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    • 4. 发明授权
    • Inverse treatment planning method
    • 逆治疗计划方法
    • US08183541B2
    • 2012-05-22
    • US12223712
    • 2007-02-02
    • Jan WilkensUwe Oelfke
    • Jan WilkensUwe Oelfke
    • G21K5/04
    • A61N5/1031A61N5/1042A61N2005/1087
    • The invention relates to a radiation treatment apparatus and an inverse treatment planning method for intensity modulated particle therapy for the treatment of a target within a biological system using at least two fields, each field comprising a plurality of Bragg peaks, the at least two fields being planned to place a defined number of beam spots j from different directions with certain weights wj within the target. The inverse treatment planning method optimizes the weights wj of the beam spots for the at least two fields simultaneously in order to produce a prescribed biological effect within the target by minimizing an objective function based on biological effects ε, the biological effects ε being treated in a linear-quadratic model, which describes the biological effects in the target by two parameters α and β, where ε=αD+βD2, D denoting a dose, and wherein the two parameters α and β for each voxel i of the target (αi and βi) are calculated as dose-averaged mean values of αi,j- and √{square root over (βi,j)}-components, which relate to all beam spots j contributing to a total dose Di in the voxel i.
    • 本发明涉及一种用于强度调制粒子治疗的放射治疗装置和逆治疗计划方法,用于使用至少两个场来处理生物系统内的靶,每个场包括多个布拉格峰,所述至少两个场是 计划在目标内放置一定数量的来自不同方向的光束点j和某些重量wj。 反向治疗计划方法同时优化至少两个场的束斑的权重wj,以便通过最小化基于生物效应和生物效应的目标函数来在目标内产生规定的生物效应。 在线性二次模型中进行处理,其通过两个参数α和&bgr来描述目标物的生物效应,其中&egr =αD+&bgr; D2,D表示剂量,并且其中两个参数α和&bgr; 对于目标的每个体素i(αi和&bgr; i)被计算为αi,j-和√{平方根超过(&bgr; i,j)}分量的剂量平均平均值,其与所有束点 j对体素i中的总剂量Di有贡献。
    • 6. 发明申请
    • Irradiation device for therapeutic treatment of skin diseases and other ailments
    • 用于治疗皮肤病和其他疾病的照射装置
    • US20050085878A1
    • 2005-04-21
    • US10971790
    • 2004-10-22
    • Jan WilkensRolf Stirner
    • Jan WilkensRolf Stirner
    • A61N5/06
    • A61N5/0616A61N2005/0642A61N2005/0644H01J61/125
    • The invention relates to an irradiation device and method for the treatment of totally or partially cell-mediated inflammations of the skin, the connective tissue and the viscera, viral and other infectious diseases such as HIV and prionic infections, fungal infections of the skin and the mucous membranes, bacterial diseases of the skin and the mucous membranes as well hand eczema and anal eczema which comprises at least one irradiation device to irradiate a surface treatment area where the wavelength of the emitted radiation to a treatment area is longer than 400 nm and comprises at least one spectral band between 400-500 nm while the radiation device has a gas discharge lamp containing at least gallium, indium or their respective halides as irradiation source, means that less than 7% of the overall optical output are emitted in the UV range, wherein at least 30% of the optical output are emitted in the range of 400-500 nm; and contains means for the generation of optical pulses towards a treatment area with a power density of the optical pulse peaks larger than 0.5 W/cm2 and smaller than 500 W/cm2. The energy of one pulse relates to 0.05-10 J/cm2.
    • 本发明涉及一种用于治疗全身或部分细胞介导的皮肤炎,结缔组织和内脏炎症,病毒和其他传染病如艾滋病毒和朊病毒感染,皮肤真菌感染和 粘膜,皮肤和粘膜的细菌性疾病以及手湿疹和肛门湿疹,其包括至少一个照射装置以照射发射的辐射的波长到处理区域的表面处理区域超过400nm,并且包括 在400-500nm之间的至少一个光谱带,而辐射装置具有至少包含镓,铟或其各自的卤化物作为辐射源的气体放电灯,意味着总体光输出的小于7%在UV范围内发射 ,其中至少30%的光输出在400-500nm的范围内发射; 并且包含用于向处理区域产生光脉冲的装置,其中光脉冲峰值的功率密度大于0.5W / cm 2且小于500W / cm 2 / >。 一个脉冲的能量涉及0.05-10J / cm 2。
    • 7. 发明授权
    • Grid system for a suspended ceiling
    • 吊顶系统
    • US08640408B2
    • 2014-02-04
    • US13326905
    • 2011-12-15
    • Jan Wilkens
    • Jan Wilkens
    • E04C2/52E04B2/00E04B9/00E04B5/10E04C3/02E04B1/38
    • E04B9/122E04B9/125
    • The disclosure relates to a grid system including at least one main runner including an aperture; at least one cross spacer including a slot, with the slot formed from a bottom side thereof; and a fixing element. The main runner is insertable into the slot in the cross spacer from a first side of the cross spacer such that, when the main runner is inserted into said slot, the aperture of the main runner is at least partly accessible from a second side of the cross spacer, the second side being opposite to the first side. The cross spacer further includes an aperture, and the fixing element is adapted to, in a locked position, extend through the aperture in the main runner and through the aperture in the cross spacer such that the relative position of the main runner and the cross spacer is fixed.
    • 本公开涉及包括至少一个主流道的网格系统,该主流道包括孔; 至少一个包括槽的交叉间隔件,其槽从底侧形成; 和固定元件。 主流道可从交叉垫片的第一侧插入交叉垫片中的狭槽中,使得当主流道插入所述槽中时,主流道的开口至少部分地可从第二侧 交叉间隔件,第二侧与第一侧相对。 交叉垫片还包括孔,并且固定元件适于在锁定位置延伸穿过主流道中的孔并穿过交叉间隔件中的孔,使得主流道和交叉垫片的相对位置 是固定的
    • 8. 发明申请
    • Inverse Treatment Planning Method
    • 反向治疗计划方法
    • US20090060130A1
    • 2009-03-05
    • US12223712
    • 2007-02-02
    • Jan WilkensUwe Oelfke
    • Jan WilkensUwe Oelfke
    • A61N5/10G06K9/00
    • A61N5/1031A61N5/1042A61N2005/1087
    • The invention relates to a radiation treatment apparatus and an inverse treatment planning method for intensity modulated particle therapy for the treatment of a target within a biological system using at least two fields, each field comprising a plurality of Bragg peaks, the at least two fields being planned to place a defined number of beam spots j from different directions with certain weights wj within the target. The inverse treatment planning method optimizes the weights wj of the beam spots for the at least two fields simultaneously in order to produce a prescribed biological effect within the target by minimizing an objective function based on biological effects ε, the biological effects ε being treated in a linear-quadratic model, which describes the biological effects in the target by two parameters α and β, where ε=αD+βD2, D denoting a dose, and wherein the two parameters α and β for each voxel i of the target (αi and βi) are calculated as dose-averaged mean values of αi,j- and √{square root over (βi,j)}-components, which relate to all beam spots j contributing to a total dose Di in the voxel i.
    • 本发明涉及一种用于强度调制粒子治疗的放射治疗装置和逆治疗计划方法,用于使用至少两个场来处理生物系统内的靶,每个场包括多个布拉格峰,所述至少两个场是 计划在目标内放置一定数量的来自不同方向的光束点j和某些重量wj。 逆治疗计划方法同时优化至少两个场的束斑的权重wj,以便通过使基于生物效应的最小化目标函数来产生规定的生物效应,所述目标函数是在一个 线性二次模型,其通过两个参数α和β描述目标中的生物效应,其中epsilon =αD+βD2,D表示剂量,并且其中目标的每个体素i的两个参数α和β(alphai和 betai)计算为alphai,j-和√{平方根超过(betai,j)}分量的剂量平均平均值,其涉及对体素i中的总剂量Di有贡献的所有束斑点j。
    • 9. 发明申请
    • Grid System For A Suspended Ceiling
    • 悬挂天花板网格系统
    • US20120159890A1
    • 2012-06-28
    • US13326905
    • 2011-12-15
    • Jan Wilkens
    • Jan Wilkens
    • E04B9/18
    • E04B9/122E04B9/125
    • The disclosure relates to a grid system including at least one main runner including an aperture; at least one cross spacer including a slot, with the slot formed from a bottom side thereof; and a fixing element. The main runner is insertable into the slot in the cross spacer from a first side of the cross spacer such that, when the main runner is inserted into said slot, the aperture of the main runner is at least partly accessible from a second side of the cross spacer, the second side being opposite to the first side. The cross spacer further includes an aperture, and the fixing element is adapted to, in a locked position, extend through the aperture in the main runner and through the aperture in the cross spacer such that the relative position of the main runner and the cross spacer is fixed.
    • 本公开涉及包括至少一个主流道的网格系统,该主流道包括孔; 至少一个包括槽的交叉间隔件,其槽从底侧形成; 和固定元件。 主流道可从交叉垫片的第一侧插入交叉垫片中的槽中,使得当主流道插入所述槽中时,主流道的开口至少部分地可从第二侧 交叉间隔件,第二侧与第一侧相对。 交叉垫片还包括孔,并且固定元件适于在锁定位置延伸穿过主流道中的孔并穿过交叉间隔件中的孔,使得主流道和交叉垫片的相对位置 是固定的