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1. 发明申请

US20110228239A1 LITHOGRAPHIC APPARATUS, AN ILLUMINATION SYSTEM, A PROJECTION SYSTEM AND A METHOD OF MANUFACTURING A DEVICE USING A LITHOGRAPHIC APPARATUS 有权
标题翻译：平面设备，照明系统，投影系统和使用平面设备制造设备的方法
公开(公告)号：US20110228239A1
公开(公告)日：2011-09-22
申请号：US13050476
申请日：2011-03-17
申请人： Jeroen Gerard GOSEN , Antonius Johannus Van Der Net , Bart Dinand Paarhuis , Frank Johannes Jacobus Van Boxtel , Jinggao Li
发明人： Jeroen Gerard GOSEN , Antonius Johannus Van Der Net , Bart Dinand Paarhuis , Frank Johannes Jacobus Van Boxtel , Jinggao Li
IPC分类号： G03B27/52
CPC分类号： G03F7/70916
摘要： A gas curtain is provided to separate a component of a lithographic apparatus from contaminated gas. The gas curtain is supplied by an opening. The opening is at a boundary of a protection environment with which a surface of the component comes into contact. The gas curtain may separate the component from a moving part of the apparatus.
摘要翻译：提供气帘以将光刻设备的部件与受污染的气体分离。气幕由开口提供。开口处于组件表面接触的保护环境的边界。气幕可以将组件与设备的移动部分分离。

2. 发明授权

US08810769B2 Lithographic apparatus, an illumination system, a projection system and a method of manufacturing a device using a lithographic apparatus 有权
标题翻译：光刻设备，照明系统，投影系统以及使用光刻设备制造设备的方法
公开(公告)号：US08810769B2
公开(公告)日：2014-08-19
申请号：US13050476
申请日：2011-03-17
申请人： Jeroen Gerard Gosen , Antonius Johannus Van Der Net , Bart Dinand Paarhuis , Frank Johannes Jacobus Van Boxtel , Jinggao Li
发明人： Jeroen Gerard Gosen , Antonius Johannus Van Der Net , Bart Dinand Paarhuis , Frank Johannes Jacobus Van Boxtel , Jinggao Li
IPC分类号： G03B27/52
CPC分类号： G03F7/70916
摘要： A gas curtain is provided to separate a component of a lithographic apparatus from contaminated gas. The gas curtain is supplied by an opening. The opening is at a boundary of a protection environment with which a surface of the component comes into contact. The gas curtain may separate the component from a moving part of the apparatus.
摘要翻译：提供气帘以将光刻设备的部件与受污染的气体分离。气幕由开口提供。开口处于组件表面接触的保护环境的边界。气幕可以将组件与设备的移动部分分离。

3. 发明申请

US20120249983A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20120249983A1
公开(公告)日：2012-10-04
申请号：US13430159
申请日：2012-03-26
申请人： Herman Vogel , Jeroen Gerard Gosen , Bart Dinand Paarhuis , Frank Johannes Jacobus Van Boxtel , Jinggao Li
发明人： Herman Vogel , Jeroen Gerard Gosen , Bart Dinand Paarhuis , Frank Johannes Jacobus Van Boxtel , Jinggao Li
IPC分类号： G03B27/42
CPC分类号： G03F7/70908 , G03F7/70866
摘要： An apparatus, in an embodiment, having a patterning device support including a first planar element having a first flow-restricting surface; a second planar element including a second flow-restricting surface facing the first flow-restricting surface; a support driver to linearly move the support along a certain direction relative to the second planar element, wherein the first and/or second flow-restricting surface has one or more projections and/or recesses between the first and second flow-restricting surfaces, and wherein the projection and/or recess on the first and/or second flow-restricting surface is arranged to provide a flow resistance, per unit width of the first and/or second flow-restricting surface perpendicular to the flow, that is lower against flow that is parallel to the certain direction than against flow that is perpendicular to the certain direction. The flow-restricting surfaces may direct gas flow onto a driver part that generates heat.
摘要翻译：在一个实施例中，具有图案形成装置支撑件的装置包括具有第一流动限制表面的第一平面元件; 第二平面元件，包括面向第一流动限制表面的第二流动限制表面; 支撑驱动器，用于沿着相对于第二平面元件的某个方向线性地移动支撑件，其中第一和/或第二流动限制表面在第一和第二流动限制表面之间具有一个或多个突起和/或凹部，以及其中所述第一和/或第二限流表面上的所述突起和/或凹部被布置成提供与所述流动垂直的所述第一和/或第二流动限制表面的每单位宽度的流动阻力，其平行于一定方向，而不是垂直于某一方向的流动。流动限制表面可以将气流引导到产生热量的驱动器部件上。

4. 发明授权

US09081311B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US09081311B2
公开(公告)日：2015-07-14
申请号：US13430159
申请日：2012-03-26
申请人： Herman Vogel , Jeroen Gerard Gosen , Bart Dinand Paarhuis , Frank Johannes Jacobus Van Boxtel , Jinggao Li
发明人： Herman Vogel , Jeroen Gerard Gosen , Bart Dinand Paarhuis , Frank Johannes Jacobus Van Boxtel , Jinggao Li
IPC分类号： G03B27/62 , G03B27/64 , G03B27/52 , G03F7/20
CPC分类号： G03F7/70908 , G03F7/70866
摘要： An apparatus, in an embodiment, having a patterning device support including a first planar element having a first flow-restricting surface; a second planar element including a second flow-restricting surface facing the first flow-restricting surface; a support driver to linearly move the support along a certain direction relative to the second planar element, wherein the first and/or second flow-restricting surface has one or more projections and/or recesses between the first and second flow-restricting surfaces, and wherein the projection and/or recess on the first and/or second flow-restricting surface is arranged to provide a flow resistance, per unit width of the first and/or second flow-restricting surface perpendicular to the flow, that is lower against flow that is parallel to the certain direction than against flow that is perpendicular to the certain direction. The flow-restricting surfaces may direct gas flow onto a driver part that generates heat.
摘要翻译：在一个实施例中，具有图案形成装置支撑件的装置包括具有第一流动限制表面的第一平面元件; 第二平面元件，包括面向第一流动限制表面的第二流动限制表面; 支撑驱动器，用于沿着相对于第二平面元件的某个方向线性地移动支撑件，其中第一和/或第二流动限制表面在第一和第二流动限制表面之间具有一个或多个突起和/或凹部，以及其中所述第一和/或第二限流表面上的所述突起和/或凹部被布置成提供与所述流动垂直的所述第一和/或第二流动限制表面的每单位宽度的流动阻力，其平行于一定方向，而不是垂直于某一方向的流动。流动限制表面可以将气流引导到产生热量的驱动器部件上。

5. 发明授权

US09811007B2 Lithographic apparatus and method of cooling a component in a lithographic apparatus 有权
公开(公告)号：US09811007B2
公开(公告)日：2017-11-07
申请号：US13644653
申请日：2012-10-04
申请人： Frank Johannes Jacobus Van Boxtel , Antonius Johannus Van Der Net , Leonarda Hendrika Van Den Heuvel
发明人： Frank Johannes Jacobus Van Boxtel , Antonius Johannus Van Der Net , Leonarda Hendrika Van Den Heuvel
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70875 , G03F7/70891 , G03F7/70991
摘要： A lithographic apparatus includes a component and a local cooler to apply a local cooling load to the component. The local cooler has a gas passageway including a flow restriction upstream of the component and configured to direct a flow of gas exiting the flow restriction to cool a surface of the component.

6. 发明授权

US08988657B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08988657B2
公开(公告)日：2015-03-24
申请号：US13541300
申请日：2012-07-03
申请人： Frank Johannes Jacobus Van Boxtel , Jeroen Gerard Gosen , Anthonie Kuijper , Arjan Hubrecht Josef Anna Martens , Jean-Philippe Xavier Van Damme , Peter Schoenmakers , Franciscus Joannes Anthonius Evers , Jaap Wilhelmus Petrus Van Empel , Léon Hubert Joseph Coumans , Justin Johannes Hermanus Gerritzen
发明人： Frank Johannes Jacobus Van Boxtel , Jeroen Gerard Gosen , Anthonie Kuijper , Arjan Hubrecht Josef Anna Martens , Jean-Philippe Xavier Van Damme , Peter Schoenmakers , Franciscus Joannes Anthonius Evers , Jaap Wilhelmus Petrus Van Empel , Léon Hubert Joseph Coumans , Justin Johannes Hermanus Gerritzen
IPC分类号： G03F7/20
CPC分类号： G03F7/70716 , G03F7/70866 , G03F7/70916 , G03F7/70933
摘要： A lithographic apparatus having a component that moves in a first direction, the component including a passive gas flow system. The passive gas flow system has a gas inlet to drive gas into the passive gas flow system when the component moves in the first direction and a gas outlet, connected to the gas inlet by a gas conduit, to direct the gas that is driven into the passive gas flow system in a certain direction.
摘要翻译：具有沿第一方向移动的部件的光刻设备，所述部件包括被动气体流动系统。被动气流系统具有气体入口，用于当部件沿第一方向移动时将气体驱动到被动气体流动系统中，气体出口通过气体导管连接到气体入口，以将被驱动的气体引导到被动气流系统在一定方向。

7. 发明申请

US20130155380A1 PUMP SYSTEM, A CARBON DIOXIDE SUPPLY SYSTEM, AN EXTRACTION SYSTEM, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD 有权
标题翻译：泵系统，二氧化碳供应系统，提取系统，平面设备和设备制造方法
公开(公告)号：US20130155380A1
公开(公告)日：2013-06-20
申请号：US13714205
申请日：2012-12-13
申请人： Marc Léon Van Der Gaag , Leonarda Hendrika Van Den Heuvel , Arjan Hubrecht Josef Anna Martens , Frank Johannes Jacobus Van Boxtel
发明人： Marc Léon Van Der Gaag , Leonarda Hendrika Van Den Heuvel , Arjan Hubrecht Josef Anna Martens , Frank Johannes Jacobus Van Boxtel
IPC分类号： G03F7/00
CPC分类号： G03F7/00 , G03F7/70341 , Y10T137/0396 , Y10T137/8326 , Y10T137/85986
摘要： An extraction system, including a pump to pump gas along a conduit to a check valve configured to open at an upstream pressure over a certain magnitude, a pressure sensor to generate a signal indicative of a pressure of gas between the pump and the check valve, and a controller configured to generate a stop signal if a signal from the pressure sensor indicates that the pressure of gas between the pump and the check valve is below a certain magnitude.
摘要翻译：一种提取系统，包括泵，其将气体沿导管泵送至配置成在一定大小的上游压力下打开的止回阀;压力传感器，用于产生指示泵和止回阀之间的气体压力的信号; 以及控制器，被配置为如果来自压力传感器的信号指示泵和止回阀之间的气体压力低于一定量值，则产生停止信号。

8. 发明申请

US20130149649A1 LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20130149649A1
公开(公告)日：2013-06-13
申请号：US13693923
申请日：2012-12-04
申请人： Theodorus Wilhelmus POLET , Henrikus Herman Marie Cox , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Jimmy Matheus Wilhelmus Van De Winkel , Gregory Martin Mason Corcoran , Frank Johannes Jacobus Van Boxtel
发明人： Theodorus Wilhelmus POLET , Henrikus Herman Marie Cox , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Jimmy Matheus Wilhelmus Van De Winkel , Gregory Martin Mason Corcoran , Frank Johannes Jacobus Van Boxtel
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70758 , G03F7/70783
摘要： A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.
摘要翻译：一种光刻设备，具有：用于保持基板的基板台; 投影系统，被配置为将图案化的辐射束投影到所述基板的目标部分上; 衬底表面致动器，其包括流体开口，用于从面向衬底表面致动器的面向表面的流体流过，以在衬底表面致动器和面对表面之间产生力，面对表面是衬底的顶表面或表面基本上与基板共面; 以及位置控制器，其通过改变通过流体开口的流体流动来控制面对表面的一部分的位置和/或取向，以相对于投影系统移位相对表面的一部分。

9. 发明授权

US08675170B2 Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method 有权
标题翻译：气体歧管，光刻设备模块，光刻设备和器件制造方法
公开(公告)号：US08675170B2
公开(公告)日：2014-03-18
申请号：US13406006
申请日：2012-02-27
申请人： Frank Johannes Jacobus Van Boxtel , Pieter Debrauwer , Antonius Arnoldus Henricus Van Der Steen , Robin Bernardus Johannes Koldeweij
发明人： Frank Johannes Jacobus Van Boxtel , Pieter Debrauwer , Antonius Arnoldus Henricus Van Der Steen , Robin Bernardus Johannes Koldeweij
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03B27/52 , G03F7/70891
摘要： A gas manifold to direct a gas flow between two parallel plates of an optical component of a lithographic apparatus, the gas manifold having an inlet to provide a gas flow to the gas manifold, a lattice comprising a plurality of through holes to homogenize the gas flow, a contractor downstream of the lattice to reduce the cross sectional area through which the gas flow flows, and an outlet downstream of the contractor to provide the gas flow to the two parallel plates.
摘要翻译：气体歧管，用于将气流引导到光刻设备的光学部件的两个平行板之间，气体歧管具有向气体歧管提供气流的入口，包括多个通孔以使气流均匀化的格子，格栅下游的承包商，以减少气流流过的横截面积，以及承包商下游的出口，以将气流提供给两个平行板。

10. 发明授权

US08675169B2 Gas manifold, module for a lithographic apparatus, lithographic apparatus and device manufacturing method 有权
标题翻译：气体歧管，光刻设备模块，光刻设备和器件制造方法
公开(公告)号：US08675169B2
公开(公告)日：2014-03-18
申请号：US13273817
申请日：2011-10-14
申请人： Frank Johannes Jacobus Van Boxtel , Marinus Johannes Maria Van Dam , Johannes Christiaan Maria Jasper , Ronald Van Der Ham , Sergei Yurievich Shulepov , Gerben Pieterse , Marco Baragona , Pieter Debrauwer , Antonius Arnoldus Henricus Van Der Steen
发明人： Frank Johannes Jacobus Van Boxtel , Marinus Johannes Maria Van Dam , Johannes Christiaan Maria Jasper , Ronald Van Der Ham , Sergei Yurievich Shulepov , Gerben Pieterse , Marco Baragona , Pieter Debrauwer , Antonius Arnoldus Henricus Van Der Steen
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70891 , G03F7/70091 , G03F7/70991
摘要： A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.
摘要翻译：气体歧管，用于将气流引导到光刻设备的光学部件的两个板之间，气体歧管具有入口，入口下游的扩散器，入口下游的流动矫正器，流动矫直机下游的承重器，和承包商下游的出口。

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