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    • 1. 发明申请
    • Photoactive Film, Its Preparation And Use, And Preparation Of Surface Relief And Optically Anisotropic Structures By Irradiating Said Film
    • 光活性膜,其制备和使用,以及通过辐射所述膜的表面浮雕和光学各向异性结构的制备
    • US20090233014A1
    • 2009-09-17
    • US11721407
    • 2005-12-08
    • Joachim StumpeLeonid GoldenbergOlga Kulikovska
    • Joachim StumpeLeonid GoldenbergOlga Kulikovska
    • G03F7/00B29C41/00G03F7/004H01G9/022B29C39/00B29C35/00
    • G11B7/245G03C1/733G11B7/246G11B7/2467G11B7/2475G11B7/249G11B7/25G11B7/2531G11B7/257Y10T428/24479Y10T428/24802
    • The present invention relates to a homogeneous, photoactive film consisting of or comprising a polyelectrolyte carrying residues which may undergo a photoreaction, the polyelectrolyte mainly comprising at least one structure according to any of formulae (I) to (IV), namely [Pol(R*—P—R′)]oon+n/xAx− (I), n/xAx+[Pol(R*—P—R′)]oon− (II), [Pol(R1*-Q-R1′)]oon+n/xΛx− (III), n/xΛx+[Pol(R1*-Q-R1′)]oon− (IV), wherein Pol means a repeating unit of a linear or branched polymer chain, o indicates the number of the repeating unit of the polymer chain, and (R*—P—R′) and (R1*-Q-R1′) are n-fold positively or negatively charged side chains of the repeating unit Pol, wherein P is a group which is capable of photo-induced E/Z isomerization, Q is a group capable of participating in a photocycloaddition, or capable of participating in a photoinduced rearrangement, or the so called Photo-Fries reaction, A is a cation or anion which is oppositely charged, n is preferably 1 or 2, x is 1 or 2, and o is at least 2, with the proviso that in one polyelectrolyte, groups [R—P—R′] and/or [R1-Q-R1′] all have the same sign. The invention is further directed to the preparation of the film, its use and a method for the preparation of a replica of a film of the invention having a surface relief structure.
    • 本发明涉及一种均匀的光活性膜,其由携带可能经历光反应的残余物的聚电解质组成或包含,该聚电解质主要包含至少一种根据式(I)至(IV)中任一项的结构,即[Pol *(P-R')] oon + n / xAx-(I),n / xAx + [Pol(R * -P-R')] oon-(II),[Pol(R1 * -Q-R1' ]其中Pol表示直链或支链聚合物链的重复单元,o表示数字(n),n / xLambdax-(III),n / xLambdax + [Pol(R1 * -Q-R1' 的聚合物链的重复单元,(R * -P-R')和(R 1 * -Q-R 1')是重复单元Pol的n倍带正电荷或带负电荷的侧链,其中P是基团 能够进行光诱导的E / Z异构化,Q是能够参与光环加成,或能够参与光诱导重排的基团或所谓的Photo-Fries反应,A是相反的阳离子或阴离子 充电,n优选为1或2,x为1或2,o为 至少2,条件是在一个聚电解质中,[R-P-R']和/或[R1-Q-R1']基团都具有相同的符号。 本发明进一步涉及膜的制备,其用途和制备本发明的具有表面浮雕结构的膜的复制品的方法。