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1. 发明授权

US4464455A Dry-developing negative resist composition 失效
标题翻译：干显影负性抗蚀剂组合物
公开(公告)号：US4464455A
公开(公告)日：1984-08-07
申请号：US385887
申请日：1982-06-07
申请人： Yasuhiro Yoneda , Kenroh Kitamura , Jiro Naito , Toshisuke Kitakohji
发明人： Yasuhiro Yoneda , Kenroh Kitamura , Jiro Naito , Toshisuke Kitakohji
IPC分类号： G03F7/004 , G03F7/038 , G03F7/075 , G03F7/09 , G03F7/30 , G03F7/36 , G03C5/16
CPC分类号： G03F7/094 , G03F7/038 , G03F7/0755 , G03F7/36 , Y10S430/143
摘要： A dry-developing negative resist composition consisting of (a) a polymer of a monomer of the following formula I or II or a copolymer of a monomer of the following formula I with a monomer of the following formula II, ##STR1## in which R represents alkyl of 1 to 6 carbon atoms, benzyl, phenyl, or cyclohexyl and (b) 1% to 70% by weight, based on the weight of the composition, of a silicone compound. A negative resist pattern can be formed on a substrate by a process comprising coating the substrate with the resist composition, exposing the resist layer to an ionizing radiation, subjecting the resist layer to a relief treatment, and developing a resist pattern on the substrate by treatment with gas plasma.
摘要翻译：由（a）下式I或II的单体的聚合物或下式I的单体的共聚物与下式II的单体组成的干显影负性抗蚀剂组合物， > II，其中R表示1至6个碳原子的烷基，苄基，苯基或环己基，和（b）1重量％至70重量％，基于组合物的重量，硅氧烷化合物。可以通过包括用抗蚀剂组合物涂覆基板，将抗蚀剂层暴露于电离辐射，使抗蚀剂层进行浮雕处理，以及通过处理在基板上显影抗蚀剂图案的方法，在基板上形成负的抗蚀剂图案与气体等离子体。

2. 发明授权

US4481279A Dry-developing resist composition 失效
标题翻译：干显影抗蚀剂组合物
公开(公告)号：US4481279A
公开(公告)日：1984-11-06
申请号：US385886
申请日：1982-06-07
申请人： Jiro Naito , Yasuhiro Yoneda , Kenroh Kitamura
发明人： Jiro Naito , Yasuhiro Yoneda , Kenroh Kitamura
IPC分类号： C08F290/00 , C08F299/00 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/11 , G03F7/30 , G03F7/36 , G03C1/72 , G03F7/26
CPC分类号： G03F7/039 , G03F7/11 , G03F7/36
摘要： A dry-developing positive resist composition consisting of (a) a polymeric material containing, in the molecular structure, unsaturated hydrocarbon bonds inclusive of vinyl, allyl, cinnamoyl, or acryl double bonds or epoxy groups or halogen atoms and (b) 1% to 70% by weight, based on the weight of the composition, of a silicon compound. A positive resist pattern is formed on a substrate by a process comprising coating the substrate with said resist composition, exposing the resist layer to radiation, and developing a resist pattern on the substrate by treatment with gas plasma.
摘要翻译：一种干发展正性抗蚀剂组合物，其由（a）在分子结构中含有不饱和烃键（包括乙烯基，烯丙基，肉桂酰基或丙烯酸双键或环氧基或卤素原子）的聚合物材料组成，和（b）1％ 70重量％，基于组合物的重量，硅化合物。通过包括用所述抗蚀剂组合物涂覆基材，将抗蚀剂层暴露于辐射以及通过用等离子体处理在基板上显影抗蚀剂图案的方法，在基板上形成正的抗蚀剂图案。

3. 发明授权

US4267258A Negative type deep ultraviolet resist 失效
标题翻译：负型深紫外线抗蚀剂
公开(公告)号：US4267258A
公开(公告)日：1981-05-12
申请号：US101688
申请日：1979-12-10
申请人： Yasuhiro Yoneda , Kenro Kitamura , Jiro Naito , Toshisuke Kitakohji
发明人： Yasuhiro Yoneda , Kenro Kitamura , Jiro Naito , Toshisuke Kitakohji
IPC分类号： G03F7/20 , G03F7/038 , H01L21/027 , G03C1/68
CPC分类号： G03F7/038 , G03F7/0388
摘要： A negative type resist is provided for deep ultraviolet light lithography. This resist comprises a polymer of a diallyl ester of a dicarboxylic acid having a degree of dispersion of 3 or less, which is given by the ratio of a weight-average molecular weight Mw to a number-average molecular weight Mn. This deep UV resist can produce a fine detail resist pattern having a high resolution, and it has a high sensitivity to irradiating the coated film of the polymer on a substrate with deep UV light followed by development.
摘要翻译：为深紫外光光刻提供负型抗蚀剂。该抗蚀剂包含通过重均分子量Mw与数均分子量Mn的比率给出的分散度为3以下的二羧酸的二烯丙基酯的聚合物。这种深紫外线抗蚀剂可以产生具有高分辨率的精细细节抗蚀剂图案，并且对具有深紫外光的基板上的聚合物的涂覆膜进行照射，然后显影，具有高灵敏度。

4. 发明申请

US20130283704A1 METHOD FOR PRODUCING POLISHING LIQUID COMPOSITION 有权
标题翻译：生产抛光液体组合物的方法
公开(公告)号：US20130283704A1
公开(公告)日：2013-10-31
申请号：US13996976
申请日：2011-12-21
申请人： Yasuhiro Yoneda , Kanji Sato
发明人： Yasuhiro Yoneda , Kanji Sato
IPC分类号： C09G1/02
CPC分类号： C09G1/02 , C09K3/1463 , G11B5/8404
摘要： Provided is a method for producing a polishing composition capable of reducing scratches and particles of an object to be polished, after polishing. It is a method for producing a polishing composition including a step of filtering with a filtration filter a silica particle dispersion containing colloidal silica whose primary particles have an average particle diameter in a range of 1 to 100 nm, wherein the filtration filter includes diatomite cationized by use of a polyvalent amine compound having 9 to 200 cationic groups in the molecule.
摘要翻译：本发明提供一种能够在研磨后能够减少被研磨物的划痕和微粒的抛光组合物的制造方法。一种抛光组合物的制造方法，其特征在于，使用过滤器过滤含有一次粒子的平均粒径为1〜100nm的胶态二氧化硅的二氧化硅粒子分散体，其中，过滤器包括由硅藻土阳离子化的硅藻土在分子中使用具有9至200个阳离子基团的多价胺化合物。

5. 发明申请

US20070253073A1 Objective lens 有权
标题翻译：物镜
公开(公告)号：US20070253073A1
公开(公告)日：2007-11-01
申请号：US11787068
申请日：2007-04-13
申请人： Yasutaka Terashima , Yasuhiro Yoneda , Teruo Yamashita , Hideaki Koyanagi
发明人： Yasutaka Terashima , Yasuhiro Yoneda , Teruo Yamashita , Hideaki Koyanagi
IPC分类号： G02B3/00
CPC分类号： C03C3/068 , C03B11/08 , C03B2215/49 , C03B2215/69 , C03C3/095 , Y02P40/57 , Y10T428/31504
摘要： Lens aberration in an objective lens for recording and reproducing optical information, which is composed of a molded aspherical single lens, is inhibited while at the same time good lens productivity is attained. Also attained are excellent optical properties and high production efficiency in a mold processing step and a press molding step conducted to manufacture the lens. To this end there is provided an objective lens 1 having a convex aspherical surface formed at a first surface and a numerical aperture NA which satisfies the condition NA≧0.8. It is preferable to have an aspherical surface also at the second surface. A molding material that was premolded to a prescribed shape and is in a heated and softened state is press molded by using a pair of upper and lower molds having opposing molding surfaces, a molding surface shape is transferred by using a spherical molding material with a radius r and pressing the molding material between a pair of upper and lower molds, and the paraxial curvature radius R of the convex aspherical surface satisfies the following relation r/R≦1.35.
摘要翻译：用于记录和再现光学信息的物镜中的由模制的非球面单透镜组成的透镜像差被抑制，同时获得良好的透镜生产率。在模具加工步骤和进行制造透镜的压制成型步骤中也获得了优异的光学性能和高生产效率。为此，提供一种具有形成在第一表面上的凸非球面的物镜1和满足条件NA> = 0.8的数值孔径NA。优选在第二表面也具有非球面。将预成型为规定形状并处于加热软化状态的成型材料通过使用具有相对成型面的一对上下模具进行加压成型，通过使用具有半径的球形成型材料转印成型面形状并且在一对上模和下模之间挤压成型材料，并且凸非球面的近轴曲率半径R满足以下关系r / R <= 1.35。

6. 发明申请

US20050172671A1 Methods of manufacturing molded glass articles 审中-公开
标题翻译：制造模制玻璃制品的方法
公开(公告)号：US20050172671A1
公开(公告)日：2005-08-11
申请号：US10602706
申请日：2003-06-25
申请人： Yasuhiro Yoneda , Hiroyuki Sawada
发明人： Yasuhiro Yoneda , Hiroyuki Sawada
IPC分类号： C03B11/00 , C03B11/08 , C03B11/12 , C03B11/16 , C03B29/02 , C03B35/00 , C03B40/04 , G02B3/00
CPC分类号： C03B40/04 , C03B11/122 , C03B11/16 , C03B29/02 , C03B35/005 , C03B2215/60 , C03B2215/69 , C03B2215/72 , Y02P40/57
摘要： Disclosed is methods of manufacturing optical elements such as optical glass lenses and to methods of manufacturing optical glass elements in which a heat softened optical glass material is press molded in a pressing mold with high precision. Optical pick up units is also disclosed and it comprises an object lens manufactured by the method. In the method, at least one of an upper mold and a lower mold having a shape such that when a glass material is in contact with the upper mold and the lower mold, a molding surface of at least one of the upper mold or the lower mold forms a closed space with a surface of the glass material. The method comprises the steps of supplying a glass material, at a temperature of less than a temperature at which the glass material exhibits a viscosity of 1011 poises, between the upper mold and the lower mold; heating the supplied glass material by thermal conduction by means of contact with the upper mold or lower mold on the side on which the space is formed; and moving at least one of the upper mold and the lower mold at an average moving rate of less than or equal to 10 mm/min at least for a distance h micrometers after the glass material becomes in contact with the upper mold and the lower mold, when a temperature of the pressing mold is at a predetermined temperature T2 within a range in which the glass material exhibits a viscosity of from 107.4 to 1010.5 poises, wherein a maximum height of the space in the direction of the moving of the movable mold is denoted as h micrometers.
摘要翻译：公开了制造诸如光学玻璃透镜的光学元件的方法以及制造光学玻璃元件的方法，其中将热软化的光学玻璃材料以高精度压模成型。还公开了光学拾取单元，并且其包括通过该方法制造的物镜。在该方法中，上模具和下模具中的至少一个具有使得当玻璃材料与上模具和下模具接触时的形状，上模具或下模具中的至少一个的模制表面模具形成具有玻璃材料表面的封闭空间。该方法包括以下步骤：在上模和下模之间的玻璃材料表现出10psi的粘度的温度以下的温度下供给玻璃材料; 通过与形成有空间的一侧上的上模具或下模具的接触通过热传导来加热供应的玻璃材料; 并且在玻璃材料与上模具和下模具接触之后，以小于或等于10mm / min的平均移动速度至少移动距离h微米移动上模具和下模具中的至少一个当压模的温度在玻璃材料的粘度为10〜10〜10℃的范围内处于规定温度T 2时，其中可移动模具的移动方向上的空间的最大高度表示为h微米。

7. 发明授权

US06743851B2 Polyimide film 失效
标题翻译：聚酰亚胺膜
公开(公告)号：US06743851B2
公开(公告)日：2004-06-01
申请号：US09962637
申请日：2001-09-25
申请人： Akira Tanaka , Satoshi Tazaki , Yasuhiro Yoneda , Kishio Yokouchi
发明人： Akira Tanaka , Satoshi Tazaki , Yasuhiro Yoneda , Kishio Yokouchi
IPC分类号： C08L3900
CPC分类号： G03F7/0387 , C08G73/1025 , C08K5/3472 , H05K3/285 , C08L79/08
摘要： A polyimide resin composition comprising a polyimide resin (A) and at least one 1H-tetrazole (B) selected from the group consisting of 1H-tetrazole, 5,5′-bis-1H-tetrazole, and derivatives thereof, and having an excellent rust preventing effect on copper and copper alloys.
摘要翻译：一种聚酰亚胺树脂组合物，其包含聚酰亚胺树脂（A）和至少一种选自1H-四唑，5,5'-双-1H-四唑及其衍生物的1H-四唑（B），并且具有优异的对铜和铜合金的防锈效果。

8. 发明授权

US06307091B1 Trifluoro-substituted benzoic acid, esters thereof and processes for preparing the same 失效
标题翻译：三氟取代的苯甲酸，其酯及其制备方法
公开(公告)号：US06307091B1
公开(公告)日：2001-10-23
申请号：US09678694
申请日：2000-10-03
申请人： Yasuhito Yamamoto , Yasuhiro Yoneda , Kikuo Ataka , Naoyuki Yokota
发明人： Yasuhito Yamamoto , Yasuhiro Yoneda , Kikuo Ataka , Naoyuki Yokota
IPC分类号： C07C6308
CPC分类号： C07C69/76 , C07C63/70
摘要： The present invention is to provided a trifluoro-substituted benzoic acid, an ester thereof, particularly 2,3,4-trifluoro-5-iodobenzonic acid, 2,3,4-trifluoro-5-trifluoromethylbenzonic acid, esters thereof, which are useful as a starting material for synthesizeing a quinolonecarboxylic acid compound useful as a medicine, an anti-bacterial agent or an antiviral agent, and processes for preparing these compounds and 2,4,5-trifluoro-3-iodobenzonic acid, 2,4,5-trifluoro-3-trifluoromethylbenzoic acid and esters thereof.
摘要翻译：本发明提供三氟取代的苯甲酸，其酯，特别是2,3,4-三氟-5-碘苯甲酸，2,3,4-三氟-5-三氟甲基苯甲酸及其酯，它们是有用的作为合成可用作药物的喹诺酮羧酸化合物的起始原料，抗菌剂或抗病毒剂，以及制备这些化合物的方法和2,4,5-三氟-3-碘苯甲酸，2,4,5 三氟-3-三氟甲基苯甲酸及其酯。

9. 发明授权

US6001488A Composition of epoxy group-containing cycloolefin resin 失效
标题翻译：含环氧基的环烯烃树脂的组成
公开(公告)号：US6001488A
公开(公告)日：1999-12-14
申请号：US106179
申请日：1998-06-29
申请人： Hideaki Kataoka , Eiko Yuda , Shigemitsu Kamiya , Masahide Yamamoto , Yoshikatsu Ishizuki , Yasuhiro Yoneda , Daisuke Mizutani , Kishio Yokouchi
发明人： Hideaki Kataoka , Eiko Yuda , Shigemitsu Kamiya , Masahide Yamamoto , Yoshikatsu Ishizuki , Yasuhiro Yoneda , Daisuke Mizutani , Kishio Yokouchi
IPC分类号： C08F283/14 , C08G59/32 , C08G59/34 , C08G61/08 , C08L51/08 , G03F7/004 , G03F7/012 , G03F7/038 , H01B3/40 , H01B3/44 , B32B27/04 , B32B27/28 , C08F255/08 , C08L51/06
CPC分类号： C08G59/027 , C08F283/14 , C08G59/3218 , C08G61/08 , C08L51/08 , G03F7/0045 , G03F7/0125 , G03F7/038 , H01B3/40 , H01B3/441 , Y10S428/901 , Y10T428/31663
摘要： A resin composition comprising an epoxy group-containing cycloolefin resin and a crosslinking agent is provided. More specifically, a resin composition comprising an epoxy group-containing thermoplastic norbornene resin obtained by introducing epoxy groups into a thermoplastic norbornene resin, and as the crosslinking agent, a curing agent for epoxy resins or a photoreactive substance is provided. The resin composition is suitable for use as an insulating material.
摘要翻译：提供了包含含环氧基的环烯烃树脂和交联剂的树脂组合物。更具体地说，提供一种包含通过将环氧基引入到热塑性降冰片烯树脂中而获得的含环氧基的热塑性降冰片烯树脂和作为交联剂的环氧树脂或光反应性物质的固化剂的树脂组合物。树脂组合物适合用作绝缘材料。

10. 发明授权

US4657843A Use of polysilsesquioxane without hydroxyl group for forming mask 失效
标题翻译：使用不含羟基的聚倍半硅氧烷形成面膜
公开(公告)号：US4657843A
公开(公告)日：1987-04-14
申请号：US835741
申请日：1986-03-03
申请人： Shun-ichi Fukuyama , Yasuhiro Yoneda , Masashi Miyagawa , Kota Nishii
发明人： Shun-ichi Fukuyama , Yasuhiro Yoneda , Masashi Miyagawa , Kota Nishii
IPC分类号： G03F7/004 , G03F7/075 , G03C5/16 , G03F7/26
CPC分类号： G03F7/0757 , Y10S438/948
摘要： A high-energy radiation-sensitive pattern-forming resist material consisting of polysilsesquioxane having no hydroxyl group in its molecule. The pattern-forming material of this invention has an improved sensitivity to high-energy radiation exposure, a high resistance to dry etching, a high resolution capability, and an improved thermal stability.
摘要翻译：由分子中不含羟基的聚倍半硅氧烷构成的高能辐射敏感图案形成抗蚀剂材料。本发明的图形形成材料对高能辐射曝光具有改进的敏感性，高耐干腐蚀性，高分辨能力和改善的热稳定性。

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