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    • 2. 发明授权
    • Electrophoretic migration imaging dispersion
    • 电泳迁移成像分散体
    • US4255506A
    • 1981-03-10
    • US32313
    • 1979-04-23
    • James A. Van AllanLouis J. RossiMelvin S. BloomMichael T. ReganHal E. WrightJoseph Y. Kaukeinen
    • James A. Van AllanLouis J. RossiMelvin S. BloomMichael T. ReganHal E. WrightJoseph Y. Kaukeinen
    • G03G17/04G03G13/24
    • G03G17/04
    • In general, materials having the structure ##STR1## wherein n equals 1 or 2;A represents phenylene, naphthylene, anthracenyl, anthracenediyl, and dibenzothien-diyl;R.sub.1 and R.sub.2 which may be the same or different when taken alone represent hydrogen, cyano, alkylcarbonyl and arylcarbamoyl, arylcarbonyl, cyanoaryl;R.sub.1 and R.sub.2, when taken together, represent sufficient atoms to form substituted and unsubstituted radicals selected from the group consisting of furanylidene, fluorenylidene, pyrimidinylidene, thiazolidinylidene, pyrrolinyl, and indenyl, isoxazolinylidene, pyrazolinylidene and indanylidene, wherein said substituents are selected from the group consisting of hydrogen, cyano, aryl, oxo, thioxo, nitro, alkyl, nitroaryl, carbamoyl and cyanoalkyl; andalkyl represents an alkyl group having from one to six carbon atoms; aryl represents an aromatic nucleus selected from the group consisting of benzene, naphthalene or anthracene, are useful in electrophoretic migration imaging processes.
    • 通常,具有结构的材料,其中n等于1或2; A代表亚苯基,亚萘基,蒽基,蒽二基和二苯并噻吩二基; R 1和R 2 + L可以相同或不同,代表氢,氰基,烷基羰基和芳基氨基甲酰基,芳基羰基,氰基芳基; 当R1和R2一起表示足够的原子以形成选自亚苄基,亚芴基,亚嘧啶基,噻唑烷亚基,吡咯啉基和茚基,异唑啉基,吡嗪并亚基和茚满基的取代和未取代的基团,其中所述取代基选自 由氢,氰基,芳基,氧代,硫代,硝基,烷基,硝基芳基,氨基甲酰基和氰基烷基组成。 和烷基表示具有1至6个碳原子的烷基; 芳基表示选自苯,萘或蒽的芳族核,可用于电泳迁移成像过程。
    • 3. 发明授权
    • Electrophoretic migration imaging process
    • 电泳迁移成像过程
    • US4165984A
    • 1979-08-28
    • US889715
    • 1978-03-24
    • James A. Van AllanLouis J. RossiMelvin S. BloomMichael T. ReganHal E. WrightJoseph Y. Kaukeinen
    • James A. Van AllanLouis J. RossiMelvin S. BloomMichael T. ReganHal E. WrightJoseph Y. Kaukeinen
    • C09B1/00C09B23/01C09B23/04G03G17/04G03G13/22
    • C09B23/04C09B1/00C09B23/0091G03G17/04
    • In general, materials having the structure ##STR1## WHEREIN N EQUALS 1 OR 2;A represents phenylene, naphthylene, anthracenyl, anthracenediyl, and dibenzothien-diyl;R.sub.1 and R.sub.2, which may be the same or different when taken alone represent hydrogen, cyano, alkylcarbonyl and arylcarbamoyl, arylcarbonyl, cyanoaryl;R.sub.1 and R.sub.2, when taken together, represent sufficient atoms to form substituted and unsubstituted radicals selected from the group consisting of furanylidene, fluorenylidene, pyrimidinylidene, thiazolidinylidene, pyrrolinyl, and indenyl, isoxazolinylidene, pyrazolinylidene and indanylidene, wherein said substituents are selected from the group consisting of hydrogen, cyano, aryl, oxo, thioxo, nitro, alkyl, nitroaryl, carbamoyl and cyanoalkyl; andAlkyl represents an alkyl group having from one to six carbon atoms; aryl represents an aromatic nucleus selected from the group consisting of benzene, naphthalene or anthracene, are useful in electrophoretic migration imaging processes.
    • 通常,具有结构等于1或2的结构的材料; A代表亚苯基,亚萘基,蒽基,蒽二基和二苯并噻吩二基; 当取代时,R 1和R 2可以相同或不同,表示氢,氰基,烷基羰基和芳基氨基甲酰基,芳基羰基,氰基芳基; 当R1和R2一起表示足够的原子以形成选自亚苄基,亚芴基,亚嘧啶基,噻唑烷亚基,吡咯啉基和茚基,异唑啉基,吡嗪并亚基和茚满基的取代和未取代的基团,其中所述取代基选自 由氢,氰基,芳基,氧代,硫代,硝基,烷基,硝基芳基,氨基甲酰基和氰基烷基组成。 和阿尔基代表一个从一个到六个碳原子的阿尔基集团; ARYL代表从苯并噻吩,萘甲酸或蒽醌组成的组中选择的芳族核子有用于电泳移植成像过程。
    • 6. 发明授权
    • Electrophotosensitive materials for migration imaging processes
    • 用于迁移成像过程的电光敏材料
    • US4293626A
    • 1981-10-06
    • US202406
    • 1980-10-31
    • Frank G. WebsterMichael T. ReganLouis J. Rossi
    • Frank G. WebsterMichael T. ReganLouis J. Rossi
    • G03G17/04G03G5/06
    • G03G17/04
    • Electrophotosensitive materials having the structure ##STR1## wherein: M and N may be zero, one or two;L.sup.1, L.sup.2, L.sup.3, L.sup.4, L.sup.5, L.sup.6, and L.sup.7 may be cyano, hydrogen, substituted or unsubstituted alkyl, alkoxy, aralkyl, aryl or heterocycyl and in addition any two of L.sup.1, L.sup.2 and L.sup.3 and any two of L.sup.4, L.sup.5, L.sup.6 and L.sup.7 may together represent the elements needed to complete a carbocyclic or heterocyclic ring having from 5-12 carbon atoms;A.sup.1 may be the same as A.sup.2 and in addition may represent a substituted or unsubstituted aryl group;A.sup.2 represents a basic substituted or unsubstituted heterocyclic nucleus; andB.sup.1 and B.sup.2 represent cyano, cyanoaryl, carboxy, alkoxycarbonyl, aryloxycarbonyl, alkylsulfonyl, acyl, arylcarbonyl, heteroyl groups such as benzofuroyl, nitro, nitro substituted aryl, sulfonyl, fluorosulfonyl, trifluoromethylsulfonyl, carbamoyl, arylcarbamoyl, and alkylcarbamoyl orB.sup.2 may be combined with .dbd.CL.sup.4 -CL.sup.5 .dbd. or .dbd.CL.sup.6 -CL.sup.7 .dbd. to provide sufficient atoms to form a substituted pyrindine nucleus.
    • 具有结构 的电光敏材料其中:M和N可以是零,一个或两个; L1,L2,L3,L4,L5,L6和L7可以是氰基,氢,取代或未取代的烷基,烷氧基,芳烷基,芳基或杂环基,此外,L1,L2和L3中的任何两个以及L4,L5中的任何两个 L6和L7可以一起代表完成具有5-12个碳原子的碳环或杂环所需的元素; A1可以与A2相同,另外可以表示取代或未取代的芳基; A2表示碱性取代或未取代的杂环核; 并且B1和B2表示氰基,氰基芳基,羧基,烷氧基羰基,芳氧基羰基,烷基磺酰基,酰基,芳基羰基,杂基如苯并呋喃基,硝基,硝基取代的芳基,磺酰基,氟代磺酰基,三氟甲磺酰基,氨基甲酰基,芳基氨基甲酰基和烷基氨基甲酰基或B2。 用= CL4-CL5 =或= CL6-CL7 =提供足够的原子以形成取代的pyrindine核。
    • 7. 发明授权
    • Electrophotosensitive materials for migration imaging processes
    • 用于迁移成像过程的电光敏材料
    • US4272595A
    • 1981-06-09
    • US012172
    • 1979-02-14
    • Frank G. WebsterMichael T. ReganLouis J. Rossi
    • Frank G. WebsterMichael T. ReganLouis J. Rossi
    • G03G17/04G03G5/06
    • G03G17/04
    • Electrophotosensitive materials having the structure ##STR1## wherein: M and N may be zero, one or two;L.sup.1, L.sup.2, L.sup.3, L.sup.4, L.sup.5, L.sup.6, and L.sup.7 may be cyano, hydrogen, substituted or unsubstituted alkyl, alkoxy, aralkyl, aryl or heterocycyl and in addition any two of L.sup.1, L.sup.2 and L.sup.3 and any two of L.sup.4, L.sup.5, L.sup.6 and L.sup.7 may together represent the elements needed to complete a carbocyclic or heterocyclic ring having from 5-12 carbon atoms;A.sup.1 may be the same as A.sup.2 and in addition may represent a substituted or unsubstituted aryl group;A.sup.2 represents a basic substituted or unsubstituted heterocyclic nucleus; andB.sup.1 and B.sup.2 represent cyano, cyanoaryl, carboxy, alkoxycarbonyl, aryloxycarbonyl, alkylsulfonyl, acyl, arylcarbonyl, heteroyl groups such as benzofuroyl, nitro, nitro substituted aryl, sulfonyl, fluorosulfonyl, tirfluoromethylsulfonyl, carbamoyl, arylcarbamoyl, and alkylcarbamoyl orB.sup.2 may be combined with .dbd.CL.sup.4 --CL.sup.5 .dbd. or .dbd.CL.sup.6 --CL.sup.7 .dbd. to provide sufficient atoms to form a substituted pyrindine nucleus.
    • 具有结构 的电光敏材料其中:M和N可以是零,一个或两个; L1,L2,L3,L4,L5,L6和L7可以是氰基,氢,取代或未取代的烷基,烷氧基,芳烷基,芳基或杂环基,此外,L1,L2和L3中的任何两个以及L4,L5中的任何两个 L6和L7可以一起代表完成具有5-12个碳原子的碳环或杂环所需的元素; A1可以与A2相同,另外可以表示取代或未取代的芳基; A2表示碱性取代或未取代的杂环核; 并且B1和B2表示氰基,氰基芳基,羧基,烷氧基羰基,芳氧基羰基,烷基磺酰基,酰基,芳基羰基,杂基如苯并呋喃基,硝基,硝基取代的芳基,磺酰基,氟代磺酰基,二氟甲基磺酰基,氨基甲酰基,芳基氨基甲酰基和烷基氨基甲酰基或B2。 用= CL4-CL5 =或= CL6-CL7 =提供足够的原子以形成取代的pyrindine核。