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    • 2. 发明授权
    • Imidazoisoquinoline compounds useful as anti-ulcerative agents
    • 咪唑并异喹啉化合物可用作抗溃疡剂
    • US4686227A
    • 1987-08-11
    • US745638
    • 1985-06-17
    • Ikuo UedaYouichi ShiokawaMasayuki KatoNobukiyo KonishiAtsushi Akahane
    • Ikuo UedaYouichi ShiokawaMasayuki KatoNobukiyo KonishiAtsushi Akahane
    • C07D471/04A61K31/47A61P1/04C07D487/04A61K31/395C07D405/04
    • C07D487/04
    • A compound of the formula: ##STR1## wherein R.sup.1 is lower alkyl,R.sup.3 is hydrogen, halogen or ar(lower)alkoxy, andR is lower alkanoyl, nitroso, amino, carboxy, esterified carboxy, carbamoyl, hydroxycarbamoyl, haloformyl, aminomethyleneamino which may be substituted with cyano or lower alkyl, iminomethylamino which may be substituted with cyano or lower alkyl, or a group of the formula: --A--R.sup.2 in whichA is lower alkylene andR.sup.2 is di(lower)alkylamino, cyano, lower alkoxy, N-containing heterocyclic group which may have suitable substituent(s), lower alkynyloxy, lower alkenyloxy, lower alkylthio, amino(lower)alkylthio, lower alkylsulfinyl, lower alkylsulfonyl, carboxy, esterified carboxy, carbamoyl, hydroxycarbamoyl, hydroxy, lower alkanoyloxy, heterocyclicamino (lower)alkylthio having two oxo groups, hydrogen or a group of the formula: ##STR2## in which R.sup.4, R.sup.5 and R.sup.6 are each lower alkyl andX is an acid residue,and pharmaceutically acceptable salts thereof.The compounds are useful as anti ulcer agents.
    • 下式的化合物,其中R 1为低级烷基,R 3为氢,卤素或芳(低级)烷氧基,R为低级烷酰基,亚硝基,氨基,羧基,酯化羧基,氨基甲酰基,羟基氨基甲酰基,卤代甲酰基,氨基亚甲基氨基 可以被氰基或低级烷基取代,可以被氰基或低级烷基取代的亚氨基甲基氨基,或下列基团:其中A是低级亚烷基,R2是二(低级)烷基氨基,氰基,低级烷氧基 ,可具有适当取代基的含N杂环基,低级炔氧基,低级烯氧基,低级烷硫基,氨基(低级)烷硫基,低级烷基亚磺酰基,低级烷基磺酰基,羧基,酯化羧基,氨基甲酰基,羟基氨基甲酰基,羟基,低级烷酰氧基, 具有两个氧代基的杂环氨基(低级)烷硫基,氢或下式的基团:其中R 4,R 5和R 6各自为低级烷基,X为酸残基,及其药学上可接受的盐。 该化合物可用作抗溃疡剂。