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1. 发明申请

US20080220597A1 Photoresists and methods for use thereof 审中-公开
标题翻译：光刻胶及其使用方法
公开(公告)号：US20080220597A1
公开(公告)日：2008-09-11
申请号：US11981623
申请日：2007-10-31
申请人： James F. Cameron , Peter Trefonas , George G. Barclay , Jin Wuk Sung
发明人： James F. Cameron , Peter Trefonas , George G. Barclay , Jin Wuk Sung
IPC分类号： H01L21/425
CPC分类号： G03F7/40 , G03F7/0392 , G03F7/0397 , G03F7/16 , G03F7/405
摘要： New photoresists are provided that can be applied and imaged with reduced undesired outgassing and/or as thick coating layers. Preferred resists of the invention are chemically-amplified positive-acting resists that contain photoactive and resin components.
摘要翻译：提供了新的光致抗蚀剂，其可以用减少的不需要的脱气和/或作为厚的涂层施加和成像。本发明优选的抗蚀剂是含有光活性和树脂成分的化学放大的正性作用抗蚀剂。

2. 发明授权

US07297616B2 Methods, photoresists and substrates for ion-implant lithography 有权
标题翻译：方法，光刻胶和离子植入式光刻用基材
公开(公告)号：US07297616B2
公开(公告)日：2007-11-20
申请号：US10822225
申请日：2004-04-09
申请人： James F. Cameron , Peter Trefonas, III , George G. Barclay , Jin Wuk Sung
发明人： James F. Cameron , Peter Trefonas, III , George G. Barclay , Jin Wuk Sung
IPC分类号： H01L21/425
CPC分类号： G03F7/40 , G03F7/0392 , G03F7/0397 , G03F7/16 , G03F7/405
摘要： New photoresists are provided that can be applied and imaged with reduced undesired outgassing and/or as thick coating layers. Preferred resists of the invention are chemically-amplified positive-acting resists that contain photoactive and resin components.
摘要翻译：提供了新的光致抗蚀剂，其可以用减少的不需要的脱气和/或作为厚的涂层施加和成像。本发明优选的抗蚀剂是含有光活性和树脂成分的化学放大的正性作用抗蚀剂。

3. 发明授权

US06406828B1 Polymer and photoresist compositions 有权
标题翻译：聚合物和光刻胶组合物
公开(公告)号：US06406828B1
公开(公告)日：2002-06-18
申请号：US09511726
申请日：2000-02-24
申请人： Charles R. Szmanda , George G. Barclay , Peter Trefonas, III , Wang Yueh
发明人： Charles R. Szmanda , George G. Barclay , Peter Trefonas, III , Wang Yueh
IPC分类号： G03F7004
CPC分类号： G03F7/0395 , C08F32/08 , G03F7/0045 , G03F7/039 , G03F7/0397 , Y10S430/108
摘要： Disclosed are polymers including as polymerized units one or more spirocyclic olefin monomer of the formulae I or Ia wherein A=CH2; G=C(Z′), O, and NR2; R2=H, (C1-C8)alkyl or substituted (C1-C8)alkyl; E and W are independently selected from C(Z′), O and a chemical bond; Z′=O; n=1; m=1; m′=0; 1=0 to 5; and p=0 to 5; provided that when both E and W are C(Z′), G is NR2; wherein T and L are taken together to form a double bond. These polymers are useful in photoresist compositions. Methods of making and using these polymers are also disclosed.
摘要翻译：公开了包括作为聚合单元的一种或多种式I或Iawherein A = CH 2的螺环烯烃单体的聚合物; G = C（Z'），O和NR2; R2 = H，（C1-C8）烷基或取代的（C1-C8）烷基; E和W独立地选自C（Z'），O和化学键; Z'= O; n = 1; m = 1; m'= 0; 1 = 0〜5; 和p = 0至5; 条件是当E和W都为C（Z'）时，G为NR2; 其中T和L一起形成双键。这些聚合物可用于光致抗蚀剂组合物。还公开了制备和使用这些聚合物的方法。

4. 发明授权

US06379861B1 Polymers and photoresist compositions comprising same 有权
标题翻译：包含其的聚合物和光致抗蚀剂组合物
公开(公告)号：US06379861B1
公开(公告)日：2002-04-30
申请号：US09510069
申请日：2000-02-22
申请人： Peter Trefonas, III , Gary N. Taylor , George G. Barclay
发明人： Peter Trefonas, III , Gary N. Taylor , George G. Barclay
IPC分类号： G03C172
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/111 , Y10S430/115
摘要： The present invention provides novel polymers and photoresist compositions that comprise the polymers as a resin binder component. The photoresist compositions of the invention can provide highly resolved relief images upon exposure to short wavelengths, including 193 nm and 248 nm. The resists of the invention are also useful or imaging at other wavelengths such as 365 nm. Polymers of the invention include those that comprise a photogenerated acid-labile unit that is ester group that comprises an alkyl moiety having about 5 or more carbon atoms and at least two secondary, tertiary or quaternary carbon atoms. The alkyl moiety of the ester group can be a noncyclic or single ring alicyclic group. The carboxyl (C═O(O)) oxygen of the ester group is often preferably directly bonded to a quaternary carbon atom.
摘要翻译：本发明提供了包含作为树脂粘合剂组分的聚合物的新型聚合物和光致抗蚀剂组合物。本发明的光致抗蚀剂组合物可以在暴露于包括193nm和248nm的短波长的情况下提供高度分辨的浮雕图像。本发明的抗蚀剂也可用于其它波长例如365nm。本发明的聚合物包括包含光生酸不稳定单元的那些，其是包含具有约5个或更多个碳原子和至少两个仲，叔或季碳原子的烷基部分的酯基。酯基的烷基部分可以是非环或单环脂环族基团。酯基的羧基（C = O（O））氧通常优选直接键合到季碳原子。

5. 发明授权

US6136501A Polymers and photoresist compositions comprising same 有权
标题翻译：包含其的聚合物和光致抗蚀剂组合物
公开(公告)号：US6136501A
公开(公告)日：2000-10-24
申请号：US143462
申请日：1998-08-28
申请人： Peter Trefonas, III , Gary N. Taylor , George G. Barclay
发明人： Peter Trefonas, III , Gary N. Taylor , George G. Barclay
IPC分类号： C07C67/14 , C07C69/54 , C08L33/08 , C08L33/10 , G03F7/004 , G03F7/028 , G03F7/039 , H01L21/027
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： The present invention provides novel polymers and photoresist compositions that comprise the polymers as a resin binder component. The photoresist compositions of the invention can provide highly resolved relief images upon exposure to short wavelengths, including 193 nm and 248 nm. The resists of the invention are also useful or imaging at other wavelengths such as 365 nm. Polymers of the invention include those that comprise a photogenerated acid-labile unit that is ester group that comprises an alkyl moiety having about 5 or more carbon atoms and at least two secondary, tertiary or quaternary carbon atoms. The alkyl moiety of the ester group can be a noncyclic or single ring alicyclic group. The carboxyl (C.dbd.O(O)) oxygen of the ester group is often preferably directly bonded to a quaternary carbon atom.
摘要翻译：本发明提供了包含作为树脂粘合剂组分的聚合物的新型聚合物和光致抗蚀剂组合物。本发明的光致抗蚀剂组合物可以在暴露于包括193nm和248nm的短波长的情况下提供高度分辨的浮雕图像。本发明的抗蚀剂也可用于其它波长例如365nm。本发明的聚合物包括包含光生酸不稳定单元的那些，其是包含具有约5个或更多个碳原子和至少两个仲，叔或季碳原子的烷基部分的酯基。酯基的烷基部分可以是非环或单环脂环族基团。酯基的羧基（C = O（+ E，未取代O + EE））氧通常优选直接键合到季碳原子上。

6. 发明授权

US07118847B2 Polymer and photoresist compositions 有权
标题翻译：聚合物和光致抗蚀剂组合物
公开(公告)号：US07118847B2
公开(公告)日：2006-10-10
申请号：US10970837
申请日：2004-10-22
申请人： Charles R. Szmanda , George G. Barclay , Peter Trefonas, III , Wang Yueh
发明人： Charles R. Szmanda , George G. Barclay , Peter Trefonas, III , Wang Yueh
IPC分类号： G03C1/76 , G03C1/492 , G03C1/494 , G03C5/00
CPC分类号： G03F7/0395 , C08F32/08 , G03F7/0045 , G03F7/039 , G03F7/0397 , Y10S430/108
摘要： Disclosed are spirocyclic olefin polymers, methods of preparing spirocyclic olefin polymers, photresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.
摘要翻译：公开了螺环烯烃聚合物，制备螺环烯烃聚合物的方法，包括螺环烯烃树脂粘合剂的光热组合物以及使用这种光致抗蚀剂组合物形成浮雕图像的方法。

7. 发明授权

US06599677B2 Polymer and photoresist compositions 有权
公开(公告)号：US06599677B2
公开(公告)日：2003-07-29
申请号：US10126904
申请日：2002-04-20
申请人： Charles R. Szmanda , George G. Barclay , Peter Trefonas, III , Wang Yueh
发明人： Charles R. Szmanda , George G. Barclay , Peter Trefonas, III , Wang Yueh
IPC分类号： G03F7004
CPC分类号： G03F7/0395 , C08F32/08 , G03F7/0045 , G03F7/039 , G03F7/0397 , Y10S430/108
摘要： Disclosed are spirocyclic olefin ploymers, methods of preparing spirocyclic olefin polymers, photoresist compositions including spirocyclic olefin resin binders and methods of forming relief images using such photoresist compositions.

8. 发明授权

US07582412B2 Multilayer photoresist systems 有权
标题翻译：多层光刻胶系统
公开(公告)号：US07582412B2
公开(公告)日：2009-09-01
申请号：US10717975
申请日：2003-11-20
申请人： James F. Cameron , Dana A. Gronbeck , George G. Barclay
发明人： James F. Cameron , Dana A. Gronbeck , George G. Barclay
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： G03F7/091 , G03F7/0755 , G03F7/0757 , G03F7/0758 , G03F7/094 , Y10S430/106 , Y10S430/128
摘要： Multilayer photoresist systems are provided. In particular aspects, the invention relates to underlayer composition for an overcoated photoresist, particularly an overcoated silicon-containing photoresist. Preferred underlayer compositions comprise one or more resins or other components that impart etch-resistant and antireflective properties, such as one or more resins that contain phenyl or other etch-resistant groups and anthracene or other moieties that are effective anti-reflective chromophores for photoresist exposure radiation.
摘要翻译：提供多层光刻胶系统。在具体方面，本发明涉及用于外包层光致抗蚀剂的底层组合物，特别是外包覆的含硅光致抗蚀剂。优选的底层组合物包含赋予抗蚀刻和抗反射性能的一种或多种树脂或其它组分，例如含有苯基或其它抗蚀刻基团的一种或多种树脂和作为光致抗蚀剂曝光的有效抗反射发色团的蒽或其它部分辐射。

9. 发明授权

US07306892B2 Multilayer photoresist system 失效
标题翻译：多层光刻胶系统
公开(公告)号：US07306892B2
公开(公告)日：2007-12-11
申请号：US10718487
申请日：2003-11-20
申请人： George G. Barclay , James F. Cameron
发明人： George G. Barclay , James F. Cameron
IPC分类号： G03F7/11 , G03F7/032 , G03F7/30
CPC分类号： G03F7/0758 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0757 , G03F7/091 , G03F7/094
摘要： Multilayer photoresist systems are provided. In particular aspects, the invention relates to underlayer composition for an overcoated photoresist, particularly an overcoated silicon-containing photoresist that is imaged at short exposure wavelengths.
摘要翻译：提供多层光刻胶系统。在具体方面，本发明涉及用于外涂光致抗蚀剂的底层组合物，特别是在短曝光波长下成像的外涂覆的含硅光致抗蚀剂。

10. 发明授权

US09507260B2 Compositions and processes for photolithography 有权
标题翻译：光刻的组成和工艺
公开(公告)号：US09507260B2
公开(公告)日：2016-11-29
申请号：US12592160
申请日：2009-11-19
申请人： Deyan Wang , Chunyi Wu , Cheng-Bai Xu , George G. Barclay
发明人： Deyan Wang , Chunyi Wu , Cheng-Bai Xu , George G. Barclay
IPC分类号： G03F7/039 , G03F7/20 , G03F7/004 , G03F7/038 , G03F7/11 , G03F7/075
CPC分类号： G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/0757 , G03F7/11 , G03F7/2041
摘要： New photoresist compositions are provided that are useful for immersion lithography. In one preferred aspect, photoresist composition are provided that comprise: (i) one or more resins that comprise photoacid-labile groups, (ii) a photoactive component, and (iii) one or more materials that comprise photoacid labile groups and that are distinct from the one or more resins; wherein the deprotection activation energy of photoacid-labile groups of the one or more materials is about the same as or lower than the deprotection activation energy of photoacid-labile groups of the one or more resins. In another preferred aspect, photoresist compositions are provided that comprise (i) one or more resins, (ii) a photoactive component, and (iii) one or more materials that comprise a sufficient amount of acidic groups to provide a dark field dissolution rate of at least one angstrom per second.
摘要翻译：提供了可用于浸没式光刻的新的光致抗蚀剂组合物。在一个优选的方面，提供光致抗蚀剂组合物，其包含：（i）一种或多种包含光酸不稳定基团的树脂，（ii）光活性组分，和（iii）一种或多种包含光致酸不稳定基团并且是不同的从一种或多种树脂; 其中所述一种或多种材料的光致酸不稳定基团的去保护活化能大约等于或低于所述一种或多种树脂的光致酸不稳定基团的去保护活化能。在另一个优选的方面，提供光致抗蚀剂组合物，其包含（i）一种或多种树脂，（ii）光活性组分，和（iii）一种或多种包含足够量的酸性基团以提供暗场溶解速率的材料每秒至少一埃。

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