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1. 发明授权

US07352473B2 Lithographic apparatus, device manufacturing method, and computer program 有权
标题翻译：光刻设备，设备制造方法和计算机程序
公开(公告)号：US07352473B2
公开(公告)日：2008-04-01
申请号：US10825221
申请日：2004-04-16
申请人： Johannes Mathias Theodorus Antonius Adriaens , Marcel Hendrikus Maria Beems , Engelbertus Antonius Fransiscus Van Der Pasch
发明人： Johannes Mathias Theodorus Antonius Adriaens , Marcel Hendrikus Maria Beems , Engelbertus Antonius Fransiscus Van Der Pasch
IPC分类号： G01B11/02
CPC分类号： G01B9/02027 , G01B9/02018 , G01B9/0207 , G03F7/70775 , G03F9/7003
摘要： In an interferometric displacement measuring system, a correction for beamshear is made. The correction may be a polynomial of a variable proportional to the length of the optical path traversed by the measurement beam and the angle of the measurement mirror. The correction compensates for errors caused by non-planarity of the wavefront of the measurement beam.
摘要翻译：在干涉位移测量系统中，进行横梁的校正。校正可以是与由测量光束穿过的光路的长度和测量镜的角度成比例的变量的多项式。校正补偿由测量光束的波前的非平面性引起的误差。

2. 发明授权

US07557903B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07557903B2
公开(公告)日：2009-07-07
申请号：US11296871
申请日：2005-12-08
申请人： Carolus Johannes Catharina Schoormans , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Nicolas Alban Lallemant , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Mathias Theodorus Antonius Adriaens
发明人： Carolus Johannes Catharina Schoormans , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Nicolas Alban Lallemant , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Mathias Theodorus Antonius Adriaens
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/70775
摘要： A device manufacturing method includes projecting a patterned beam of radiation onto a substrate, wherein the position of a movable object is determined in a number of degrees of freedom using a number of sensors, the number of sensors being larger than the number of degrees of freedom, wherein the position of the movable object in the number of degrees of freedom is determined using signals of each of the sensors, wherein the signals of the sensors are weighed on the basis of the difference between noise levels of each of the sensors. Accuracy of the position measurement of movable object and/or overlay and focus performance are improved in lithographic apparatus.
摘要翻译：一种器件制造方法包括将图案化的辐射束投射到衬底上，其中可移动物体的位置使用多个传感器以多个自由度确定，传感器的数量大于自由度的数量其中，利用每个传感器的信号来确定可移动物体的位置，其中，所述传感器的信号是基于每个传感器的噪声水平之差而被称重的。在光刻设备中，可移动物体的位置测量精度和/或覆盖和聚焦性能得到改善。

3. 发明申请

US20080212055A1 Calibration method for a lithographic apparatus 有权
标题翻译：光刻设备的校准方法
公开(公告)号：US20080212055A1
公开(公告)日：2008-09-04
申请号：US11713086
申请日：2007-03-02
申请人： Carolus Johannes Catharina Schoormans , Alex Van Zon , Johannes Mathias Theodorus Antonius Adriaens
发明人： Carolus Johannes Catharina Schoormans , Alex Van Zon , Johannes Mathias Theodorus Antonius Adriaens
IPC分类号： G03B43/00
CPC分类号： G03F7/70725
摘要： Method to calibrate a substrate table position in a lithographic apparatus includes providing a substrate on the substrate table with a two dimensional arrangement of patterns; positioning the substrate table with a positioning system; measuring positions of the substrate table in at least two dimensions with a position measurement system; reading out the arrangement of patterns as a function of the measured positions of the substrate table with a pattern read out system to obtain pattern read out results; deriving position errors as a function of the measured positions of the substrate table compared with the pattern read out results; calibrating the positioning system using the position errors, the calibrating including determining drift influences of the positioning system, correcting the position errors as a function of the corresponding two dimensional position of the substrate table with the determined drift influences, and calibrating the positioning system with the corrected position errors.
摘要翻译：在光刻设备中校准衬底台位置的方法包括在衬底台上提供具有图案的二维排列的衬底; 用定位系统定位基板台; 使用位置测量系统测量至少两个维度的衬底台的位置; 通过图案读出系统读出作为衬底台的测量位置的函数的图案排列，以获得图案读出结果; 根据读出的结果，导出位置误差作为衬底台的测量位置的函数; 使用位置误差校准定位系统，校准包括确定定位系统的漂移影响，根据所确定的漂移影响校正作为基板台的相应二维位置的函数的位置误差，以及校准定位系统校正位置误差。

4. 发明授权

US07102736B2 Method of calibration, calibration substrate, and method of device manufacture 有权
标题翻译：校准方法，校准基板和器件制造方法
公开(公告)号：US07102736B2
公开(公告)日：2006-09-05
申请号：US10878626
申请日：2004-06-29
申请人： Carolus Johannes Catharina Schoormans , Johannes Mathias Theodorus Antonius Adriaens
发明人： Carolus Johannes Catharina Schoormans , Johannes Mathias Theodorus Antonius Adriaens
IPC分类号： G03B27/32 , G03B27/42 , G03C5/00
CPC分类号： G03F9/7011 , G03F9/7015 , G03F9/7019 , G03F9/7049
摘要： A method of calibration according to one embodiment includes moving a table to a plurality of exposure positions. At each position, a first part of a measurement system measures a position of the table along each of two orthogonal axes in the plane, and a mark is exposed onto the substrate. For each mark, and for two different orientations of the substrate, a second part of the measurement system measures measurement positions of the table corresponding to the mark. Based on the measured positions, a characterization of a position measurement error of the measurement system along one of the orthogonal axes, as a function of position along both of the orthogonal axes, is obtained.
摘要翻译：根据一个实施例的校准方法包括将桌子移动到多个曝光位置。在每个位置，测量系统的第一部分测量在平面中的两个正交轴中的每一个上的工作台的位置，并且将标记暴露在衬底上。对于每个标记，并且对于基板的两个不同取向，测量系统的第二部分测量与标记相对应的表的测量位置。基于测量位置，获得沿着正交轴之一的测量系统的位置测量误差的特征，作为沿着两个正交轴的位置的函数。

5. 发明授权

US08330941B2 Calibration method for a lithographic apparatus 有权
标题翻译：光刻设备的校准方法
公开(公告)号：US08330941B2
公开(公告)日：2012-12-11
申请号：US12700154
申请日：2010-02-04
申请人： Carolus Johannes Catharina Schoormans , Alex Van Zon , Johannes Mathias Theodorus Antonius Adriaens
发明人： Carolus Johannes Catharina Schoormans , Alex Van Zon , Johannes Mathias Theodorus Antonius Adriaens
IPC分类号： G03B27/32 , G03B27/52
CPC分类号： G03F7/70725
摘要： Method to calibrate a substrate table position in a lithographic apparatus includes providing a substrate on the substrate table with a two dimensional arrangement of patterns; positioning the substrate table with a positioning system; measuring positions of the substrate table in at least two dimensions with a position measurement system; reading out the arrangement of patterns as a function of the measured positions of the substrate table with a pattern read out system to obtain pattern read out results; deriving position errors as a function of the measured positions of the substrate table compared with the pattern read out results; calibrating the positioning system using the position errors, the calibrating including determining drift influences of the positioning system, correcting the position errors as a function of the corresponding two dimensional position of the substrate table with the determined drift influences, and calibrating the positioning system with the corrected position errors.
摘要翻译：在光刻设备中校准衬底台位置的方法包括在衬底台上提供具有图案的二维排列的衬底; 用定位系统定位基板台; 使用位置测量系统测量至少两个维度的衬底台的位置; 通过图案读出系统读出作为衬底台的测量位置的函数的图案排列，以获得图案读出结果; 根据读出的结果，导出位置误差作为衬底台的测量位置的函数; 使用位置误差校准定位系统，校准包括确定定位系统的漂移影响，根据所确定的漂移影响校正作为基板台的相应二维位置的函数的位置误差，以及校准定位系统校正位置误差。

6. 发明授权

US07684011B2 Calibration method for a lithographic apparatus 有权
标题翻译：光刻设备的校准方法
公开(公告)号：US07684011B2
公开(公告)日：2010-03-23
申请号：US11713086
申请日：2007-03-02
申请人： Carolus Johannes Catharina Schoormans , Alex Van Zon , Johannes Mathias Theodorus Antonius Adriaens
发明人： Carolus Johannes Catharina Schoormans , Alex Van Zon , Johannes Mathias Theodorus Antonius Adriaens
IPC分类号： G03B27/42 , G03B27/58 , G03B27/32
CPC分类号： G03F7/70725
摘要： Method to calibrate a substrate table position in a lithographic apparatus includes providing a substrate on the substrate table with a two dimensional arrangement of patterns; positioning the substrate table with a positioning system; measuring positions of the substrate table in at least two dimensions with a position measurement system; reading out the arrangement of patterns as a function of the measured positions of the substrate table with a pattern read out system to obtain pattern read out results; deriving position errors as a function of the measured positions of the substrate table compared with the pattern read out results; calibrating the positioning system using the position errors, the calibrating including determining drift influences of the positioning system, correcting the position errors as a function of the corresponding two dimensional position of the substrate table with the determined drift influences, and calibrating the positioning system with the corrected position errors.
摘要翻译：在光刻设备中校准衬底台位置的方法包括在衬底台上提供具有图案的二维排列的衬底; 用定位系统定位基板台; 使用位置测量系统测量至少两个维度的衬底台的位置; 通过图案读出系统读出作为衬底台的测量位置的函数的图案排列，以获得图案读出结果; 根据读出的结果，导出位置误差作为衬底台的测量位置的函数; 使用位置误差校准定位系统，校准包括确定定位系统的漂移影响，根据所确定的漂移影响校正作为基板台的相应二维位置的函数的位置误差，以及校准定位系统校正位置误差。

7. 发明授权

US07283249B2 Lithographic apparatus and a method of calibrating such an apparatus 有权
标题翻译：光刻设备和校准这种设备的方法
公开(公告)号：US07283249B2
公开(公告)日：2007-10-16
申请号：US11101629
申请日：2005-04-08
申请人： Emiel Jozef Melanie Eussen , Johannes Mathias Theodorus Antonius Adriaens
发明人： Emiel Jozef Melanie Eussen , Johannes Mathias Theodorus Antonius Adriaens
IPC分类号： G01B11/02
CPC分类号： G03F7/70775
摘要： A lithographic apparatus includes an object support configured to support an object. The apparatus further includes X, Y and Z interferometer measurement systems, and an object support positioning system configured to position the object support in a number of degrees of freedom on the basis of measurements of the interferometer measurement systems. A calibration device is configured to measure Ry of the object support with the X interferometer measurement system in at least two different Z positions, measure Ry of the object support with the Z interferometer measurement system in at least two different Z positions, calibrate a linear Z dependency of Ry on the basis of the measurements, and calibrating a linear X dependency of Z on the basis of the previous calibration. Similarly, a linear Y dependency of Z is calibrated.
摘要翻译：光刻设备包括被配置为支撑物体的物体支撑件。该装置还包括X，Y和Z干涉仪测量系统，以及被配置为基于干涉仪测量系统的测量将物体支撑件定位在多个自由度的对象支撑定位系统。校准装置被配置为利用X干涉仪测量系统在至少两个不同的Z位置中测量对象支撑的Ry，在至少两个不同的Z位置中用Z干涉仪测量系统测量对象支撑的Ry，校准线性Z 基于测量的Ry的依赖性，并且基于先前的校准来校准Z的线性X依赖性。类似地，Z的线性Y依赖性被校准。

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