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    • 5. 发明授权
    • Optical measurements of stress in thin film materials
    • 薄膜材料应力光学测量
    • US5546811A
    • 1996-08-20
    • US377308
    • 1995-01-24
    • John A. RogersKeith A. Nelson
    • John A. RogersKeith A. Nelson
    • G01L5/00G01M9/00G01L1/24
    • G01L5/0047
    • A method for determining the residual stress in an unsupported region of a thin film. The method includes the steps of (a) optically exciting the film with a spatially and temporally varying optical excitation field to launch counter-propagating acoustic modes along at least one wavevector; (b) diffracting a portion of an optical probe field off the excited acoustic modes to generate a time-dependent signal field at the excitation wavevector; (c) detecting the signal field to generate a time-dependent, light-induced signal; (d) analyzing the light-induced signal to determine the frequencies of the acoustic modes; (e) partially determining the dispersion of at least one mode; and, (f) comparing the measured dispersion to that calculated using a mathematical model to allow the residual stress properties of the unsupported region of the film to be determined.
    • 一种用于确定薄膜未支撑区域中的残余应力的方法。 该方法包括以下步骤:(a)利用空间和时间上变化的光激励场域来对激光膜进行光学激发,以沿着至少一个波矢发射反向传播声模; (b)将光探测器场的一部分衍射离开激发的声学模式,以在激励波矢上产生时间相关的信号场; (c)检测信号场以产生时间依赖的光诱导信号; (d)分析光感信号以确定声模的频率; (e)部分地确定至少一种模式的色散; 和(f)使用数学模型将所测量的色散与所计算的色散进行比较,以确定膜的未支撑区域的残余应力特性。
    • 8. 发明授权
    • Method and device for measuring thin films and semiconductor substrates using reflection mode geometry
    • 使用反射模式几何测量薄膜和半导体衬底的方法和装置
    • US06795198B1
    • 2004-09-21
    • US09087141
    • 1998-05-28
    • Martin FuchsMatthew J. BanetKeith A. NelsonJohn A. Rogers
    • Martin FuchsMatthew J. BanetKeith A. NelsonJohn A. Rogers
    • G01B902
    • G01N21/1717G01B11/0666G01N29/2418G01N2291/0423
    • The invention provides both a method and apparatus that measures a property of a structure that includes at least one layer. The apparatus features a laser (e.g., a microchip laser, described below) that generates an optical pulse, and a diffractive mask that receives the optical pulse and diffracts it to generate at least two excitation pulses. An optical system, (e.g., an achromat lens pair) receives the optical pulses and spatially and temporally overlaps them on or in the structure to form an excitation pattern that launches an acoustic wave. The acoustic wave modulates a property of the structure, e.g., it generates a time-dependent “surface ripple” or modulates an optical property such as the sample's refractive index or absorption coefficient. Surface ripple is defined as a time-dependent change in the morphology of the surface; its peak-to-null amplitude is typically a few angstroms or less. The apparatus also includes a light source that produces a probe beam that reflects off the modulated property to generate a signal beam. An optical detection system receives the reflected signal beam and in response generates a light-induced electrical signal. An analyzer analyzes the signal to measure the property of the structure.
    • 本发明提供了一种测量包括至少一层的结构的性质的方法和装置。 该装置具有产生光脉冲的激光器(例如,下面描述的微芯片激光器),以及接收光脉冲并衍射以产生至少两个激励脉冲的衍射掩模。 光学系统(例如,消色差透镜对)接收光学脉冲,并且在结构中或结构中空间和时间上重叠它们以形成发射声波的激发图案。 声波调制结构的性质,例如,其产生时间依赖性的“表面纹波”或调制光学特性,例如样品的折射率或吸收系数。 表面波纹定义为表面形态的时间依赖性变化; 其峰到零幅度通常为几埃或更小。 该装置还包括产生探测光束的光源,其反射出调制的特性以产生信号光束。 光学检测系统接收反射的信号光束,并且响应于产生光诱导的电信号。 分析仪分析信号以测量结构的性质。