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1. 发明授权

US08012403B2 Method for producing high purity low dielectric constant ceramic and hybrid ceramic films 失效
标题翻译：制造高纯度低介电常数陶瓷和混合陶瓷膜的方法
公开(公告)号：US08012403B2
公开(公告)日：2011-09-06
申请号：US10489924
申请日：2001-09-14
申请人： Jerome C. Birnbaum , Glen E. Fryxell , Shari Li Xiaohong , Christopher A. Coyle , Glen C. Dunham , Suresh Baskaran , Ralph E. Williford
发明人： Jerome C. Birnbaum , Glen E. Fryxell , Shari Li Xiaohong , Christopher A. Coyle , Glen C. Dunham , Suresh Baskaran , Ralph E. Williford
IPC分类号： B28B1/30
CPC分类号： C04B35/62655 , B01D67/0048 , B01D67/0058 , B01D67/0088 , B01D67/0093 , B01D71/024 , B01D2323/18 , B01D2323/30 , C04B20/0056 , C04B35/14 , C04B35/16 , C04B35/624 , C04B38/0022 , C04B2111/00482 , C04B2111/1025 , C04B2235/72 , H01L21/31695 , C04B38/0051 , C04B38/009 , C04B38/02 , C04B38/10 , C04B14/4631
摘要： Porous ceramic and hybrid ceramic films are useful as low dielectric constant interlayers in semiconductor interconnects. (Hybrid ceramic films are defined as films that contain organic and ceramic molecular components in the structure, as, for example, organosilicates). This invention describes the usefulness of humidity treatments (using specific temperature/humidity treatments as illustrative examples) in increasing mechanical integrity of porous dielectric films with minimal detrimental effect on film porosity or dielectric constant and with no adverse impact on film quality. The efficacy of such treatments is illustrated using surfactant-templated mesoporous silicate films as an example. This invention also describes a specific family of additives to be used with highly pure alkali-metal-free ceramic and hybrid precursors for such dielectric films that will enable better control of the film porosity and quality and lower dielectric constants with the required mechanical integrity. The efficacy of such additives is illustrated using surfactant-templated mesoporous silicate films as a model example. The invention should be broadly applicable to any cross-linked ceramic or hybrid ceramic films (including silicate and organosilicate films, and especially highly porous forms of the films for low-dielectric constant applications). The invention has been found to be particularly effective with surfactant-templated silicate films with nanometer-scale porosity. The invention in either embodiment should also be applicable to evaporation-induced formation of other cross-linked shapes such as fibers and powders.
摘要翻译：多孔陶瓷和混合陶瓷膜可用作半导体互连中的低介电常数中间层。（混合陶瓷膜被定义为在结构中含有有机和陶瓷分子组分的膜，例如有机硅酸盐）。本发明描述了在增加多孔电介质膜的机械完整性的情况下，湿度处理（使用特定温度/湿度处理作为说明性实例）的有用性，对膜孔隙率或介电常数具有最小的有害影响，并且对膜质量没有不利影响。以表面活性剂模板的介孔硅酸盐膜为例说明了这种处理的效果。本发明还描述了与用于这种介电膜的高纯度无碱金属的陶瓷和混合前体一起使用的特定的添加剂族，其将能够以所需的机械完整性更好地控制膜孔隙率和质量以及更低的介电常数。作为示例，使用表面活性剂模板的中孔硅酸盐膜来说明这些添加剂的功效。本发明应广泛适用于任何交联的陶瓷或混合陶瓷膜（包括硅酸盐和有机硅酸盐膜，特别是用于低介电常数应用的膜的高度多孔形式）。已经发现本发明对于具有纳米级孔隙率的表面活性剂模板化硅酸盐膜是特别有效的。在任一实施方案中的本发明也应适用于其它交联形状如纤维和粉末的蒸发诱导形成。

2. 发明授权

US06329017B1 Mesoporous silica film from a solution containing a surfactant and methods of making same 失效
标题翻译：介孔二氧化硅薄膜由含有表面活性剂的溶液及其制备方法
公开(公告)号：US06329017B1
公开(公告)日：2001-12-11
申请号：US09413062
申请日：1999-10-04
申请人： Jun Liu , Karel Domansky , Xiaohong Li , Glen E. Fryxell , Suresh Baskaran , Nathan J. Kohler , Suntharampillai Thevuthasan , Christopher A. Coyle , Jerome C. Birnbaum
发明人： Jun Liu , Karel Domansky , Xiaohong Li , Glen E. Fryxell , Suresh Baskaran , Nathan J. Kohler , Suntharampillai Thevuthasan , Christopher A. Coyle , Jerome C. Birnbaum
IPC分类号： B05D312
CPC分类号： C01B37/02 , H01L21/31695 , Y10T428/249969 , Y10T428/249972
摘要： The present invention is a mesoporous silica film having a low dielectric constant and method of making having the steps of combining a surfactant in a silica precursor solution, spin-coating a film from this solution mixture, forming a partially hydroxylated mesoporous film, and dehydroxylating the hydroxylated film to obtain the mesoporous film. It is advantageous that the small polyoxyethylene ether surfactants used in spin-coated films as described in the present invention will result in fine pores smaller on average than about 20 nm. The resulting mesoporous film has a dielectric constant less than 3, which is stable in moist air with a specific humidity. The present invention provides a method for superior control of film thickness and thickness uniformity over a coated wafer, and films with low dielectric constant.
摘要翻译：本发明是具有低介电常数的介孔二氧化硅薄膜及其制造方法，其具有以下步骤：在二氧化硅前体溶液中混合表面活性剂，从该溶液混合物中旋涂薄膜，形成部分羟基化介孔薄膜，并使羟基化膜得到介孔膜。在本发明中所述的旋转涂膜中使用的小聚氧乙烯醚表面活性剂的优点是平均产生比20nm小的细孔。得到的介孔膜的介电常数小于3，在湿度相对湿度的空气中稳定。本发明提供了一种用于在涂覆的晶片上优良控制膜厚度和厚度均匀性的方法以及具有低介电常数的膜。

3. 发明授权

US06383466B1 Method of dehydroxylating a hydroxylated material and method of making a mesoporous film 失效
标题翻译：脱羟基化羟基化材料的方法和制备介孔膜的方法
公开(公告)号：US06383466B1
公开(公告)日：2002-05-07
申请号：US09222569
申请日：1998-12-28
申请人： Karel Domansky , Glen E. Fryxell , Jun Liu , Nathan J. Kohler , Suresh Baskaran
发明人： Karel Domansky , Glen E. Fryxell , Jun Liu , Nathan J. Kohler , Suresh Baskaran
IPC分类号： C01B33159
CPC分类号： C01B37/02 , H01L21/31695
摘要： The present invention is a method of dehydroxylating a silica surface that is hydroxylated having the steps of exposing the silica surface separately to a silicon organic compound and a dehydroxylating gas. Exposure to the silicon organic compound can be in liquid, gas or solution phase, and exposure to a dehydroxylating gas is typically at elevated temperatures. In one embodiment, the improvement of the dehydroxylation procedure is the repetition of the soaking and dehydroxylating gas exposure. In another embodiment, the improvement is the use of an inert gas that is substantially free of hydrogen. In yet another embodiment, the present invention is the combination of the two-step dehydroxylation method with a surfactant templating method of making a mesoporous film.
摘要翻译：本发明是一种将羟基化的二氧化硅表面脱羟基化的方法，其具有将二氧化硅表面分别暴露于硅有机化合物和脱羟基化气体的步骤。暴露于硅有机化合物可以是液体，气体或溶液相，并且暴露于脱羟基化气体通常处于升高的温度。在一个实施方案中，脱羟基化程序的改进是重复浸泡和脱羟基化气体暴露。在另一个实施方案中，改进是使用基本上不含氢的惰性气体。在另一个实施方案中，本发明是两步脱羟基化方法与制备介孔膜的表面活性剂模板法的组合。

4. 发明授权

US06537507B2 Non-thermal plasma reactor design and single structural dielectric barrier 失效
标题翻译：非热等离子体反应堆设计和单结构介电屏障
公开(公告)号：US06537507B2
公开(公告)日：2003-03-25
申请号：US09741764
申请日：2000-12-19
申请人： David Emil Nelson , Bob Xiaobin Li , Mark David Hemingway , Darrell R. Herling , Suresh Baskaran
发明人： David Emil Nelson , Bob Xiaobin Li , Mark David Hemingway , Darrell R. Herling , Suresh Baskaran
IPC分类号： B01J1908
CPC分类号： B01J19/08 , B01D53/32 , B01D2259/818 , F01N3/01 , F01N3/0275 , F01N3/0892 , F01N2570/14
摘要： A non-thermal plasma reactor element is provided comprising a multi-cell stack prepared from a plurality of formed building blocks of dielectric material, the walls of the building blocks defining a cell having an exhaust passage for flowing gas to be treated therethrough. A conductive print forming an electrode and connector is disposed on at least one wall of each of the cells and outer insulative plates, disposed on opposite ends of the multi-cell stack, are provided to protect the conductive print. The non-thermal plasma reactor element includes cells defined by a single structural dielectric barrier comprising a “conductor-single structural dielectric barrier-exhaust passage-conductor” arrangement, wherein individual cells of the reactor element are defined by a single structural dielectric barrier.
摘要翻译：提供了一种非热等离子体反应器元件，其包括由多个形成的电介质材料构成块制备的多电池堆，所述构造块的壁限定具有用于流动待处理气体的排气通道的电池。形成电极和连接器的导电印刷设置在设置在多单元叠层的相对端上的每个单元和外绝缘板的至少一个壁上以保护导电印刷。非热等离子体反应器元件包括由包括“导体 - 单一结构介电阻挡 - 排气通道 - 导体”布置的单个结构介电屏障限定的单元，其中反应器元件的单个电池由单个结构介电屏障限定。

5. 发明授权

US5766784A Thin films and uses 失效
标题翻译：薄膜和用途
公开(公告)号：US5766784A
公开(公告)日：1998-06-16
申请号：US630022
申请日：1996-04-08
申请人： Suresh Baskaran , Gordon L. Graff , Lin Song
发明人： Suresh Baskaran , Gordon L. Graff , Lin Song
IPC分类号： B05D1/18 , B05D1/20 , C01G23/047 , C23C18/12
CPC分类号： C23C18/1216 , B05D1/185 , B82Y30/00 , B82Y40/00 , C01G23/047 , B05D1/208 , C01P2002/70 , C01P2002/84 , C01P2004/03 , C01P2004/86
摘要： The invention provides a method for synthesizing a titanium oxide-containing film comprising the following steps: (a) preparing an aqueous solution of a titanium chelate with a titanium molarity in the range of 0.01M to 0.6M. (b) immersing a substrate in the prepared solution, (c) decomposing the titanium chelate to deposit a film on the substrate. The titanium chelate maybe decomposed acid, base, temperature or other means. A preferred method provides for the deposit of adherent titanium oxide films from C2 to C5 hydroxy carboxylic acids. In another aspect the invention is a novel article of manufacture having a titanium coating which protects the substrate against ultraviolet damage. In another aspect the invention provides novel semipermeable gas separation membranes, and a method for producing them.
摘要翻译：本发明提供一种合成含氧化钛膜的方法，包括以下步骤：（a）制备钛摩尔浓度为0.01M至0.6M范围内的钛螯合物水溶液。（b）将基材浸入制备的溶液中，（c）分解钛螯合物以在基材上沉积膜。钛螯合物可以分解酸，碱，温度等手段。优选的方法提供从C2到C5羟基羧酸沉积粘附的氧化钛膜。在另一方面，本发明是具有钛涂层的新型制造品，其保护基底免受紫外线损伤。另一方面，本发明提供新型的半透气分离膜及其制造方法。

6. 发明申请

US20050258578A1 Method for producing high purity low dielectric constant ceramic and hybrid ceramic films field of the invention 失效
标题翻译：本发明制备高纯度低介电常数陶瓷和复合陶瓷薄膜领域的方法
公开(公告)号：US20050258578A1
公开(公告)日：2005-11-24
申请号：US10489924
申请日：2001-09-14
申请人： Jerome Birnbaum , Glen Fryxell , Shari Xiaohong , Christopher Coyle , Glen Dunham , Suresh Baskaran , Ralph Williford
发明人： Jerome Birnbaum , Glen Fryxell , Shari Xiaohong , Christopher Coyle , Glen Dunham , Suresh Baskaran , Ralph Williford
IPC分类号： C04B38/06 , B28B1/30 , B28B11/00 , C01B33/12 , C04B20/00 , C04B33/32 , C04B35/14 , C04B35/16 , C04B35/624 , C04B38/00 , C04B38/10 , C04B41/80 , H01L21/316
CPC分类号： C04B35/62655 , B01D67/0048 , B01D67/0058 , B01D67/0088 , B01D67/0093 , B01D71/024 , B01D2323/18 , B01D2323/30 , C04B20/0056 , C04B35/14 , C04B35/16 , C04B35/624 , C04B38/0022 , C04B2111/00482 , C04B2111/1025 , C04B2235/72 , H01L21/31695 , C04B38/0051 , C04B38/009 , C04B38/02 , C04B38/10 , C04B14/4631
摘要： Porous ceramic and hybrid ceramic films are useful as low dielectric constant interlayers in semiconductor interconnects. (Hybrid ceramic films are defined as films that contain organic and ceramic molecular components in the structure, as, for example, organosilicates). This invention describes the usefulness of humidity treatments (using specific temperature/humidity treatments as illustrative examples) in increasing mechanical integrity of porous dielectric films with minimal detrimental effect on film porosity or dielectric constant and with no adverse impact on film quality. The efficacy of such treatments is illustrated using surfactant-templated mesoporous silicate films as an example. This invention also describes a specific family of additives to be used with highly pure alkali-metal-free ceramic and hybrid precursors for such dielectric films that will enable better control of the film porosity and quality and lower dielectric constants with the required mechanical integrity. The efficacy of such additives is illustrated using surfactant-templated mesoporous silicate films as a model example. The invention should be broadly applicable to any cross-linked ceramic or hybrid ceramic films (including silicate and organosilicate films, and especially highly porous forms of the films for low-dielectric constant applications). The invention has been found to be particularly effective with surfactant-templated silicate films with nanometer-scale porosity. The invention in either embodiment should also be applicable to evaporation-induced formation of other cross-linked shapes such as fibers and powders.
摘要翻译：多孔陶瓷和混合陶瓷膜可用作半导体互连中的低介电常数中间层。（混合陶瓷膜被定义为在结构中含有有机和陶瓷分子组分的膜，例如有机硅酸盐）。本发明描述了在增加多孔电介质膜的机械完整性的情况下，湿度处理（使用特定温度/湿度处理作为说明性实例）的有用性，对膜孔隙率或介电常数具有最小的有害影响，并且对膜质量没有不利影响。以表面活性剂模板的介孔硅酸盐膜为例说明了这种处理的效果。本发明还描述了与用于这种介电膜的高纯度无碱金属的陶瓷和混合前体一起使用的特定的添加剂族，其将能够以所需的机械完整性更好地控制膜孔隙率和质量以及更低的介电常数。作为示例，使用表面活性剂模板的中孔硅酸盐膜来说明这些添加剂的功效。本发明应广泛适用于任何交联的陶瓷或混合陶瓷膜（包括硅酸盐和有机硅酸盐膜，特别是用于低介电常数应用的膜的高度多孔形式）。已经发现本发明对于具有纳米级孔隙率的表面活性剂模板化硅酸盐膜是特别有效的。在任一实施方案中的本发明也应适用于其它交联形状如纤维和粉末的蒸发诱导形成。

7. 发明授权

US06548113B1 Vacuum/gas phase reactor for dehydroxylation and alkylation of porous silica 失效
标题翻译：真空/气相反应器用于多羟基硅烷的脱羟基和烷基化
公开(公告)号：US06548113B1
公开(公告)日：2003-04-15
申请号：US09711666
申请日：2000-11-09
申请人： Jerome Birnbaum , Gary Maupin , Glen Dunham , Glen Fryxell , Suresh Baskaran
发明人： Jerome Birnbaum , Gary Maupin , Glen Dunham , Glen Fryxell , Suresh Baskaran
IPC分类号： C23C1644
CPC分类号： C01B37/02 , H01L21/31695 , Y10T428/249969 , Y10T428/249972
摘要： Vacuum/gas phase reactor embodiments used in gas phase dehydroxylation and alkylation reactions are described in which the substrate could be subjected to high vacuum, heated to target temperature, and treated with silane as quickly and efficiently as possible. To better facilitate the silylation and to increase the efficiency of the process, the reactor is designed to contain quasi-catalytic surfaces which can act both as an “activator” to put species in a higher energy state or a highly activated state, and as a “scrubber” to eliminate possible poisons or reactive by-products generated in the silylation reactions. One described embodiment is a hot filament reactor having hot, preferably metallic, solid surfaces within the reactor's chamber in which wafers having mesoporous silicate films are treated. Another is an IR reactor having upper and lower quartz windows sealing the upper and lower periphery of an aluminum annulus to form a heated chamber. Finally, a flange reactor is described that includes a flange base and lid forming a tiny chamber therein for a wafer, the reactor being heated by conduction from a hot sand bath. The dehydroxylation and alkylation treatment of mesoporous silica films produces treated films exhibiting low dielectric constant and high elastic modulus.
摘要翻译：描述了用于气相脱羟基和烷基化反应的真空/气相反应器实施例，其中基底可经受高真空，加热至目标温度，并尽可能快速且有效地用硅烷处理。为了更好地促进甲硅烷基化和提高该方法的效率，反应器被设计成包含准催化剂表面，它们既可以作为“活化剂”来将物质置于更高能量状态或高活化状态，也可以作为 “洗涤器”来消除在甲硅烷化反应中产生的可能的毒物或反应性副产物。一个描述的实施方案是在反应器室内具有热的，优选金属的固体表面的热丝反应器，其中处理具有介孔硅酸盐膜的晶片。另一种是IR反应器，其具有密封铝环空的上下周边的上，下石英窗，以形成加热室。最后，描述了一种法兰反应器，其包括法兰基座和盖子，用于在晶片上形成微小的室，该反应器由热砂浴传导加热。介孔二氧化硅膜的脱羟基化和烷基化处理产生显示低介电常数和高弹性模量的处理膜。

8. 再颁专利

USRE40299E1 Mesoporous-silica films, fibers, and powders by evaporation 有权
标题翻译：介孔二氧化硅薄膜，纤维和粉末通过蒸发
公开(公告)号：USRE40299E1
公开(公告)日：2008-05-06
申请号：US09481988
申请日：2000-01-11
申请人： Paul J. Bruinsma , Suresh Baskaran , Jagannadha R. Bontha , Jun Liu
发明人： Paul J. Bruinsma , Suresh Baskaran , Jagannadha R. Bontha , Jun Liu
IPC分类号： C01B33/12
CPC分类号： C04B41/4582 , B01J20/103 , B01J21/08 , B01J37/0236 , B01J37/033 , C01B37/005 , C01B37/02 , C04B20/0056 , C04B35/14 , C04B35/62218 , C04B38/0022 , C04B41/009 , C04B41/81 , C04B38/009 , C04B38/02 , C04B38/10 , C04B14/4631 , C04B20/006
摘要： This invention pertains to surfactant-templated nanometer-scale porosity of a silica precursor solution and forming a mesoporous material by first forming the silica precursor solution into a preform having a high surface area to volume ratio, then rapid drying or evaporating a solvent from the silica precursor solution. The mesoporous material may be in any geometric form, but is preferably in the form of a film, fiber, powder or combinations thereof. The rapid drying or evaporation of solvent from the solution is accomplished by layer thinning, for example spin casting, liquid drawing, and liquid spraying respectively. Production of a film is by layer thinning, wherein a layer of the silica precursor solution is formed on a surface followed by removal of an amount of the silica precursor solution and leaving a geometrically thinner layer of the silica precursor solution from which the solvent quickly escapes via evaporation. Layer thinning may be by any method including but not limited to squeegeeing and/or spin casting. In powder formation by spray drying, the same conditions of fast drying exists as in spin-casting (as well as in fiber spinning) because of the high surface-area to volume ratio of the product. When a powder is produced by liquid spraying, the particles or micro-bubbles within the powder are hollow spheres with walls composed of mesoporous silica. Mesoporous fiber formation starts with a similar silica precursor solution but with an added pre-polymer making a pituitous mixture that is drawn into a thin strand from which solvent is evaporated leaving the mesoporous fiber(s).
摘要翻译：本发明涉及二氧化硅前体溶液的表面活性剂模板纳米级孔隙率，并通过首先将二氧化硅前体溶液形成具有高表面积与体积比的预成型体形成介孔材料，然后快速干燥或蒸发二氧化硅溶剂前体溶液。介孔材料可以是任何几何形式，但优选为薄膜，纤维，粉末或其组合的形式。溶剂从溶液中快速干燥或蒸发即可通过层间稀化来实现，例如旋转浇铸，液体拉伸和液体喷涂。膜的制备是通过薄层变薄，其中在表面上形成二氧化硅前体溶液层，然后除去一定量的二氧化硅前体溶液，并留下几何较薄的二氧化硅前体溶液层，溶剂快速从其中逸出通过蒸发。层薄化可以通过任何方法，包括但不限于刮涂和/或旋转浇铸。在通过喷雾干燥形成粉末的过程中，由于产品的表面积与体积比高，因此在旋转铸造（以及纤维纺丝）中存在相同的快干条件。当通过液体喷雾产生粉末时，粉末中的颗粒或微小气泡是具有由介孔二氧化硅组成的壁的中空球体。中孔纤维形成从类似的二氧化硅前体溶液开始，但是加入预聚物制成垂直的混合物，其被拉入薄的链中，从该溶液中蒸发掉溶剂，留下介孔纤维。

9. 发明授权

US06984298B2 Gas sensor having an insulating layer 有权
标题翻译：气体传感器具有绝缘层
公开(公告)号：US06984298B2
公开(公告)日：2006-01-10
申请号：US10042867
申请日：2002-01-09
申请人： Kaius K. Polikarpus , Walter T. Symons , Kerry Gross , William J. LaBarge , Suresh Baskaran , Craig Fredrick Habeger , John David Vienna , Jarrod Vincent Crum , John Gerard Darab , Timothy R. Armstrong
发明人： Kaius K. Polikarpus , Walter T. Symons , Kerry Gross , William J. LaBarge , Suresh Baskaran , Craig Fredrick Habeger , John David Vienna , Jarrod Vincent Crum , John Gerard Darab , Timothy R. Armstrong
IPC分类号： G01N27/407
CPC分类号： C04B35/6264 , B32B2315/02 , C03C8/02 , C04B35/111 , C04B35/117 , C04B35/63 , C04B35/632 , C04B35/634 , C04B2235/36 , C04B2235/6025 , C04B2235/96 , C04B2235/9607 , C04B2235/9615 , C04B2237/343 , C04B2237/348 , G01N27/4071
摘要： Disclosed herein is a ceramic part, gas sensor, and method for making the gas sensor. The ceramic part comprises: an insulating layer affixed to a substrate wherein the insulating layer comprising Al2O3 particles; and a glass comprising about 45 to about 69 mole percent SiO2, 0 to about 9 mole percent B2O3, 0 to about 26 mole percent Al2O3, 0 and 25 mole percent SrO, and about 10 to about 26 mole percent RE2O3, where RE2O3 is selected from the group consisting of Y2O3, three valent rare earth oxides, and combinations comprising at least one of the foregoing.In one embodiment of a ceramic part, a gas sensor comprises: an electrolyte layer having disposed on opposite sides thereof a first electrode and a second electrode; and an insulating layer that is in intimate contact with the second electrode, wherein the insulating layer comprises alumina and frit.The method of making the gas sensor comprises: disposing a first electrode and a second electrode on opposite sides of an electrolyte layer; forming an insulating layer comprising alumina and frit; disposing the insulating layer adjacent to the second electrode to form a green sensor; and heating the green sensor to a temperature sufficient to sinter the electrolyte layer and the insulating layer.
摘要翻译：这里公开了一种用于制造气体传感器的陶瓷部件，气体传感器和方法。陶瓷部件包括：固定在基板上的绝缘层，其中包含Al 2 O 3颗粒的绝缘层; 和包含约45至约69摩尔％的SiO 2，0至约9摩尔％的B 2 O 3 3，0至约26的玻璃摩尔百分比的Al 2 O 3，0和25摩尔％的SrO和约10至约26摩尔％的RE 2 O 3 其中RE 2 2 O 3 3选自Y 2 O 3，N 3，三价稀土氧化物，以及包含前述的至少一种的组合。在陶瓷部件的一个实施例中，气体传感器包括：电解质层，其在其相对侧上设置有第一电极和第二电极; 以及与所述第二电极紧密接触的绝缘层，其中所述绝缘层包括氧化铝和玻璃料。制造气体传感器的方法包括：在电解质层的相对侧上设置第一电极和第二电极; 形成包含氧化铝和玻璃料的绝缘层; 将所述绝缘层设置成与所述第二电极相邻以形成绿色传感器; 并将绿色传感器加热到足以烧结电解质层和绝缘层的温度。

10. 发明授权

US5922299A Mesoporous-silica films, fibers, and powders by evaporation 失效
标题翻译：介孔二氧化硅薄膜，纤维和粉末通过蒸发
公开(公告)号：US5922299A
公开(公告)日：1999-07-13
申请号：US921754
申请日：1997-08-26
申请人： Paul J. Bruinsma , Suresh Baskaran , Jagannadha R. Bontha , Jun Liu
发明人： Paul J. Bruinsma , Suresh Baskaran , Jagannadha R. Bontha , Jun Liu
IPC分类号： B01J20/10 , B01J21/08 , B01J37/02 , B01J37/03 , C01B37/00 , C01B37/02 , C04B20/00 , C04B35/14 , C04B35/622 , C04B38/00 , C01B33/12
CPC分类号： C04B41/4582 , B01J20/103 , B01J21/08 , B01J37/0236 , B01J37/033 , C01B37/005 , C01B37/02 , C04B20/0056 , C04B35/14 , C04B35/62218 , C04B38/0022 , C04B41/009 , C04B41/81
摘要： This invention pertains to surfactant-templated nanometer-scale porosity of a silica precursor solution and forming a mesoporous material by first forming the silica precursor solution into a preform having a high surface area to volume ratio, then rapid drying or evaporating a solvent from the silica precursor solution. The mesoporous material may be in any geometric form, but is preferably in the form of a film, fiber, powder or combinations thereof. The rapid drying or evaporation of solvent from the solution is accomplished by layer thinning, for example spin casting, liquid drawing, and liquid spraying respectively. Production of a film is by layer thinning, wherein a layer of the silica precursor solution is formed on a surface followed by removal of an amount of the silica precursor solution and leaving a geometrically thinner layer of the silica precursor solution from which the solvent quickly escapes via evaporation. Layer thinning may be by any method including but not limited to squeegeeing and/or spin casting. In powder formation by spray drying, the same conditions of fast drying exists as in spin-casting (as well as in fiber spinning) because of the high surface-area to volume ratio of the product. When a powder is produced by liquid spraying, the particles or micro-bubbles within the powder are hollow spheres with walls composed of mesoporous silica. Mesoporous fiber formation starts with a similar silica precursor solution but with an added pre-polymer making a pituitous mixture that is drawn into a thin strand from which solvent is evaporated leaving the mesoporous fiber(s).
摘要翻译：本发明涉及二氧化硅前体溶液的表面活性剂模板纳米级孔隙率，并通过首先将二氧化硅前体溶液形成具有高表面积与体积比的预成型体形成介孔材料，然后快速干燥或蒸发二氧化硅溶剂前体溶液。介孔材料可以是任何几何形式，但优选为薄膜，纤维，粉末或其组合的形式。溶剂从溶液中快速干燥或蒸发即可通过层间稀化来实现，例如旋转浇铸，液体拉伸和液体喷涂。膜的制备是通过薄层变薄，其中在表面上形成二氧化硅前体溶液层，然后除去一定量的二氧化硅前体溶液，并留下几何较薄的二氧化硅前体溶液层，溶剂快速从其中逸出通过蒸发。层薄化可以通过任何方法，包括但不限于刮涂和/或旋转浇铸。在通过喷雾干燥形成粉末的过程中，由于产品的表面积与体积比高，因此在旋转铸造（以及纤维纺丝）中存在相同的快干条件。当通过液体喷雾产生粉末时，粉末中的颗粒或微小气泡是具有由介孔二氧化硅组成的壁的中空球体。中孔纤维形成从类似的二氧化硅前体溶液开始，但是加入预聚物制成垂直的混合物，其被拉入薄的链中，从该溶液中蒸发掉溶剂，留下介孔纤维。

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