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1. 发明申请

US20080299467A1 Mask mold, manufacturing method thereof, and method for forming large-sized micro pattern using mask mold 审中-公开
标题翻译：掩模模具及其制造方法以及使用掩模模具形成大尺寸微图案的方法
公开(公告)号：US20080299467A1
公开(公告)日：2008-12-04
申请号：US12149520
申请日：2008-05-02
申请人： Jeong Gil Kim , Young Tae Cho , Young Suk Sim , Sung Hoon Cho , Suk Won Lee , Seon Mi Park , Sin Kwon , Jung Woo Seo , Jung Woo Park , Sung Woo Cho
发明人： Jeong Gil Kim , Young Tae Cho , Young Suk Sim , Sung Hoon Cho , Suk Won Lee , Seon Mi Park , Sin Kwon , Jung Woo Seo , Jung Woo Park , Sung Woo Cho
IPC分类号： G03F1/14 , B05D3/06
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Disclosed are a mask mold, a manufacturing method thereof, and a method for forming a large-sized micro pattern using the manufactured mask mold, in which the size of a nano-level micro pattern can be enlarged using a simple method with low cost and interference and stitching errors between cells forming a large area can be minimized. The method for manufacturing the mask mold includes the operations of coating resist on a mask or a plurality of small molds having an engraved micro pattern, pressing the small molds to imprint the micro pattern on the resist, curing the resist, and releasing the small molds from the resist.
摘要翻译：公开了一种掩模模具及其制造方法，以及使用该制造的掩模模具形成大尺寸微图案的方法，其中可以使用简单的方法以低成本扩大纳米级微图案的尺寸，并且可以使形成大面积的电池之间的干涉和缝合误差最小化。掩模模具的制造方法包括在掩模上涂布抗蚀剂或具有雕刻微图案的多个小型模具的操作，按压小模具将微图案压印在抗蚀剂上，固化抗蚀剂，并释放小模具从抗拒。

2. 发明申请

US20100290143A1 Color filter and apparatus and method of manufacturing the same 审中-公开
标题翻译：滤色器及其制造方法
公开(公告)号：US20100290143A1
公开(公告)日：2010-11-18
申请号：US12662478
申请日：2010-04-20
申请人： Jeong Gil Kim , Young Tae Cho , Suk Won Lee , Sin Kwon , Ki Hyun Kim , Jung Woo Seo
发明人： Jeong Gil Kim , Young Tae Cho , Suk Won Lee , Sin Kwon , Ki Hyun Kim , Jung Woo Seo
IPC分类号： G02B5/22 , B05D5/06 , B05C1/08 , G02B1/04
CPC分类号： G02B5/201 , B05C1/0834 , G02B5/223
摘要： Disclosed herein are a color filter having a black matrix and an apparatus and method of manufacturing the same. The method may include applying an organic film to a substrate, forming a pattern on the organic film by applying pressure to the organic film with a mold having prominences and depressions, and forming a black matrix by applying an ink to the pattern of the organic film. The formation of the black matrix may be achieved by a roll to roll method. The black matrix is easily formed by carrying out imprinting and printing on the organic film applied to the substrate. The black matrix may have a fine line width of a nano level by imprinting and printing. Further, since the black matrix is formed by the roll to roll method, material costs may be reduced and the color filter may be manufactured at a relatively high speed.
摘要翻译：本文公开了具有黑矩阵的滤色器及其制造方法。该方法可以包括将有机膜施加到基底上，通过用具有突起和凹陷的模具对有机膜施加压力，在有机膜上形成图案，并通过向有机膜的图案施加墨来形成黑色矩阵。黑色矩阵的形成可以通过卷绕方法来实现。通过在施加到基板上的有机膜上进行印刷和印刷，容易地形成黑色矩阵。通过印刷和印刷，黑色矩阵可以具有纳米级的细线宽度。此外，由于通过卷绕方法形成黑色矩阵，所以可以降低材料成本，并且可以以相对高的速度制造滤色器。

3. 发明授权

US08557130B2 Nano-imprint lithography methods 有权
标题翻译：纳米压印光刻方法
公开(公告)号：US08557130B2
公开(公告)日：2013-10-15
申请号：US12654023
申请日：2009-12-08
申请人： Young Tae Cho , Suk Won Lee , Sin Kwon , Jung Woo Seo , Jeong Gil Kim
发明人： Young Tae Cho , Suk Won Lee , Sin Kwon , Jung Woo Seo , Jeong Gil Kim
IPC分类号： C03C15/00 , C03C25/68 , C23F1/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： In forming a pattern on a substrate with reduced pattern error using a mold having an area smaller than an area of the substrate, a first resin pattern is formed on at least a first of a plurality of regions of an etching object layer by imprinting resin applied to the etching object layer using a first mold The etching object layer is then etched using the first resin pattern as an etching mask. A second resin pattern is formed on at least a second of the plurality of regions by imprinting resin applied to the etching object layer using a second mold. The etching object layer is again etched using the second resin pattern as an etching mask.
摘要翻译：在使用面积小于基板的面积的模具的基板上形成图案减少图案的情况下，通过印刷树脂施加在蚀刻对象层的多个区域的至少第一区域上形成第一树脂图案使用第一模具到蚀刻对象层。然后使用第一树脂图案作为蚀刻掩模蚀刻蚀刻对象层。通过使用第二模具将施加到蚀刻对象层的树脂压印，在多个区域中的至少一个区域上形成第二树脂图案。使用第二树脂图案作为蚀刻掩模再次蚀刻蚀刻对象层。

4. 发明申请

US20110300345A1 Surface Having Superhydrophobic Region And Superhydrophilic Region 审中-公开
标题翻译：超疏水区和超亲水区表面
公开(公告)号：US20110300345A1
公开(公告)日：2011-12-08
申请号：US13150361
申请日：2011-06-01
申请人： Aleksandr Bessonov , Jung Woo Seo , Jeong Gil Kim , Suk Won Lee , Jong Woo Lee , Eun Soo Hwang , Young-Tae Cho
发明人： Aleksandr Bessonov , Jung Woo Seo , Jeong Gil Kim , Suk Won Lee , Jong Woo Lee , Eun Soo Hwang , Young-Tae Cho
IPC分类号： B32B3/00
CPC分类号： B82Y30/00 , B82Y10/00 , Y10T428/24802
摘要： According to an example embodiment, a patterned surface includes a micro-structural surface with a micro or nano pattern on a substrate, wherein the micro-structural surface has superhydrophobic regions and superhydrophilic regions.
摘要翻译：根据示例性实施例，图案化表面包括在衬底上具有微观或纳米图案的微结构表面，其中微结构表面具有超疏水区域和超亲水区域。

5. 发明申请

US20100282162A1 Roll-to-roll patterning apparatus and patterning system having the same 有权
标题翻译：卷对卷图案装置和具有该图案的图案形成系统
公开(公告)号：US20100282162A1
公开(公告)日：2010-11-11
申请号：US12662677
申请日：2010-04-28
申请人： Young Tae Cho , Sin Kwon , Ki Hyun Kim , Jung Woo Seo , Dong Min Kim , Jeong Gil Kim
发明人： Young Tae Cho , Sin Kwon , Ki Hyun Kim , Jung Woo Seo , Dong Min Kim , Jeong Gil Kim
IPC分类号： B05C9/08 , B05C1/08
CPC分类号： B65H23/038 , B05C5/0241 , B05D1/40 , B05D3/067 , B65H2301/5114 , B65H2301/5126 , B65H2404/15212
摘要： Disclosed herein is a roll-to-roll patterning apparatus and a patterning system using the same. The patterning system may include a supply roll to supply a film member, a recovery roll to recover the film member, and a roll-to-roll patterning apparatus forming a coating on the film member. The roll-to-roll patterning apparatus may include a pattern roller, a plurality of press rollers, and an alignment roller. The pattern roller may include an outer peripheral surface with a first pattern. The plurality of press rollers may press a film member against the pattern roller to form a second pattern on the film member. The alignment roller may be spaced apart from the pattern roller and may be arranged at an upstream position in a movement direction of the film member. The alignment roller may align the film member entering a region between the pattern roller and the plurality of press rollers.
摘要翻译：本文公开了一种卷对卷图案形成装置和使用其的图案形成系统。图案形成系统可以包括用于供应膜构件的供应辊，用于回收膜构件的回收辊以及在膜构件上形成涂层的卷对卷图案形成装置。卷对卷图案形成装置可以包括图案辊，多个压辊和对准辊。图案辊可以包括具有第一图案的外周表面。多个压辊可以将膜构件压靠在图案辊上，以在膜构件上形成第二图案。对准辊可以与图案辊间隔开，并且可以布置在膜构件的移动方向上的上游位置处。对准辊可以将膜构件对准进入图案辊和多个压辊之间的区域。

6. 发明授权

US08424487B2 Roll-to-roll patterning apparatus and patterning system having the same 有权
标题翻译：卷对卷图案装置和具有该图案的图案形成系统
公开(公告)号：US08424487B2
公开(公告)日：2013-04-23
申请号：US12662677
申请日：2010-04-28
申请人： Young Tae Cho , Sin Kwon , Ki Hyun Kim , Jung Woo Seo , Dong Min Kim , Jeong Gil Kim
发明人： Young Tae Cho , Sin Kwon , Ki Hyun Kim , Jung Woo Seo , Dong Min Kim , Jeong Gil Kim
IPC分类号： B05C11/00 , B05C1/00 , B05C1/06
CPC分类号： B65H23/038 , B05C5/0241 , B05D1/40 , B05D3/067 , B65H2301/5114 , B65H2301/5126 , B65H2404/15212
摘要： Disclosed herein is a roll-to-roll patterning apparatus and a patterning system using the same. The patterning system may include a supply roll to supply a film member, a recovery roll to recover the film member, and a roll-to-roll patterning apparatus forming a coating on the film member. The roll-to-roll patterning apparatus may include a pattern roller, a plurality of press rollers, and an alignment roller. The pattern roller may include an outer peripheral surface with a first pattern. The plurality of press rollers may press a film member against the pattern roller to form a second pattern on the film member. The alignment roller may be spaced apart from the pattern roller and may be arranged at an upstream position in a movement direction of the film member. The alignment roller may align the film member entering a region between the pattern roller and the plurality of press rollers.
摘要翻译：本文公开了一种卷对卷图案形成装置和使用其的图案形成系统。图案形成系统可以包括用于供应膜构件的供应辊，用于回收膜构件的回收辊以及在膜构件上形成涂层的卷对卷图案形成装置。卷对卷图案形成装置可以包括图案辊，多个压辊和对准辊。图案辊可以包括具有第一图案的外周表面。多个压辊可以将膜构件压靠在图案辊上，以在膜构件上形成第二图案。对准辊可以与图案辊间隔开，并且可以布置在膜构件的移动方向上的上游位置处。对准辊可以将膜构件对准进入图案辊和多个压辊之间的区域。

7. 发明申请

US20100140220A1 Nano-imprint lithography methods 有权
标题翻译：纳米压印光刻方法
公开(公告)号：US20100140220A1
公开(公告)日：2010-06-10
申请号：US12654023
申请日：2009-12-08
申请人： Young Tae Cho , Suk Won Lee , Sin Kwon , Jung Woo Seo , Jeong Gll Kim
发明人： Young Tae Cho , Suk Won Lee , Sin Kwon , Jung Woo Seo , Jeong Gll Kim
IPC分类号： C23F1/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： In forming a pattern on a substrate with reduced pattern error using a mold having an area smaller than an area of the substrate, a first resin pattern is formed on at least a first of a plurality of regions of an etching object layer by imprinting resin applied to the etching object layer using a first mold The etching object layer is then etched using the first resin pattern as an etching mask. A second resin pattern is formed on at least a second of the plurality of regions by imprinting resin applied to the etching object layer using a second mold. The etching object layer is again etched using the second resin pattern as an etching mask.
摘要翻译：在使用面积小于基板的面积的模具的基板上形成图案减少图案的情况下，通过印刷树脂施加在蚀刻对象层的多个区域的至少第一区域上形成第一树脂图案使用第一模具到蚀刻对象层。然后使用第一树脂图案作为蚀刻掩模蚀刻蚀刻对象层。通过使用第二模具将施加到蚀刻对象层的树脂压印，在多个区域中的至少一个区域上形成第二树脂图案。使用第二树脂图案作为蚀刻掩模再次蚀刻蚀刻对象层。

8. 发明申请

US20100072245A1 High speed and fine substrate alignment apparatus in roll to roll system 有权
标题翻译：卷对卷系统中高速精细的基板对准装置
公开(公告)号：US20100072245A1
公开(公告)日：2010-03-25
申请号：US12461061
申请日：2009-07-30
申请人： Dong Min Kim , Sin Kwon , Young Tae Cho , Jung Woo Seo , Ki Keon Yeom , Ki Hyun Kim
发明人： Dong Min Kim , Sin Kwon , Young Tae Cho , Jung Woo Seo , Ki Keon Yeom , Ki Hyun Kim
IPC分类号： B65H20/00
CPC分类号： B65H23/26 , B65H2301/511 , B65H2555/14
摘要： Disclosed is a substrate alignment apparatus capable of performing coarse and fine alignments of a substrate in a progressing route to remove or reduce an alignment error between the substrate and a pattern roll. The coarse alignment may be performed by moving a frame using a stage when the alignment error is relatively large, and the fine alignment may be performed by moving subsidiary rollers of a roller unit relative to a main roller of a roller unit when the alignment error is relatively small. An example substrate alignment apparatus may include a frame and a roller unit rotatably fixed to the frame to support a substrate, wherein the roller unit includes a main roller, and at least one subsidiary roller fixed to the main roller such that the at least one subsidiary roller can move relative to the main roller to align the substrate.
摘要翻译：公开了一种基板对准装置，其能够在进行中的路线中执行基板的粗略和精细对准以去除或减小基板和图案辊之间的对准误差。当对准误差相对较大时，可以通过使用阶段移动框架来执行粗略对准，并且当对准误差为对准误差时，可以通过相对于辊单元的主辊移动辊单元的辅助辊来执行精细对准比较小示例性基板对准装置可以包括框架和滚子单元，其可旋转地固定到框架以支撑基板，其中滚子单元包括主辊，以及至少一个辅助辊，其固定到主辊，使得至少一个附属辊可以相对于主辊移动以对准衬底。

9. 发明授权

US08596509B2 High speed and fine substrate alignment apparatus in roll to roll system 有权
标题翻译：卷对卷系统中高速精细的基板对准装置
公开(公告)号：US08596509B2
公开(公告)日：2013-12-03
申请号：US12461061
申请日：2009-07-30
申请人： Dong Min Kim , Sin Kwon , Young Tae Cho , Jung Woo Seo , Ki Keon Yeom , Ki Hyun Kim
发明人： Dong Min Kim , Sin Kwon , Young Tae Cho , Jung Woo Seo , Ki Keon Yeom , Ki Hyun Kim
IPC分类号： B65H23/038 , B65H23/192 , B65H27/00
CPC分类号： B65H23/26 , B65H2301/511 , B65H2555/14
摘要： Disclosed is a substrate alignment apparatus capable of performing coarse and fine alignments of a substrate in a progressing route to remove or reduce an alignment error between the substrate and a pattern roll. The coarse alignment may be performed by moving a frame using a stage when the alignment error is relatively large, and the fine alignment may be performed by moving subsidiary rollers of a roller unit relative to a main roller of a roller unit when the alignment error is relatively small. An example substrate alignment apparatus may include a frame and a roller unit rotatably fixed to the frame to support a substrate, wherein the roller unit includes a main roller, and at least one subsidiary roller fixed to the main roller such that the at least one subsidiary roller can move relative to the main roller to align the substrate.
摘要翻译：公开了一种基板对准装置，其能够在进行中的路线中执行基板的粗略和精细对准以去除或减小基板和图案辊之间的对准误差。当对准误差相对较大时，可以通过使用阶段移动框架来执行粗略对准，并且当对准误差为对准误差时，可以通过相对于辊单元的主辊移动辊单元的辅助辊来执行精细对准比较小示例性基板对准装置可以包括框架和滚子单元，其可旋转地固定到框架以支撑基板，其中滚子单元包括主辊，以及至少一个辅助辊，其固定到主辊，使得至少一个附属辊可以相对于主辊移动以对准衬底。

10. 发明申请

US20120125215A1 Roll Printing Apparatus 有权
标题翻译：卷筒印刷设备
公开(公告)号：US20120125215A1
公开(公告)日：2012-05-24
申请号：US13303305
申请日：2011-11-23
申请人： Jung Woo Cho , Dae Jung Kim , Dong Min Kim , Sin Kwon , Jung Woo Seo
发明人： Jung Woo Cho , Dae Jung Kim , Dong Min Kim , Sin Kwon , Jung Woo Seo
IPC分类号： B41F35/02
CPC分类号： B41F35/00 , B41F17/26 , B41P2235/26 , B41P2235/27 , H05K3/1275
摘要： According to example embodiments, a roll printing apparatus includes a cleaning device in which a cleaning nozzle unit and a spray nozzle unit are integrated so that both a reverse offset process and a cliche cleaning process may be achieved in the roll printing apparatus. The roll printing apparatus may include a base plate, a blanket roll to transfer an ink material to a cliche and a substrate, a blanket roll supporter located on the base plate to support the blanket roll, a cliche table located on the base plate to fix and move the cliche, a substrate table located on the base plate to fix the substrate, and the cleaning device installed on the base plate to clean the cliche. The cleaning device may include a cleaning nozzle unit to spray a cleaning solution and a spray nozzle unit to spray DIW, which are integrated.
摘要翻译：根据示例性实施例，卷筒印刷装置包括清洁装置，其中清洁喷嘴单元和喷嘴单元被整合，使得可以在卷筒印刷装置中实现反向偏移处理和清晰处理。卷筒印刷装置可以包括基板，用于将油墨材料转印到纸板和基板的橡皮布辊，位于基板上以支撑橡皮布辊的覆盖辊支撑件，位于基板上的陈列台，以固定并移动底板，位于基板上的基板台以固定基板，以及安装在基板上的清洁装置以清洁陈列架。清洁装置可以包括用于喷射清洁溶液的清洁喷嘴单元和喷射单元以喷射集成的DIW。

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