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    • 1. 发明授权
    • Transfer printing apparatus for mask pattern and mask pattern preparation method
    • 用于掩模图案和掩模图案制备方法的转印印刷装置
    • US08935982B2
    • 2015-01-20
    • US13380115
    • 2011-03-24
    • Weifeng ZhouJian GuoXing Ming
    • Weifeng ZhouJian GuoXing Ming
    • B41M1/42B41J2/43G03G15/22G03G19/00
    • B41J2/43G03G15/221G03G19/00
    • The present invention discloses a mask pattern transferring device and a method of preparing a mask pattern transferring device. The mask pattern transferring device comprises: a magnetization head disposed on a magnetization head carrying device, for magnetizing composite powders each comprising a core of ferromagnetic metal and an outer resin film; a rotary roller formed of a non-ferromagnetic material, for adsorbing the composite powders magnetized by the magnetization head; a demagnetization head disposed at a downstream of the magnetization head in the rotating direction of the rotary roller, for demagnetizing the magnetized composite powders adsorbed by the rotary roller; and a collecting container, the outer edge of which is tangent with one side of the rotary roller, and which is disposed at the downstream of the magnetization head along the periphery of the rotary roller to collect the demagnetized composite powders.
    • 本发明公开了一种掩膜图案转印装置及其制备方法。 掩模图案转印装置包括:磁化头,设置在磁化头承载装置上,用于磁化每个包括铁磁金属芯和外部树脂膜的复合粉末; 由非铁磁材料形成的用于吸附由磁化头磁化的复合粉末的旋转辊; 磁化头设置在旋转辊的旋转方向的下游的退磁头,用于对被旋转辊吸附的磁化复合粉末进行去磁; 以及收集容器,其外边缘与旋转辊的一侧相切,并且沿着旋转辊的周边设置在磁化头的下游,以收集去磁复合粉末。
    • 3. 发明申请
    • RESIST COATING DEVICE AND METHOD
    • 电阻涂层装置及方法
    • US20120201964A1
    • 2012-08-09
    • US13499951
    • 2011-04-19
    • Weifeng ZhouJian GuoXing Ming
    • Weifeng ZhouJian GuoXing Ming
    • B05D1/26B05D3/02B05C5/02
    • B05C5/027B05C9/06G03F7/16H01L21/6715
    • A gumming device and method can reduce or avoid generation of air bubbles between layers thereby improving quality and manufacturing efficiency of TFT LCD. The gumming device comprises a nozzle, a gum feeding mechanism connected with the nozzle and a nozzle moving mechanism. Wherein at least two rows of gum injection holes are included in the nozzle, and the two adjacent rows of gum injection holes are separated by a spacer. The gumming method comprises that the nozzle is moved on the substrate by the nozzle moving mechanism, and each row of gum injection holes in the nozzle is successively opened in a direction opposite to the moving direction of nozzle for applying gum. The gumming device is used for applying multilayer gum.
    • 上胶装置和方法可以减少或避免层之间产生气泡,从而提高TFT LCD的质量和制造效率。 上胶装置包括喷嘴,与喷嘴连接的输胶机构和喷嘴移动机构。 其中在喷嘴中包括至少两排胶注射孔,并且两个相邻排的胶注射孔被隔离物分开。 上胶方法包括喷嘴通过喷嘴移动机构在基板上移动,并且喷嘴中的每排胶注入孔在与用于涂胶的喷嘴的移动方向相反的方向上连续打开。 上胶装置用于涂敷多层胶。
    • 5. 发明授权
    • Array substrate and liquid crystal display panel
    • 阵列基板和液晶显示面板
    • US09170462B2
    • 2015-10-27
    • US13270866
    • 2011-10-11
    • Jian GuoWeifeng ZhouXing MingHao Wu
    • Jian GuoWeifeng ZhouXing MingHao Wu
    • G02F1/1362
    • G02F1/136259G02F2001/136263
    • An array substrate comprises a first metal layer in which first signal lines are disposed; a second metal layer in which second signal lines are disposed; an insulation layer provided between the first and second metal layers. A repairing line is provided in edge regions of the second metal layer and insulated from the second signal lines, and the repairing line comprises a first longitudinal portion, a second longitudinal portion and a transverse portion, the first longitudinal portion is electrically connected to the second longitudinal portion by the transverse portion. A projection of the first longitudinal portion in a plane of the first metal layer intersects with one end of each of the first signal lines, and a projection of the second longitudinal portion in the plane of the first metal layer intersects with the other end of each of the first signal lines.
    • 阵列基板包括其中设置有第一信号线的第一金属层; 设置第二信号线的第二金属层; 设置在第一和第二金属层之间的绝缘层。 修理线设置在第二金属层的边缘区域并与第二信号线绝缘,并且修理线包括第一纵向部分,第二纵向部分和横向部分,第一纵向部分电连接到第二纵向部分 纵向部分由横向部分。 第一纵向部分在第一金属层的平面中的突起与第一信号线的一端相交,并且第一纵向部分在第一金属层的平面中的突起与每个第一金属层的另一端相交 的第一条信号线。
    • 7. 发明授权
    • Exposure apparatus, mask plate and exposing method
    • 曝光装置,掩模板和曝光方法
    • US08502956B2
    • 2013-08-06
    • US13105110
    • 2011-05-11
    • Jian GuoWeifeng ZhouXing MingYong ChenGuanghui Xiao
    • Jian GuoWeifeng ZhouXing MingYong ChenGuanghui Xiao
    • G03B27/42G03B27/32
    • G03F7/7015G03F1/14G03F1/38G03F1/50G03F1/52G03F7/70275G03F7/70283G03F7/70466
    • An exposure apparatus comprises: a loading stage for supporting a substrate; a mask plate parallel to the loading stage and above the loading stage, the mask plate including a light transmitting region and a light absorbing region on its lower surface, a light reflecting region being provided in the light absorbing region; a lens device provided between the mask plate and the loading stage; a first illumination light source, light from which vertically striking on the upper surface of the mask plate from above, passing through the mask plate and striking on the loading stage via the lens device; a light reflecting device provided in the lens device; and a second illumination light source, light from which being reflected onto the lower surface of the mask plate by the light reflecting device located in the lens device, the light being reflected by the light reflecting region on the lower surface of the mask plate and striking on the loading stage via the lens device.
    • 曝光装置包括:用于支撑基板的装载台; 掩模板,其平行于所述装载台并且在所述装载台的上方,所述掩模板在其下表面上包括透光区域和光吸收区域,所述光反射区域设置在所述光吸收区域中; 设置在所述掩模板和所述装载台之间的透镜装置; 第一照明光源,从上方垂直撞击掩模板的上表面的光,穿过掩模板并经由透镜装置撞击装载台; 设置在所述透镜装置中的光反射装置; 以及第二照明光源,通过位于透镜装置中的光反射装置反射到掩模板的下表面的光,该光被掩模板的下表面上的光反射区域反射并且被击打 通过透镜装置在装载台上。
    • 8. 发明申请
    • TRANSFER PRINTING APPARATUS FOR MASK PATTERN AND MASK PATTERN PREPARATION METHOD
    • 用于掩模图案和掩模图案制作方法的转印打印设备
    • US20120097056A1
    • 2012-04-26
    • US13380115
    • 2011-03-24
    • Weifeng ZhouJian GuoXing Ming
    • Weifeng ZhouJian GuoXing Ming
    • B41J1/22B41M1/42
    • B41J2/43G03G15/221G03G19/00
    • The present invention discloses a mask pattern transferring device and a method of preparing a mask pattern transferring device. The mask pattern transferring device comprises: a magnetization head disposed on a magnetization head carrying device, for magnetizing composite powders each comprising a core of ferromagnetic metal and an outer resin film; a rotary roller formed of a non-ferromagnetic material, for adsorbing the composite powders magnetized by the magnetization head; a demagnetization head disposed at a downstream of the magnetization head in the rotating direction of the rotary roller, for demagnetizing the magnetized composite powders adsorbed by the rotary roller; and a collecting container, the outer edge of which is tangent with one side of the rotary roller, and which is disposed at the downstream of the magnetization head along the periphery of the rotary roller to collect the demagnetized composite powders.
    • 本发明公开了一种掩膜图案转印装置及其制备方法。 掩模图案转印装置包括:磁化头,设置在磁化头承载装置上,用于磁化每个包括铁磁金属芯和外部树脂膜的复合粉末; 由非铁磁材料形成的用于吸附由磁化头磁化的复合粉末的旋转辊; 磁化头设置在旋转辊的旋转方向的下游的退磁头,用于对被旋转辊吸附的磁化复合粉末进行去磁; 以及收集容器,其外边缘与旋转辊的一侧相切,并且沿着旋转辊的周边设置在磁化头的下游,以收集去磁复合粉末。