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    • 4. 发明申请
    • PIXEL SENSOR CELL FOR COLLECTING ELECTRONS AND HOLES
    • 用于收集电子和孔的像素传感器单元
    • US20070029581A1
    • 2007-02-08
    • US11161535
    • 2005-08-08
    • James AdkissonAndres BryantJohn Ellis-MonaghanMark JaffeJeffrey JohnsonAlain Loiseau
    • James AdkissonAndres BryantJohn Ellis-MonaghanMark JaffeJeffrey JohnsonAlain Loiseau
    • H01L27/148
    • H01L27/14603H01L27/14609H01L27/14689H01L31/035281
    • The present invention is a pixel sensor cell and method of making the same. The pixel sensor cell approximately doubles the available signal for a given quanta of light. The device of the present invention utilizes the holes produced by impinging photons in a pixel sensor cell circuit. A pixel sensor cell having reduced complexity includes an n-type collection well region formed beneath a surface of a substrate for collecting electrons generated by electromagnetic radiation impinging on the pixel sensor cell and a p-type collection well region formed beneath the surface of the substrate for collecting holes generated by the impinging photons. A circuit structure having a first input is coupled to the n-type collection well region and a second input is coupled to the p-type collection well region, wherein an output signal of the pixel sensor cell is the magnitude of the difference of a signal of the first input and a signal of the second input.
    • 本发明是像素传感器单元及其制造方法。 像素传感器单元对于给定的光量大约使可用信号加倍。 本发明的器件利用通过在像素传感器单元电路中照射光子而产生的空穴。 具有降低的复杂度的像素传感器单元包括形成在基板的表面下面的n型收集阱区域,用于收集由电子辐射照射在像素传感器单元上​​产生的电子以及形成在基板表面下方的p型收集阱区域 用于收集由撞击光子产生的孔。 具有第一输入的电路结构耦合到n型收集阱区域,而第二输入端耦合到p型收集阱区域,其中像素传感器单元的输出信号是信号的差值的大小 的第一输入和第二输入的信号。
    • 6. 发明申请
    • IMAGE SENSOR CELLS
    • 图像传感器细胞
    • US20070108485A1
    • 2007-05-17
    • US11619024
    • 2007-01-02
    • James AdkissonJohn Ellis-MonaghanJeffrey GambinoMark JaffeRichard Rassel
    • James AdkissonJohn Ellis-MonaghanJeffrey GambinoMark JaffeRichard Rassel
    • H01L31/113H01L21/00
    • H01L27/14609H01L27/1463H01L27/14641H01L27/14643H01L31/035281
    • A structure (and method for forming the same) for an image sensor cell. The method includes providing a semiconductor substrate. Then, a charge collection well is formed in the semiconductor substrate, the charge collection well comprising dopants of a first doping polarity. Next, a surface pinning layer is formed in the charge collection well, the surface pinning layer comprising dopants of a second doping polarity opposite to the first doping polarity. Then, an electrically conductive push electrode is formed in direct physical contact with the surface pinning layer but not in direct physical contact with the charge collection well. Then, a transfer transistor is formed on the semiconductor substrate. The transfer transistor includes first and second source/drain regions and a channel region. The first and second source/drain regions comprise dopants of the first doping polarity. The first source/drain region is in direct physical contact with the charge collection well.
    • 用于图像传感器单元的结构(及其形成方法)。 该方法包括提供半导体衬底。 然后,在半导体衬底中形成电荷收集阱,电荷收集阱包含第一掺杂极性的掺杂剂。 接下来,在电荷收集阱中形成表面钉扎层,表面钉扎层包括与第一掺杂极性相反的第二掺杂极性的掺杂剂。 然后,导电的推动电极形成为与表面钉扎层直接物理接触,但不与电荷收集阱直接物理接触。 然后,在半导体衬底上形成传输晶体管。 传输晶体管包括第一和第二源极/漏极区域和沟道区域。 第一和第二源/漏区包括第一掺杂极性的掺杂剂。 第一源极/漏极区域与电荷收集阱直接物理接触。
    • 9. 发明申请
    • A CMOS IMAGER PHOTODIODE WITH ENHANCED CAPACITANCE
    • 具有增强电容的CMOS成像器光电二极管
    • US20070187734A1
    • 2007-08-16
    • US11276085
    • 2006-02-14
    • James AdkissonJohn Ellis-MonaghanMark JaffeDale PearsonDennis Rogers
    • James AdkissonJohn Ellis-MonaghanMark JaffeDale PearsonDennis Rogers
    • H01L31/062
    • H01L27/14643H01L27/1463H01L27/14689H01L31/035281
    • A pixel sensor cell having a semiconductor substrate having a surface; a photosensitive element formed in a substrate having a non-laterally disposed charge collection region entirely isolated from a physical boundary including the substrate surface. The photosensitive element comprises a trench having sidewalls formed in the substrate of a first conductivity type material; a first doped layer of a second conductivity type material formed adjacent to at least one of the sidewalls; and a second doped layer of the first conductivity type material formed between the first doped layer and the at least one trench sidewall and formed at a surface of the substrate, the second doped layer isolating the first doped layer from the at least one trench sidewall and the substrate surface. In a further embodiment, an additional photosensitive element is provided that includes a laterally disposed charge collection region that contacts the non-laterally disposed charge collection region of the photosensitive element and underlies the doped layer formed at the substrate surface.
    • 一种像素传感器单元,具有具有表面的半导体衬底; 形成在具有与包括基板表面的物理边界完全隔离的非横向布置的电荷收集区域的基板中的感光元件。 感光元件包括具有形成在第一导电类型材料的衬底中的侧壁的沟槽; 与所述侧壁中的至少一个相邻形成的第二导电类型材料的第一掺杂层; 以及形成在所述第一掺杂层和所述至少一个沟槽侧壁之间且形成在所述衬底的表面处的所述第一导电类型材料的第二掺杂层,所述第二掺杂层将所述第一掺杂层与所述至少一个沟槽侧壁隔离, 基材表面。 在另一个实施例中,提供附加的光敏元件,其包括横向设置的电荷收集区域,其接触感光元件的非横向设置的电荷收集区域,并且位于形成在基底表面处的掺杂层的下方。