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    • 1. 发明申请
    • Calibration method for a lithographic apparatus
    • 光刻设备的校准方法
    • US20080212055A1
    • 2008-09-04
    • US11713086
    • 2007-03-02
    • Carolus Johannes Catharina SchoormansAlex Van ZonJohannes Mathias Theodorus Antonius Adriaens
    • Carolus Johannes Catharina SchoormansAlex Van ZonJohannes Mathias Theodorus Antonius Adriaens
    • G03B43/00
    • G03F7/70725
    • Method to calibrate a substrate table position in a lithographic apparatus includes providing a substrate on the substrate table with a two dimensional arrangement of patterns; positioning the substrate table with a positioning system; measuring positions of the substrate table in at least two dimensions with a position measurement system; reading out the arrangement of patterns as a function of the measured positions of the substrate table with a pattern read out system to obtain pattern read out results; deriving position errors as a function of the measured positions of the substrate table compared with the pattern read out results; calibrating the positioning system using the position errors, the calibrating including determining drift influences of the positioning system, correcting the position errors as a function of the corresponding two dimensional position of the substrate table with the determined drift influences, and calibrating the positioning system with the corrected position errors.
    • 在光刻设备中校准衬底台位置的方法包括在衬底台上提供具有图案的二维排列的衬底; 用定位系统定位基板台; 使用位置测量系统测量至少两个维度的衬底台的位置; 通过图案读出系统读出作为衬底台的测量位置的函数的图案排列,以获得图案读出结果; 根据读出的结果,导出位置误差作为衬底台的测量位置的函数; 使用位置误差校准定位系统,校准包括确定定位系统的漂移影响,根据所确定的漂移影响校正作为基板台的相应二维位置的函数的位置误差,以及校准定位系统 校正位置误差。
    • 2. 发明授权
    • Calibration method for a lithographic apparatus
    • 光刻设备的校准方法
    • US08330941B2
    • 2012-12-11
    • US12700154
    • 2010-02-04
    • Carolus Johannes Catharina SchoormansAlex Van ZonJohannes Mathias Theodorus Antonius Adriaens
    • Carolus Johannes Catharina SchoormansAlex Van ZonJohannes Mathias Theodorus Antonius Adriaens
    • G03B27/32G03B27/52
    • G03F7/70725
    • Method to calibrate a substrate table position in a lithographic apparatus includes providing a substrate on the substrate table with a two dimensional arrangement of patterns; positioning the substrate table with a positioning system; measuring positions of the substrate table in at least two dimensions with a position measurement system; reading out the arrangement of patterns as a function of the measured positions of the substrate table with a pattern read out system to obtain pattern read out results; deriving position errors as a function of the measured positions of the substrate table compared with the pattern read out results; calibrating the positioning system using the position errors, the calibrating including determining drift influences of the positioning system, correcting the position errors as a function of the corresponding two dimensional position of the substrate table with the determined drift influences, and calibrating the positioning system with the corrected position errors.
    • 在光刻设备中校准衬底台位置的方法包括在衬底台上提供具有图案的二维排列的衬底; 用定位系统定位基板台; 使用位置测量系统测量至少两个维度的衬底台的位置; 通过图案读出系统读出作为衬底台的测量位置的函数的图案排列,以获得图案读出结果; 根据读出的结果,导出位置误差作为衬底台的测量位置的函数; 使用位置误差校准定位系统,校准包括确定定位系统的漂移影响,根据所确定的漂移影响校正作为基板台的相应二维位置的函数的位置误差,以及校准定位系统 校正位置误差。
    • 3. 发明授权
    • Calibration method for a lithographic apparatus
    • 光刻设备的校准方法
    • US07684011B2
    • 2010-03-23
    • US11713086
    • 2007-03-02
    • Carolus Johannes Catharina SchoormansAlex Van ZonJohannes Mathias Theodorus Antonius Adriaens
    • Carolus Johannes Catharina SchoormansAlex Van ZonJohannes Mathias Theodorus Antonius Adriaens
    • G03B27/42G03B27/58G03B27/32
    • G03F7/70725
    • Method to calibrate a substrate table position in a lithographic apparatus includes providing a substrate on the substrate table with a two dimensional arrangement of patterns; positioning the substrate table with a positioning system; measuring positions of the substrate table in at least two dimensions with a position measurement system; reading out the arrangement of patterns as a function of the measured positions of the substrate table with a pattern read out system to obtain pattern read out results; deriving position errors as a function of the measured positions of the substrate table compared with the pattern read out results; calibrating the positioning system using the position errors, the calibrating including determining drift influences of the positioning system, correcting the position errors as a function of the corresponding two dimensional position of the substrate table with the determined drift influences, and calibrating the positioning system with the corrected position errors.
    • 在光刻设备中校准衬底台位置的方法包括在衬底台上提供具有图案的二维排列的衬底; 用定位系统定位基板台; 使用位置测量系统测量至少两个维度的衬底台的位置; 通过图案读出系统读出作为衬底台的测量位置的函数的图案排列,以获得图案读出结果; 根据读出的结果,导出位置误差作为衬底台的测量位置的函数; 使用位置误差校准定位系统,校准包括确定定位系统的漂移影响,根据所确定的漂移影响校正作为基板台的相应二维位置的函数的位置误差,以及校准定位系统 校正位置误差。