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    • 1. 发明授权
    • Device for detecting/storing electromagnetic beams, method for making same, and use thereof and imager incorporating same
    • 用于检测/存储电磁束的装置,其制造方法及其用途以及结合其的成像器
    • US07982251B2
    • 2011-07-19
    • US12282584
    • 2007-03-13
    • Jean-Philippe BourgoinVincent DeryckeJulien Borghetti
    • Jean-Philippe BourgoinVincent DeryckeJulien Borghetti
    • H01L31/10
    • B82Y10/00H01L27/305H01L51/0036H01L51/0048H01L51/0545H01L51/0562H01L51/428Y02E10/549Y02P70/521Y10S977/834Y10S977/938Y10S977/954
    • The invention concerns a device for detecting and storing electromagnetic beams, an imager incorporating same, a method for making said device and use thereof. The inventive device comprises a field-effect phototransistor including: two source and drain contact electrodes, an electrical conduction unit which is connected to the two contact electrodes and which is coated with a photosensitive polymeric coating capable of absorbing the beams, of detecting, of generating in response the loads detected by said unit and of storing said loads, and a gate electrode which is capable of controlling the electric current in the unit as well as spatially distributing the loads in said coating and which is separated from said unit by a gate dielectric. Said device is configured such that the conduction unit comprises at least one semiconductive nanotube or nanowire capable of supplying an electric signal representing a modification of the conductivity of the phototransistor having been exposed to a beam, and that the gate dielectric has a thickness and a permittivity ∈, which satisfy ∈r>0.2 nm*1, so that the conductivity after exposition may be electrically reset in a reduced time and that the device forms at least one imaging pixel.
    • 本发明涉及一种用于检测和存储电磁波束的装置,一种包含其的成像器件,一种制造该装置的方法及其用途。 本发明的器件包括场效应晶体管,其包括:两个源极和漏极接触电极,导电单元,其连接到两个接触电极并且涂覆有能够吸收光束的光敏聚合物涂层,以检测产生 响应于由所述单元检测到的负载和存储所述负载的负载,以及能够控制所述单元中的电流以及空间分布所述涂层中的负载并且通过栅极电介质与所述单元分离的栅电极 。 所述器件被配置为使得导电单元包括至少一个能够提供表示已经暴露于光束的光电晶体管的导电性的变化的电信号的半导体纳米管或纳米线,并且栅极电介质具有厚度和介电常数 ∈,其满足∈r> 0.2nm * 1,使得曝光后的电导率可以在减少的时间内电复位,并且器件形成至少一个成像像素。
    • 4. 发明申请
    • DEVICE FOR DETECTING/STORING ELECTROMAGNETIC BEAMS, METHOD FOR MAKING SAME, AND USE THEREOF AND IMAGER INCORPORATING SAME
    • 用于检测/存储电磁波的装置,制造它们的方法及其使用方法和包含它们的成像器
    • US20090179240A1
    • 2009-07-16
    • US12282584
    • 2007-03-13
    • Jean-Philippe BourgoinVincent DeryckeJulien Borghetti
    • Jean-Philippe BourgoinVincent DeryckeJulien Borghetti
    • H01L31/112H01L21/28
    • B82Y10/00H01L27/305H01L51/0036H01L51/0048H01L51/0545H01L51/0562H01L51/428Y02E10/549Y02P70/521Y10S977/834Y10S977/938Y10S977/954
    • The invention concerns a device for detecting and storing electromagnetic beams, an imager incorporating same, a method for making said device and use thereof. The inventive device comprises a field-effect phototransistor including: two source and drain contact electrodes, an electrical conduction unit which is connected to the two contact electrodes and which is coated with a photosensitive polymeric coating capable of absorbing the beams, of detecting, of generating in response the loads detected by said unit and of storing said loads, and a gate electrode which is capable of controlling the electric current in the unit as well as spatially distributing the loads in said coating and which is separated from said unit by a gate dielectric. Said device is configured such that the conduction unit comprises at least one semiconductive nanotube or nanowire capable of supplying an electric signal representing a modification of the conductivity of the phototransistor having been exposed to a beam, and that the gate dielectric has a thickness and a permittivity ε, which satisfy εr>0.2 nm* 1, so that the conductivity after exposition may be electrically reset in a reduced time and that the device forms at least one imaging pixel.
    • 本发明涉及一种用于检测和存储电磁波束的装置,一种包含其的成像器件,一种制造该装置的方法及其用途。 本发明的器件包括场效应晶体管,其包括:两个源极和漏极接触电极,导电单元,其连接到两个接触电极并且涂覆有能够吸收光束的光敏聚合物涂层,以检测产生 响应于由所述单元检测到的负载和存储所述负载的负载,以及能够控制所述单元中的电流以及空间分布所述涂层中的负载并且通过栅极电介质与所述单元分离的栅电极 。 所述器件被配置为使得导电单元包括至少一个能够提供表示已经暴露于光束的光电晶体管的导电性的变化的电信号的半导体纳米管或纳米线,并且栅极电介质具有厚度和介电常数 ε,其满足epsilon> 0.2nm * 1,使得在曝光后的电导率可以在减少的时间内电复位,并且器件形成至少一个成像像素。