专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07231016B2 Efficient measurement of diffuse X-ray reflections 有权
标题翻译：扩散X射线反射的有效测量
公开(公告)号：US07231016B2
公开(公告)日：2007-06-12
申请号：US11396719
申请日：2006-04-04
申请人： David Berman , Isaac Mazor , Boris Yokhin , Amos Gvirtzman
发明人： David Berman , Isaac Mazor , Boris Yokhin , Amos Gvirtzman
IPC分类号： G01N23/20
CPC分类号： G01N23/203 , G01B15/02
摘要： A method for inspection of a sample having a surface layer. The method includes acquiring a first reflectance spectrum of the sample while irradiating the sample with a collimated beam of X-rays, and processing the first reflectance spectrum to measure a diffuse reflection property of the sample. A second reflectance spectrum of the sample is acquired while irradiating the sample with a converging beam of the X-rays. The second reflectance spectrum is analyzed using the diffuse reflection property so as to determine a characteristic of the surface layer of the sample.
摘要翻译：一种用于检查具有表面层的样品的方法。该方法包括在准直的X射线束照射样品时获取样品的第一反射光谱，并且处理第一反射光谱以测量样品的漫反射特性。在用X射线的会聚束照射样品的同时获取样品的第二反射光谱。使用漫反射特性分析第二反射光谱，以确定样品的表面层的特性。

2. 发明授权

US06680996B2 Dual-wavelength X-ray reflectometry 有权
标题翻译：双波长X射线反射计
公开(公告)号：US06680996B2
公开(公告)日：2004-01-20
申请号：US10078640
申请日：2002-02-19
申请人： Boris Yokhin , Isaac Mazor , Amos Gvirtzman
发明人： Boris Yokhin , Isaac Mazor , Amos Gvirtzman
IPC分类号： G01N2320
CPC分类号： G01N23/20
摘要： A method for testing a surface includes finding respective first and second critical angles for total external reflection of radiation from an area of the surface at first and second wavelengths. The first and second critical angles are compared to determine an orientation of a tangent to the surface in the area.
摘要翻译：用于测试表面的方法包括：在第一和第二波长处，从表面的区域发现用于辐射的全部外部反射的相应的第一和第二临界角。比较第一和第二临界角以确定该区域中与表面相切的取向。

3. 发明授权

US06556652B1 Measurement of critical dimensions using X-rays 有权
标题翻译：使用X射线测量临界尺寸
公开(公告)号：US06556652B1
公开(公告)日：2003-04-29
申请号：US09635212
申请日：2000-08-09
申请人： Isaac Mazor , Boris Yokhin , Amos Gvirtzman
发明人： Isaac Mazor , Boris Yokhin , Amos Gvirtzman
IPC分类号： G01N23201
CPC分类号： G01B15/00 , G01N23/201
摘要： A method for measurement of critical dimensions includes irradiating a surface of a substrate with a beam of X-rays. A pattern of the X-rays scattered from the surface due to features formed on the surface is detected and analyzed to measure a dimension of the features in a direction parallel to the surface.
摘要翻译：用于测量临界尺寸的方法包括用X射线照射衬底的表面。检测并分析由于表面上形成的特征而从表面散射的X射线的图案，以测量特征在平行于表面的方向上的尺寸。

4. 发明授权

US08731138B2 High-resolution X-ray diffraction measurement with enhanced sensitivity 有权
$High-resolution X-ray diffraction measurement with enhanced sensitivity$
标题翻译：具有增强灵敏度的高分辨率X射线衍射测量
公开(公告)号：US08731138B2
公开(公告)日：2014-05-20
申请号：US13547073
申请日：2012-07-12
申请人： Boris Yokhin , Isaac Mazor , Alexander Krohmal , Amos Gvirtzman , Gennady Openganden , David Berman , Matthew Wormington
发明人： Boris Yokhin , Isaac Mazor , Alexander Krohmal , Amos Gvirtzman , Gennady Openganden , David Berman , Matthew Wormington
IPC分类号： G01N23/20 , G01N23/203 , G01N23/207
CPC分类号： G01N23/207
摘要： A method for analysis includes directing a converging beam of X-rays toward a surface of a sample having an epitaxial layer formed thereon, and sensing the X-rays that are diffracted from the sample while resolving the sensed X-rays as a function of angle so as to generate a diffraction spectrum including a diffraction peak and fringes due to the epitaxial layer. A characteristic of the fringes is analyzed in order to measure a relaxation of the epitaxial layer.
摘要翻译：一种用于分析的方法包括将X射线的会聚束引导到其上形成有外延层的样品的表面，并且感测从样品衍射的X射线，同时将感测的X射线解析为角度的函数从而产生由于外延层而引起的衍射峰和条纹的衍射光谱。分析边缘的特性以测量外延层的弛豫。

5. 发明申请

US20110164730A1 High-Resolution X-Ray Diffraction Measurement with Enhanced Sensitivity 有权
$High-Resolution X-Ray Diffraction Measurement with Enhanced Sensitivity$
标题翻译：具有增强灵敏度的高分辨率X射线衍射测量
公开(公告)号：US20110164730A1
公开(公告)日：2011-07-07
申请号：US12683436
申请日：2010-01-07
申请人： Boris Yokhin , Isaac Mazor , Alexander Krohmal , Amos Gvirtzman , Gennady Ofengenden , David Berman , Matthew Wormington
发明人： Boris Yokhin , Isaac Mazor , Alexander Krohmal , Amos Gvirtzman , Gennady Ofengenden , David Berman , Matthew Wormington
IPC分类号： G01N23/207
CPC分类号： G01N23/207
摘要： A method for analysis includes directing a converging beam of X-rays toward a surface of a sample having an epitaxial layer formed thereon, and sensing the X-rays that are diffracted from the sample while resolving the sensed X-rays as a function of angle so as to generate a diffraction spectrum including a diffraction peak and fringes due to the epitaxial layer. A characteristic of the fringes is analyzed in order to measure a relaxation of the epitaxial layer.
摘要翻译：一种用于分析的方法包括将X射线的会聚束引导到其上形成有外延层的样品的表面，并且感测从样品衍射的X射线，同时将感测的X射线解析为角度的函数从而产生由于外延层而引起的衍射峰和条纹的衍射光谱。分析边缘的特性以测量外延层的弛豫。

6. 发明申请

US20060023836A1 Enhancement of X-ray reflectometry by measurement of diffuse reflections 有权
公开(公告)号：US20060023836A1
公开(公告)日：2006-02-02
申请号：US10902177
申请日：2004-07-30
申请人： David Berman , Isaac Mazor , Boris Yokhin , Amos Gvirtzman
发明人： David Berman , Isaac Mazor , Boris Yokhin , Amos Gvirtzman
IPC分类号： G01N23/20
CPC分类号： G01N23/203 , G01B15/02
摘要： A method for inspection of a sample having a surface layer. The method includes acquiring a first reflectance spectrum of the sample while irradiating the sample with a collimated beam of X-rays, and processing the first reflectance spectrum to measure a diffuse reflection property of the sample. A second reflectance spectrum of the sample is acquired while irradiating the sample with a converging beam of the X-rays. The second reflectance spectrum is analyzed using the diffuse reflection property so as to determine a characteristic of the surface layer of the sample.

7. 发明授权

US06381303B1 X-ray microanalyzer for thin films 有权
标题翻译：用于薄膜的X射线微量分析仪
公开(公告)号：US06381303B1
公开(公告)日：2002-04-30
申请号：US09408894
申请日：1999-09-29
申请人： Long Vu , Boris Yokhin , Isaac Mazor , Amos Gvirtzman
发明人： Long Vu , Boris Yokhin , Isaac Mazor , Amos Gvirtzman
IPC分类号： G01N23223
CPC分类号： G01N23/20
摘要： Apparatus for X-ray microanalysis of a sample includes an X-ray source, which irradiates a spot having a dimension less than 500 &mgr;m on a surface of the sample. A first X-ray detector captures fluorescent X-rays emitted from the sample, responsive to the irradiation, at a high angle relative to the surface of the sample. A second X-ray detector captures X-rays from the spot at a grazing angle relative to the surface of the sample. Processing circuitry receives respective signals from the first and second X-ray detectors responsive to the X-rays captured thereby, and analyzes the signals in combination to determine a property of a surface layer of the sample within the area of the spot.
摘要翻译：用于样品的X射线微量分析的装置包括X射线源，其在样品的表面上照射尺寸小于500μm的斑点。第一X射线检测器相对于样品的表面以高角度捕获从样品发射的荧光X射线，其响应于照射。第二个X射线检测器以相对于样品表面的掠角捕获来自斑点的X射线。处理电路响应于由此捕获的X射线，从第一和第二X射线检测器接收相应的信号，并组合分析信号以确定样品在斑点区域内的表面层的性质。

8. 发明申请

US20120281814A1 High-Resolution X-Ray Diffraction Measurement with Enhanced Sensitivity 有权
$High-Resolution X-Ray Diffraction Measurement with Enhanced Sensitivity$
标题翻译：具有增强灵敏度的高分辨率X射线衍射测量
公开(公告)号：US20120281814A1
公开(公告)日：2012-11-08
申请号：US13547073
申请日：2012-07-12
申请人： Boris Yokhin , Isaac Mazor , Alexander Krohmal , Amos Gvirtzman , Gennady Openganden , David Berman , Matthew Wormington
发明人： Boris Yokhin , Isaac Mazor , Alexander Krohmal , Amos Gvirtzman , Gennady Openganden , David Berman , Matthew Wormington
IPC分类号： G01N23/207
CPC分类号： G01N23/207
摘要： A method for analysis includes directing a converging beam of X-rays toward a surface of a sample having an epitaxial layer formed thereon, and sensing the X-rays that are diffracted from the sample while resolving the sensed X-rays as a function of angle so as to generate a diffraction spectrum including a diffraction peak and fringes due to the epitaxial layer. A characteristic of the fringes is analyzed in order to measure a relaxation of the epitaxial layer.
摘要翻译：一种用于分析的方法包括将X射线的会聚束引导到其上形成有外延层的样品的表面，并且感测从样品衍射的X射线，同时将感测的X射线解析为角度的函数从而产生由于外延层而引起的衍射峰和条纹的衍射光谱。分析边缘的特性以测量外延层的弛豫。

9. 发明授权

US08243878B2 High-resolution X-ray diffraction measurement with enhanced sensitivity 有权
$High-resolution X-ray diffraction measurement with enhanced sensitivity$
标题翻译：具有增强灵敏度的高分辨率X射线衍射测量
公开(公告)号：US08243878B2
公开(公告)日：2012-08-14
申请号：US12683436
申请日：2010-01-07
申请人： Boris Yokhin , Isaac Mazor , Alexander Krohmal , Amos Gvirtzman , Gennady Openganden , David Berman , Matthew Wormington
发明人： Boris Yokhin , Isaac Mazor , Alexander Krohmal , Amos Gvirtzman , Gennady Openganden , David Berman , Matthew Wormington
IPC分类号： G01N23/20 , G01N23/203 , G01N23/207
CPC分类号： G01N23/207
摘要： A method for analysis includes directing a converging beam of X-rays toward a surface of a sample having an epitaxial layer formed thereon, and sensing the X-rays that are diffracted from the sample while resolving the sensed X-rays as a function of angle so as to generate a diffraction spectrum including a diffraction peak and fringes due to the epitaxial layer. A characteristic of the fringes is analyzed in order to measure a relaxation of the epitaxial layer.
摘要翻译：一种用于分析的方法包括将X射线的会聚束引导到其上形成有外延层的样品的表面，并且感测从样品衍射的X射线，同时将感测的X射线解析为角度的函数从而产生由于外延层而引起的衍射峰和条纹的衍射光谱。分析边缘的特性以测量外延层的弛豫。

10. 发明授权

US07551719B2 Multifunction X-ray analysis system 有权
标题翻译：多功能X射线分析系统
公开(公告)号：US07551719B2
公开(公告)日：2009-06-23
申请号：US11200857
申请日：2005-08-10
申请人： Boris Yokhin , Alexander Krokhmal , Tzachi Rafaeli , Isaac Mazor , Amos Gvirtzman
发明人： Boris Yokhin , Alexander Krokhmal , Tzachi Rafaeli , Isaac Mazor , Amos Gvirtzman
IPC分类号： G01B15/02 , G01N23/20 , G01N23/201
CPC分类号： G01N23/20008
摘要： Apparatus for analysis of a sample includes a radiation source, which is adapted to direct a first, converging beam of X-rays toward a surface of the sample and to direct a second, collimated beam of the X-rays toward the surface of the sample. A motion assembly moves the radiation source between a first source position, in which the X-rays are directed toward the surface of the sample at a grazing angle, and a second source position, in which the X-rays are directed toward the surface in a vicinity of a Bragg angle of the sample. A detector assembly senses the X-rays scattered from the sample as a function of angle while the radiation source is in either of the first and second source configurations and in either of the first and second source positions. A signal processor receives and processes output signals from the detector assembly so as to determine a characteristic of the sample.
摘要翻译：用于分析样品的装置包括辐射源，其适于将X射线的第一收敛束指向样品的表面，并将X射线的第二准直光束引向样品的表面。运动组件使辐射源在X射线以掠射角指向样品表面的第一源位置和第二源位置之间移动，在该第二源位置，X射线朝向表面样品的布拉格角附近。检测器组件在辐射源处于第一和第二源配置中的任一个中以及在第一和第二源位置中的任一个中时，感测从样品散射的X射线作为角度的函数。信号处理器接收并处理来自检测器组件的输出信号，以便确定样品的特性。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式