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1. 发明申请

US20110269378A1 CHEMICAL MECHANICAL POLISHING SYSTEM 有权
标题翻译：化学机械抛光系统
公开(公告)号：US20110269378A1
公开(公告)日：2011-11-03
申请号：US13095404
申请日：2011-04-27
申请人： Jae Phil Boo , Dong Soo Kim , Keon Sik Seo , Chan Woon Jeon , Jun Ho Ban , Ja Cheul Goo
发明人： Jae Phil Boo , Dong Soo Kim , Keon Sik Seo , Chan Woon Jeon , Jun Ho Ban , Ja Cheul Goo
IPC分类号： B24B37/04 , B24B1/00
CPC分类号： B24B37/345 , B24B37/30
摘要： The invention relates to a chemical mechanical polishing system, comprising: at least one polishing platens rotatably installed with a platen pad mounted on its upper surface; a guide rail disposed along a predetermined path; a substrate carrier unit including a rotary union to downwardly press a substrate during a polishing process, the substrate carrier unit moving along the guide rail with loading the substrate; and a docking unit installed to be docked to the substrate carrier unit so as to supply air pressure to the rotary union which downwardly presses the substrate held by the substrate carrier unit, when the substrate carrier unit is positioned over the polishing platen, whereby even though the substrate carrier unit is moved to consecutively polish the substrate on the plural polishing platens, it substantially removes a phenomenon of the twisting of air pressure supply tubes due to the movement of the substrate carrier unit.
摘要翻译：本发明涉及一种化学机械抛光系统，包括：至少一个抛光盘，其可旋转地安装有安装在其上表面上的压板; 沿预定路径设置的导轨; 衬底载体单元，其包括旋转接头，用于在抛光过程中向基板施加压力，所述衬底载体单元沿着所述导轨移动并加载所述衬底; 以及对接单元，其安装成对接到基板载体单元，以便当基板载体单元位于抛光平台上时，向压缩由基板承载单元保持的基板向下挤压的旋转接头提供空气压力，由此即使衬底载体单元移动以连续地抛光多个抛光平板上的衬底，基本上消除了由于衬底载体单元的运动引起的空气压力供应管的扭转现象。

2. 发明授权

US08882563B2 Chemical mechanical polishing system 有权
标题翻译：化学机械抛光系统
公开(公告)号：US08882563B2
公开(公告)日：2014-11-11
申请号：US13095404
申请日：2011-04-27
申请人： Jae Phil Boo , Dong Soo Kim , Keon Sik Seo , Chan Woon Jeon , Jun Ho Ban , Ja Cheul Goo
发明人： Jae Phil Boo , Dong Soo Kim , Keon Sik Seo , Chan Woon Jeon , Jun Ho Ban , Ja Cheul Goo
IPC分类号： B24B49/00 , B24B5/00 , B24B37/30 , B24B37/34
CPC分类号： B24B37/345 , B24B37/30
摘要： The invention relates to a chemical mechanical polishing system, comprising: at least one polishing platens rotatably installed with a platen pad mounted on its upper surface; a guide rail disposed along a predetermined path; a substrate carrier unit including a rotary union to downwardly press a substrate during a polishing process, the substrate carrier unit moving along the guide rail with loading the substrate; and a docking unit installed to be docked to the substrate carrier unit so as to supply air pressure to the rotary union which downwardly presses the substrate held by the substrate carrier unit, when the substrate carrier unit is positioned over the polishing platen, whereby even though the substrate carrier unit is moved to consecutively polish the substrate on the plural polishing platens, it substantially removes a phenomenon of the twisting of air pressure supply tubes due to the movement of the substrate carrier unit.
摘要翻译：本发明涉及一种化学机械抛光系统，包括：至少一个抛光盘，其可旋转地安装有安装在其上表面上的压板; 沿预定路径设置的导轨; 衬底载体单元，其包括旋转接头，用于在抛光过程中向基板施加压力，所述衬底载体单元沿着所述导轨移动并加载所述衬底; 以及对接单元，其安装成对接到基板载体单元，以便当基板载体单元位于抛光平台上时，向压缩由基板承载单元保持的基板向下挤压的旋转接头提供空气压力，由此即使衬底载体单元移动以连续地抛光多个抛光平板上的衬底，基本上消除了由于衬底载体单元的运动引起的空气压力供应管的扭转现象。

3. 发明授权

US08662956B2 Conditioner of chemical mechanical polishing apparatus 有权
标题翻译：化学机械抛光装置的护发素
公开(公告)号：US08662956B2
公开(公告)日：2014-03-04
申请号：US13099401
申请日：2011-05-03
申请人： Keon Sik Seo , Jae Phil Boo , Dong Soo Kim , Ja Cheul Goo , Chan Woon Jeon , Jnn Ho Ban
发明人： Keon Sik Seo , Jae Phil Boo , Dong Soo Kim , Ja Cheul Goo , Chan Woon Jeon , Jnn Ho Ban
IPC分类号： B24B53/00 , B24B1/00
CPC分类号： B24B53/017 , B24B49/16
摘要： Provided are a conditioner of a chemical mechanical polishing apparatus for polishing a substrate over a platen pad that rotates and a method thereof. The conditioner includes a disk holder, a piston rod, a housing, and a load sensor. The disk holder secures a conditioning disk that finely cuts a surface of the platen pad. The piston rod delivers a normal force to the disk holder. The housing covers at least a portion of the piston rod. The load sensor is installed to receive the normal force that the piston rod delivers to the piston rod and measuring the normal force.
摘要翻译：提供一种用于在旋转的压板上抛光基板的化学机械抛光装置的调节器及其方法。调节器包括盘保持器，活塞杆，壳体和负载传感器。盘保持器固定调节盘，该调节盘精细地切割压板垫的表面。活塞杆向盘保持器施加法向力。壳体覆盖活塞杆的至少一部分。安装负载传感器以接收活塞杆传递到活塞杆并测量法向力的法向力。

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