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1. 发明申请

US20050224748A1 Process of removing residue from a precision surface using liquid or supercritical critical carbon dioxide composition 有权
标题翻译：使用液体或超临界关键二氧化碳组合物从精密表面除去残留物的方法
公开(公告)号：US20050224748A1
公开(公告)日：2005-10-13
申请号：US10966301
申请日：2004-10-15
申请人： John Cotte , Dario Goldfarb , Pamela Jones , Kenneth McCullough , Wayne Moreau , Keith Pope , John Simons , Charles Taft
发明人： John Cotte , Dario Goldfarb , Pamela Jones , Kenneth McCullough , Wayne Moreau , Keith Pope , John Simons , Charles Taft
IPC分类号： B08B7/00 , C11D7/08 , C11D7/26 , C11D7/28 , C11D7/50 , C11D11/00 , H01L21/02 , H01L21/311 , H01L21/3213 , C23G1/00
CPC分类号： H01L21/02071 , B08B7/0021 , C11D7/08 , C11D7/265 , C11D7/28 , C11D7/50 , C11D11/0047 , H01L21/31116
摘要： A composition which includes liquid or supercritical carbon dioxide and an acid having a pKa of less than about 4. The composition is employed in a process of removing residue from a precision surface, such as a semiconductor sample, in which the precision surface is contacted with the composition under thermodynamic conditions consistent with the retention of the liquid or supercritical carbon dioxide in the liquid or supercritical state.
摘要翻译：包括液体或超临界二氧化碳和pKa小于约4的酸的组合物。该组合物用于从精密表面与精密表面接触的精密表面（例如半导体样品）中除去残余物的方法在热力学条件下的组成与液体或超临界二氧化碳在液体或超临界状态下的保留一致。

2. 发明申请

US20050211269A1 Apparatus and method for rapid thermal control of a workpiece in liquid or dense phase fluid 失效
标题翻译：液体或致密相流体中工件快速热控制的装置和方法
公开(公告)号：US20050211269A1
公开(公告)日：2005-09-29
申请号：US11128022
申请日：2005-05-12
申请人： John Simons , Kenneth McCullough , Wayne Moreau , John Cotte , Keith Pope , Charles Taft , Dario Goldfarb
发明人： John Simons , Kenneth McCullough , Wayne Moreau , John Cotte , Keith Pope , Charles Taft , Dario Goldfarb
IPC分类号： B08B7/00 , H01L21/00 , C23G1/00
CPC分类号： H01L21/02101 , B08B7/0021 , H01L21/67109 , H01L21/67248 , Y10S134/902
摘要： A surface cleaning apparatus comprising a chamber, and a thermal transfer device. The chamber is capable of holding a semiconductor structure therein. The thermal transfer device is connected to the chamber. The thermal transfer device has a surface disposed inside the chamber for contacting the semiconducting structure and controlling a temperature of the semiconductor structure in contact with the surface. The thermal transfer device has a thermal control module connected to the surface for heating and cooling the surface to thermally cycle the surface. The thermal control module effects a substantially immediate thermal response of the surface when thermally recycling the surface.
摘要翻译：一种表面清洁装置，包括腔室和热转印装置。该室能够在其中保持半导体结构。热传递装置连接到腔室。热传递装置具有设置在室内的表面，用于接触半导体结构并控制与表面接触的半导体结构的温度。热转印装置具有连接到表面的热控制模块，用于加热和冷却表面以使表面热循环。当热再循环表面时，热控制模块会对表面产生实质上即时的热响应。

3. 发明申请

US20050087490A1 Process for removing impurities from low dielectric constant films disposed on semiconductor devices 审中-公开
标题翻译：从设置在半导体器件上的低介电常数膜除去杂质的工艺
公开(公告)号：US20050087490A1
公开(公告)日：2005-04-28
申请号：US10695374
申请日：2003-10-28
申请人： Mark Chace , Jeffrey Hedrick , Habib Hichri , Keith Pope , Jia Lee , Kelly Malone , Kenneth McCullough , Wayne Moreau , Darryl Restaino , Shahab Siddiqui
发明人： Mark Chace , Jeffrey Hedrick , Habib Hichri , Keith Pope , Jia Lee , Kelly Malone , Kenneth McCullough , Wayne Moreau , Darryl Restaino , Shahab Siddiqui
IPC分类号： B01D11/04 , B01D11/00
CPC分类号： B01D11/0407
摘要： A process of removing impurities from a cured low dielectric constant organic polymeric film disposed on a semiconductor device. The process involves disposing a low dielectric constant curable organic polymeric film on an electrically conductive surface of a semiconductor device. The organic polymeric film is cured on the semiconductor device and thereupon contacted with supercritical carbon dioxide, optionally in the presence of at least one cosolvent.
摘要翻译：从设置在半导体器件上的固化的低介电常数有机聚合物膜去除杂质的方法。该方法包括将低介电常数可固化有机聚合物膜设置在半导体器件的导电表面上。有机聚合物膜在半导体器件上固化，随后与超临界二氧化碳接触，任选地在至少一种助溶剂的存在下。

4. 发明授权

US07108001B2 Method and apparatus for rotation of a workpiece in supercritical fluid solutions for removing photo resist, residues and particles therefrom 失效
标题翻译：用于在超临界流体溶液中旋转工件的方法和装置，用于从中除去光致抗蚀剂，残余物和颗粒
公开(公告)号：US07108001B2
公开(公告)日：2006-09-19
申请号：US10818548
申请日：2004-04-05
申请人： Keith Pope , David J Mount , Laura Rothman , Rick C White , Clifton Busby , Stephen B Douglas , Raymond J Doww, III
发明人： Keith Pope , David J Mount , Laura Rothman , Rick C White , Clifton Busby , Stephen B Douglas , Raymond J Doww, III
IPC分类号： B08B3/04 , B08B7/04
CPC分类号： H01L21/67051 , B08B7/0021 , H01L21/67023 , Y10S134/902
摘要： A supercritical fluid cleaning system uses process fluid for operating rotary motors in the chamber with fluid bearings and fluid load levitation for rotating workpieces and impellers. Rotating speed and direction sensors and a home position locator facilitate motor control. Impellers add further agitation of the fluid in the chamber, faster processing, and greater uniformity of supercritical fluid components and increase mass transfer of fluid to the processed surface. Centrifugal operated clips and cassettes hold wafers and impellers. Non-contact, fluid operated rotating mechanisms reduce contamination. Physical, rotational, and shear affects are enhanced through centrifugal forces which can induce the separation of films localized deposits or molecular products of the reaction from the surface. There is a concomitant agitation of fluid, and continuous angular acceleration imparted to the processed surface features.
摘要翻译：超临界流体清洁系统使用工艺流体来操作腔室中的旋转马达，其具有用于旋转工件和叶轮的流体轴承和流体载荷悬浮。旋转速度和方向传感器和原位定位器便于马达控制。叶轮进一步搅拌了室内的流体，加快了处理速度，提高了超临界流体组分的均匀性，并增加了流体到处理过的表面的传质。离心式操作的夹子和盒子保持晶片和叶轮。非接触，流体操作的旋转机构减少污染。物理，旋转和剪切影响通过离心力增强，这可以引起膜的局部沉积物或反应物的分子产物与表面的分离。伴随着流体的搅动，以及赋予处理过的表面特征的连续角加速度。

5. 发明申请

US20060029310A1 Loadbearing platform with fluid support, isolation and rotation 审中-公开
标题翻译：承载平台具有流体支撑，隔离和旋转
公开(公告)号：US20060029310A1
公开(公告)日：2006-02-09
申请号：US11098992
申请日：2005-04-05
申请人： Rick White , Keith Pope , David Mount , Laura Rothman , Clifton Busby , Raymond Dow
发明人： Rick White , Keith Pope , David Mount , Laura Rothman , Clifton Busby , Raymond Dow
IPC分类号： F16C32/06
CPC分类号： H01L21/67784 , F01D15/06 , F16C32/0696 , H01L21/68792
摘要： Device for fluidic support and bi-directional rotation of an item in a process chamber where the operating fluid is compatible with the process. The device has a rotable load bearing platform with a load bearing interface between it and a base in the chamber. Fluid, which may be supercritical fluid, is applied through load bearing ports into the interface to fluidly support the weight and create rotational forces on the load platform. A turbine on the load platform is actuated by fluid flow directed from turbine ports in the chamber connected to the fluid source. Markers on the load platform and sensors in the chamber provide speed and direction sensing. An electromagnetic source in the chamber reacts with a permanent magnet in the rotable platform to provide an electromagnetic force for moving, or changing or holding the relative position of the load platform.
摘要翻译：用于流体支撑和在工作流体与工艺相容的处理室中的物品的双向旋转的装置。该装置具有可旋转的承载平台，在其与腔室中的基座之间具有承载界面。流体，其可以是超临界流体，通过承载端口施加到界面中以流体地支撑重物并在负载平台上产生旋转力。负载平台上的涡轮机通过从连接到流体源的腔室中的涡轮端口引导的流体流来致动。负载平台上的标记和室内的传感器提供速度和方向感测。室中的电磁源与可旋转平台中的永磁体反应，以提供用于移动或改变或保持负载平台的相对位置的电磁力。

6. 发明申请

US20070012341A1 SUPERCRITICAL FLUID DELIVERY SYSTEM FOR SEMICONDUCTOR WAFER PROCESSING 审中-公开
标题翻译：用于半导体波浪加工的超临界流体输送系统
公开(公告)号：US20070012341A1
公开(公告)日：2007-01-18
申请号：US11468840
申请日：2006-08-31
申请人： Stephen Douglas , Rick White , Keith Pope , David Mount , Heiko Moritz
发明人： Stephen Douglas , Rick White , Keith Pope , David Mount , Heiko Moritz
IPC分类号： B08B3/00
CPC分类号： B08B7/0021 , B01J3/008 , H01L21/67034 , Y02P20/544
摘要： An elevated pressure and temperature fluid processing system providing a pressurized fluid delivery system including a process fluid supply system and pump for supplying a process fluid at a process pressure, and a process fluid heater for heating the process fluid; a process chamber with a process chamber heater; and a process discharge collection system. The system also provides a process chamber inflow valve for connecting the pressurized fluid delivery system to the process chamber for fluid flow, and a process chamber outflow valve for connecting the process chamber to the collection system for fluid flow. A process chamber bypass valve connects the pressurized fluid delivery system to the process discharge collection system so as to bypass the process chamber. A computer control system controls the pump, the process fluid heater, the chamber heater, and the valves.
摘要翻译：提供的压力和温度流体处理系统提供加压流体输送系统，其包括用于在过程压力下供应过程流体的过程流体供应系统和泵以及用于加热过程流体的过程流体加热器; 具有处理室加热器的处理室; 和过程排出物收集系统。该系统还提供了用于将加压流体输送系统连接到用于流体流动的处理室的处理室流入阀，以及用于将处理室连接到用于流体流动的收集系统的处理室流出阀。处理室旁通阀将加压流体输送系统连接到过程排放收集系统，以便绕过处理室。计算机控制系统控制泵，过程流体加热器，腔室加热器和阀。

7. 发明申请

US20050183743A1 Method and system for maintaining a solution of a sparingly soluble additive in a process fluid 审中-公开
标题翻译：将微溶于添加剂的溶液保持在工艺流体中的方法和系统
公开(公告)号：US20050183743A1
公开(公告)日：2005-08-25
申请号：US11064640
申请日：2005-02-24
申请人： Keith Pope
发明人： Keith Pope
IPC分类号： B08B3/04 , B08B7/00
CPC分类号： B08B7/0021
摘要： A method is disclosed for the introduction of at least one additive to a processes chamber, that method comprising: supplying a process fluid to the process chamber; introducing at least one co-solvent to the process fluid thereby forming a mixture of process fluid and co-solvent without the additive; allowing a concentration of the co-solvent relative to the process fluid at least within the process chamber to reach a level at which the sparingly soluble additive is soluble; adding a solution of the additive to the mixture of the process fluid and the co-solvent, and processing a workpiece in the fluid.
摘要翻译：公开了一种用于向处理室引入至少一种添加剂的方法，该方法包括：将工艺流体供应到处理室; 将至少一种共溶剂引入所述工艺流体，由此形成工艺流体和辅助溶剂的混合物而没有添加剂; 允许至少在处理室内相对于工艺流体的共溶剂的浓度达到微溶添加剂可溶的水平; 将添加剂的溶液加入到工艺流体和助溶剂的混合物中，以及处理流体中的工件。

8. 发明授权

US5935869A Method of planarizing semiconductor wafers 失效
标题翻译：平面化半导体晶片的方法
公开(公告)号：US5935869A
公开(公告)日：1999-08-10
申请号：US889994
申请日：1997-07-10
申请人： Cuc Huynh , Rangarajan Jagannathan , Amarnath Jha , Thomas Martin , Keith Pope , Thomas Sandwick
发明人： Cuc Huynh , Rangarajan Jagannathan , Amarnath Jha , Thomas Martin , Keith Pope , Thomas Sandwick
IPC分类号： H01L21/304 , C11D7/32 , C11D7/50 , C11D11/00 , H01L21/306 , H01L21/00
CPC分类号： H01L21/30625 , C11D11/0047 , C11D7/5013 , C11D7/3218
摘要： A CMP semiconductor wafer planarization method is provided employing an aqueous solution of a trialkanol amine as a wafer cleaning solution. Wafers are produced exhibiting a substantial reduction in semiconductor device failures as shown by a significant decrease in m.sub.1- m.sub.1 (metal to metal) shorts.
摘要翻译：使用三烷醇胺的水溶液作为晶片清洗液提供CMP半导体晶片平面化方法。制造的晶片表现出显着降低的半导体器件故障，如m1-m1（金属对金属）短路的显着降低所示。

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