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1. 发明授权

US07015366B2 Fluorinated compound, fluoropolymer and process for its production 失效
标题翻译：氟化合物，含氟聚合物及其生产工艺
公开(公告)号：US07015366B2
公开(公告)日：2006-03-21
申请号：US11218472
申请日：2005-09-06
申请人： Shun-ichi Kodama , Isamu Kaneko , Osamu Yokokoji , Shinji Okada , Yoko Takebe , Yasuhide Kawaguchi
发明人： Shun-ichi Kodama , Isamu Kaneko , Osamu Yokokoji , Shinji Okada , Yoko Takebe , Yasuhide Kawaguchi
IPC分类号： C07C41/00 , C07C43/00 , C07C407/00 , C07C409/00 , C08F136/16
CPC分类号： C08F36/20 , C08F36/16 , C08F214/18 , C08F2/60
摘要： To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg.A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1): CFR1═CR2—Q—CR3═CHR4 (1) wherein each of R1 to R4 which are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.
摘要翻译：提供具有高浓度官能团的含氟聚合物以提供官能团的足够特性，并且不会降低Tg。具有由式（1）表示的含官能团的氟化二烯的环化聚合形成的单体单元的含氟聚合物：<？in-line-formula description =“In-line formula”end =“lead”→CFR < 1 -CR 2 -Q-CR 3 -RR 4（1）<？在线公式描述=“ 其中独立的R 1〜R 4中的每一个表示氢原子，氟原子，具有至多8个碳原子的烷基或脂环族烃基，并且其中至少一个是脂环族烃基，条件是烷基或脂环族烃基中的氢原子可以被氟原子取代，烷基或氟代烷基; Q表示可以通过酸或能够转化为这种封端的酸性基团的基团而能够形成酸性基团的封端酸性基团的二价有机基团。

2. 发明申请

US20060004164A1 Fluorinated compound, fluoropolymer and process for its production 失效
标题翻译：氟化合物，含氟聚合物及其生产工艺
公开(公告)号：US20060004164A1
公开(公告)日：2006-01-05
申请号：US11218472
申请日：2005-09-06
申请人： Shun-ichi Kodama , Isamu Kaneko , Osamu Yokokoji , Shinji Okada , Yoko Takebe , Yasuhide Kawaguchi
发明人： Shun-ichi Kodama , Isamu Kaneko , Osamu Yokokoji , Shinji Okada , Yoko Takebe , Yasuhide Kawaguchi
IPC分类号： C08F114/18 , C07C21/18
CPC分类号： C08F36/20 , C08F36/16 , C08F214/18 , C08F2/60
摘要： To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg. A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1): CFR1═CR2-Q-CR3═CHR4 (1) wherein each of R1 to R4 which are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.
摘要翻译：提供具有高浓度官能团的含氟聚合物以提供官能团的足够特性，并且不会导致Tg的降低。具有由式（1）表示的含官能团的氟化二烯的环化聚合形成的单体单元的含氟聚合物：<？in-line-formula description =“In-line formula”end =“lead”→CFR < 1 -CR 2 -Q-CR 3 -RR 4（1）<？在线公式描述=“ 其中独立的R 1〜R 4中的每一个表示氢原子，氟原子，具有至多8个碳原子的烷基或脂环族烃基，并且其中至少一个是脂环族烃基，条件是烷基或脂环族烃基中的氢原子可以被氟原子取代，烷基或氟代烷基; Q表示可以通过酸或能够转化为这种封端的酸性基团的基团而能够形成酸性基团的封端酸性基团的二价有机基团。

3. 发明授权

US06818258B2 Resist composition 失效
标题翻译：抗蚀组成
公开(公告)号：US06818258B2
公开(公告)日：2004-11-16
申请号：US10635514
申请日：2003-08-07
申请人： Isamu Kaneko , Shinji Okada , Yasuhide Kawaguchi , Yoko Takebe , Shun-ichi Kodama
发明人： Isamu Kaneko , Shinji Okada , Yasuhide Kawaguchi , Yoko Takebe , Shun-ichi Kodama
IPC分类号： B05D306
CPC分类号： G03F7/0392 , G03F7/0046 , G03F7/0395 , Y10S430/114 , Y10S430/146 , Y10T428/3154
摘要： To provide a chemical amplification type resist composition which is excellent in transparency to a radiation and in dry etching properties and which gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc. A resist composition comprising a fluoropolymer (A) which is a fluoropolymer having repeating units formed by cyclopolymerization of a fluorinated diene represented by the formula (1) and which has blocked acidic groups as Q, an acid-generating compound (B) which generates an acid under irradiation with light, and an organic solvent (C): CF2═CR1—Q—CR2═CH2 (1) wherein each of R1 and R2 which are independent of each other, is a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group, and Q is a bivalent organic group having a blocked acidic group capable of forming an acidic group by an acid or a group which can be converted to such a blocked acidic group.
摘要翻译：提供一种透光性和干蚀刻性能优异的化学放大型抗蚀剂组合物，其具有优异的灵敏度，分辨率，均匀性，耐热性等的抗蚀剂图案。一种抗蚀剂组合物，其包含含氟聚合物（A）是具有由式（1）表示的氟化二烯和阻聚酸性基团Q的重复单元形成的重复单元，在光照下产生酸的产酸化合物（B）和有机溶剂（C）：其中彼此独立的R 1和R 2各自为氢原子，氟原子，甲基或三氟甲基，Q为具有封端的二价有机基团能够通过酸或可以转化为这种封闭的酸性基团的基团形成酸性基团的酸性基团。

4. 发明授权

US06815146B2 Resist composition 失效
标题翻译：抗蚀组成
公开(公告)号：US06815146B2
公开(公告)日：2004-11-09
申请号：US10376243
申请日：2003-03-03
申请人： Shinji Okada , Yasuhide Kawaguchi , Yoko Takebe , Isamu Kaneko , Shun-ichi Kodama
发明人： Shinji Okada , Yasuhide Kawaguchi , Yoko Takebe , Isamu Kaneko , Shun-ichi Kodama
IPC分类号： G03F7039
CPC分类号： G03F7/0046 , G03F7/0395 , Y10S430/115 , Y10S430/146
摘要： A resist composition containing a fluoropolymer, an acid-generating compound and an organic solvent, a resist film, and methods for making thereof.

5. 发明授权

US06733952B2 Resist composition 失效
标题翻译：抗蚀组成
公开(公告)号：US06733952B2
公开(公告)日：2004-05-11
申请号：US10316877
申请日：2002-12-12
申请人： Isamu Kaneko , Shinji Okada , Yasuhide Kawaguchi , Yoko Takebe , Shun-ichi Kodama
发明人： Isamu Kaneko , Shinji Okada , Yasuhide Kawaguchi , Yoko Takebe , Shun-ichi Kodama
IPC分类号： G03F7004
CPC分类号： G03F7/0395 , C08L27/12 , C08L29/14 , G03F7/0046 , G03F7/0392 , Y10S430/106 , Y10S430/108 , C08L2666/04
摘要： The following resist composition of chemical amplification type, which is excellent in transparency to light beams and dry etching properties and gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc. A resist composition which comprises a fluoropolymer (A) comprising monomer units (a) of a fluorovinyl monomer having —CF2—OR (wherein R is a C1-10 alkyl group) and monomer units (b) of an alicyclic ethylenic monomer, an acid-generating compound (B) which generates an acid upon irradiation with light, and an organic solvent (C).
摘要翻译：以下的抗光蚀剂组合物，其具有优异的透光性和干蚀刻性，并提供了灵敏度，分辨率，均匀性，耐热性等优异的抗蚀剂图案。一种抗蚀剂组合物，其包含含氟聚合物（A），其包含具有-CF2-OR（其中R是C1-10烷基）的氟乙烯基单体的单体单元（a）和脂环族烯属单体的单体单元（b），产生酸的产酸化合物（B）用光照射，和有机溶剂（C）。

6. 发明授权

US06984704B2 Fluorinated compound, fluoropolymer and process for its production 失效
公开(公告)号：US06984704B2
公开(公告)日：2006-01-10
申请号：US11059695
申请日：2005-02-17
申请人： Shun-ichi Kodama , Isamu Kaneko , Osamu Yokokoji , Shinji Okada , Yoko Takebe , Yasuhide Kawaguchi
发明人： Shun-ichi Kodama , Isamu Kaneko , Osamu Yokokoji , Shinji Okada , Yoko Takebe , Yasuhide Kawaguchi
IPC分类号： C08F36/20 , C08F114/18
CPC分类号： C08F36/20 , C08F36/16 , C08F214/18 , C08F2/60
摘要： To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg.A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1): CFR1═CR2-Q-CR3═CHR4 (1) wherein each of R1 to R4 which are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.

7. 发明申请

US20050143542A1 Fluorinated compound, fluoropolymer and process for its production 失效
标题翻译：氟化合物，含氟聚合物及其生产工艺
公开(公告)号：US20050143542A1
公开(公告)日：2005-06-30
申请号：US11059695
申请日：2005-02-17
申请人： Shun-ichi Kodama , Isamu Kaneko , Osamu Yokokoji , Shinji Okada , Yoko Takebe , Yasuhide Kawaguchi
发明人： Shun-ichi Kodama , Isamu Kaneko , Osamu Yokokoji , Shinji Okada , Yoko Takebe , Yasuhide Kawaguchi
IPC分类号： C08F36/16 , C08F36/20 , C08F214/18
CPC分类号： C08F36/20 , C08F36/16 , C08F214/18 , C08F2/60
摘要： To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg. A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1): CFR1═CR2-Q-CR3═CHR4 (1) wherein each of R1 to R4 which are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.
摘要翻译：提供具有高浓度官能团的含氟聚合物以提供官能团的足够特性，并且不会降低Tg。具有由式（1）表示的含官能团的氟化二烯的环化聚合形成的单体单元的含氟聚合物：<？in-line-formula description =“In-line formula”end =“lead”→CFR < 1 -CR 2 -Q-CR 3 -RR 4（1）<？在线公式描述=“ 其中独立的R 1〜R 4中的每一个表示氢原子，氟原子，具有至多8个碳原子的烷基或脂环族烃基，并且其中至少一个是脂环族烃基，条件是烷基或脂环族烃基中的氢原子可以被氟原子取代，烷基或氟代烷基; Q表示可以通过酸或能够转化为这种封端的酸性基团的基团而能够形成酸性基团的封端酸性基团的二价有机基团。

8. 发明授权

US07026416B2 Fluoropolymer 失效
标题翻译：含氟聚合物
公开(公告)号：US07026416B2
公开(公告)日：2006-04-11
申请号：US11124133
申请日：2005-05-09
申请人： Yasuhide Kawaguchi , Shinji Okada , Yoko Takebe , Osamu Yokokoji , Isamu Kaneko
发明人： Yasuhide Kawaguchi , Shinji Okada , Yoko Takebe , Osamu Yokokoji , Isamu Kaneko
IPC分类号： C08F136/16 , C08F236/16 , C08F36/16 , G03F7/039
CPC分类号： C08F214/18 , C08F36/20 , C08F2/60
摘要： To provide a fluoropolymer suitable for use as a base polymer for resist materials for excimer lasers having a wavelength of 250 nm or shorter.A fluoropolymer having a monomer unit formed by cyclopolymerization of a fluorinated diene compound represented by the following formula (3), CF2═CFCF2—C(CF3)(R5)—CH2CH═CH2 (3) wherein R5 is either a hydroxyl group blocked by —CHR7—O—R8 or an organic group having the hydroxyl group, and R8 is a cyclic saturated hydrocarbon such as a cycloalkyl group which may have a substituent, or an organic group having the cyclic saturated hydrocarbon.
摘要翻译：提供适合作为波长为250nm以下的准分子激光的抗蚀剂材料的基础聚合物的氟聚合物。具有由下式（3）表示的氟化二烯化合物的环化聚合形成的单体单元的含氟聚合物，<？in-line-formula description =“In-Line Formulas”end =“lead”→> CF 2 -CFCF 2 -C（CF 3）（R 5）CH 2 CH- （3）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中R 5是羟基被封闭或具有羟基的有机基团，R 8为环状饱和烃，例如环烷基其可以具有取代基，或具有环状饱和烃的有机基团。

9. 发明申请

US20050202345A1 Resist composition 审中-公开
标题翻译：抗蚀组成
公开(公告)号：US20050202345A1
公开(公告)日：2005-09-15
申请号：US11124214
申请日：2005-05-09
申请人： Yasuhide Kawaguchi , Isamu Kaneko , Yoko Takebe , Shinji Okada , Osamu Yokokoji
发明人： Yasuhide Kawaguchi , Isamu Kaneko , Yoko Takebe , Shinji Okada , Osamu Yokokoji
IPC分类号： C08F8/00 , C08F8/02 , C08F14/18 , C08F16/02 , C08F16/24 , C08F36/16 , G03C1/492 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0397 , C08F14/18 , C08F36/16 , G03C1/492 , G03F7/0046 , G03F7/0392
摘要： A resist composition which can easily form a resist pattern excellent in transparency for vacuum ultraviolet rays such as an F2 excimer laser or the like and dry etching characteristics and further excellent in sensitivity, resolution, flatness, thermal resistance and the like, is provided. The resist composition, characterized by comprising (A) a fluorine-containing polymer having an acidic group blocked with a blocking group containing a cycloalkyl group, an organic group having one or more of cycloalkyl groups, a bicycloalkyl group or the like, (B) an acid generating compound capable of generating an acid by irradiation with a light, and (C) an organic solvent.
摘要翻译：能容易地形成例如F 2激子等真空紫外线透明性优异的抗干蚀剂组合物和干蚀刻特性，并且灵敏度，分辨率，平坦度，耐热性更好等等。抗蚀剂组合物，其特征在于，包含（A）具有被含有环烷基的封端基封闭的酸性基团的含氟聚合物，具有一个或多个环烷基的有机基团，双环烷基等，（B）能够通过光照射产生酸的酸产生化合物，和（C）有机溶剂。

10. 发明申请

US20050209409A1 Fluoropolymer 失效
标题翻译：含氟聚合物
公开(公告)号：US20050209409A1
公开(公告)日：2005-09-22
申请号：US11124133
申请日：2005-05-09
申请人： Yasuhide Kawaguchi , Shinji Okada , Yoko Takebe , Osamu Yokokoji , Isamu Kaneko
发明人： Yasuhide Kawaguchi , Shinji Okada , Yoko Takebe , Osamu Yokokoji , Isamu Kaneko
IPC分类号： C08F36/20 , C08F214/18 , C08F257/00
CPC分类号： C08F214/18 , C08F36/20 , C08F2/60
摘要： To provide a fluoropolymer suitable for use as a base polymer for resist materials for excimer lasers having a wavelength of 250 nm or shorter. A fluoropolymer having a monomer unit formed by cyclopolymerization of a fluorinated diene compound represented by the following formula (3), CF2═CFCF2—C(CF3)(R5)—CH2CH═CH2 (3) wherein R5 is either a hydroxyl group blocked by —CHR7—O—R8 or an organic group having the hydroxyl group, and R8 is a cyclic saturated hydrocarbon such as a cycloalkyl group which may have a substituent, or an organic group having the cyclic saturated hydrocarbon.
摘要翻译：提供适合作为波长为250nm以下的准分子激光的抗蚀剂材料的基础聚合物的氟聚合物。具有由下式（3）表示的氟化二烯化合物的环化聚合形成的单体单元的含氟聚合物，<？in-line-formula description =“In-Line Formulas”end =“lead”→> CF 2 -CFCF 2 -C（CF 3）（R 5）CH 2 CH- （3）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中R 5是羟基被封闭或具有羟基的有机基团，R 8为环状饱和烃，例如环烷基其可以具有取代基，或具有环状饱和烃的有机基团。

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