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    • 4. 发明授权
    • Apparatus for coating a moving glass substrate
    • 用于涂覆移动玻璃基板的装置
    • US5863337A
    • 1999-01-26
    • US464113
    • 1995-06-05
    • George A. NeumanJohn F. SopkoDouglas S. Dauson
    • George A. NeumanJohn F. SopkoDouglas S. Dauson
    • C03C17/00C03C17/245C03C17/34C23C16/40C23C16/44C23C16/453C23C16/54C23C16/00
    • C03C17/002C03C17/245C03C17/2453C03C17/3417C23C16/401C23C16/402C23C16/4412C23C16/453C23C16/545C03C2217/213C03C2217/23C03C2218/152
    • An apparatus for coating a moving substrate which provides means for directing a coating composition vapor toward a substrate surface and moving portions of the vapor in opposite directions. The apparatus of the present invention may have the exhaust means on either side of the vapor directing means spaced at different distances from the vapor directing means, or the exhaust means may be spaced equally from the vapor directing means, but at different distances from the substrate surface. In another embodiment, the apparatus comprises the means to alter the flow volume of the vapor directing means and the two exhaust means such that the flow volume of the first and second exhaust means are not equal, such as by the exhaust means having openings of unequal surface area, wherein the exhaust means may be spaced equally or unequally from the vapor directing means at the same or different distances from the substrate surface. In another embodiment, the apparatus further comprises a structural element bridging the space between the vapor directing means and the exhaust means, which may be spaced equally or unequally from the vapor directing means, and at the same or different distances from the substrate surface.
    • 一种用于涂覆移动衬底的装置,其提供用于将涂料组合物蒸气引向衬底表面并使蒸气沿相反方向移动的装置。 本发明的装置可以在蒸汽引导装置的任一侧上具有与蒸汽引导装置不同距离间隔开的排气装置,或者排气装置可以与蒸气引导装置间隔开,但距衬底不同的距离 表面。 在另一个实施例中,该装置包括改变蒸汽导向装置和两个排气装置的流量的装置,使得第一和第二排气装置的流量不相等,例如具有不等的开口的排气装置 表面积,其中所述排气装置可以与所述蒸气引导装置以相同或不同的距离与所述基板表面间隔开或不等间隔。 在另一个实施例中,该装置还包括桥接蒸气引导装置和排气装置之间的空间的结构元件,其可以与蒸气引导装置相等或不相等地间隔开,并且距离衬底表面相同或不同。
    • 10. 发明授权
    • Compounds and compositions for coating glass with silicon oxide
    • 用氧化硅涂覆玻璃的化合物和组合物
    • US07897259B1
    • 2011-03-01
    • US09057677
    • 1998-04-09
    • David E. LococqGeorge A. NeumanRoyann L. Stewart-Davis
    • David E. LococqGeorge A. NeumanRoyann L. Stewart-Davis
    • B32B17/06B32B18/00
    • C23C16/401C03C17/002C03C17/245C03C17/2453C03C17/3417C03C2217/213C03C2217/23C03C2218/152C23C16/4412C23C16/545
    • Silicon compounds useful as coating reactants for the chemical vapor deposition of silicon oxide are disclosed, along with compounds useful as accelerants to increase the deposition rate of silicon oxide. The silicon-containing precursor comprises the structural formula wherein R1 is an alkyl, alkenyl, alkynyl or aryl radical which may be substituted, and R2 is a functional group which increases the reactivity of the silicon compound by withdrawing electron density away from the silicon atom, such as hydrogen, halogen, alkenyl, alkynyl, halogenated alkyl and perhalogenated alkyl radicals. The accelerant is a compound selected to take advantage of the partial positive charge on the silicon atom. Such accelerant compounds include Lewis acids and bases; water; ozone; trivalent compounds of nitrogen, boron and phosphorus; tetravalent compounds of sulfur and selenium; pentavalent compounds of phosphorus and a variety of metal compounds. Also disclosed are compositions including an additional metal-containing coating precursor, such as an organotin compound, to deposit another metal oxide along with silicon oxide.
    • 公开了可用作氧化硅的化学气相沉积的涂料反应物的硅化合物,以及可用作增加氧化硅沉积速率的促进剂的化合物。 含硅前体包括以下结构式:其中R 1为可被取代的烷基,链烯基,炔基或芳基,R2为通过从硅原子排出电子密度而提高硅化合物反应性的官能团, 例如氢,卤素,烯基,炔基,卤代烷基和全卤代烷基。 促进剂是选择用于利用硅原子上的部分正电荷的化合物。 这种促进剂化合物包括路易斯酸和碱; 水; 臭氧; 氮,硼和磷的三价化合物; 硫和硒的四价化合物; 五价磷化合物和各种金属化合物。 还公开了包含另外的含金属的涂层前体,例如有机锡化合物,以沉积另外的金属氧化物和氧化硅的组合物。