会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 4. 发明申请
    • CONFIGURABLE NP CHANNEL LATERAL DRAIN EXTENDED MOS-BASED TRANSISTOR
    • 可配置的NP通道横向引入扩展的MOS晶体管
    • US20110074493A1
    • 2011-03-31
    • US12883726
    • 2010-09-16
    • Marie DenisonHannes Estl
    • Marie DenisonHannes Estl
    • G05F1/10H01L29/78H01L21/8238
    • H01L27/092H01L29/0634H01L29/0653H01L29/402H01L29/404H01L29/407H01L29/7816H01L29/7824H01L29/7831H01L29/7834H01L29/7835H01L29/7846
    • An integrated circuit containing a configurable dual n/p-channel 3-D resurf high voltage MOS field effect transistor (MOSFET) is disclosed. An n-channel drain is coterminous with a p-channel source in an n-well, and a p-channel drain is coterminous with an n-channel source in a p-well. A lateral drift region including n-type drift lanes and p-type drift lanes extends between the n and p wells. A resurf layer abuts the lateral drift region. The n-channel MOS gate is separate from the p-channel MOS gate. The p-channel MOS gate may be operated as a field plate in the n-channel mode, and vice versa. An n-channel MOS transistor may be integrated into the n-channel MOS source to provide an n-channel cascode transistor configuration, and similarly for a p-channel cascode configuration, to debias parasitic bipolar transistors under the MOS gates. Circuits using the MOSFET with various loads are also disclosed.
    • 公开了一种包含可配置的双n / p沟道3-D复用高压MOS场效应晶体管(MOSFET)的集成电路。 n沟道漏极在n阱中与p沟道源相邻,并且p沟道漏极与p阱中的n沟道源相邻。 包括n型漂移通道和p型漂移通道的横向漂移区域在n阱和p阱之间延伸。 再生层邻接横向漂移区域。 n沟道MOS栅极与p沟道MOS栅极分离。 p沟道MOS栅极可以作为n沟道模式中的场板操作,反之亦然。 n沟道MOS晶体管可以被集成到n沟道MOS源中以提供n沟道共源共栅晶体管配置,并且类似地用于p沟道共源共栅配置,以在MOS栅极之下去除寄生双极晶体管。 还公开了使用具有各种负载的MOSFET的电路。
    • 6. 发明授权
    • Configurable NP channel lateral drain extended MOS-based transistor
    • 可配置NP沟道横向漏极扩展MOS晶体管
    • US08492233B2
    • 2013-07-23
    • US12883726
    • 2010-09-16
    • Marie DenisonHannes Estl
    • Marie DenisonHannes Estl
    • H01L29/43
    • H01L27/092H01L29/0634H01L29/0653H01L29/402H01L29/404H01L29/407H01L29/7816H01L29/7824H01L29/7831H01L29/7834H01L29/7835H01L29/7846
    • An integrated circuit containing a configurable dual n/p-channel 3-D resurf high voltage MOS field effect transistor (MOSFET) is disclosed. An n-channel drain is coterminous with a p-channel source in an n-well, and a p-channel drain is coterminous with an n-channel source in a p-well. A lateral drift region including n-type drift lanes and p-type drift lanes extends between the n and p wells. A resurf layer abuts the lateral drift region. The n-channel MOS gate is separate from the p-channel MOS gate. The p-channel MOS gate may be operated as a field plate in the n-channel mode, and vice versa. An n-channel MOS transistor may be integrated into the n-channel MOS source to provide an n-channel cascode transistor configuration, and similarly for a p-channel cascode configuration, to debias parasitic bipolar transistors under the MOS gates. Circuits using the MOSFET with various loads are also disclosed.
    • 公开了一种包含可配置的双n / p沟道3-D复用高压MOS场效应晶体管(MOSFET)的集成电路。 n沟道漏极在n阱中与p沟道源相邻,并且p沟道漏极与p阱中的n沟道源相邻。 包括n型漂移通道和p型漂移通道的横向漂移区域在n阱和p阱之间延伸。 再生层邻接横向漂移区域。 n沟道MOS栅极与p沟道MOS栅极分离。 p沟道MOS栅极可以作为n沟道模式中的场板操作,反之亦然。 n沟道MOS晶体管可以被集成到n沟道MOS源中以提供n沟道共源共栅晶体管配置,并且类似地用于p沟道共源共栅配置,以在MOS栅极之下去除寄生双极晶体管。 还公开了使用具有各种负载的MOSFET的电路。