination to dispense ink drops into sub-pixel wells in improved patterns and with improved ink distribution within the sub-pixel well. These offset print techniques may also enable tighter grouping of ink drops within a sub-pixel well and enable faster printing operations.
摘要翻译：根据本发明，打印头内的多排喷嘴可以布置成彼此靠近并且彼此偏离，以便于喷墨打印。打印头可以包括单排喷嘴，或者可以包括多排喷嘴。每排喷嘴可以被定位成使得紧邻的喷嘴排可以偏移预定距离。在一些实施例中，相邻排的喷嘴可以以相同的颜色打印。以这种方式，相邻的喷嘴排可以组合使用，以将墨滴以改进的图案分配到子像素阱中，并且改进子像素阱内的油墨分布。这些偏移打印技术还可以使得子像素内的墨滴更紧密地分组并且能够实现更快的打印操作。

7. 发明授权

US07847566B2 Configurable prober for TFT LCD array test 有权
标题翻译：可配置探针用于TFT LCD阵列测试
公开(公告)号：US07847566B2
公开(公告)日：2010-12-07
申请号：US11940432
申请日：2007-11-15
申请人： Matthias Brunner , Shinichi Kurita , Ralf Schmid , Fayez (Frank) E. Abboud , Benjamin Johnston , Paul Bocian , Emanuel Beer
发明人： Matthias Brunner , Shinichi Kurita , Ralf Schmid , Fayez (Frank) E. Abboud , Benjamin Johnston , Paul Bocian , Emanuel Beer
IPC分类号： G01R31/26
CPC分类号： G09G3/006 , G01R31/2893 , G01R31/305
摘要： A method of testing electronic devices on substrates is described. The method includes placing a configurable prober over a first substrate, testing the first substrate, re-configuring the configurable prober, placing the configurable prober over a second substrate, and testing the second substrate.
摘要翻译：描述了一种在基板上测试电子器件的方法。该方法包括将可配置的探测器放置在第一衬底上，测试第一衬底，重新配置可配置的探测器，将可配置的探测器放置在第二衬底上，以及测试第二衬底。

8. 发明申请

US20090090883A1 CHAMBER ISOLATION VALVE RF GROUNDING 有权
标题翻译：室隔离阀射频接地
公开(公告)号：US20090090883A1
公开(公告)日：2009-04-09
申请号：US12333043
申请日：2008-12-11
申请人： Ke Ling Lee , Shinichi Kurita , Emanuel Beer
发明人： Ke Ling Lee , Shinichi Kurita , Emanuel Beer
IPC分类号： F16K25/00
CPC分类号： F16K3/0227 , F16K51/02 , H01J37/32844 , H01J2237/166 , H01L21/67126 , Y02C20/30 , Y02P70/605 , Y10S277/919 , Y10S277/92 , Y10T137/8242
摘要： Embodiments described herein provide a method and apparatus for grounding a chamber isolation valve. In one embodiment, a grounded chamber isolation valve for a plasma processing system is described. The chamber isolation valve includes a door and a bracing member movably attached to and opposing the door, and at least one electrically conductive member in electrical communication with the door, the at least one electrically conductive member comprising one or more reaction bumpers disposed on the bracing member that are adapted to contact at least one grounded component of the plasma processing system when the door is in the closed position.
摘要翻译：本文描述的实施例提供了用于使腔室隔离阀接地的方法和装置。在一个实施例中，描述了用于等离子体处理系统的接地室隔离阀。室隔离阀包括门和可移动地附接到门并与其相对的支撑构件，以及至少一个与门电连通的导电构件，所述至少一个导电构件包括设置在支撑上的一个或多个反应缓冲器当门处于关闭位置时，适于接触等离子体处理系统的至少一个接地部件的构件。

9. 发明授权

US07330021B2 Integrated substrate transfer module 有权
标题翻译：集成基板传输模块
公开(公告)号：US07330021B2
公开(公告)日：2008-02-12
申请号：US11018236
申请日：2004-12-21
申请人： Shinichi Kurita , Emanuel Beer , Hung T. Nguyen , Benjamin Johnston , Fayez E. Abboud
发明人： Shinichi Kurita , Emanuel Beer , Hung T. Nguyen , Benjamin Johnston , Fayez E. Abboud
IPC分类号： G01R13/04
CPC分类号： G09G3/006 , G01R31/2893 , G01R31/305
摘要： A substrate table and method for supporting and transferring a substrate are provided. The substrate table includes a segmented stage having an upper surface for supporting a substrate, and an end effector. The end effector includes two or more spaced apart fingers and an upper surface for supporting a substrate. The end effector is at least partially disposed and moveable within the segmented stage such that the fingers of the end effector and the segmented stage interdigitate to occupy the same horizontal plane. The segmented stage is adapted to raise and lower about the end effector.
摘要翻译：提供了用于支撑和转移衬底的衬底台和方法。衬底台包括具有用于支撑衬底的上表面的分段段和端部执行器。末端执行器包括两个或更多间隔开的指状物和用于支撑基底的上表面。末端执行器至少部分地设置并在分段台内移动，使得末端执行器和分段台阶的指状物相互指向以占据相同的水平面。分段段适于围绕末端执行器升高和降低。

10. 发明申请

US20060005771A1 Apparatus and method of shaping profiles of large-area PECVD electrodes 审中-公开
标题翻译：大面积PECVD电极成形轮廓的装置和方法
公开(公告)号：US20060005771A1
公开(公告)日：2006-01-12
申请号：US11143506
申请日：2005-06-02
申请人： John White , Emanuel Beer , Wei Chang , Robin Tiner , Soo Choi
发明人： John White , Emanuel Beer , Wei Chang , Robin Tiner , Soo Choi
IPC分类号： C23C16/00 , C23F1/00
CPC分类号： C23C16/4583 , H01J37/3244 , H01J2237/3325
摘要： An apparatus and method for shaping profiles of a large-area PECVD electrode is provided. A plasma-enhanced CVD chamber for processing a large-area substrate is first provided. The chamber includes a lower electrode that supports a large area substrate. The lower electrode is shaped to selectively conform the supported substrate in a selected orientation under operating conditions. The orientation may be either planar or nonplanar. The substrate complies with the shape of the electrode so the substrate is substantially parallel to an upper electrode in the chamber, and/or to a gas diffusion plate in the chamber. The lower electrode comprises a substrate support fabricated from a material of insufficient strength to support itself at operating temperatures and pressure in the chamber. The shape of the substrate support is adjusted by modifying the dimensions and/or planarity of a supporting base structure, and/or by appropriately varying the thickness of the substrate support.
摘要翻译：提供了一种用于形成大面积PECVD电极的轮廓的装置和方法。首先提供用于处理大面积基板的等离子体增强CVD室。该室包括支撑大面积基板的下电极。下电极被成形为在操作条件下以选定的方向选择性地使受支撑的衬底符合。取向可以是平面或非平面的。基板符合电极的形状，因此基板基本上平行于腔室中的上部电极，和/或腔室中的气体扩散板。下电极包括由强度不足的材料制成的衬底支撑件，以在腔室中的操作温度和压力下自身支撑。通过改变支撑基底结构的尺寸和/或平面度和/或通过适当地改变基底支撑件的厚度来调节基底支撑件的形状。

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