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1. 发明授权

US5939511A Resin purification process 失效
标题翻译：树脂净化工艺
公开(公告)号：US5939511A
公开(公告)日：1999-08-17
申请号：US57115
申请日：1998-04-08
申请人： Anthony Zampini , Suzanne M. Coley
发明人： Anthony Zampini , Suzanne M. Coley
IPC分类号： C08G8/04 , C08G8/08 , G03F7/023
CPC分类号： G03F7/0236 , C08G8/04 , C08G8/08
摘要： The invention is directed to purification of phenolic resins and to a process for preparing an organic photoresist coating composition. The process comprises reacting one or more phenols to form a crude phenolic resin. The crude phenolic resin formed is then separated from its reaction mixture and dissolved in an aqueous insoluble organic solvent in an organic solvent that is a solvent for the photoresist coating composition. The solution so formed is then mixed with an aqueous phase to extract water soluble impurities from the resin solution into the aqueous phase. Finally, the purified resin solution is further diluted with additional photoresist solvent.
摘要翻译：本发明涉及酚醛树脂的纯化和制备有机光致抗蚀剂涂料组合物的方法。该方法包括使一种或多种酚反应形成粗酚醛树脂。然后将形成的粗制酚醛树脂与其反应混合物分离并溶解在水溶性有机溶剂中的有机溶剂中，该有机溶剂是光刻胶涂料组合物的溶剂。然后将如此形成的溶液与水相混合以将水溶性杂质从树脂溶液中提取到水相中。最后，用额外的光致抗蚀剂溶剂进一步稀释纯化的树脂溶液。

2. 发明授权

US5789522A Resin purification process 失效
公开(公告)号：US5789522A
公开(公告)日：1998-08-04
申请号：US709340
申请日：1996-09-06
申请人： Anthony Zampini , Suzanne M. Coley
发明人： Anthony Zampini , Suzanne M. Coley
IPC分类号： C08G8/04 , C08G8/08 , G03F7/023
CPC分类号： G03F7/0236 , C08G8/04 , C08G8/08
摘要： The invention is directed to purification of phenolic resins and to a process for preparing an organic photoresist coating composition. The process comprises reacting one or more phenols to form a crude phenolic resin. The crude phenolic resin formed is then separated from its reaction mixture and dissolved in an aqueous insoluble organic solvent in an organic solvent that is a solvent for the photoresist coating composition. The solution so formed is then mixed with an aqueous phase to extract water soluble impurities from the resin solution into the aqueous phase. Finally, the purified resin solution is further diluted with additional photoresist solvent.

3. 发明申请

US20190354015A1 COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST 审中-公开
公开(公告)号：US20190354015A1
公开(公告)日：2019-11-21
申请号：US16525526
申请日：2019-07-29
申请人： Owendi Ongayi , Vipul Jain , Suzanne Coley , Anthony Zampini
发明人： Owendi Ongayi , Vipul Jain , Suzanne Coley , Anthony Zampini
IPC分类号： G03F7/09 , G03F7/11 , G03F7/16
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more uracil moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.

4. 发明授权

US09696627B2 Compositions comprising base-reactive component and processes for photolithography 有权
公开(公告)号：US09696627B2
公开(公告)日：2017-07-04
申请号：US12966928
申请日：2010-12-13
申请人： Deyan Wang , Jinrong Liu , Cong Liu , Doris Kang , Anthony Zampini , Cheng-Bai Xu
发明人： Deyan Wang , Jinrong Liu , Cong Liu , Doris Kang , Anthony Zampini , Cheng-Bai Xu
IPC分类号： G03F7/20 , G03F7/32 , G03F7/039 , G03F7/004
CPC分类号： G03F7/2041 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/322
摘要： New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have base-reactive groups. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.

5. 发明授权

US09429844B2 Coating compositions for use with an overcoated photoresist 有权
标题翻译：用于外涂光致抗蚀剂的涂料组合物
公开(公告)号：US09429844B2
公开(公告)日：2016-08-30
申请号：US11712160
申请日：2007-02-28
申请人： Anthony Zampini , Gerald B. Wayton
发明人： Anthony Zampini , Gerald B. Wayton
IPC分类号： G03F7/11 , G03F7/09 , G03F7/20 , H01L21/027 , C08L35/00 , C09D135/00 , C08L33/06 , C08L67/00
CPC分类号： G03F7/091 , C08L33/066 , C08L35/00 , C08L67/00 , C08L2312/00 , C09D133/064 , C09D133/066 , C09D133/12 , C09D135/00 , C09D145/00 , C09D167/02 , G03F7/094 , G03F7/2004 , G03F7/2041 , H01L21/0276 , C08L2666/18 , C08L2666/04
摘要： Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred organic coating compositions of the invention comprise one or more resins that can harden upon thermal treatment without generation of a cleavage product. Particularly preferred organic coating compositions of the invention comprise one or more components that comprise anhydride and hydroxy moieties.
摘要翻译：提供了有机涂料组合物，包括抗反射涂料组合物，其可以减少从衬底暴露辐射的反射回到外涂光致抗蚀剂层和/或作为平坦化或通孔填充层的功能。本发明的优选的有机涂料组合物包含一种或多种可以在不产生裂解产物的情况下硬化的树脂。本发明特别优选的有机涂料组合物包含一种或多种包含酸酐和羟基部分的组分。

6. 发明授权

US08455178B2 Coating compositions for photolithography 有权
标题翻译：光刻用涂料组合物
公开(公告)号：US08455178B2
公开(公告)日：2013-06-04
申请号：US11904028
申请日：2007-09-25
申请人： Anthony Zampini , Michael K. Gallagher , Vipul Jain , Owendi Ongayi
发明人： Anthony Zampini , Michael K. Gallagher , Vipul Jain , Owendi Ongayi
IPC分类号： G03F7/00 , G03F7/26
CPC分类号： G03F7/091 , G03F7/0392
摘要： Underlying coating compositions are provided that comprise one or more resins comprising one or more modified imide groups. These coating compositions are particularly useful as antireflective layers for an overcoated photoresist layer. Preferred systems can be thermally treated to increase hydrophilicity of the composition coating layer to inhibit undesired intermixing with an overcoated organic composition layer, while rendering the composition coating layer removable with aqueous alkaline photoresist developer.
摘要翻译：提供了包含一种或多种包含一种或多种改性酰亚胺基团的树脂的底涂层组合物。这些涂料组合物特别可用作外涂光致抗蚀剂层的抗反射层。优选的体系可以被热处理以增加组合物涂层的亲水性，以抑制与外涂有机组合物层的不期望的混合，同时使含水碱性光致抗蚀剂显影剂可除去组合物涂层。

7. 发明申请

US20080248331A1 Coating composition 审中-公开
标题翻译：涂料组成
公开(公告)号：US20080248331A1
公开(公告)日：2008-10-09
申请号：US12080944
申请日：2008-04-07
申请人： Michael K. Gallagher , Anthony Zampini
发明人： Michael K. Gallagher , Anthony Zampini
IPC分类号： B32B9/04 , B05D1/36 , G03F7/00 , C08G73/00
CPC分类号： G03F7/091
摘要： The invention relates to organic coating compositions useful for photolithographic processes including the manufacture of semiconductors and other electronic devices. Compositions of the invention comprise component that comprise a nitrile-containing component, such as a resin component that contains nitrile moieties. Compositions of the invention are particularly useful as an underlayer material in two, three, four or more layer pattern forming processes.
摘要翻译：本发明涉及可用于光刻工艺的有机涂料组合物，包括制造半导体和其它电子器件。本发明的组合物包含包含含腈组分的组分，例如含有腈部分的树脂组分。本发明的组合物特别可用作两层，三层，四层或更多层图案形成工艺中的底层材料。

8. 发明授权

US06844270B2 Polymers and photoresist compositions for short wavelength imaging 失效
标题翻译：用于短波长成像的聚合物和光致抗蚀剂组合物
公开(公告)号：US06844270B2
公开(公告)日：2005-01-18
申请号：US09994130
申请日：2001-11-26
申请人： Anthony Zampini , Sungseo Cho
发明人： Anthony Zampini , Sungseo Cho
IPC分类号： G03F7/039 , H01L21/027 , H01L21/31 , H01L21/469
CPC分类号： G03F7/0392 , H01L21/0271 , Y10S438/948
摘要： The present invention includes polyacetal polymers and photoresist compositions that include the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-300 nm, particularly 157 nm.
摘要翻译：本发明包括聚缩醛聚合物和光致抗蚀剂组合物，其包括作为树脂粘合剂组分的聚合物。本发明的光刻胶包括可以在短波长例如亚300nm，特别是157nm下有效成像的化学放大的正性抗蚀剂。

9. 发明授权

US5932389A Controlled alternating and block copolymer resins 失效
标题翻译：控制交替和嵌段共聚物树脂
公开(公告)号：US5932389A
公开(公告)日：1999-08-03
申请号：US027450
申请日：1998-02-20
申请人： Anthony Zampini
发明人： Anthony Zampini
IPC分类号： G03C1/52
CPC分类号： C08G8/12 , C08G8/10 , G03F7/0236
摘要： This invention relates to alternating and block copolymer resins of uniform and controlled chain length and methods for preparing the same. The alternating copolymer resins are formed from the reaction of a bisoxymethylphenol, a reactive phenolic compound and a monooxymethylphenol. The alternating copolymer may then be further reacted with a second reactive compound in the presence of an aldehyde to form the substantially blocked copolymer. The resins of the invention are characterized by a low molecular weight distribution. The resins are useful for the formulation of high resolution photoresist materials.
摘要翻译：本发明涉及均匀和受控链长度的交替和嵌段共聚物树脂及其制备方法。交替共聚物树脂是由二氧化甲基苯酚，反应性酚类化合物和单氧基甲基苯酚的反应形成的。然后可以在醛的存在下将交替共聚物与第二反应性化合物进一步反应以形成基本上封闭的共聚物。本发明的树脂的特征在于低分子量分布。这些树脂可用于制备高分辨率光致抗蚀剂材料。

10. 发明授权

US5178986A Positive photoresist composition with naphthoquinonediazidesulfonate of oligomeric phenol 失效
标题翻译：具有低聚苯酚萘醌二叠氮化物的正性光致抗蚀剂组合物
公开(公告)号：US5178986A
公开(公告)日：1993-01-12
申请号：US902458
申请日：1992-06-19
申请人： Anthony Zampini , David C. Madoux , Peter Trefonas, III , Charles R. Szmanda
发明人： Anthony Zampini , David C. Madoux , Peter Trefonas, III , Charles R. Szmanda
IPC分类号： G03F7/022
CPC分类号： G03F7/022
摘要： A radiation sensitive oligomeric compound is described as the photoactive component with a base soluble phenolic matrix resin to provide improved photo-resist composition having high light-sensitivity, high resolution, excellent developer resistance and excellent resistance to thermal flow.
摘要翻译：辐射敏感低聚化合物被描述为具有碱溶性酚基树脂的光活性组分，以提供具有高光敏性，高分辨率，优异的显影剂抗性和优异的耐热流动性的改进的光致抗蚀剂组合物。

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