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1. 发明申请

US20100290143A1 Color filter and apparatus and method of manufacturing the same 审中-公开
标题翻译：滤色器及其制造方法
公开(公告)号：US20100290143A1
公开(公告)日：2010-11-18
申请号：US12662478
申请日：2010-04-20
申请人： Jeong Gil Kim , Young Tae Cho , Suk Won Lee , Sin Kwon , Ki Hyun Kim , Jung Woo Seo
发明人： Jeong Gil Kim , Young Tae Cho , Suk Won Lee , Sin Kwon , Ki Hyun Kim , Jung Woo Seo
IPC分类号： G02B5/22 , B05D5/06 , B05C1/08 , G02B1/04
CPC分类号： G02B5/201 , B05C1/0834 , G02B5/223
摘要： Disclosed herein are a color filter having a black matrix and an apparatus and method of manufacturing the same. The method may include applying an organic film to a substrate, forming a pattern on the organic film by applying pressure to the organic film with a mold having prominences and depressions, and forming a black matrix by applying an ink to the pattern of the organic film. The formation of the black matrix may be achieved by a roll to roll method. The black matrix is easily formed by carrying out imprinting and printing on the organic film applied to the substrate. The black matrix may have a fine line width of a nano level by imprinting and printing. Further, since the black matrix is formed by the roll to roll method, material costs may be reduced and the color filter may be manufactured at a relatively high speed.
摘要翻译：本文公开了具有黑矩阵的滤色器及其制造方法。该方法可以包括将有机膜施加到基底上，通过用具有突起和凹陷的模具对有机膜施加压力，在有机膜上形成图案，并通过向有机膜的图案施加墨来形成黑色矩阵。黑色矩阵的形成可以通过卷绕方法来实现。通过在施加到基板上的有机膜上进行印刷和印刷，容易地形成黑色矩阵。通过印刷和印刷，黑色矩阵可以具有纳米级的细线宽度。此外，由于通过卷绕方法形成黑色矩阵，所以可以降低材料成本，并且可以以相对高的速度制造滤色器。

2. 发明授权

US08557130B2 Nano-imprint lithography methods 有权
标题翻译：纳米压印光刻方法
公开(公告)号：US08557130B2
公开(公告)日：2013-10-15
申请号：US12654023
申请日：2009-12-08
申请人： Young Tae Cho , Suk Won Lee , Sin Kwon , Jung Woo Seo , Jeong Gil Kim
发明人： Young Tae Cho , Suk Won Lee , Sin Kwon , Jung Woo Seo , Jeong Gil Kim
IPC分类号： C03C15/00 , C03C25/68 , C23F1/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： In forming a pattern on a substrate with reduced pattern error using a mold having an area smaller than an area of the substrate, a first resin pattern is formed on at least a first of a plurality of regions of an etching object layer by imprinting resin applied to the etching object layer using a first mold The etching object layer is then etched using the first resin pattern as an etching mask. A second resin pattern is formed on at least a second of the plurality of regions by imprinting resin applied to the etching object layer using a second mold. The etching object layer is again etched using the second resin pattern as an etching mask.
摘要翻译：在使用面积小于基板的面积的模具的基板上形成图案减少图案的情况下，通过印刷树脂施加在蚀刻对象层的多个区域的至少第一区域上形成第一树脂图案使用第一模具到蚀刻对象层。然后使用第一树脂图案作为蚀刻掩模蚀刻蚀刻对象层。通过使用第二模具将施加到蚀刻对象层的树脂压印，在多个区域中的至少一个区域上形成第二树脂图案。使用第二树脂图案作为蚀刻掩模再次蚀刻蚀刻对象层。

3. 发明申请

US20080299467A1 Mask mold, manufacturing method thereof, and method for forming large-sized micro pattern using mask mold 审中-公开
标题翻译：掩模模具及其制造方法以及使用掩模模具形成大尺寸微图案的方法
公开(公告)号：US20080299467A1
公开(公告)日：2008-12-04
申请号：US12149520
申请日：2008-05-02
申请人： Jeong Gil Kim , Young Tae Cho , Young Suk Sim , Sung Hoon Cho , Suk Won Lee , Seon Mi Park , Sin Kwon , Jung Woo Seo , Jung Woo Park , Sung Woo Cho
发明人： Jeong Gil Kim , Young Tae Cho , Young Suk Sim , Sung Hoon Cho , Suk Won Lee , Seon Mi Park , Sin Kwon , Jung Woo Seo , Jung Woo Park , Sung Woo Cho
IPC分类号： G03F1/14 , B05D3/06
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Disclosed are a mask mold, a manufacturing method thereof, and a method for forming a large-sized micro pattern using the manufactured mask mold, in which the size of a nano-level micro pattern can be enlarged using a simple method with low cost and interference and stitching errors between cells forming a large area can be minimized. The method for manufacturing the mask mold includes the operations of coating resist on a mask or a plurality of small molds having an engraved micro pattern, pressing the small molds to imprint the micro pattern on the resist, curing the resist, and releasing the small molds from the resist.
摘要翻译：公开了一种掩模模具及其制造方法，以及使用该制造的掩模模具形成大尺寸微图案的方法，其中可以使用简单的方法以低成本扩大纳米级微图案的尺寸，并且可以使形成大面积的电池之间的干涉和缝合误差最小化。掩模模具的制造方法包括在掩模上涂布抗蚀剂或具有雕刻微图案的多个小型模具的操作，按压小模具将微图案压印在抗蚀剂上，固化抗蚀剂，并释放小模具从抗拒。

4. 发明授权

US08424487B2 Roll-to-roll patterning apparatus and patterning system having the same 有权
标题翻译：卷对卷图案装置和具有该图案的图案形成系统
公开(公告)号：US08424487B2
公开(公告)日：2013-04-23
申请号：US12662677
申请日：2010-04-28
申请人： Young Tae Cho , Sin Kwon , Ki Hyun Kim , Jung Woo Seo , Dong Min Kim , Jeong Gil Kim
发明人： Young Tae Cho , Sin Kwon , Ki Hyun Kim , Jung Woo Seo , Dong Min Kim , Jeong Gil Kim
IPC分类号： B05C11/00 , B05C1/00 , B05C1/06
CPC分类号： B65H23/038 , B05C5/0241 , B05D1/40 , B05D3/067 , B65H2301/5114 , B65H2301/5126 , B65H2404/15212
摘要： Disclosed herein is a roll-to-roll patterning apparatus and a patterning system using the same. The patterning system may include a supply roll to supply a film member, a recovery roll to recover the film member, and a roll-to-roll patterning apparatus forming a coating on the film member. The roll-to-roll patterning apparatus may include a pattern roller, a plurality of press rollers, and an alignment roller. The pattern roller may include an outer peripheral surface with a first pattern. The plurality of press rollers may press a film member against the pattern roller to form a second pattern on the film member. The alignment roller may be spaced apart from the pattern roller and may be arranged at an upstream position in a movement direction of the film member. The alignment roller may align the film member entering a region between the pattern roller and the plurality of press rollers.
摘要翻译：本文公开了一种卷对卷图案形成装置和使用其的图案形成系统。图案形成系统可以包括用于供应膜构件的供应辊，用于回收膜构件的回收辊以及在膜构件上形成涂层的卷对卷图案形成装置。卷对卷图案形成装置可以包括图案辊，多个压辊和对准辊。图案辊可以包括具有第一图案的外周表面。多个压辊可以将膜构件压靠在图案辊上，以在膜构件上形成第二图案。对准辊可以与图案辊间隔开，并且可以布置在膜构件的移动方向上的上游位置处。对准辊可以将膜构件对准进入图案辊和多个压辊之间的区域。

5. 发明申请

US20100282162A1 Roll-to-roll patterning apparatus and patterning system having the same 有权
标题翻译：卷对卷图案装置和具有该图案的图案形成系统
公开(公告)号：US20100282162A1
公开(公告)日：2010-11-11
申请号：US12662677
申请日：2010-04-28
申请人： Young Tae Cho , Sin Kwon , Ki Hyun Kim , Jung Woo Seo , Dong Min Kim , Jeong Gil Kim
发明人： Young Tae Cho , Sin Kwon , Ki Hyun Kim , Jung Woo Seo , Dong Min Kim , Jeong Gil Kim
IPC分类号： B05C9/08 , B05C1/08
CPC分类号： B65H23/038 , B05C5/0241 , B05D1/40 , B05D3/067 , B65H2301/5114 , B65H2301/5126 , B65H2404/15212
摘要： Disclosed herein is a roll-to-roll patterning apparatus and a patterning system using the same. The patterning system may include a supply roll to supply a film member, a recovery roll to recover the film member, and a roll-to-roll patterning apparatus forming a coating on the film member. The roll-to-roll patterning apparatus may include a pattern roller, a plurality of press rollers, and an alignment roller. The pattern roller may include an outer peripheral surface with a first pattern. The plurality of press rollers may press a film member against the pattern roller to form a second pattern on the film member. The alignment roller may be spaced apart from the pattern roller and may be arranged at an upstream position in a movement direction of the film member. The alignment roller may align the film member entering a region between the pattern roller and the plurality of press rollers.
摘要翻译：本文公开了一种卷对卷图案形成装置和使用其的图案形成系统。图案形成系统可以包括用于供应膜构件的供应辊，用于回收膜构件的回收辊以及在膜构件上形成涂层的卷对卷图案形成装置。卷对卷图案形成装置可以包括图案辊，多个压辊和对准辊。图案辊可以包括具有第一图案的外周表面。多个压辊可以将膜构件压靠在图案辊上，以在膜构件上形成第二图案。对准辊可以与图案辊间隔开，并且可以布置在膜构件的移动方向上的上游位置处。对准辊可以将膜构件对准进入图案辊和多个压辊之间的区域。

6. 发明申请

US20110300345A1 Surface Having Superhydrophobic Region And Superhydrophilic Region 审中-公开
标题翻译：超疏水区和超亲水区表面
公开(公告)号：US20110300345A1
公开(公告)日：2011-12-08
申请号：US13150361
申请日：2011-06-01
申请人： Aleksandr Bessonov , Jung Woo Seo , Jeong Gil Kim , Suk Won Lee , Jong Woo Lee , Eun Soo Hwang , Young-Tae Cho
发明人： Aleksandr Bessonov , Jung Woo Seo , Jeong Gil Kim , Suk Won Lee , Jong Woo Lee , Eun Soo Hwang , Young-Tae Cho
IPC分类号： B32B3/00
CPC分类号： B82Y30/00 , B82Y10/00 , Y10T428/24802
摘要： According to an example embodiment, a patterned surface includes a micro-structural surface with a micro or nano pattern on a substrate, wherein the micro-structural surface has superhydrophobic regions and superhydrophilic regions.
摘要翻译：根据示例性实施例，图案化表面包括在衬底上具有微观或纳米图案的微结构表面，其中微结构表面具有超疏水区域和超亲水区域。

7. 发明申请

US20120082745A1 PATTERNING MOLD AND MANUFACTURING METHOD THEREOF 有权
标题翻译：模式及其制造方法
公开(公告)号：US20120082745A1
公开(公告)日：2012-04-05
申请号：US13229047
申请日：2011-09-09
申请人： Eui Sun Choi , Eun Soo Hwang , Young Tae Cho , Dong Min Kim , Jeong Gil Kim , Jong Woo Lee , Eun Ah Park
发明人： Eui Sun Choi , Eun Soo Hwang , Young Tae Cho , Dong Min Kim , Jeong Gil Kim , Jong Woo Lee , Eun Ah Park
IPC分类号： B29C59/02 , B29C33/40
CPC分类号： B29C33/3857 , B29C33/0016 , B29C33/428 , B29C2033/426 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017
摘要： Disclosed herein is a patterning mold configured to form a micropattern on a substrate or glass. The disclosed patterning mold includes a transfer body with a patterning part formed at one end of the transfer body to transfer a nanoparticle material to one surface of the substrate. The patterning mold further includes a fixing member coupled to an exterior of the transfer body, to prevent or reduce deformation of the exterior of the transfer body.
摘要翻译：本文公开了一种图案化模具，其被配置为在基板或玻璃上形成微图案。所公开的图案形成模具包括转印体，其具有形成在转印体一端的图形部分，以将纳米颗粒材料转印到基底的一个表面。图案形成模具还包括连接到转印体的外部的固定构件，以防止或减少转印体外部的变形。

8. 发明申请

US20100096770A1 Method for fabrication of mold for nano imprinting and method for production of photonic crystal using the same 审中-公开
标题翻译：纳米压印用模具的制造方法及其制造方法
公开(公告)号：US20100096770A1
公开(公告)日：2010-04-22
申请号：US12585874
申请日：2009-09-28
申请人： Young Tae Cho , Jeong Gil Kim
发明人： Young Tae Cho , Jeong Gil Kim
IPC分类号： B29C33/42
CPC分类号： B29C33/3878
摘要： A manufacturing process using a replica mold for nano imprinting having a grid type pattern by combining a nano imprint with a dry etching process is disclosed. In order to attain such a manufacturing process, a method of fabricating a mold for nano imprinting may include arranging a master mold having first patterns over a substrate having metal patterns so that both the first pattern and the metal pattern cross over each other, applying resin between the master mold and the substrate, applying an imprinting treatment of the substrate as well as the master mold, hardening the resin, and etching the hardened resin after the master mold is released, so as to form a replica mold for nano imprint. The nano imprinting process and the etching process may easily form a pattern in a more complicated structure, and therefore, may improve production yield and reduce processing time thereof.
摘要翻译：公开了一种使用复制模具进行纳米压印的制造工艺，其具有通过将纳米压印与干蚀刻工艺组合而具有格栅型图案。为了实现这种制造工艺，制造用于纳米压印的模具的方法可以包括在具有金属图案的基板上布置具有第一图案的母模，使得第一图案和金属图案彼此交叉，施加树脂在母模和基板之间，在母模脱模之后，对基板以及母模进行压印处理，硬化树脂，并蚀刻硬化树脂，以形成用于纳米压印的复制模。纳米压印工艺和蚀刻工艺可以容易地形成更复杂结构的图案，因此可以提高生产成品率并缩短其处理时间。

9. 发明授权

US08168107B2 Method of forming a pattern using nano imprinting and method of manufacturing a mold to form such a pattern 有权
标题翻译：使用纳米压印形成图案的方法和制造模具以形成这种图案的方法
公开(公告)号：US08168107B2
公开(公告)日：2012-05-01
申请号：US12453978
申请日：2009-05-28
申请人： Young Tae Cho , Young Suk Sim , Jeong Gil Kim
发明人： Young Tae Cho , Young Suk Sim , Jeong Gil Kim
IPC分类号： B28B11/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Example embodiments relate to a method of forming a three-dimensional micro pattern or a multi-step pattern using a nano imprinting process and a method of manufacturing a mold to form such a pattern. A molding polymer may be patterned in a one-step shape on a substrate having UV barrier patterns, thereby easing the manufacture of a mold for multi-step imprinting and simplifying the formation of a multi-step pattern using the one-step shaped mold by avoiding the repetition of more complicated processes. Consequently, it may be possible to form a relatively large-area micro pattern, a relatively large-area pattern usable in flat panel displays, and a nano pattern having a size of several tens of nanometers in a semiconductor process, thereby contributing to the reduction of process costs, the reduction of process time, and the improvement of production yield.
摘要翻译：示例实施例涉及使用纳米压印工艺形成三维微图案或多步图案的方法以及制造模具以形成这种图案的方法。成型聚合物可以在具有UV阻挡图案的基板上以一步形状图案化，从而减轻用于多步压印的模具的制造，并且通过使用一步成型模具简化多步图案的形成避免重复更复杂的过程。因此，可以在半导体工艺中形成相对大面积的微图案，可用于平板显示器的相对大面积图案和具有几十纳米尺寸的纳米图案，从而有助于减少的工艺成本，减少加工时间，提高产量。

10. 发明申请

US20120080819A1 PATTERNING MOLD AND MANUFACTURING METHOD THEREOF 审中-公开
标题翻译：模式及其制造方法
公开(公告)号：US20120080819A1
公开(公告)日：2012-04-05
申请号：US13221395
申请日：2011-08-30
申请人： Eui Son Choi , Eun Soo Hwang , Young Tae Cho , Dong Min Kim , Jeong Gil Kim , Jong Woo Lee , Eun Ah Park
发明人： Eui Son Choi , Eun Soo Hwang , Young Tae Cho , Dong Min Kim , Jeong Gil Kim , Jong Woo Lee , Eun Ah Park
IPC分类号： B29C59/02
CPC分类号： B29C45/2632 , B29C33/0033 , B29C33/306 , B29C33/424 , B29C39/26 , B29K2101/10
摘要： Disclosed herein is a patterning mold to form a micropattern on a substrate or glass. The disclosed patterning mold includes a body having a patterning part formed at one end of the body. The patterning part may be configured to contact a surface of the substrate, to form a channel. In example embodiments, an ink supply passage communicating with the channel may be formed in the patterning mold, to supply an ink to the channel. In example embodiments, a fixing member is coupled to an exterior of the transfer body, to prevent or reduce deformation of the exterior of the transfer body.
摘要翻译：本文公开了一种用于在基板或玻璃上形成微图案的图案化模具。所公开的图案形成模具包括具有形成在主体一端的图形部分的主体。图案形成部分可以被配置为接触衬底的表面，以形成沟道。在示例性实施例中，可以在图案化模具中形成与通道连通的供墨通道，以将墨水供应到通道。在示例性实施例中，固定构件联接到转印体的外部，以防止或减少转印体外部的变形。

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