专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06318042B1 Grid system for a suspended ceiling 有权
标题翻译：吊顶系统
公开(公告)号：US06318042B1
公开(公告)日：2001-11-20
申请号：US09603920
申请日：2000-06-26
申请人： Lars Bloom , Tord Edvinsson , Magnus Mollborn , Mikael Moller , Fredrik Nilsson , Jan Wilkens
发明人： Lars Bloom , Tord Edvinsson , Magnus Mollborn , Mikael Moller , Fredrik Nilsson , Jan Wilkens
IPC分类号： E04F1308
CPC分类号： E04B9/16 , E04B9/065 , E04B9/122 , E04B9/26
摘要： A grid system for a suspended ceiling comprising mutually spaced main runners of T-profile suspended by means of hangers at the web of the T-profile, the flanges of the T-profile forming support surfaces for tiles. Apertures are punched at regular spacing in the web of the T-profile registering transversely of the main runners. Channeled girders opening upwards and extending over several main runners along registering apertures therein engage the main runners to define the spacing therebetween, the web of the T-profile being received in slots in the bottom and side walls (18) of the channeled girder. Each girder is fixedly connected with the runners by fastening elements engaging the apertures therein.
摘要翻译：一种用于悬吊天花板的格栅系统，包括相互间隔开的T形轮廓的主流道，T型轮廓通过悬挂在T型轮腹的腹板上悬挂，T形轮廓形成用于瓦片的支撑表面。在横向于主流道的T型材的腹板中以规则间隔冲孔。引导梁向上开口并沿着其中的多个主流道延伸，沿其对准孔接合主流道以限定它们之间的间隔，T型材的腹板被接纳在所引导的梁的底部和侧壁（18）中的狭槽中。每个梁通过与其中的孔接合的紧固元件与跑道固定连接。

2. 发明授权

US08640408B2 Grid system for a suspended ceiling 有权
标题翻译：吊顶系统
公开(公告)号：US08640408B2
公开(公告)日：2014-02-04
申请号：US13326905
申请日：2011-12-15
申请人： Jan Wilkens
发明人： Jan Wilkens
IPC分类号： E04C2/52 , E04B2/00 , E04B9/00 , E04B5/10 , E04C3/02 , E04B1/38
CPC分类号： E04B9/122 , E04B9/125
摘要： The disclosure relates to a grid system including at least one main runner including an aperture; at least one cross spacer including a slot, with the slot formed from a bottom side thereof; and a fixing element. The main runner is insertable into the slot in the cross spacer from a first side of the cross spacer such that, when the main runner is inserted into said slot, the aperture of the main runner is at least partly accessible from a second side of the cross spacer, the second side being opposite to the first side. The cross spacer further includes an aperture, and the fixing element is adapted to, in a locked position, extend through the aperture in the main runner and through the aperture in the cross spacer such that the relative position of the main runner and the cross spacer is fixed.
摘要翻译：本公开涉及包括至少一个主流道的网格系统，该主流道包括孔; 至少一个包括槽的交叉间隔件，其槽从底侧形成; 和固定元件。主流道可从交叉垫片的第一侧插入交叉垫片中的狭槽中，使得当主流道插入所述槽中时，主流道的开口至少部分地可从第二侧交叉间隔件，第二侧与第一侧相对。交叉垫片还包括孔，并且固定元件适于在锁定位置延伸穿过主流道中的孔并穿过交叉间隔件中的孔，使得主流道和交叉垫片的相对位置是固定的

3. 发明申请

US20110146183A1 CEILING TILE UNIT AND A METHOD FOR FORMING A CEILING TILE UNIT 审中-公开
标题翻译：天花板单元和形成天花板单元的方法
公开(公告)号：US20110146183A1
公开(公告)日：2011-06-23
申请号：US12971137
申请日：2010-12-17
申请人： Jan WILKENS , Jonas SKEPPAS , Thomas NILSSON
发明人： Jan WILKENS , Jonas SKEPPAS , Thomas NILSSON
IPC分类号： E04B9/18 , E04C2/40 , E04B1/35
CPC分类号： E04B9/0414 , E04B9/045
摘要： The present invention relates to a ceiling tile unit comprising a tile body made of mineral fibre material, a surface layer and a guide. The tile body has a front side, a rear side and at least one side edge, and the surface layer is arranged on said front side of said tile body. A groove is provided in said rear side of said tile body dividing said tile body into a first tile body section and a second tile body section. Said guide is adapted to form a fold guidance for inclination of said first tile body section in relation to said second tile body section by folding about an axis parallel to the longitudinal direction of said groove. The invention further relates to a method for forming a ceiling tile unit.
摘要翻译：本发明涉及一种天花板瓦片单元，其包括由矿物纤维材料制成的瓦片体，表面层和引导件。瓦片体具有前侧，后侧和至少一个侧边缘，并且表面层布置在所述瓦体的所述前侧上。在所述砖体的所述后侧设置有将所述砖体分为第一砖体部分和第二砖体部分的槽。所述引导件适于通过围绕平行于所述凹槽的纵向方向的轴线折叠来形成相对于所述第二瓦片主体部分倾斜所述第一瓦片主体部分的折叠引导件。本发明还涉及一种用于形成天花板瓦片单元的方法。

4. 发明申请

US20090060130A1 Inverse Treatment Planning Method 有权
标题翻译：反向治疗计划方法
公开(公告)号：US20090060130A1
公开(公告)日：2009-03-05
申请号：US12223712
申请日：2007-02-02
申请人： Jan Wilkens , Uwe Oelfke
发明人： Jan Wilkens , Uwe Oelfke
IPC分类号： A61N5/10 , G06K9/00
CPC分类号： A61N5/1031 , A61N5/1042 , A61N2005/1087
摘要： The invention relates to a radiation treatment apparatus and an inverse treatment planning method for intensity modulated particle therapy for the treatment of a target within a biological system using at least two fields, each field comprising a plurality of Bragg peaks, the at least two fields being planned to place a defined number of beam spots j from different directions with certain weights wj within the target. The inverse treatment planning method optimizes the weights wj of the beam spots for the at least two fields simultaneously in order to produce a prescribed biological effect within the target by minimizing an objective function based on biological effects ε, the biological effects ε being treated in a linear-quadratic model, which describes the biological effects in the target by two parameters α and β, where ε=αD+βD2, D denoting a dose, and wherein the two parameters α and β for each voxel i of the target (αi and βi) are calculated as dose-averaged mean values of αi,j- and √{square root over (βi,j)}-components, which relate to all beam spots j contributing to a total dose Di in the voxel i.
摘要翻译：本发明涉及一种用于强度调制粒子治疗的放射治疗装置和逆治疗计划方法，用于使用至少两个场来处理生物系统内的靶，每个场包括多个布拉格峰，所述至少两个场是计划在目标内放置一定数量的来自不同方向的光束点j和某些重量wj。逆治疗计划方法同时优化至少两个场的束斑的权重wj，以便通过使基于生物效应的最小化目标函数来产生规定的生物效应，所述目标函数是在一个线性二次模型，其通过两个参数α和β描述目标中的生物效应，其中epsilon =αD+βD2，D表示剂量，并且其中目标的每个体素i的两个参数α和β（alphai和 betai）计算为alphai，j-和√{平方根超过（betai，j）}分量的剂量平均平均值，其涉及对体素i中的总剂量Di有贡献的所有束斑点j。

5. 发明授权

US08183541B2 Inverse treatment planning method 有权
标题翻译：逆治疗计划方法
公开(公告)号：US08183541B2
公开(公告)日：2012-05-22
申请号：US12223712
申请日：2007-02-02
申请人： Jan Wilkens , Uwe Oelfke
发明人： Jan Wilkens , Uwe Oelfke
IPC分类号： G21K5/04
CPC分类号： A61N5/1031 , A61N5/1042 , A61N2005/1087
摘要： The invention relates to a radiation treatment apparatus and an inverse treatment planning method for intensity modulated particle therapy for the treatment of a target within a biological system using at least two fields, each field comprising a plurality of Bragg peaks, the at least two fields being planned to place a defined number of beam spots j from different directions with certain weights wj within the target. The inverse treatment planning method optimizes the weights wj of the beam spots for the at least two fields simultaneously in order to produce a prescribed biological effect within the target by minimizing an objective function based on biological effects ε, the biological effects ε being treated in a linear-quadratic model, which describes the biological effects in the target by two parameters α and β, where ε=αD+βD2, D denoting a dose, and wherein the two parameters α and β for each voxel i of the target (αi and βi) are calculated as dose-averaged mean values of αi,j- and √{square root over (βi,j)}-components, which relate to all beam spots j contributing to a total dose Di in the voxel i.
摘要翻译：本发明涉及一种用于强度调制粒子治疗的放射治疗装置和逆治疗计划方法，用于使用至少两个场来处理生物系统内的靶，每个场包括多个布拉格峰，所述至少两个场是计划在目标内放置一定数量的来自不同方向的光束点j和某些重量wj。反向治疗计划方法同时优化至少两个场的束斑的权重wj，以便通过最小化基于生物效应和生物效应的目标函数来在目标内产生规定的生物效应。在线性二次模型中进行处理，其通过两个参数α和＆bgr来描述目标物的生物效应，其中＆egr =αD+＆bgr; D2，D表示剂量，并且其中两个参数α和＆bgr; 对于目标的每个体素i（αi和＆bgr; i）被计算为αi，j-和√{平方根超过（＆bgr; i，j）}分量的剂量平均平均值，其与所有束点 j对体素i中的总剂量Di有贡献。

6. 发明申请

US20070073276A1 Irradiation device and method for the treatment of acne and acne scars 审中-公开
标题翻译：用于治疗痤疮和痤疮疤痕的照射装置和方法
公开(公告)号：US20070073276A1
公开(公告)日：2007-03-29
申请号：US11606702
申请日：2006-11-30
申请人： Jan Wilkens , Rolf Stirner
发明人： Jan Wilkens , Rolf Stirner
IPC分类号： A61B18/18
CPC分类号： A61N5/0616 , A61N2005/0642 , A61N2005/0644 , H01J61/125
摘要： An irradiation device (1) and a method for the treatment of acne and acne scars, comprising at least one source of radiation (2), the source of radiation emitting at least one broadband spectrum in the wavelength range of 320-at least 540 nm and the radiation source (2) being pulse-operable and/or movable relatively to the area to be irradiated, the pulse energy being between 0.05-10 J/cm2 and the peak irradiation intensity being between 0.5 W/cm2 and 100 kW/cm2.
摘要翻译：一种照射装置（1）和用于治疗痤疮和痤疮疤痕的方法，包括至少一个辐射源（2），辐射源发射至少一个波长范围为320-至少540nm的宽带光谱并且所述辐射源（2）相对于被照射的区域是脉冲可操作的和/或可移动的，所述脉冲能量在0.05-10J / cm 2之间，并且所述峰值照射强度在0.5 W / cm 2和100kW / cm 2。

7. 发明申请

US20050085878A1 Irradiation device for therapeutic treatment of skin diseases and other ailments 审中-公开
标题翻译：用于治疗皮肤病和其他疾病的照射装置
公开(公告)号：US20050085878A1
公开(公告)日：2005-04-21
申请号：US10971790
申请日：2004-10-22
申请人： Jan Wilkens , Rolf Stirner
发明人： Jan Wilkens , Rolf Stirner
IPC分类号： A61N5/06
CPC分类号： A61N5/0616 , A61N2005/0642 , A61N2005/0644 , H01J61/125
摘要： The invention relates to an irradiation device and method for the treatment of totally or partially cell-mediated inflammations of the skin, the connective tissue and the viscera, viral and other infectious diseases such as HIV and prionic infections, fungal infections of the skin and the mucous membranes, bacterial diseases of the skin and the mucous membranes as well hand eczema and anal eczema which comprises at least one irradiation device to irradiate a surface treatment area where the wavelength of the emitted radiation to a treatment area is longer than 400 nm and comprises at least one spectral band between 400-500 nm while the radiation device has a gas discharge lamp containing at least gallium, indium or their respective halides as irradiation source, means that less than 7% of the overall optical output are emitted in the UV range, wherein at least 30% of the optical output are emitted in the range of 400-500 nm; and contains means for the generation of optical pulses towards a treatment area with a power density of the optical pulse peaks larger than 0.5 W/cm2 and smaller than 500 W/cm2. The energy of one pulse relates to 0.05-10 J/cm2.
摘要翻译：本发明涉及一种用于治疗全身或部分细胞介导的皮肤炎，结缔组织和内脏炎症，病毒和其他传染病如艾滋病毒和朊病毒感染，皮肤真菌感染和粘膜，皮肤和粘膜的细菌性疾病以及手湿疹和肛门湿疹，其包括至少一个照射装置以照射发射的辐射的波长到处理区域的表面处理区域超过400nm，并且包括在400-500nm之间的至少一个光谱带，而辐射装置具有至少包含镓，铟或其各自的卤化物作为辐射源的气体放电灯，意味着总体光输出的小于7％在UV范围内发射，其中至少30％的光输出在400-500nm的范围内发射; 并且包含用于向处理区域产生光脉冲的装置，其中光脉冲峰值的功率密度大于0.5W / cm 2且小于500W / cm 2 / >。一个脉冲的能量涉及0.05-10J / cm 2。

8. 发明授权

US5895637A Process for preparing sodium disilicate having a high ion-exchange capacity 失效
标题翻译：具有高离子交换能力的二硅酸钠的制备方法
公开(公告)号：US5895637A
公开(公告)日：1999-04-20
申请号：US723025
申请日：1996-09-30
申请人： Jan Wilkens , Gunther Schimmel , Alexander Tapper
发明人： Jan Wilkens , Gunther Schimmel , Alexander Tapper
IPC分类号： C01B33/32 , C01B33/38 , C11D3/08 , C11D3/12 , C11D7/14
CPC分类号： C11D3/1273 , C01B33/38 , C11D3/08
摘要： The invention relates to a process for preparing sodium disilicate in the .beta. form having a high ion-exchange capacity and a molar ratio Na.sub.2 O:SiO.sub.2 of about 1:2 from a silicate source and sodium hydroxide solution at elevated temperature, with the product formed being separated off by filtration, wherein the product is further heat treated at from 450.degree. to 780.degree. C. and/or is pressed to form compact parts.
摘要翻译：本发明涉及一种在硅酸盐源和氢氧化钠溶液中在升高的温度下制备具有高离子交换能力和约1:2的Na 2 O:SiO 2的摩尔比为β形式的二硅酸钠的方法，其中形成的产物为通过过滤分离，其中产物在450℃至780℃进一步热处理和/或被压制以形成紧凑的部件。

9. 发明申请

US20120159890A1 Grid System For A Suspended Ceiling 有权
标题翻译：悬挂天花板网格系统
公开(公告)号：US20120159890A1
公开(公告)日：2012-06-28
申请号：US13326905
申请日：2011-12-15
申请人： Jan Wilkens
发明人： Jan Wilkens
IPC分类号： E04B9/18
CPC分类号： E04B9/122 , E04B9/125
摘要： The disclosure relates to a grid system including at least one main runner including an aperture; at least one cross spacer including a slot, with the slot formed from a bottom side thereof; and a fixing element. The main runner is insertable into the slot in the cross spacer from a first side of the cross spacer such that, when the main runner is inserted into said slot, the aperture of the main runner is at least partly accessible from a second side of the cross spacer, the second side being opposite to the first side. The cross spacer further includes an aperture, and the fixing element is adapted to, in a locked position, extend through the aperture in the main runner and through the aperture in the cross spacer such that the relative position of the main runner and the cross spacer is fixed.
摘要翻译：本公开涉及包括至少一个主流道的网格系统，该主流道包括孔; 至少一个包括槽的交叉间隔件，其槽从底侧形成; 和固定元件。主流道可从交叉垫片的第一侧插入交叉垫片中的槽中，使得当主流道插入所述槽中时，主流道的开口至少部分地可从第二侧交叉间隔件，第二侧与第一侧相对。交叉垫片还包括孔，并且固定元件适于在锁定位置延伸穿过主流道中的孔并穿过交叉间隔件中的孔，使得主流道和交叉垫片的相对位置是固定的

10. 发明授权

US07309804B2 Process for purifying 1,2-dichloroethane 有权
标题翻译： 1,2-二氯乙烷净化方法
公开(公告)号：US07309804B2
公开(公告)日：2007-12-18
申请号：US10280704
申请日：2002-10-25
申请人： Helmut Grumann , Manfred Stoger , Jurgen Eichler , Dieter Jaculi , Winfried Lork , Arend Greve , Jan Wilkens , Peter Kammerhofer , Hermann Tropp
发明人： Helmut Grumann , Manfred Stoger , Jurgen Eichler , Dieter Jaculi , Winfried Lork , Arend Greve , Jan Wilkens , Peter Kammerhofer , Hermann Tropp
IPC分类号： C07C17/02
CPC分类号： C07C17/38 , C07C17/156 , C07C19/045
摘要： A process for the preparation of 1,2-dichloroethane that is very pure with respect to chloral or/and chloral hydrate and carbon dioxide is described herein. The process comprises oxychlorination of ethylene, using hydrogen chloride and an oxygen-containing gas, and alkali treatment of the 1,2-dichloroethane produced. In the process, the carbon dioxide present in the 1,2-dichloroethane-containing organic phase is, in accordance with the invention, substantially separated out from the 1,2-dichloroethane-containing organic phase before the alkali treatment.
摘要翻译：本文描述了制备相对于氯醛或/和水合氯醛和二氧化碳非常纯的1,2-二氯乙烷的方法。该方法包括使用氯化氢和含氧气体对乙烯进行氧氯化，并对所生产的1,2-二氯乙烷进行碱处理。在该方法中，根据本发明，存在于含1,2-二氯乙烷的有机相中的二氧化碳在碱处理之前基本上与含1,2-二氯乙烷的有机相分离。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式