专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06802955B2 Method and apparatus for the electrochemical deposition and planarization of a material on a workpiece surface 有权
标题翻译：用于在工件表面上的材料的电化学沉积和平坦化的方法和装置
公开(公告)号：US06802955B2
公开(公告)日：2004-10-12
申请号：US10044514
申请日：2002-01-11
申请人： Ismail Emesh , Periya Gopalan , Phillip M. Rayer, II , Bentley J. Palmer
发明人： Ismail Emesh , Periya Gopalan , Phillip M. Rayer, II , Bentley J. Palmer
IPC分类号： B23H300
CPC分类号： C25D17/14 , B23H5/08 , C25D7/123 , C25D17/001 , C25F7/00 , H01L21/2885 , H01L21/32125
摘要： An electrochemical apparatus is provided which deposits material onto or removes material from the surface of a workpiece. The apparatus comprises a polishing pad and a platen which is in turn comprised of a first conductive layer in contact with the polishing pad and coupled to a first potential, a second conductive layer coupled to a second potential, and a first insulating layer disposed between the first and second conductive layers. At least one electrical contact is positioned within the polishing pad and is electrically coupled to the second conductive layer. A reservoir is provided which places an electrolyte solution in contact with the polishing pad and the workpiece. A carrier positions and/or presses the workpiece against the polishing pad.
摘要翻译：提供了一种电化学装置，其将材料沉积在工件表面上或从工件表面去除材料。该设备包括抛光垫和压板，该压板又由与抛光垫接触并与第一电位接触的第一导电层，耦合到第二电位的第二导电层以及设置在第二电位之间的第一绝缘层第一和第二导电层。至少一个电触点位于抛光垫内并电耦合到第二导电层。提供一个储存器，其将电解质溶液与抛光垫和工件接触。载体定位和/或将工件压靠在抛光垫上。

2. 发明授权

US07297239B2 Method and apparatus for the electrochemical deposition and planarization of a material on a workpiece surface 有权
标题翻译：用于在工件表面上的材料的电化学沉积和平坦化的方法和装置
公开(公告)号：US07297239B2
公开(公告)日：2007-11-20
申请号：US10921666
申请日：2004-08-18
申请人： Ismail Emesh , Periya Gopalan , Phillip M. Rayer, II , Bentley J. Palmer
发明人： Ismail Emesh , Periya Gopalan , Phillip M. Rayer, II , Bentley J. Palmer
IPC分类号： C25D17/14 , C25F7/00 , B23H5/06 , B23H7/22
CPC分类号： C25D17/14 , B23H5/08 , C25D7/123 , C25D17/001 , C25F7/00 , H01L21/2885 , H01L21/32125
摘要： An electrochemical apparatus is provided which deposits material onto or removes material from the surface of a workpiece. The apparatus comprises a polishing pad and a platen which is in turn comprised of a first conductive layer in contact with the polishing pad and coupled to a first potential, a second conductive layer coupled to a second potential, and a first insulating layer disposed between the first and second conductive layers. At least one electrical contact is positioned within the polishing pad and is electrically coupled to the second conductive layer. A reservoir is provided which places an electrolyte solution in contact with the polishing pad and the workpiece. A carrier positions and/or presses the workpiece against the polishing pad.
摘要翻译：提供了一种电化学装置，其将材料沉积在工件表面上或从工件表面去除材料。该设备包括抛光垫和压板，该压板又包括与抛光垫接触并与第一电位接触的第一导电层，耦合到第二电位的第二导电层和设置在第二电位之间的第一绝缘层第一和第二导电层。至少一个电触点位于抛光垫内并电耦合到第二导电层。提供一个储存器，其将电解质溶液与抛光垫和工件接触。载体定位和/或将工件压靠在抛光垫上。

3. 发明授权

US06406362B1 Seal for use with a chemical mechanical planarization apparatus 失效
标题翻译：用于化学机械平面化装置的密封
公开(公告)号：US06406362B1
公开(公告)日：2002-06-18
申请号：US09754449
申请日：2001-01-04
申请人： Andrew Yednak, III , Phillip M. Rayer, II
发明人： Andrew Yednak, III , Phillip M. Rayer, II
IPC分类号： B24B3704
CPC分类号： B24B37/16 , B24B41/04
摘要： The present invention provides a labyrinth seal for use with a workpiece planarization apparatus, such as a chemical mechanical planarization apparatus. In accordance with one aspect of the invention, there is provided a labyrinth seal comprising a member having at least one sloped feature which is configured to inhibit a fluid from traveling into and through the labyrinth. In accordance with another aspect of the invention, there is provided a workpiece polishing apparatus including a rotary shaft assembly which comprises a housing having a plurality of interior components; a shaft extending longitudinally through the housing, wherein the shaft includes a first end connected to a motor for rotating the shaft relative to the housing; a platen connected to a second end of the shaft; and a labyrinth seal located in a space between the platen and the housing, wherein the labyrinth seal comprises a member having at least one sloped feature which is configured to inhibit a fluid from traveling into and through the labyrinth seal. In accordance with yet another aspect of the invention, there is provided a labyrinth seal having at least one sloped feature, wherein the labyrinth seal is coupled to a fluid purge system including a purge line connected to a source of pressurized fluid and terminating in the labyrinth seal.
摘要翻译：本发明提供了一种用于与诸如化学机械平面化装置的工件平面化装置一起使用的迷宫式密封件。根据本发明的一个方面，提供了一种迷宫式密封件，其包括具有至少一个倾斜特征的构件，所述至少一个倾斜特征被构造成阻止流体进入并穿过迷宫。根据本发明的另一方面，提供了一种工件抛光装置，其包括旋转轴组件，其包括具有多个内部部件的壳体; 轴纵向延伸穿过所述壳体，其中所述轴包括连接到电动机的第一端，用于相对于所述壳体旋转所述轴; 连接到所述轴的第二端的压板; 以及位于所述压板和所述壳体之间的空间中的迷宫式密封件，其中所述迷宫式密封件包括具有至少一个倾斜特征的构件，所述至少一个倾斜特征被构造成阻止流体进入并穿过所述迷宫式密封件。根据本发明的另一方面，提供了一种具有至少一个倾斜特征的迷宫式密封件，其中迷宫式密封件联接到包括连接到加压流体源并且终止于迷宫中的清除管线的流体清洗系统密封。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式