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1. 发明申请

US20060279718A1 Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly 有权
标题翻译：用于进行倾斜聚焦的方法和曝光装置以及由此制造的装置
公开(公告)号：US20060279718A1
公开(公告)日：2006-12-14
申请号：US11441348
申请日：2006-05-26
申请人： Arie Den Boef , Jacobus Burghoorn , Martinus Leenders , Uwe Mickan , Roeland Vanneer , Jan Hauschild
发明人： Arie Den Boef , Jacobus Burghoorn , Martinus Leenders , Uwe Mickan , Roeland Vanneer , Jan Hauschild
IPC分类号： G03B27/52
CPC分类号： G03F7/70641 , G03F7/70283 , G03F9/7026 , G03F9/7069
摘要： A method for performing a tilted focus test includes the steps of providing a target object, providing a projection beam of radiation using a radiation source, providing a reflective device to introduce a projected projection beam of radiation onto the target portion, introducing a first projected projection beam of radiation onto the target object using the reflective device in a first orientation, using a tilting device for tilting the reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, introducing a second projected projection beam of radiation onto the target object, and determining a lateral shift of the first and second projected projection beams on the target object and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.
摘要翻译：执行倾斜聚焦测试的方法包括以下步骤：提供目标物体，使用辐射源提供辐射投影光束，提供反射装置以将投射的投射射束投射到目标部分上，引入第一投射投影使用倾斜装置将反射装置倾斜到第二取向以提供具有相对于所述第一投影光束的倾斜的第二投影光束，引入第二投射投影确定目标物体上的第一和第二投影投影光束的横向位移，并根据所述横向偏移确定目标物体相对于投影投影光束的散焦。

2. 发明申请

US20060141375A1 Exposure apparatus, a tilting device method for performing a tilted focus test, and a device manufactured accordingly 失效
公开(公告)号：US20060141375A1
公开(公告)日：2006-06-29
申请号：US11020557
申请日：2004-12-27
申请人： Jan Hauschild , Arie Den Boef , Martinus Antonius Leenders , Uwe Mickan , Roeland Maria Vanneer
发明人： Jan Hauschild , Arie Den Boef , Martinus Antonius Leenders , Uwe Mickan , Roeland Maria Vanneer
IPC分类号： G03B27/00 , G03C5/00
CPC分类号： G03F7/70191 , G03F7/70108 , G03F7/70125 , G03F7/70641
摘要： The present invention relates to an exposure apparatus that includes an illumination system for providing a projection beam of radiation, a support structure for supporting a device provided with a pattern, the device serving to impart the projection beam with a pattern in its cross-section; a table for holding a target object, a projection system for projecting the patterned beam onto the target object and a tilting device for providing the projection beam with a tilt. The tilting device is provided substantially in a pupil plane of the projection system.

3. 发明授权

US07834975B2 Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly 有权
标题翻译：用于进行倾斜聚焦的方法和曝光装置以及由此制造的装置
公开(公告)号：US07834975B2
公开(公告)日：2010-11-16
申请号：US11441348
申请日：2006-05-26
申请人： Jacobus Burghoorn , Jan Hauschild , Arie Jeffrey Den Boef , Martinus Hendrikus Antonius Leenders , Uwe Mickan , Roeland Nicolaas Maria Vanneer
发明人： Jacobus Burghoorn , Jan Hauschild , Arie Jeffrey Den Boef , Martinus Hendrikus Antonius Leenders , Uwe Mickan , Roeland Nicolaas Maria Vanneer
IPC分类号： G03B27/42
CPC分类号： G03F7/70641 , G03F7/70283 , G03F9/7026 , G03F9/7069
摘要： A method for performing a tilted focus test includes the steps of providing a target object, providing a projection beam of radiation using a radiation source, providing a reflective device to introduce a projected projection beam of radiation onto the target portion, introducing a first projected projection beam of radiation onto the target object using the reflective device in a first orientation, using a tilting device for tilting the reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, introducing a second projected projection beam of radiation onto the target object, and determining a lateral shift of the first and second projected projection beams on the target object and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.
摘要翻译：执行倾斜聚焦测试的方法包括以下步骤：提供目标物体，使用辐射源提供辐射投影光束，提供反射装置以将投射的投影射束投射到目标部分上，引入第一投射投影使用倾斜装置将反射装置倾斜到第二取向以提供具有相对于所述第一投影光束的倾斜的第二投影光束，引入第二投射投影确定目标物体上的第一和第二投影投影光束的横向位移，并根据所述横向偏移确定目标物体相对于投影投影光束的散焦。

4. 发明授权

US07518706B2 Exposure apparatus, a tilting device method for performing a tilted focus test, and a device manufactured accordingly 失效
标题翻译：曝光装置，用于进行倾斜聚焦试验的倾斜装置方法以及相应地制造的装置
公开(公告)号：US07518706B2
公开(公告)日：2009-04-14
申请号：US11020557
申请日：2004-12-27
申请人： Jan Hauschild , Arie Jeffrey Den Boef , Martinus Hendrikus Antonius Leenders , Uwe Mickan , Roeland Nicolaas Maria Vanneer , Jacobus Burghoorn
发明人： Jan Hauschild , Arie Jeffrey Den Boef , Martinus Hendrikus Antonius Leenders , Uwe Mickan , Roeland Nicolaas Maria Vanneer , Jacobus Burghoorn
IPC分类号： G03B27/72 , G03B24/42 , G03B27/52 , G03B27/54
CPC分类号： G03F7/70191 , G03F7/70108 , G03F7/70125 , G03F7/70641
摘要： The present invention relates to an exposure apparatus that includes an illumination system for providing a projection beam of radiation, a support structure for supporting a device provided with a pattern, the device serving to impart the projection beam with a pattern in its cross-section; a table for holding a target object, a projection system for projecting the patterned beam onto the target object and a tilting device for providing the projection beam with a tilt. The tilting device is provided substantially in a pupil plane of the projection system.
摘要翻译：本发明涉及一种曝光装置，其包括用于提供投影射线束的照明系统，用于支撑设置有图案的装置的支撑结构，该装置用于使投影光束在其横截面上具有图案; 用于保持目标物体的桌子，用于将图案化的光束投影到目标物体上的投影系统和用于向投影光束提供倾斜的倾斜装置。倾斜装置基本上设置在投影系统的光瞳平面中。

5. 发明授权

US07502097B2 Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly 有权
标题翻译：用于进行倾斜聚焦的方法和曝光装置以及由此制造的装置
公开(公告)号：US07502097B2
公开(公告)日：2009-03-10
申请号：US11270826
申请日：2005-11-10
申请人： Jan Hauschild
发明人： Jan Hauschild
IPC分类号： G03B27/52 , G03B27/42 , G03B27/32
CPC分类号： G02B27/0075 , G03F7/70108 , G03F7/70125 , G03F7/70191 , G03F7/70641 , G03F9/7026
摘要： The invention is directed to a method for performing a tilted focus test that includes providing a target object, providing a projection beam of radiation using a radiation source, providing at least one reflective device to produce a projected projection beam of radiation onto the target portion, and producing a first projected projection beam of radiation onto the target object using the at least one reflective device in a first orientation. The invention further includes using a tilting device for tilting the at least one reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, producing a second projected projection beam of radiation onto the target object, determining a lateral shift of the first and second projected projection beams on the target object, and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.
摘要翻译：本发明涉及一种用于执行倾斜聚焦测试的方法，该方法包括提供目标物体，使用辐射源提供辐射投影光束，提供至少一个反射装置以产生投影的投影投射射束到目标部分上，以及使用所述至少一个反射装置在第一取向上产生第一投射的投影投射射束到所述目标物体上。本发明还包括使用倾斜装置来将至少一个反射装置倾斜到第二取向以提供具有相对于所述第一投影光束的倾斜的第二投影光束，从而产生第二投影的投射投射射束到目标物体上，确定第一和第二投影投影光束在目标物体上的横向偏移，并且从所述横向偏移确定目标物体相对于投影投影光束的散焦。

6. 发明申请

US20060146302A1 Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly 有权
公开(公告)号：US20060146302A1
公开(公告)日：2006-07-06
申请号：US11270826
申请日：2005-11-10
申请人： Jan Hauschild
发明人： Jan Hauschild
IPC分类号： G03B27/68
CPC分类号： G02B27/0075 , G03F7/70108 , G03F7/70125 , G03F7/70191 , G03F7/70641 , G03F9/7026
摘要： The invention is directed to a method for performing a tilted focus test that includes providing a target object, providing a projection beam of radiation using a radiation source, providing at least one reflective device to produce a projected projection beam of radiation onto the target portion, and producing a first projected projection beam of radiation onto the target object using the at least one reflective device in a first orientation. The invention further includes using a tilting device for tilting the at least one reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, producing a second projected projection beam of radiation onto the target object, determining a lateral shift of the first and second projected projection beams on the target object, and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.

7. 发明授权

US07355675B2 Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus 失效
标题翻译：用于测量关于基板的信息的方法和用于光刻设备的基板
公开(公告)号：US07355675B2
公开(公告)日：2008-04-08
申请号：US11135630
申请日：2005-05-24
申请人： Sanjay Lalbahadoersing , Marco Johannes Annemarie Pieters , Jan Hauschild , Coen Van De Vin
发明人： Sanjay Lalbahadoersing , Marco Johannes Annemarie Pieters , Jan Hauschild , Coen Van De Vin
IPC分类号： G03B27/42
CPC分类号： G03F9/7084 , G03F7/70633
摘要： A method for measuring information provided by a substrate. The substrate includes a feature that has been created by a lithographic apparatus. The method includes projecting a beam of light onto a marker disposed above and/or near the feature on the substrate, and detecting information provided by the marker with a sensor. A coating is disposed on the substrate so that the coating lies between the beam of light and the feature to substantially prevent the beam of light from being reflected by the feature and causing an inaccurate readout of the information provided by the marker.
摘要翻译：一种用于测量由衬底提供的信息的方法。衬底包括由光刻设备产生的特征。该方法包括将光束投射到设置在基板上的特征上方和/或附近的标记上，以及用传感器检测由标记提供的信息。涂层设置在基板上，使得涂层位于光束和特征之间，以基本上防止光束被特征反射并导致由标记提供的信息的不准确的读出。

8. 发明授权

US07298455B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07298455B2
公开(公告)日：2007-11-20
申请号：US11154950
申请日：2005-06-17
申请人： Arnold Sinke , Jan Hauschild
发明人： Arnold Sinke , Jan Hauschild
IPC分类号： G03B27/52 , G03B27/72
CPC分类号： G03F7/70641 , G03F7/70066
摘要： The present invention provides a lithographic apparatus, including: a substrate table constructed to hold a substrate; a projection system configured to project a radiation beam through an exposure slit area onto a target portion of the substrate; a patterning device configured to import the radiation beam with a pattern in its cross-section to form a patterned radiation beam, the patterned radiation beam at the target portion of the substrate being in focus over a depth of focus; and a measurement system that is arranged to measure a surface topography of at least part of the target portion, wherein the projection system is arranged to adjust a dimension of the exposure slit area to form an adjusted exposure slit area over which surface topography variations are equal to or smaller than the depth of focus.
摘要翻译：本发明提供一种光刻设备，包括：基板台，其构造成保持基板; 投影系统，被配置为将辐射束通过曝光狭缝区域突出到所述基板的目标部分上; 图案形成装置，其构造成以其横截面中的图案导入辐射束，以形成图案化的辐射束，所述衬底的目标部分处的图案化辐射束在聚焦深度上聚焦; 以及测量系统，其布置成测量所述目标部分的至少一部分的表面形貌，其中所述投影系统被布置成调整所述曝光狭缝区域的尺寸，以形成调整的曝光狭缝区域，在所述曝光狭缝区域上，表面形貌变化相等达到或小于焦深。

9. 发明申请

US20060132744A1 Lithographic apparatus focus test method and system, and device manufacturing method 失效
标题翻译：光刻设备聚焦测试方法和系统，以及器件制造方法
公开(公告)号：US20060132744A1
公开(公告)日：2006-06-22
申请号：US11017230
申请日：2004-12-21
申请人： Jan Hauschild , Marco Pieters , Coen Van De Vin
发明人： Jan Hauschild , Marco Pieters , Coen Van De Vin
IPC分类号： G03B27/52
CPC分类号： G03F7/70641
摘要： A method and system for performing a focus test in a lithographic apparatus. According to the method, a substrate is provided with a layer of radiation sensitive material, the substrate is illuminated in the lithographic apparatus using a first focus sensitive feature and a second focus feature, and the substrate is analyzed to provide results of the focus test using the first focus sensitive feature as imaged on the substrate. The focus test is performed on a regular production wafer, and the results of the focus test are allowed if predetermined statistic properties associated with the second focus feature as imaged on the substrate are within predetermined limits. The second focus feature may be focus sensitive or focus insensitive.
摘要翻译：一种用于在光刻设备中执行聚焦测试的方法和系统。根据该方法，衬底设置有一层辐射敏感材料，使用第一焦点敏感特征和第二焦点特征在光刻设备中照射衬底，并且分析衬底以提供聚焦测试的结果，使用第一个焦点敏感特征成像在基底上。如果在基板上成像的与第二焦点特征相关联的预定统计特性在预定限度内，则可以在常规生产晶片上执行聚焦测试，并且允许聚焦测试的结果。第二个焦点特征可能是焦点敏感或焦点不敏感。

10. 发明授权

US07502096B2 Lithographic apparatus, calibration method, device manufacturing method and computer program product 有权
标题翻译：光刻设备，校准方法，设备制造方法和计算机程序产品
公开(公告)号：US07502096B2
公开(公告)日：2009-03-10
申请号：US11348530
申请日：2006-02-07
申请人： Jeffrey Godefridus Cornelis Tempelaars , Gerardus Carolus Johannus Hofmans , Rene Oesterholt , Jan Hauschild , Hans Erik Kattouw
发明人： Jeffrey Godefridus Cornelis Tempelaars , Gerardus Carolus Johannus Hofmans , Rene Oesterholt , Jan Hauschild , Hans Erik Kattouw
IPC分类号： G02B27/42
CPC分类号： G03F9/7034 , G03F9/7011 , G03F9/7019
摘要： Calibration of spot height offsets in a level sensor is performed on a resist-coated substrate to eliminate process dependencies of substrate position measurements obtained by the level sensor.
摘要翻译：在抗蚀剂涂覆的基板上执行液位传感器中的点高度偏移的校准，以消除由液位传感器获得的基板位置测量的过程依赖性。

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