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1. 发明授权

US06558475B1 Process for cleaning a workpiece using supercritical carbon dioxide 失效
标题翻译：使用超临界二氧化碳清洗工件的工艺
公开(公告)号：US06558475B1
公开(公告)日：2003-05-06
申请号：US09546355
申请日：2000-04-10
申请人： Jesse Stephen Jur , Kenneth J. McCullough , Wayne Martin Moreau , John Patrick Simons , Charles Jesse Taft
发明人： Jesse Stephen Jur , Kenneth J. McCullough , Wayne Martin Moreau , John Patrick Simons , Charles Jesse Taft
IPC分类号： B08B300
CPC分类号： B08B7/0021 , Y10S134/902
摘要： The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus includes means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media includes means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.
摘要翻译：本发明提供一种用保持在单一流体相的清洁介质清洁工件的设备。该装置包括用于提供清洁介质的装置; 用于接收清洁介质和工件的可加压清洁容器; 以及用于将清洁介质的单个流体相保持在清洁容器中的装置。本发明还提供了一种用于在工件暴露于清洁介质的单个流体相的条件下用清洁介质清洁工件的方法。本发明还包括一种用于存储介质的方法，其包括用于控制本发明方法的处理器的指令。存储介质包括用于控制处理器以控制工件和清洁介质的接触状态的装置，使得工件暴露于清洁介质的单个流体相。

2. 发明授权

US06892741B2 Apparatus and process for supercritical carbon dioxide phase processing 失效
公开(公告)号：US06892741B2
公开(公告)日：2005-05-17
申请号：US10761496
申请日：2004-01-21
申请人： Jesse Stephen Jur , Kenneth J. McCullough , Wayne Martin Moreau , John Patrick Simons , Charles Jesse Taft
发明人： Jesse Stephen Jur , Kenneth J. McCullough , Wayne Martin Moreau , John Patrick Simons , Charles Jesse Taft
IPC分类号： B08B7/00 , B08B3/02
CPC分类号： B08B7/0021 , Y10S134/902
摘要： The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus comprises means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media comprises means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.

3. 发明授权

US06953042B2 Apparatus and process for supercritical carbon dioxide phase processing 失效
标题翻译：超临界二氧化碳相加工的设备和工艺
公开(公告)号：US06953042B2
公开(公告)日：2005-10-11
申请号：US10295531
申请日：2002-11-15
申请人： Jesse Stephen Jur , Kenneth J. McCullough , Wayne Martin Moreau , John Patrick Simons , Charles Jesse Taft
发明人： Jesse Stephen Jur , Kenneth J. McCullough , Wayne Martin Moreau , John Patrick Simons , Charles Jesse Taft
IPC分类号： B08B7/00 , B08B3/00
CPC分类号： B08B7/0021 , Y10S134/902
摘要： The present invention provides an apparatus for cleaning a workpiece with a cleaning medium that is maintained at a single fluid phase. The apparatus comprises means for providing the cleaning medium; a pressurizable cleaning vessel for receiving the cleaning medium and the workpiece; and means for maintaining a single fluid phase of the cleaning medium in the cleaning vessel. The present invention further provides a process for cleaning the workpiece with cleaning medium under conditions such that the workpiece is exposed to a single fluid phase of the cleaning medium. The present invention further includes a process for a storage media that includes instructions for controlling a processor for the process of the present invention. The storage media comprises means for controlling the processor to control contacting conditions of the workpiece and the cleaning medium such that the workpiece is exposed to a single fluid phase of the cleaning medium.
摘要翻译：本发明提供一种用保持在单一流体相的清洁介质清洁工件的设备。该装置包括用于提供清洁介质的装置; 用于接收清洁介质和工件的可加压清洁容器; 以及用于将清洁介质的单个流体相保持在清洁容器中的装置。本发明还提供了一种用于在工件暴露于清洁介质的单个流体相的条件下用清洁介质清洁工件的方法。本发明还包括一种用于存储介质的方法，其包括用于控制本发明方法的处理器的指令。存储介质包括用于控制处理器以控制工件和清洁介质的接触状态的装置，使得工件暴露于清洁介质的单个流体相。

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