专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07834975B2 Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly 有权
标题翻译：用于进行倾斜聚焦的方法和曝光装置以及由此制造的装置
公开(公告)号：US07834975B2
公开(公告)日：2010-11-16
申请号：US11441348
申请日：2006-05-26
申请人： Jacobus Burghoorn , Jan Hauschild , Arie Jeffrey Den Boef , Martinus Hendrikus Antonius Leenders , Uwe Mickan , Roeland Nicolaas Maria Vanneer
发明人： Jacobus Burghoorn , Jan Hauschild , Arie Jeffrey Den Boef , Martinus Hendrikus Antonius Leenders , Uwe Mickan , Roeland Nicolaas Maria Vanneer
IPC分类号： G03B27/42
CPC分类号： G03F7/70641 , G03F7/70283 , G03F9/7026 , G03F9/7069
摘要： A method for performing a tilted focus test includes the steps of providing a target object, providing a projection beam of radiation using a radiation source, providing a reflective device to introduce a projected projection beam of radiation onto the target portion, introducing a first projected projection beam of radiation onto the target object using the reflective device in a first orientation, using a tilting device for tilting the reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, introducing a second projected projection beam of radiation onto the target object, and determining a lateral shift of the first and second projected projection beams on the target object and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.
摘要翻译：执行倾斜聚焦测试的方法包括以下步骤：提供目标物体，使用辐射源提供辐射投影光束，提供反射装置以将投射的投影射束投射到目标部分上，引入第一投射投影使用倾斜装置将反射装置倾斜到第二取向以提供具有相对于所述第一投影光束的倾斜的第二投影光束，引入第二投射投影确定目标物体上的第一和第二投影投影光束的横向位移，并根据所述横向偏移确定目标物体相对于投影投影光束的散焦。

2. 发明授权

US07518706B2 Exposure apparatus, a tilting device method for performing a tilted focus test, and a device manufactured accordingly 失效
标题翻译：曝光装置，用于进行倾斜聚焦试验的倾斜装置方法以及相应地制造的装置
公开(公告)号：US07518706B2
公开(公告)日：2009-04-14
申请号：US11020557
申请日：2004-12-27
申请人： Jan Hauschild , Arie Jeffrey Den Boef , Martinus Hendrikus Antonius Leenders , Uwe Mickan , Roeland Nicolaas Maria Vanneer , Jacobus Burghoorn
发明人： Jan Hauschild , Arie Jeffrey Den Boef , Martinus Hendrikus Antonius Leenders , Uwe Mickan , Roeland Nicolaas Maria Vanneer , Jacobus Burghoorn
IPC分类号： G03B27/72 , G03B24/42 , G03B27/52 , G03B27/54
CPC分类号： G03F7/70191 , G03F7/70108 , G03F7/70125 , G03F7/70641
摘要： The present invention relates to an exposure apparatus that includes an illumination system for providing a projection beam of radiation, a support structure for supporting a device provided with a pattern, the device serving to impart the projection beam with a pattern in its cross-section; a table for holding a target object, a projection system for projecting the patterned beam onto the target object and a tilting device for providing the projection beam with a tilt. The tilting device is provided substantially in a pupil plane of the projection system.
摘要翻译：本发明涉及一种曝光装置，其包括用于提供投影射线束的照明系统，用于支撑设置有图案的装置的支撑结构，该装置用于使投影光束在其横截面上具有图案; 用于保持目标物体的桌子，用于将图案化的光束投影到目标物体上的投影系统和用于向投影光束提供倾斜的倾斜装置。倾斜装置基本上设置在投影系统的光瞳平面中。

3. 发明申请

US20060279718A1 Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly 有权
标题翻译：用于进行倾斜聚焦的方法和曝光装置以及由此制造的装置
公开(公告)号：US20060279718A1
公开(公告)日：2006-12-14
申请号：US11441348
申请日：2006-05-26
申请人： Arie Den Boef , Jacobus Burghoorn , Martinus Leenders , Uwe Mickan , Roeland Vanneer , Jan Hauschild
发明人： Arie Den Boef , Jacobus Burghoorn , Martinus Leenders , Uwe Mickan , Roeland Vanneer , Jan Hauschild
IPC分类号： G03B27/52
CPC分类号： G03F7/70641 , G03F7/70283 , G03F9/7026 , G03F9/7069
摘要： A method for performing a tilted focus test includes the steps of providing a target object, providing a projection beam of radiation using a radiation source, providing a reflective device to introduce a projected projection beam of radiation onto the target portion, introducing a first projected projection beam of radiation onto the target object using the reflective device in a first orientation, using a tilting device for tilting the reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, introducing a second projected projection beam of radiation onto the target object, and determining a lateral shift of the first and second projected projection beams on the target object and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.
摘要翻译：执行倾斜聚焦测试的方法包括以下步骤：提供目标物体，使用辐射源提供辐射投影光束，提供反射装置以将投射的投射射束投射到目标部分上，引入第一投射投影使用倾斜装置将反射装置倾斜到第二取向以提供具有相对于所述第一投影光束的倾斜的第二投影光束，引入第二投射投影确定目标物体上的第一和第二投影投影光束的横向位移，并根据所述横向偏移确定目标物体相对于投影投影光束的散焦。

4. 发明授权

US07879682B2 Marker structure and method for controlling alignment of layers of a multi-layered substrate 有权
标题翻译：用于控制多层基板的层的对准的标记结构和方法
公开(公告)号：US07879682B2
公开(公告)日：2011-02-01
申请号：US12611428
申请日：2009-11-03
申请人： Richard Johannes Franciscus Van Haren , Arie Jeffrey Den Boef , Jacobus Burghoorn , Maurits Van Der Schaar , Bart Rijpers
发明人： Richard Johannes Franciscus Van Haren , Arie Jeffrey Den Boef , Jacobus Burghoorn , Maurits Van Der Schaar , Bart Rijpers
IPC分类号： H01L21/76 , H01L21/78 , H01L21/46 , H01L23/544 , G01B11/00
CPC分类号： H01L23/544 , G03F7/70633 , G03F9/7049 , G03F9/7065 , G03F9/7076 , G03F9/7092 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： The invention includes a lithographic system having a first source for generating radiation with a first wavelength and an alignment system with a second source for generating radiation with a second wavelength. The second wavelength is larger than the first wavelength. A marker structure is provided having a first layer and a second layer. The second layer is present either directly or indirectly on top of said first layer. The first layer has a first periodic structure and the second layer has a second periodic structure. At least one of the periodic structures has a plurality of features in at least one direction with a dimension smaller than 400 nm. Additionally, a combination of the first and second periodic structure forms a diffractive structure arranged to be illuminated by radiation with the second wavelength.
摘要翻译：本发明包括具有用于产生具有第一波长的辐射的第一源和具有用于产生具有第二波长的辐射的第二源的对准系统的光刻系统。第二波长大于第一波长。提供了具有第一层和第二层的标记结构。第二层直接或间接地存在于所述第一层的顶部。第一层具有第一周期性结构，第二层具有第二周期性结构。至少一个周期性结构在尺寸小于400nm的至少一个方向上具有多个特征。另外，第一和第二周期结构的组合形成被布置为被具有第二波长的辐射照射的衍射结构。

5. 发明授权

US07629697B2 Marker structure and method for controlling alignment of layers of a multi-layered substrate 有权
标题翻译：用于控制多层基板的层的对准的标记结构和方法
公开(公告)号：US07629697B2
公开(公告)日：2009-12-08
申请号：US10986179
申请日：2004-11-12
申请人： Richard Johannes Franciscus Van Haren , Arie Jeffrey Den Boef , Jacobus Burghoorn , Maurits Van Der Schaar , Bartolomeus Petrus Rijpers
发明人： Richard Johannes Franciscus Van Haren , Arie Jeffrey Den Boef , Jacobus Burghoorn , Maurits Van Der Schaar , Bartolomeus Petrus Rijpers
IPC分类号： H01L23/544 , H01L21/76 , H01L21/78 , H01L21/46 , G01B11/00
CPC分类号： H01L23/544 , G03F7/70633 , G03F9/7049 , G03F9/7065 , G03F9/7076 , G03F9/7092 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： The invention includes a lithographic system having a first source for generating radiation with a first wavelength and an alignment system with a second source for generating radiation with a second wavelength. The second wavelength is larger than the first wavelength. A marker structure is provided having a first layer and a second layer. The second layer is present either directly or indirectly on top of said first layer. The first layer has a first periodic structure and the second layer has a second periodic structure. At least one of the periodic structures has a plurality of features in at least one direction with a dimension smaller than 400 nm. Additionally, a combination of the first and second periodic structure forms a diffractive structure arranged to be illuminated by radiation with the second wavelength.
摘要翻译：本发明包括具有用于产生具有第一波长的辐射的第一源和具有用于产生具有第二波长的辐射的第二源的对准系统的光刻系统。第二波长大于第一波长。提供了具有第一层和第二层的标记结构。第二层直接或间接地存在于所述第一层的顶部。第一层具有第一周期性结构，第二层具有第二周期性结构。至少一个周期性结构在尺寸小于400nm的至少一个方向上具有多个特征。另外，第一和第二周期结构的组合形成被布置为被具有第二波长的辐射照射的衍射结构。

6. 发明申请

US20100068830A1 MARKER STRUCTURE AND METHOD FOR CONTROLLING ALIGNMENT OF LAYERS OF A MULTI-LAYERED SUBSTRATE 有权
标题翻译：用于控制多层基板的层的对准的标记结构和方法
公开(公告)号：US20100068830A1
公开(公告)日：2010-03-18
申请号：US12611428
申请日：2009-11-03
申请人： Richard Johannes Franciscus VAN HAREN , Arie Jeffrey Den Boef , Jacobus Burghoorn , Maurits Van Der Schaar , Bartolomeus Petrus Rijpers
发明人： Richard Johannes Franciscus VAN HAREN , Arie Jeffrey Den Boef , Jacobus Burghoorn , Maurits Van Der Schaar , Bartolomeus Petrus Rijpers
IPC分类号： H01L21/66 , G21K5/00 , H01L21/26
CPC分类号： H01L23/544 , G03F7/70633 , G03F9/7049 , G03F9/7065 , G03F9/7076 , G03F9/7092 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： The invention includes a lithographic system having a first source for generating radiation with a first wavelength and an alignment system with a second source for generating radiation with a second wavelength. The second wavelength is larger than the first wavelength. A marker structure is provided having a first layer and a second layer. The second layer is present either directly or indirectly on top of said first layer. The first layer has a first periodic structure and the second layer has a second periodic structure. At least one of the periodic structures has a plurality of features in at least one direction with a dimension smaller than 400 nm. Additionally, a combination of the first and second periodic structure forms a diffractive structure arranged to be illuminated by radiation with the second wavelength.
摘要翻译：本发明包括具有用于产生具有第一波长的辐射的第一源和具有用于产生具有第二波长的辐射的第二源的对准系统的光刻系统。第二波长大于第一波长。提供了具有第一层和第二层的标记结构。第二层直接或间接地存在于所述第一层的顶部。第一层具有第一周期性结构，第二层具有第二周期性结构。至少一个周期性结构在尺寸小于400nm的至少一个方向上具有多个特征。另外，第一和第二周期结构的组合形成被布置为被具有第二波长的辐射照射的衍射结构。

7. 发明申请

US20110128520A1 ALIGNMENT SYSTEMS AND METHODS FOR LITHOGRAPHIC SYSTEMS 有权
标题翻译：对比系统和方法的LITHOGRAPHIC系统
公开(公告)号：US20110128520A1
公开(公告)日：2011-06-02
申请号：US12977541
申请日：2010-12-23
申请人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
发明人： Franciscus Bernardus Maria Van Bilsen , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Paul Christiaan Hinnen , Hermanus Gerardus Van Horssen , Jeroen Huijbregtse , Andre Bernardus Jeunink , Henry Megens , Ramon Navarro Y Koren , Hoite Pieter Theodoor Tolsma , Hubertus Johannes Gertrudus Simons , Johny Rutger Schuurhuis , Sicco Ian Schets , Brian Young Bok Lee , Allan Reuben Dunbar
IPC分类号： G03B27/54 , G01B11/00
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
摘要翻译：用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。光刻设备具有上述对准系统。使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。

8. 发明申请

US20050189502A1 Alignment systems and methods for lithographic systems 有权
标题翻译：光刻系统的对准系统和方法
公开(公告)号：US20050189502A1
公开(公告)日：2005-09-01
申请号：US10665404
申请日：2003-09-22
申请人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Johannes Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Y Koren , Hoite Tolsma , Hubertus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
发明人： Franciscus Van Bilsen , Jacobus Burghoorn , Richard Johannes Van Haren , Paul Hinnen , Hermanus Van Horssen , Jeroen Huijbregtse , Andre Jeunink , Henry Megens , Ramon Y Koren , Hoite Tolsma , Hubertus Simons , Johny Schuurhuis , Sicco Schets , Brian Lee , Allan Dunbar
IPC分类号： G01B11/00 , G01B11/02 , G01B21/00 , G02B5/18 , G03F7/00 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/027 , H01L21/3205 , H01L21/68 , H01L23/52 , H01S3/00 , G01N21/86
CPC分类号： G03F9/7084 , G03F9/7046 , G03F9/7049 , G03F9/7076 , G03F9/7088 , G03F9/7092
摘要： An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
摘要翻译：用于光刻设备的对准系统具有对准辐射源; 具有第一检测器通道和第二检测器通道的检测系统; 以及与检测系统通信的位置确定单元。位置确定单元被构造成以组合方式处理来自所述第一和第二检测器通道的信息，以确定工件上的对准标记的位置，该组合考虑到工件的制造过程。光刻设备具有上述对准系统。使用光刻设备对准和制造器件的方法分别使用上述对准系统和光刻设备。

9. 发明授权

US06507388B2 Interferometric alignment system for use in vacuum-based lithographic apparatus 失效
标题翻译：用于基于真空的光刻设备的干涉校准系统
公开(公告)号：US06507388B2
公开(公告)日：2003-01-14
申请号：US09741009
申请日：2000-12-21
申请人： Jacobus Burghoorn
发明人： Jacobus Burghoorn
IPC分类号： G03B2742
CPC分类号： G03F9/7096 , G03F9/7049
摘要： In a lithographic apparatus having a movable object table in vacuum, an interferometer-based alignment system for detecting the position of that object table has a passive part in vacuum and an active part outside the vacuum chamber. The active part contains the beam generator, e.g. a laser, and the electronic detectors whilst the passive part contains the illumination and imaging optics. The two parts are coupled by optical fibers. The interferometer may make use of different diffraction orders from measurement and reference gratings and the order separation may be included in the passive part.
摘要翻译：在具有真空中的可移动物体台的光刻设备中，用于检测物体台的位置的基于干涉仪的对准系统具有真空中的被动部分和真空室外的活动部分。有源部分包含波束发生器，例如。激光器和电子检测器，而被动部件包含照明和成像光学元件。这两个部分通过光纤耦合。干涉仪可以利用来自测量和参考光栅的不同的衍射级，并且可以在无源部分中包括顺序分离。

10. 发明申请

US20090066921A1 METHOD FOR PRODUCING A MARKER ON A SUBSTRATE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 失效
标题翻译：在基板上生产标记的方法，平版印刷设备和器件制造方法
公开(公告)号：US20090066921A1
公开(公告)日：2009-03-12
申请号：US12269390
申请日：2008-11-12
申请人： Maurits Van Der Schaar , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Everhardus Cornelis Mos , Rene Monshouwer
发明人： Maurits Van Der Schaar , Jacobus Burghoorn , Richard Johannes Franciscus Van Haren , Everhardus Cornelis Mos , Rene Monshouwer
IPC分类号： G03B27/52
CPC分类号： G03F7/105 , G03F7/168 , G03F9/708 , G03F9/7084
摘要： A method of producing a marker on a substrate includes projecting a patterned beam on a layer of resist disposed on a substrate in a lithographic apparatus to create a latent marker; and locally heating the substrate at the marker location in the lithographic apparatus to transform the latent marker into a detectable marker.
摘要翻译：在衬底上产生标记的方法包括将图案化的光束投影到设置在光刻设备中的衬底的抗蚀剂层上以产生潜在标记; 并且在光刻设备中的标记位置处局部加热衬底，以将潜在标记转变成可检测标记。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式