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1. 发明申请

US20140054165A1 CARBON SPARK EVAPORATION 有权
标题翻译：碳泡沫蒸发
公开(公告)号：US20140054165A1
公开(公告)日：2014-02-27
申请号：US14110982
申请日：2012-03-26
申请人： Jürgen Ramm , Beno Widrig , Kurt Ruhm
发明人： Jürgen Ramm , Beno Widrig , Kurt Ruhm
IPC分类号： H01J37/32 , H05B7/20 , H05B7/148
CPC分类号： H01J37/32055 , C23C14/325 , H01J37/32064 , H05B7/148 , H05B7/20 , H05H2001/4682
摘要： The invention relates to a method for operating a pulsed discontinuous spark discharge. The spark is fed via a capacitor. Between the pulses there are switched-off time intervals during which no spark current flows. Within the pulses, that is to say during the switched-on time intervals, the supply of charge is stopped upon a current threshold being reached and is restarted, with the result that subpulses occur within the pulses. The time intervals and subpulses are chosen according to the invention such that when the capacitor is switched on again, the spark discharge readily ignites again.
摘要翻译：本发明涉及一种操作脉冲不连续火花放电的方法。火花通过电容器馈电。在脉冲之间有关闭时间间隔，在此期间没有火花电流流动。在脉冲内，也就是说，在接通时间间隔期间，在达到电流阈值时停止供电，并且重新开始，从而在脉冲内发生子脉冲。根据本发明选择时间间隔和子脉冲，使得当电容器再次接通时，火花放电容易再次点燃。

2. 发明授权

US09905399B2 Carbon spark evaporation 有权
公开(公告)号：US09905399B2
公开(公告)日：2018-02-27
申请号：US14110982
申请日：2012-03-26
申请人： Jürgen Ramm , Beno Widrig , Kurt Ruhm
发明人： Jürgen Ramm , Beno Widrig , Kurt Ruhm
IPC分类号： C23C14/00 , C23C14/32 , H01J37/32 , H05B7/148 , H05B7/20 , H05H1/46
CPC分类号： H01J37/32055 , C23C14/325 , H01J37/32064 , H05B7/148 , H05B7/20 , H05H2001/4682
摘要： The invention relates to a method for operating a pulsed discontinuous spark discharge. The spark is fed via a capacitor. Between the pulses there are switched-off time intervals during which no spark current flows. Within the pulses, that is to say during the switched-on time intervals, the supply of charge is stopped upon a current threshold being reached and is restarted, with the result that subpulses occur within the pulses. The time intervals and subpulses are chosen according to the invention such that when the capacitor is switched on again, the spark discharge readily ignites again.

3. 发明授权

US09611538B2 Method for producing metal oxide layers through arc vaporization 有权
公开(公告)号：US09611538B2
公开(公告)日：2017-04-04
申请号：US12429252
申请日：2009-04-24
申请人： Jürgen Ramm , Beno Widrig
发明人： Jürgen Ramm , Beno Widrig
IPC分类号： C01G37/14 , C23C14/34 , C22C1/04 , C23C14/00 , C23C14/08 , C23C14/32
CPC分类号： C23C14/3414 , B22F2998/00 , C22C1/0416 , C23C14/0036 , C23C14/08 , C23C14/081 , C23C14/083 , C23C14/325 , Y10T428/12028 , B22F3/15
摘要： The invention relates to a method for producing oxidic layers by means of PVD (physical vapor deposition), in particular by means of cathodic arc vaporization, wherein a powder-metallurgical target is vaporized and the powder-metallic target is formed of at least two metallic or semi-metallic components, the composition of the metallic or semi-metallic components of the target being chosen in such a manner that during heating in the transition from the room temperature into the liquid phase no phase boundary of purely solid phases, based on the phase diagram of a molten mixture of the at least two metallic or semi-metallic components, is crossed.

4. 发明申请

US20140224768A1 METHOD FOR REMOVING HARD CARBON LAYERS 有权
标题翻译：去除硬碳层的方法
公开(公告)号：US20140224768A1
公开(公告)日：2014-08-14
申请号：US14124394
申请日：2012-05-31
申请人： Jürgen Ramm , Beno Widrig
发明人： Jürgen Ramm , Beno Widrig
IPC分类号： H01J37/32
CPC分类号： H01J37/32064 , C23C16/0245 , H01J2237/3341 , H01L21/02376 , H01L21/31116 , H01L21/31122 , H01L29/66015
摘要： The invention relates to a method for removing carbon layers, in particular ta-C layers, from substrate surfaces of tools and components. The substrate to be de-coated is accordingly arranged on a substrate support in a vacuum chamber, the vacuum chamber is charged with at least one reactive gas assisting the evacuation of carbon in gaseous form and a low-voltage plasma discharge is created in the vacuum chamber to activate the reactive gas and hence assist the required chemical reaction or reactions to de-coat the coated substrate. The low-voltage plasma discharge is a dc low-volt arc discharge, the substrate surfaces to be de-coated are bombarded substantially exclusively with electrons and oxygen, nitrogen and hydrogen are used as reactive gas.
摘要翻译：本发明涉及从工具和部件的基板表面去除碳层，特别是ta-C层的方法。因此，要去除涂层的基板被布置在真空室中的基板支撑件上，真空室中装有至少一个辅助气体排出碳的反应气体，并且在真空中产生低压等离子体放电室以活化反应性气体，因此有助于所需的化学反应或反应来去除涂覆的基底。低压等离子体放电是直流低压电弧放电，基本上仅用电子和氧气轰击要去除的基板表面，使用氮和氢作为反应气体。

5. 发明申请

US20130303414A1 MOLYBDENUM MONOXIDE LAYERS, AND PRODUCTION THEREOF USING PVD 有权
标题翻译：一氧化钼薄膜及其使用PVD的生产
公开(公告)号：US20130303414A1
公开(公告)日：2013-11-14
申请号：US13881855
申请日：2011-10-06
申请人： Jürgen Ramm , Beno Widrig , Kerstin Gläntz , Florian Seibert
发明人： Jürgen Ramm , Beno Widrig , Kerstin Gläntz , Florian Seibert
IPC分类号： C10M103/06
CPC分类号： C10M103/06 , C23C14/0084 , C23C14/024 , C23C14/027 , C23C14/0676 , C23C14/08 , C23C14/325 , C23C14/3414 , C23C14/548 , C23C28/042 , C23C28/044 , C23C28/048 , C23C28/322 , C23C28/3455 , C23C28/347 , C23C28/36 , C23C28/42
摘要： The invention relates to a coating comprising at least one molybdenum-containing layer having molybdenum oxide, said molybdenum being essentially molybdenum monoxide. The invention further relates to a PVD process for producing the disclosed coating, in which the layer comprising the molybdenum monoxide is produced using arc evaporation. The invention also relates to a component that has said coating.
摘要翻译：本发明涉及包含至少一个含钼氧化物的含钼层的涂层，所述钼基本上是一氧化钼。本发明还涉及用于生产所公开的涂层的PVD方法，其中使用电弧蒸发产生包含一氧化钼的层。本发明还涉及具有所述涂层的部件。

6. 发明授权

US09945024B2 Method for producing cubic zirconia layers 有权
公开(公告)号：US09945024B2
公开(公告)日：2018-04-17
申请号：US13497283
申请日：2010-09-24
申请人： Jürgen Ramm , Beno Widrig
发明人： Jürgen Ramm , Beno Widrig
IPC分类号： C23C14/00 , C23C14/24 , C23C14/06 , C23C14/08 , C23C14/32 , C23C14/34
CPC分类号： C23C14/24 , C23C14/0021 , C23C14/0036 , C23C14/0042 , C23C14/0676 , C23C14/083 , C23C14/325 , C23C14/3485
摘要： In order to produce zirconia-based layers on a deposition substrate, wherein reactive spark deposition using pulsed spark current and/or the application of a magnetic field that is perpendicular to the spark target are employed, a mixed target comprising elemental zircon and at least one stabilizer is used, or a zirconium target comprising elemental zirconium is used, wherein in addition to oxygen, nitrogen is used as the reactive gas. As an alternative, combined with the use of the mixed target, nitrogen can also be used as the reactive gas in addition to oxygen.

7. 发明授权

US09230778B2 Method for removing hard carbon layers 有权
标题翻译：去除硬碳层的方法
公开(公告)号：US09230778B2
公开(公告)日：2016-01-05
申请号：US14124394
申请日：2012-05-31
申请人： Jürgen Ramm , Beno Widrig
发明人： Jürgen Ramm , Beno Widrig
IPC分类号： H01L21/302 , H01L21/461 , B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00 , C23F3/00 , H01J37/32 , H01L21/311 , C23C16/02 , H01L21/02 , H01L29/66
CPC分类号： H01J37/32064 , C23C16/0245 , H01J2237/3341 , H01L21/02376 , H01L21/31116 , H01L21/31122 , H01L29/66015
摘要： The invention relates to a method for removing carbon layers, in particular ta-C layers, from substrate surfaces of tools and components. The substrate to be de-coated is accordingly arranged on a substrate support in a vacuum chamber, the vacuum chamber is charged with at least one reactive gas assisting the evacuation of carbon in gaseous form and a low-voltage plasma discharge is created in the vacuum chamber to activate the reactive gas and hence assist the required chemical reaction or reactions to de-coat the coated substrate. The low-voltage plasma discharge is a dc low-volt arc discharge, the substrate surfaces to be de-coated are bombarded substantially exclusively with electrons and oxygen, nitrogen and hydrogen are used as reactive gas.
摘要翻译：本发明涉及从工具和部件的基板表面去除碳层，特别是ta-C层的方法。因此，要去除涂层的基板被布置在真空室中的基板支撑件上，真空室中装有至少一个辅助气体排出碳的反应气体，并且在真空中产生低压等离子体放电室以活化反应性气体，因此有助于所需的化学反应或反应来去除涂覆的基底。低压等离子体放电是直流低压电弧放电，基本上仅用电子和氧气轰击要去除的基板表面，使用氮和氢作为反应气体。

8. 发明授权

US07939181B2 Layer system with at least one mixed crystal layer of a multi-oxide 有权
标题翻译：具有至少一个多氧化物混合晶层的层系统
公开(公告)号：US07939181B2
公开(公告)日：2011-05-10
申请号：US11548529
申请日：2006-10-11
申请人： Jürgen Ramm , Beno Widrig , Michael Ante , Christian Wohlrab
发明人： Jürgen Ramm , Beno Widrig , Michael Ante , Christian Wohlrab
IPC分类号： B32B18/00 , B32B15/04
CPC分类号： C23C14/027 , B29C33/38 , B29C33/56 , B29K2907/04 , C23C14/0021 , C23C14/022 , C23C14/08 , Y10T428/12611 , Y10T428/12618 , Y10T428/12632 , Y10T428/12667
摘要： A PVD layer system for the coating of workpieces encompasses at least one mixed-crystal layer of a multi-oxide having the following composition: (Me11-xMe2x)2O3, where Me1 and Me2 each represent at least one of the elements Al, Cr, Fe, Li, Mg, Mn, Nb, Ti, Sb or V. The elements of Me1 and Me2 differ from one another. The crystal lattice of the mixed-crystal layer in the PVD layer system has a corundum structure which in an x-ray diffractometrically analyzed spectrum of the mixed-crystal layer is characterized by at least three of the lines associated with the corundum structure. Also disclosed is a vacuum coating method for producing a mixed-crystal layer of a multi-oxide, as well as correspondingly coated tools and components.
摘要翻译：用于涂覆工件的PVD层系统包括具有以下组成的多氧化物的至少一个混晶层：（Me11-xMe2x）2O3，其中Me1和Me2各自表示元素Al，Cr， Fe，Li，Mg，Mn，Nb，Ti，Sb或V.Me1和Me2的元素彼此不同。 PVD层系统中的混晶层的晶格具有刚玉结构，其在混合晶体层的x射线衍射分析光谱中的特征在于与刚玉结构相关联的至少三条线。还公开了一种用于制备多氧化物的混合层的真空涂覆方法，以及相应地涂覆的工具和组件。

9. 发明申请

US20080173536A1 Method For Operating a Pulsed Arc Evaporation Source and Vacuum Process System Comprising Said Pulsed Arc Evaporation Source 有权
标题翻译：用于操作包括所述脉冲电弧蒸发源的脉冲蒸发源和真空处理系统的方法
公开(公告)号：US20080173536A1
公开(公告)日：2008-07-24
申请号：US11908542
申请日：2006-03-01
申请人： Jürgen Ramm , Beno Widrig , Daniel Lendi , Volker Derflinger , Andreas Reiter
发明人： Jürgen Ramm , Beno Widrig , Daniel Lendi , Volker Derflinger , Andreas Reiter
IPC分类号： C23C14/35 , C23C14/00
CPC分类号： H01J37/3444 , C23C14/024 , C23C14/0641 , C23C14/08 , C23C14/081 , C23C14/083 , C23C14/325 , F01D5/288 , F05D2230/313 , H01J37/32055 , H01J37/34
摘要： A vacuum process system for surface-treating work pieces uses an arc evaporation source. The system has a first electrode connected to a DC power source and a second electrode, disposed separately from the arc evaporation source. The two electrodes are operated while being connected to a single pulsed power supply.
摘要翻译：用于表面处理工件的真空处理系统使用电弧蒸发源。该系统具有连接到与电弧蒸发源分开设置的直流电源和第二电极的第一电极。两个电极在连接到单个脉冲电源时被操作。

10. 发明授权

US10711341B2 Synthesis of metal oxides by reactive cathodic arc evaporation 有权
公开(公告)号：US10711341B2
公开(公告)日：2020-07-14
申请号：US13579956
申请日：2011-02-10
申请人： Jürgen Ramm , Beno Widrig
发明人： Jürgen Ramm , Beno Widrig
IPC分类号： C23C14/00 , C23C14/08 , C23C14/32
摘要： In these investigations, an attempt has been made to correlate the deposition parameters of the reactive cathodic arc evaporation with processes at the surface of the composite Al—Cr targets and the nucleation and phase formation of the synthesized Al—Cr—O layers. The oxygen partial pressure and the pulsed operation of the arc current influence the formation of intermetallic phases and solid solutions at the target surface. The nucleation of the ternary oxides at the substrate site appears to be, to some extent, controllable by the intermetallics or solid solutions formed at the target surface. A specific nucleation process at substrate site can therefore be induced by the free choice of target composition in combination with the partial pressure of the oxygen reactive gas. It also allows the control over the oxide island growth at the target surface which occurs occasionally at higher oxygen partial pressure. This hypothesis is supported by the X-ray diffraction analysis of the layers as well as of the target surface.

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