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    • 9. 发明授权
    • Method of manufacturing a thin-film magnetic head
    • 制造薄膜磁头的方法
    • US5483735A
    • 1996-01-16
    • US216573
    • 1994-03-22
    • Lambertus PostmaJan HaismaJacobus J. M. RuigrokGerardus H. J. Somers
    • Lambertus PostmaJan HaismaJacobus J. M. RuigrokGerardus H. J. Somers
    • G11B5/31G11B5/39G11B5/127
    • G11B5/3916G11B5/3919G11B5/3925Y10T29/49048
    • Method of manufacturing a magnetoresistive magnetic head in which a first insulation layer (5) of a non-magnetic material is formed on a support face (3a), on which insulation layer a soft-magnetic layer having an upper face remote from the first insulation layer is formed by deposition of a soft-magnetic material. Subsequently a layer portion is removed for forming the flux-guiding elements (17a, 17b) and an aperture extending between said elements, and non-magnetic material for forming a second insulation layer (18) having an upper face remote from the soft-magnetic layer is deposited on the soft-magnetic layer and in the aperture formed therein, which second insulation layer has such a thickness that, viewed in a direction transverse to the support face, the smallest distance between the support face and the upper face of the second insulation layer is larger than the largest distance between the support face and the upper face of the soft-magnetic layer. Subsequently, a mechanochemical polishing treatment is performed as from the upper face of the second insulation layer for forming a main surface (19) at which magnetoresistive material is subsequently deposited for forming a magnetoresistive element (23).
    • 一种制造磁阻磁头的方法,其中在支撑面(3a)上形成非磁性材料的第一绝缘层(5),绝缘层上具有远离第一绝缘体的上表面的软磁层 层通过沉积软磁材料形成。 随后,去除层部分以形成磁通引导元件(17a,17b)和在所述元件之间延伸的孔,以及用于形成具有远离软磁体的上表面的第二绝缘层(18)的非磁性材料 层沉积在软磁层上和形成在其中的孔中,该第二绝缘层具有从横向于支撑面的方向观察的厚度,即在支撑面与第二绝缘层的上表面之间的最小距离 绝缘层大于软磁层的支撑面和上表面之间的最大距离。 随后,从第二绝缘层的上表面进行机械化学抛光处理,以形成随后沉积磁阻材料以形成磁阻元件(23)的主表面(19)。