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1. 发明申请

US20120171616A1 POLYMERIZABLE PHOTOACID GENERATORS 有权
标题翻译：聚合光电发生器
公开(公告)号：US20120171616A1
公开(公告)日：2012-07-05
申请号：US13339948
申请日：2011-12-29
申请人： James W. Thackeray , Suzanne M. Coley , Vipul Jain , Owendi Ongayi , James F. Cameron , Paul J. LaBeaume , Ahmad E. Madkour
发明人： James W. Thackeray , Suzanne M. Coley , Vipul Jain , Owendi Ongayi , James F. Cameron , Paul J. LaBeaume , Ahmad E. Madkour
IPC分类号： G03F7/20 , C07C69/593 , G03F7/004 , C07C69/54 , C08F228/06 , C08G63/688
CPC分类号： G03F7/0045 , C07C309/12 , C07C309/42 , C07C381/12 , C07D333/76 , C08F220/38 , G03F7/0046 , G03F7/0397 , G03F7/20 , Y10S430/122 , Y10S430/123 , Y10S430/126
摘要： A compound has formula (I): Q-O-(A)-Z−G+ (I) wherein Q is a halogenated or non-halogenated, C2-30 olefin-containing group, A is a fluorine-substituted C1-30 alkylene group, a fluorine-substituted C3-30 cycloalkylene group, a fluorine-substituted C6-30 arylene group, or a fluorine-substituted C7-30 alkylene-arylene group, Z is an anionic group comprising sulfonate, sulfonamide, or sulfonamide, and G+ has formula (II): wherein X is S or I, each R0 is halogenated or non-halogenated and is independently C1-30 alkyl group; a polycyclic or monocyclic C3-30 cycloalkyl group; a polycyclic or monocyclic C4-30 aryl group; or a combination of these, wherein when X is S, one of the R0 groups is optionally attached to one adjacent R0 group by a single bond, and a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 3. A copolymer, a photoresist, a coated substrate and method of patterning are disclosed.
摘要翻译：化合物具有式（I）：QO-（A）-Z-G +（I）其中Q是卤代或非卤代的含C30-30烯烃基团，A是氟取代的C1-30亚烷基，氟取代的C3-30亚环烷基，氟取代的C6-30亚芳基或氟取代的C7-30亚烷基 - 亚芳基，Z是包含磺酸酯，磺酰胺或磺酰胺的阴离子基团，G +具有式（II）：其中X为S或I，每个R 0为卤代或非卤代，独立地为C 1-30烷基; 多环或单环C 3-30环烷基; 多环或单环C 4-30芳基; 或这些的组合，其中当X是S时，R0中的一个可任选地通过单键连接到一个相邻的R0基团，a是2或3，其中当X是I时，a是2，或当X 是S，a是3。公开了共聚物，光致抗蚀剂，涂布的基材和图案化方法。

2. 发明授权

US08900792B2 Polymerizable photoacid generators 有权
标题翻译：可聚合的光酸发生剂
公开(公告)号：US08900792B2
公开(公告)日：2014-12-02
申请号：US13339948
申请日：2011-12-29
申请人： James W. Thackeray , Suzanne M. Coley , Vipul Jain , Owendi Ongayi , James F. Cameron , Paul J. Labeaume , Ahmad E. Madkour
发明人： James W. Thackeray , Suzanne M. Coley , Vipul Jain , Owendi Ongayi , James F. Cameron , Paul J. Labeaume , Ahmad E. Madkour
IPC分类号： G03F7/004 , G03F7/029 , C07D333/76 , G03F7/20 , C07C309/12 , C07C309/42 , C07C381/12 , G03F7/039 , C08F220/38
CPC分类号： G03F7/0045 , C07C309/12 , C07C309/42 , C07C381/12 , C07D333/76 , C08F220/38 , G03F7/0046 , G03F7/0397 , G03F7/20 , Y10S430/122 , Y10S430/123 , Y10S430/126
摘要： A compound has formula (I): Q-O-(A)-Z−G+ (I) wherein Q is a halogenated or non-halogenated, C2-30 olefin-containing group, A is a fluorine-substituted C1-30 alkylene group, a fluorine-substituted C3-30 cycloalkylene group, a fluorine-substituted C6-30 arylene group, or a fluorine-substituted C7-30 alkylene-arylene group, Z is an anionic group comprising sulfonate, sulfonamide, or sulfonimide, and G+ has formula (II): wherein X is S or I, each R0 is halogenated or non-halogenated and is independently C1-30 alkyl group; a polycyclic or monocyclic C3-30 cycloalkyl group; a polycyclic or monocyclic C4-30 aryl group; or a combination of these, wherein when X is S, one of the R0 groups is optionally attached to one adjacent R0 group by a single bond, and a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 3. A copolymer, a photoresist, a coated substrate and method of patterning are disclosed.
摘要翻译：化合物具有式（I）：QO-（A）-Z-G +（I）其中Q是卤代或非卤代的含C30-30烯烃基团，A是氟取代的C1-30亚烷基，氟取代的C3-30亚环烷基，氟取代的C6-30亚芳基或氟取代的C7-30亚烷基 - 亚芳基，Z是包含磺酸酯，磺酰胺或磺酰亚胺的阴离子基团，G +具有式（II）：其中X为S或I，每个R 0为卤代或非卤代，独立地为C 1-30烷基; 多环或单环C 3-30环烷基; 多环或单环C 4-30芳基; 或这些的组合，其中当X是S时，R0中的一个可任选地通过单键连接到一个相邻的R0基团，a是2或3，其中当X是I时，a是2，或当X 是S，a是3。公开了共聚物，光致抗蚀剂，涂布的基材和图案化方法。

3. 发明授权

US08932797B2 Photoacid generators 有权
标题翻译：光酸发生器
公开(公告)号：US08932797B2
公开(公告)日：2015-01-13
申请号：US13307198
申请日：2011-11-30
申请人： James W. Thackeray , Suzanne M. Coley , James F. Cameron , Paul J. LaBeaume , Ahmad E. Madkour , Owendi Ongayi , Vipul Jain
发明人： James W. Thackeray , Suzanne M. Coley , James F. Cameron , Paul J. LaBeaume , Ahmad E. Madkour , Owendi Ongayi , Vipul Jain
IPC分类号： G03F7/004 , C07C303/32 , C07C309/04 , C07C309/06 , C07C309/12 , C07C309/29 , C07C309/30 , C07C309/39 , C07C381/12 , G03F7/039
CPC分类号： C07C381/12 , G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/111 , Y10S430/121 , Y10S430/122 , Y10S430/123
摘要： A photoacid generator compound has formula (I): G+Z− (I) wherein G has formula (II): In formula (II), X is S or I, each R0 is commonly attached to X and is independently C1-30 alkyl; polycyclic or monocyclic C3-30 cycloalkyl; polycyclic or monocyclic C6-30 aryl; or a combination comprising at least one of the foregoing groups. G has a molecular weight greater than 263.4 g/mol, or less than 263.4 g/mol. One or more R0 groups are further attached to an adjacent R0 group, a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 2 or 3. Z in formula (I) comprises the anion of a sulfonic acid, a sulfonimide, or a sulfonamide. A photoresist and coated film also includes the photoacid generator, and a method of forming an electronic device uses the photoresist.
摘要翻译：光致酸发生剂化合物具有式（I）：G + Z-（I）其中G具有式（II）：在式（II）中，X是S或I，每个R 0通常与X连接并且独立地为C 1-30 烷基; 多环或单环C 3-30环烷基; 多环或单环C 6-30芳基; 或包含前述组中的至少一个的组合。 G的分子量大于263.4g / mol，或小于263.4g / mol。一个或多个R 0基团进一步连接到相邻的R0基团，a是2或3，其中当X是I时，a是2，或当X是S时，a是2或3.在式（I）中的Z包括磺酸的阴离子，磺酰亚胺或磺酰胺。光致抗蚀剂和涂膜也包括光致酸产生剂，并且形成电子器件的方法使用光致抗蚀剂。

4. 发明申请

US20120141939A1 PHOTOACID GENERATORS 有权
标题翻译：光电发生器
公开(公告)号：US20120141939A1
公开(公告)日：2012-06-07
申请号：US13307198
申请日：2011-11-30
申请人： James W. Thackeray , Suzanne M. Coley , James F. Cameron , Paul J. LaBeaume , Ahmad E. Madkour , Owendi Ongayi , Vipul Jain
发明人： James W. Thackeray , Suzanne M. Coley , James F. Cameron , Paul J. LaBeaume , Ahmad E. Madkour , Owendi Ongayi , Vipul Jain
IPC分类号： G03F7/20 , C07C309/06 , G03F7/027
CPC分类号： C07C381/12 , G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/111 , Y10S430/121 , Y10S430/122 , Y10S430/123
摘要： A photoacid generator compound has formula (I): G+Z− (I) wherein G has formula (II): In formula (II), X is S or I, each R0 is commonly attached to X and is independently C1-30 alkyl; polycyclic or monocyclic C3-30 cycloalkyl; polycyclic or monocyclic C6-30 aryl; or a combination comprising at least one of the foregoing groups. G has a molecular weight greater than 263.4 g/mol, or less than 263.4 g/mol. One or more R0 groups are further attached to an adjacent R0 group, a is 2 or 3, wherein when X is I, a is 2, or when X is S, a is 2 or 3. Z in formula (I) comprises the anion of a sulfonic acid, a sulfonimide, or a sulfonamide. A photoresist and coated film also includes the photoacid generator, and a method of forming an electronic device uses the photoresist.
摘要翻译：光致酸发生剂化合物具有式（I）：G + Z-（I）其中G具有式（II）：在式（II）中，X是S或I，每个R 0通常与X连接并且独立地为C 1-30 烷基; 多环或单环C 3-30环烷基; 多环或单环C 6-30芳基; 或包含前述组中的至少一个的组合。 G的分子量大于263.4g / mol，或小于263.4g / mol。一个或多个R 0基团进一步连接到相邻的R0基团，a是2或3，其中当X是I时，a是2，或当X是S时，a是2或3.在式（I）中的Z包括磺酸的阴离子，磺酰亚胺或磺酰胺。光致抗蚀剂和涂膜也包括光致酸产生剂，并且形成电子器件的方法使用光致抗蚀剂。

5. 发明授权

US5939511A Resin purification process 失效
标题翻译：树脂净化工艺
公开(公告)号：US5939511A
公开(公告)日：1999-08-17
申请号：US57115
申请日：1998-04-08
申请人： Anthony Zampini , Suzanne M. Coley
发明人： Anthony Zampini , Suzanne M. Coley
IPC分类号： C08G8/04 , C08G8/08 , G03F7/023
CPC分类号： G03F7/0236 , C08G8/04 , C08G8/08
摘要： The invention is directed to purification of phenolic resins and to a process for preparing an organic photoresist coating composition. The process comprises reacting one or more phenols to form a crude phenolic resin. The crude phenolic resin formed is then separated from its reaction mixture and dissolved in an aqueous insoluble organic solvent in an organic solvent that is a solvent for the photoresist coating composition. The solution so formed is then mixed with an aqueous phase to extract water soluble impurities from the resin solution into the aqueous phase. Finally, the purified resin solution is further diluted with additional photoresist solvent.
摘要翻译：本发明涉及酚醛树脂的纯化和制备有机光致抗蚀剂涂料组合物的方法。该方法包括使一种或多种酚反应形成粗酚醛树脂。然后将形成的粗制酚醛树脂与其反应混合物分离并溶解在水溶性有机溶剂中的有机溶剂中，该有机溶剂是光刻胶涂料组合物的溶剂。然后将如此形成的溶液与水相混合以将水溶性杂质从树脂溶液中提取到水相中。最后，用额外的光致抗蚀剂溶剂进一步稀释纯化的树脂溶液。

6. 发明授权

US5789522A Resin purification process 失效
公开(公告)号：US5789522A
公开(公告)日：1998-08-04
申请号：US709340
申请日：1996-09-06
申请人： Anthony Zampini , Suzanne M. Coley
发明人： Anthony Zampini , Suzanne M. Coley
IPC分类号： C08G8/04 , C08G8/08 , G03F7/023
CPC分类号： G03F7/0236 , C08G8/04 , C08G8/08
摘要： The invention is directed to purification of phenolic resins and to a process for preparing an organic photoresist coating composition. The process comprises reacting one or more phenols to form a crude phenolic resin. The crude phenolic resin formed is then separated from its reaction mixture and dissolved in an aqueous insoluble organic solvent in an organic solvent that is a solvent for the photoresist coating composition. The solution so formed is then mixed with an aqueous phase to extract water soluble impurities from the resin solution into the aqueous phase. Finally, the purified resin solution is further diluted with additional photoresist solvent.

7. 发明授权

US08716518B2 Photoacid generating monomer and precursor thereof 有权
标题翻译：光产酸单体及其前体
公开(公告)号：US08716518B2
公开(公告)日：2014-05-06
申请号：US13340088
申请日：2011-12-29
申请人： Suzanne M. Coley , David R. Wilson , Francis J. Timmers
发明人： Suzanne M. Coley , David R. Wilson , Francis J. Timmers
IPC分类号： C07C309/00
CPC分类号： G03F7/0046 , C07C309/12 , C07C381/12 , C07D333/76 , C08F220/38 , G03F7/0045 , G03F7/0397
摘要： A monomer compound has the formula (I): where each R1, R2, and R3 is independently H, F, C1-10 alkyl, fluoro-substituted C1-10 alkyl, C1-10 cycloalkyl, or fluoro-substituted C1-10 cycloalkyl, provided that at least one of R1, R2, or R3 is F; n is an integer of from 1 to 10, A is a halogenated or non-halogenated C2-30 olefin-containing polymerizable group, and G+ is an organic or inorganic cation. The monomer is the reaction product of a sultone precursor and the oxyanion of a hydroxy-containing halogenated or non-halogenated C2-30 olefin-containing compound. A polymer includes the monomer of formula (I).
摘要翻译：单体化合物具有式（I）：其中每个R 1，R 2和R 3独立地为H，F，C 1-10烷基，氟取代的C 1-10烷基，C 1-10环烷基或氟取代的C 1-10环烷基条件是R 1，R 2或R 3中的至少一个为F; n为1〜10的整数，A为卤化或非卤化的含C2-30烯烃的聚合性基团，G +为有机或无机阳离子。单体是磺内酯前体与含羟基的卤代或非卤代C 2-30烯烃化合物的氧阴离子的反应产物。聚合物包括式（I）的单体。

8. 发明申请

US20120172619A1 METHOD OF PREPARING PHOTOACID GENERATING MONOMER 有权
标题翻译：制备光生产单体的方法
公开(公告)号：US20120172619A1
公开(公告)日：2012-07-05
申请号：US13339831
申请日：2011-12-29
申请人： Suzanne M. Coley , David R. Wilson , Francis J. Timmers
发明人： Suzanne M. Coley , David R. Wilson , Francis J. Timmers
IPC分类号： C07C67/29
CPC分类号： G03F7/0045 , C07C303/32 , C07C381/12 , C08F220/38 , C08F228/00 , G03F7/0046 , G03F7/0382 , G03F7/0392 , C07C309/12
摘要： A method of preparing a monomer comprises reacting a sultone of the formula (I): wherein each R is independently F, C1-10 alkyl, fluoro-substituted C1-10 alkyl, C1-10 cycloalkyl, or fluoro-substituted C1-10 cycloalkyl, provided that at least one R is F; n is an integer of from 0 to 10, and m is an integer of 1 to 4+2n, with a nucleophile having a polymerizable group. Monomers, including a photoacid-generating monomer, may be prepared by this method.
摘要翻译：制备单体的方法包括使式（I）的磺内酯：其中每个R独立地为F，C 1-10烷基，氟取代的C 1-10烷基，C 1-10环烷基或氟取代的C 1-10环烷基条件是至少一个R是F; n为0〜10的整数，m为1〜4 + 2n的整数，具有可聚合基团的亲核试剂。包括产生光致酸的单体的单体可以通过该方法制备。

9. 发明授权

US08907122B2 Method of preparing photoacid generating monomer 有权
标题翻译：制备光生酸单体的方法
公开(公告)号：US08907122B2
公开(公告)日：2014-12-09
申请号：US13339831
申请日：2011-12-29
申请人： Suzanne M. Coley , David R. Wilson , Francis J. Timmers
发明人： Suzanne M. Coley , David R. Wilson , Francis J. Timmers
IPC分类号： C07C303/32 , C07C381/12 , C08F228/00 , G03F7/004 , G03F7/038 , G03F7/039 , C08F220/38
CPC分类号： G03F7/0045 , C07C303/32 , C07C381/12 , C08F220/38 , C08F228/00 , G03F7/0046 , G03F7/0382 , G03F7/0392 , C07C309/12
摘要： A method of preparing a monomer comprises reacting a sultone of the formula (I): wherein each R is independently F, C1-10 alkyl, fluoro-substituted C1-10 alkyl, C1-10 cycloalkyl, or fluoro-substituted C1-10 cycloalkyl, provided that at least one R is F; n is an integer of from 0 to 10, and m is an integer of 1 to 4+2n, with a nucleophile having a polymerizable group. Monomers, including a photoacid-generating monomer, may be prepared by this method.
摘要翻译：制备单体的方法包括使式（I）的磺内酯：其中每个R独立地为F，C 1-10烷基，氟取代的C 1-10烷基，C 1-10环烷基或氟取代的C 1-10环烷基条件是至少一个R是F; n为0〜10的整数，m为1〜4 + 2n的整数，具有可聚合基团的亲核试剂。包括产生光致酸的单体的单体可以通过该方法制备。

10. 发明申请

US20120172555A1 PHOTOACID GENERATING MONOMER AND PRECURSOR THEREOF 有权
标题翻译：光电发生单体及其前身
公开(公告)号：US20120172555A1
公开(公告)日：2012-07-05
申请号：US13340088
申请日：2011-12-29
申请人： Suzanne M. Coley , David R. Wilson , Francis J. Timmers
发明人： Suzanne M. Coley , David R. Wilson , Francis J. Timmers
IPC分类号： C07C69/54 , C08F20/38 , C07D327/04 , C07D327/00 , C07D333/76 , C07D327/06
CPC分类号： G03F7/0046 , C07C309/12 , C07C381/12 , C07D333/76 , C08F220/38 , G03F7/0045 , G03F7/0397
摘要： A monomer compound has the formula (I): where each R1, R2, and R3 is independently H, F, C1-10 alkyl, fluoro-substituted C1-10 alkyl, C1-10 cycloalkyl, or fluoro-substituted C1-10 cycloalkyl, provided that at least one of R1, R2, or R3 is F; n is an integer of from 1 to 10, A is a halogenated or non-halogenated C2-30 olefin-containing polymerizable group, and G+ is an organic or inorganic cation. The monomer is the reaction product of a sultone precursor and the oxyanion of a hydroxy-containing halogenated or non-halogenated C2-30 olefin-containing compound. A polymer includes the monomer of formula (I).
摘要翻译：单体化合物具有式（I）：其中每个R 1，R 2和R 3独立地为H，F，C 1-10烷基，氟取代的C 1-10烷基，C 1-10环烷基或氟取代的C 1-10环烷基条件是R 1，R 2或R 3中的至少一个为F; n为1〜10的整数，A为卤化或非卤化的含C2-30烯烃的聚合性基团，G +为有机或无机阳离子。单体是磺内酯前体与含羟基的卤代或非卤代C 2-30烯烃化合物的氧阴离子的反应产物。聚合物包括式（I）的单体。

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