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1. 发明授权

US07304001B2 Fabrication methods of semiconductor integrated circuit device and photomask 失效
标题翻译：半导体集成电路器件和光掩模的制作方法
公开(公告)号：US07304001B2
公开(公告)日：2007-12-04
申请号：US10224375
申请日：2002-08-21
申请人： Isao Miyazaki , Yasushi Takeuchi , Toshihiro Morii , Koji Sekiguchi , Yoshihiko Okamoto
发明人： Isao Miyazaki , Yasushi Takeuchi , Toshihiro Morii , Koji Sekiguchi , Yoshihiko Okamoto
IPC分类号： H01L21/31
CPC分类号： H01L21/67276 , G03F1/00 , G03F7/70433 , G03F7/70525
摘要： Under the condition that a semiconductor maker and a photomask maker are separated but these are mutually connected with a communication line, the semiconductor maker gives a photomask fabrication schedule information to the photomask maker via the communication line, while the photomask maker fabricates the photomask depending on such fabrication schedule information and delivers the photomask to the semiconductor maker. The photomask maker periodically sends, in the course of fabrication process, a photomask fabrication progress information to the semiconductor maker via the communication line. The semiconductor maker regenerates the photomask fabrication schedule information depending on the photomask fabrication progress information sent from the photomask maker and then transfers the re-generated photomask fabrication schedule information to the photomask maker via the communication line. Therefore, mismatch between fabrication of semiconductor integrated circuit device and supply of photomask can be reduced or eliminated.
摘要翻译：在半导体制造商和光掩模制造商分离但这些与通信线路相互连接的条件下，半导体制造商通过通信线路向光掩模制造商提供光掩模制造进度信息，而光掩模制造商根据这种制造计划信息并将光掩模传送到半导体制造商。光掩模制造商在制造过程中周期性地通过通信线路向半导体制造商发送光掩模制造进度信息。半导体制造商根据从光掩模制造者发送的光掩模制造进度信息再生光掩模制造计划信息，然后经由通信线路将重新生成的光掩模制造进度信息传送到光掩模制造者。因此，可以减少或消除半导体集成电路器件的制造与光掩模的供给之间的不匹配。

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