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    • 5. 发明申请
    • RIDE CONTROL SYSTEM
    • 驾驶控制系统
    • US20130227937A1
    • 2013-09-05
    • US13410993
    • 2012-03-02
    • Jeffery W. DobchukJoshua D. GraeveBrian K. KelloggDerek S. HallEric R. Anderson
    • Jeffery W. DobchukJoshua D. GraeveBrian K. KelloggDerek S. HallEric R. Anderson
    • F15B13/02F15B1/027
    • E02F9/2207E02F9/2217F15B1/021F15B1/027
    • A ride control system and method where the system includes first hydraulics for equalizing pressure between ride control accumulators and boom cylinder head side, and second hydraulics for providing low pressure drop connection between ride control accumulators and boom cylinder head side. When ride control is engaged, the first hydraulics equalizes pressure between ride control accumulators and boom cylinder head side to within a pressure threshold, then the second hydraulics provides the low pressure drop connection between ride control accumulators and boom cylinder head side. Ride control system can include third hydraulics for providing fluid connection between boom cylinder rod side and tank; where after first hydraulics equalizes pressure to within pressure threshold, then third hydraulics provides connection between boom cylinder rod side and tank. The ride control system can also monitor the condition of the ride control accumulators.
    • 一种行驶控制系统和方法,其中系统包括用于平衡行驶控制蓄能器和动臂缸体侧之间的压力的第一液压装置,以及用于在行驶控制蓄能器和动臂缸体侧之间提供低压降连接的第二液压装置。 当行驶控制被接合时,第一液压将行驶控制蓄能器和动臂缸体侧之间的压力平衡到压力阈值内,然后第二液压装置提供行驶控制蓄能器与动臂缸体侧之间的低压降连接。 骑行控制系统可以包括第三液压装置,用于提供动臂缸杆侧和油箱之间的流体连接; 在第一液压系统将压力平衡到压力阈值之前,第三液压装置提供动臂缸杆侧和油箱之间的连接。 行驶控制系统还可以监控行驶控制蓄能器的状况。
    • 6. 发明授权
    • Method for fabricating semiconductor micro epi-optical components
    • 制造半导体微表面光学部件的方法
    • US6074888A
    • 2000-06-13
    • US135696
    • 1998-08-18
    • Dean TranEric R. AndersonRonald L. StrijekEdward A. RezekLuis M. Rochin
    • Dean TranEric R. AndersonRonald L. StrijekEdward A. RezekLuis M. Rochin
    • B81B1/00B81C1/00G02B3/00G02B5/00G02B6/12G02B6/122G02B6/42G03F7/40H01L31/18H01L33/00H01L21/00
    • H01L31/18G02B6/122G02B6/42H01L33/005G02B2006/12102G02B2006/12114G02B2006/12176G02B6/4246
    • A method for fabricating a monolithic micro-optical component. The construction of the micro-optical components is accomplished by using standard semiconductor fabrication techniques. The method comprises the steps of depositing an etch stop layer (44) onto a semiconductor substrate (42); depositing an optical component layer (46) onto the etch stop layer (44); coating the entire surface of the optical component layer with a photoresist material; applying a photoresist mask (50) to the photoresist material on the optical component layer (46); selectively etching away the optical component layer (46) to form at least one optical column (52); forming a pedestal (54) for each of the optical columns (52) by selectively etching away the etch stop layer (44); and finally polishing each of the optical columns (52), thereby forming monolithic optical components (56). The method may optionally include the step of removing the photoresist mask from each of the optical columns prior to polishing the optical columns, as well as the step of depositing an antireflectivity coating onto each of the optical components.
    • 一种用于制造单片微光学部件的方法。 微型光学部件的构造通过使用标准半导体制造技术来实现。 该方法包括以下步骤:在半导体衬底(42)上沉积蚀刻停止层(44); 在所述蚀刻停止层(44)上沉积光学部件层(46); 用光致抗蚀剂材料涂覆光学部件层的整个表面; 将光致抗蚀剂掩模(50)施加到光学部件层(46)上的光致抗蚀剂材料上; 选择性地蚀刻掉光学部件层(46)以形成至少一个光学柱(52); 通过选择性地蚀刻掉蚀刻停止层(44),为每个光学柱(52)形成基座(54); 并最后对每个光学柱(52)进行抛光,由此形成单片光学部件(56)。 该方法可以可选地包括在抛光光学柱之前从每个光学柱去除光致抗蚀剂掩模的步骤,以及在每个光学部件上沉积抗反射涂层的步骤。
    • 7. 发明授权
    • Ride control system
    • 骑行控制系统
    • US09091039B2
    • 2015-07-28
    • US13410993
    • 2012-03-02
    • Jeffery W. DobchukJoshua D. GraeveBrian K. KelloggDerek S. HallEric R. Anderson
    • Jeffery W. DobchukJoshua D. GraeveBrian K. KelloggDerek S. HallEric R. Anderson
    • F15B1/027E02F9/22F15B1/02
    • E02F9/2207E02F9/2217F15B1/021F15B1/027
    • A ride control system and method where the system includes first hydraulics for equalizing pressure between ride control accumulators and boom cylinder head side, and second hydraulics for providing low pressure drop connection between ride control accumulators and boom cylinder head side. When ride control is engaged, the first hydraulics equalizes pressure between ride control accumulators and boom cylinder head side to within a pressure threshold, then the second hydraulics provides the low pressure drop connection between ride control accumulators and boom cylinder head side. Ride control system can include third hydraulics for providing fluid connection between boom cylinder rod side and tank; where after first hydraulics equalizes pressure to within pressure threshold, then third hydraulics provides connection between boom cylinder rod side and tank. The ride control system can also monitor the condition of the ride control accumulators.
    • 一种行驶控制系统和方法,其中系统包括用于平衡行驶控制蓄能器和动臂缸体侧之间的压力的第一液压装置,以及用于在行驶控制蓄能器和动臂缸体侧之间提供低压降连接的第二液压装置。 当行驶控制被接合时,第一液压将行驶控制蓄能器和动臂缸体侧之间的压力平衡到压力阈值内,然后第二液压装置提供行驶控制蓄能器与动臂缸体侧之间的低压降连接。 骑行控制系统可以包括第三液压装置,用于提供动臂缸杆侧和油箱之间的流体连接; 在第一液压系统将压力平衡到压力阈值之前,第三液压装置提供动臂缸杆侧和油箱之间的连接。 行驶控制系统还可以监控行驶控制蓄能器的状况。
    • 10. 发明授权
    • Semiconductor micro epi-optical components
    • 半导体微表面光学元件
    • US06252725B1
    • 2001-06-26
    • US09498634
    • 2000-02-07
    • Dean TranEric R. AndersonRonald L. StrijekEdward A. RezekLuis M. Rochin
    • Dean TranEric R. AndersonRonald L. StrijekEdward A. RezekLuis M. Rochin
    • G02B702
    • H01L31/18G02B6/122G02B6/42G02B6/4246G02B2006/12102G02B2006/12114G02B2006/12176H01L33/005
    • A method for fabricating a monolithic micro-optical component. The construction of the micro-optical components is accomplished by using standard semiconductor fabrication techniques. The method comprises the steps of depositing an etch stop layer (44) onto a semiconductor substrate (42); depositing an optical component layer (46) onto the etch stop layer (44); coating the entire surface of the optical component layer with a photoresist material; applying a photoresist mask (50) to the photoresist material on the optical component layer (46); selectively etching away the optical component layer (46) to form at least one optical column (52); forming a pedestal (54) for each of the optical columns (52) by selectively etching away the etch stop layer (44); and finally polishing each of the optical columns (52), thereby forming monolithic optical components (56). The method may optionally include the step of removing the photoresist mask from each of the optical columns prior to polishing the optical columns, as well as the step of depositing an antireflectivity coating onto each of the optical components.
    • 一种用于制造单片微光学部件的方法。 微型光学部件的构造通过使用标准半导体制造技术来实现。 该方法包括以下步骤:在半导体衬底(42)上沉积蚀刻停止层(44); 在所述蚀刻停止层(44)上沉积光学部件层(46); 用光致抗蚀剂材料涂覆光学部件层的整个表面; 将光致抗蚀剂掩模(50)施加到光学部件层(46)上的光致抗蚀剂材料上; 选择性地蚀刻掉光学部件层(46)以形成至少一个光学柱(52); 通过选择性地蚀刻掉蚀刻停止层(44),为每个光学柱(52)形成基座(54); 并最后对每个光学柱(52)进行抛光,由此形成单片光学部件(56)。 该方法可以可选地包括在抛光光学柱之前从每个光学柱去除光致抗蚀剂掩模的步骤,以及在每个光学部件上沉积抗反射涂层的步骤。