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1. 发明申请

US20050063046A1 Sample observation method, microscope, and solid immersion lens, optical contact liquid used in the method 失效
标题翻译：样品观察方法，显微镜和固体浸没透镜，该方法中使用的光学接触液体
公开(公告)号：US20050063046A1
公开(公告)日：2005-03-24
申请号：US10876776
申请日：2004-06-28
申请人： Ikuo Arata , Shigeru Sakamoto , Hirotoshi Terada
发明人： Ikuo Arata , Shigeru Sakamoto , Hirotoshi Terada
IPC分类号： G01N21/03 , G01N21/88 , G01N21/95 , G02B21/33 , G02B21/00 , G02B21/26
CPC分类号： G02B21/33 , G01N21/8806 , G01N21/9501 , G01N2021/0342
摘要： Optical contact liquid containing an amphipathic molecule is dripped onto a semiconductor device which is a sample as an inspection object (S104), and a solid immersion lens is set thereon (S105). The inserted position of the solid immersion lens is then adjusted (S106). The optical contact liquid is then dried (S108), and thereby the solid immersion lens is brought into optically-close contact with the semiconductor device. As a result, a sample observation method and a microscope or the like can be realized, in which the solid immersion lens can be easily aligned to a desired position on the sample, and the solid immersion lens can be securely brought into optically-close contact with the sample.
摘要翻译：将含有两亲性分子的光学接触液滴在作为检查对象的样品的半导体器件上（S104），在其上设置固体浸没透镜（S105）。然后调整固体浸没透镜的插入位置（S106）。然后干燥光学接触液体（S108），从而将固体浸没透镜与半导体器件进行光学 - 紧密接触。结果，可以实现样品观察方法和显微镜等，其中固体浸没透镜可以容易地对准样品上的期望位置，并且固体浸没透镜可以牢固地进行光学紧密接触与样品。

2. 发明授权

US07576910B2 Microscope and sample observation method 有权
标题翻译：显微镜和样品观察法
公开(公告)号：US07576910B2
公开(公告)日：2009-08-18
申请号：US11979592
申请日：2007-11-06
申请人： Hirotoshi Terada , Ikuo Arata , Masaharu Tokiwa , Hiroshi Tanabe , Shigeru Sakamoto , Yoshio Isobe
发明人： Hirotoshi Terada , Ikuo Arata , Masaharu Tokiwa , Hiroshi Tanabe , Shigeru Sakamoto , Yoshio Isobe
IPC分类号： G02B21/00
CPC分类号： G02B21/33 , G01N21/9501 , G01N21/956 , G01N21/95684 , G02B21/0016 , G02B21/362
摘要： For a semiconductor device S as an inspected object, there are provided an image acquisition part 1, an optical system 2 including an objective lens 20, and a solid immersion lens (SIL) 3 movable between an insertion position including an optical axis from the semiconductor device S to the objective lens 20 and a standby position off the optical axis. Then observation is carried out in two control modes consisting of a first mode in which the SIL 3 is located at the standby position and in which focusing and aberration correction are carried out based on a refractive index n0 and a thickness t0 of a substrate of the semiconductor device S, and a second mode in which the SIL 3 is located at the insertion position and in which focusing and aberration correction are carried out based on the refractive index n0 and thickness t0 of the substrate, and a refractive index n1, a thickness d1, and a radius of curvature R1 of SIL 3. This provides a microscope and a sample observation method capable of readily performing observation of the sample necessary for an analysis of microstructure or the like of the semiconductor device.
摘要翻译：对于作为检查对象的半导体装置S，提供了图像获取部分1，包括物镜20的光学系统2和在包括来自半导体的光轴的插入位置之间可移动的固体浸没透镜（SIL）3 装置S到物镜20和离开光轴的待机位置。然后在两个控制模式下进行观察，该两种控制模式由SIL 3位于待机位置的第一模式进行，并且基于第一模式的基板的折射率n0和厚度t0进行聚焦和像差校正半导体器件S和第二模式，其中SIL 3位于插入位置，并且基于衬底的折射率n0和厚度t0执行聚焦和像差校正，并且折射率n1，厚度 d1和SIL3的曲率半径R1。这提供了能够容易地观察对半导体器件的微结构等的分析所需的样品的显微镜和样品观察方法。

3. 发明申请

US20080074739A1 Microscope and sample observation method 有权
标题翻译：显微镜和样品观察法
公开(公告)号：US20080074739A1
公开(公告)日：2008-03-27
申请号：US11979592
申请日：2007-11-06
申请人： Hirotoshi Terada , Ikuo Arata , Masaharu Tokiwa , Hiroshi Tanabe , Shigeru Sakamoto , Yoshio Isobe
发明人： Hirotoshi Terada , Ikuo Arata , Masaharu Tokiwa , Hiroshi Tanabe , Shigeru Sakamoto , Yoshio Isobe
IPC分类号： G02B21/00
CPC分类号： G02B21/33 , G01N21/9501 , G01N21/956 , G01N21/95684 , G02B21/0016 , G02B21/362
摘要： For a semiconductor device S as an inspected object, there are provided an image acquisition part 1, an optical system 2 including an objective lens 20, and a solid immersion lens (SIL) 3 movable between an insertion position including an optical axis from the semiconductor device S to the objective lens 20 and a standby position off the optical axis. Then observation is carried out in two control modes consisting of a first mode in which the SIL 3 is located at the standby position and in which focusing and aberration correction are carried out based on a refractive index n0 and a thickness t0 of a substrate of the semiconductor device S, and a second mode in which the SIL 3 is located at the insertion position and in which focusing and aberration correction are carried out based on the refractive index n0 and thickness t0 of the substrate, and a refractive index n1, a thickness d1, and a radius of curvature R1 of SIL 3. This provides a microscope and a sample observation method capable of readily performing observation of the sample necessary for an analysis of microstructure or the like of the semiconductor device.
摘要翻译：对于作为检查对象的半导体装置S，提供了图像获取部分1，包括物镜20的光学系统2和在包括来自半导体的光轴的插入位置之间可移动的固体浸没透镜（SIL）3 装置S到物镜20和离开光轴的待机位置。然后在两个控制模式下进行观察，该两种控制模式由SIL 3位于待机位置的第一模式组成，并且基于折射率n <0>进行聚焦和像差校正，半导体器件S的衬底的厚度t 0 <0 _{和其中SIL 3位于插入位置并且基于折射率执行聚焦和像差校正的第二模式 n 和底层的厚度t 0 <0，折射率n <1，厚度d 1，以及SIL 3的曲率半径R 1 1。这提供了能够容易地观察对半导体器件的微细结构等的分析所需的样品的显微镜和样品观察方法。}

4. 发明授权

US07312921B2 Microscope and sample observation method 有权
标题翻译：显微镜和样品观察法
公开(公告)号：US07312921B2
公开(公告)日：2007-12-25
申请号：US11333550
申请日：2006-01-18
申请人： Hirotoshi Terada , Ikuo Arata , Masaharu Tokiwa , Hiroshi Tanabe , Shigeru Sakamoto , Yoshio Isobe
发明人： Hirotoshi Terada , Ikuo Arata , Masaharu Tokiwa , Hiroshi Tanabe , Shigeru Sakamoto , Yoshio Isobe
IPC分类号： G02B21/00
CPC分类号： G02B21/33 , G01N21/9501 , G01N21/956 , G01N21/95684 , G02B21/0016 , G02B21/362
摘要： For a semiconductor device S as an inspected object, there are provided an image acquisition part 1, an optical system 2 including an objective lens 20, and a solid immersion lens (SIL) 3 movable between an insertion position including an optical axis from the semiconductor device S to the objective lens 20 and a standby position off the optical axis. Then observation is carried out in two control modes consisting of a first mode in which the SIL 3 is located at the standby position and in which focusing and aberration correction are carried out based on a refractive index n0 and a thickness t0 of a substrate of the semiconductor device S, and a second mode in which the SIL 3 is located at the insertion position and in which focusing and aberration correction are carried out based on the refractive index n0 and thickness t0 of the substrate, and a refractive index n1, a thickness d1, and a radius of curvature R1 of SIL 3. This provides a microscope and a sample observation method capable of readily performing observation of the sample necessary for an analysis of microstructure or the like of the semiconductor device.
摘要翻译：对于作为检查对象的半导体装置S，提供了图像获取部分1，包括物镜20的光学系统2和在包括来自半导体的光轴的插入位置之间可移动的固体浸没透镜（SIL）3 装置S到物镜20和离开光轴的待机位置。然后在两个控制模式下进行观察，该两种控制模式由SIL 3位于待机位置的第一模式组成，并且基于折射率n <0>进行聚焦和像差校正，半导体器件S的衬底的厚度t 0 <0 _{和其中SIL 3位于插入位置并且基于折射率执行聚焦和像差校正的第二模式 n 和底层的厚度t 0 <0，折射率n <1，厚度d 1，以及SIL 3的曲率半径R 1 1。这提供了能够容易地观察对半导体器件的微细结构等的分析所需的样品的显微镜和样品观察方法。}

5. 发明申请

US20060176548A1 Microscope and sample observation method 有权
标题翻译：显微镜和样品观察法
公开(公告)号：US20060176548A1
公开(公告)日：2006-08-10
申请号：US11333550
申请日：2006-01-18
申请人： Hirotoshi Terada , Ikuo Arata , Masaharu Tokiwa , Hiroshi Tanabe , Shigeru Sakamoto , Yoshio Isobe
发明人： Hirotoshi Terada , Ikuo Arata , Masaharu Tokiwa , Hiroshi Tanabe , Shigeru Sakamoto , Yoshio Isobe
IPC分类号： G02B21/00
CPC分类号： G02B21/33 , G01N21/9501 , G01N21/956 , G01N21/95684 , G02B21/0016 , G02B21/362
摘要： For a semiconductor device S as an inspected object, there are provided an image acquisition part 1, an optical system 2 including an objective lens 20, and a solid immersion lens (SIL) 3 movable between an insertion position including an optical axis from the semiconductor device S to the objective lens 20 and a standby position off the optical axis. Then observation is carried out in two control modes consisting of a first mode in which the SIL 3 is located at the standby position and in which focusing and aberration correction are carried out based on a refractive index n0 and a thickness t0 of a substrate of the semiconductor device S, and a second mode in which the SIL 3 is located at the insertion position and in which focusing and aberration correction are carried out based on the refractive index n0 and thickness t0 of the substrate, and a refractive index n1, a thickness d1, and a radius of curvature R1 of SIL 3. This provides a microscope and a sample observation method capable of readily performing observation of the sample necessary for an analysis of microstructure or the like of the semiconductor device.
摘要翻译：对于作为检查对象的半导体装置S，提供了图像获取部分1，包括物镜20的光学系统2和在包括来自半导体的光轴的插入位置之间可移动的固体浸没透镜（SIL）3 装置S到物镜20和离开光轴的待机位置。然后在两个控制模式下进行观察，该两种控制模式由SIL 3位于待机位置的第一模式组成，并且基于折射率n <0>进行聚焦和像差校正，半导体器件S的衬底的厚度t 0 <0 _{和其中SIL 3位于插入位置并且基于折射率执行聚焦和像差校正的第二模式 n 和底层的厚度t 0 <0，折射率n <1，厚度d 1，以及SIL 3的曲率半径R 1 1。这提供了能够容易地观察对半导体器件的微细结构等的分析所需的样品的显微镜和样品观察方法。}

6. 发明申请

US20080158667A1 Sample observation method, microscope, and solid immersion lens, optical contact liquid used in the method 审中-公开
标题翻译：样品观察方法，显微镜和固体浸没透镜，该方法中使用的光学接触液体
公开(公告)号：US20080158667A1
公开(公告)日：2008-07-03
申请号：US12071895
申请日：2008-02-27
申请人： Ikuo Arata , Shigeru Sakamoto , Hirotoshi Terada
发明人： Ikuo Arata , Shigeru Sakamoto , Hirotoshi Terada
IPC分类号： G02B21/00
CPC分类号： G02B21/33 , G01N21/8806 , G01N21/9501 , G01N2021/0342 , G02B21/0004
摘要： Optical contact liquid containing an amphipathic molecule is dripped onto a semiconductor device which is a sample as an inspection object (S104), and a solid immersion lens is set thereon (S105). The inserted position of the solid immersion lens is then adjusted (S106). The optical contact liquid is then dried (S108), and thereby the solid immersion lens is brought into optically-close contact with the semiconductor device. As a result, a sample observation method and a microscope or the like can be realized, in which the solid immersion lens can be easily aligned to a desired position on the sample, and the solid immersion lens can be securely brought into optically-close contact with the sample.
摘要翻译：将含有两亲性分子的光学接触液滴在作为检查对象的样品的半导体器件上（S104），在其上设置固体浸没透镜（S105）。然后调整固体浸没透镜的插入位置（S106）。然后干燥光学接触液体（S108），从而将固体浸没透镜与半导体器件进行光学 - 紧密接触。结果，可以实现样品观察方法和显微镜等，其中固体浸没透镜可以容易地对准样品上的期望位置，并且固体浸没透镜可以牢固地进行光学紧密接触与样品。

7. 发明申请

US20050190436A1 Microscope and sample observation method 有权
标题翻译：显微镜和样品观察法
公开(公告)号：US20050190436A1
公开(公告)日：2005-09-01
申请号：US10880100
申请日：2004-06-30
申请人： Hirotoshi Terada , Ikuo Arata , Masaharu Tokiwa , Hiroshi Tanabe , Shigeru Sakamoto
发明人： Hirotoshi Terada , Ikuo Arata , Masaharu Tokiwa , Hiroshi Tanabe , Shigeru Sakamoto
IPC分类号： G02B21/00 , G02B21/33
CPC分类号： G02B21/0016 , G02B21/33 , Y10S359/90
摘要： For a semiconductor device S as an inspected object, there are provided an image acquisition part 1, an optical system 2 including an objective lens 20, and a solid immersion lens (SIL) 3 movable between an insertion position including an optical axis from the semiconductor device S to the objective lens 20 and a standby position off the optical axis. Then observation is carried out in two control modes consisting of a first mode in which the SIL 3 is located at the standby position and in which focusing and aberration correction are carried out based on a refractive index no and a thickness to of a substrate of the semiconductor device S, and a second mode in which the SIL 3 is located at the insertion position and in which focusing and aberration correction are carried out based on the refractive index no and thickness t0 of the substrate, and a refractive index n1, a thickness d1, and a radius of curvature R1 of SIL 3. This provides a microscope and a sample observation method capable of readily performing observation of the sample necessary for an analysis of microstructure or the like of the semiconductor device.
摘要翻译：对于作为检查对象的半导体装置S，提供了图像获取部分1，包括物镜20的光学系统2和在包括来自半导体的光轴的插入位置之间可移动的固体浸没透镜（SIL）3 装置S到物镜20和离开光轴的待机位置。然后在两个控制模式中进行观察，该两种控制模式包括SIL 3位于待机位置的第一模式，并且基于第一模式的基板的折射率no和厚度对其执行聚焦和像差校正半导体器件S和第二模式，其中SIL 3位于插入位置，并且基于衬底的折射率no和厚度t 0 0进行聚焦和像差校正，和折射率n 1 1，厚度d 1，以及SIL 3的曲率半径R 1 1。这提供了能够容易地观察对半导体器件的微细结构等的分析所需的样品的显微镜和样品观察方法。

8. 发明授权

US07423816B2 Solid immersion lens and microscope 有权
标题翻译：固体浸没镜片和显微镜
公开(公告)号：US07423816B2
公开(公告)日：2008-09-09
申请号：US10804194
申请日：2004-03-19
申请人： Hirotoshi Terada , Ikuo Arata , Shigeru Sakamoto
发明人： Hirotoshi Terada , Ikuo Arata , Shigeru Sakamoto
IPC分类号： G02B3/02
CPC分类号： G02B21/33 , G01N21/1717 , G01N21/8806 , G01N21/9501 , G01N2021/0342 , G02B3/06
摘要： A solid immersion lens 1 comprises a spherical portion 2 and a bottom surface portion 3. The bottom surface portion 3 is attached in close contact with a substrate 10 of a semiconductor device to be an observed object. The bottom surface portion 3 of this solid immersion lens 1 is formed in a cylindrical shape. Thereby, a solid immersion lens which can be easily separated from the observed object after an observation and can, during an observation, allow a light flux with a high NA to pass and a microscope using the same can be obtained.
摘要翻译：固体浸没透镜1包括球形部分2和底面部分3。底面部3与半导体装置的基板10紧密接触而成为观察对象物。该固体浸没透镜1的底面部3形成为圆筒状。因此，可以在观察后容易地从观察对象分离的固体浸没透镜，并且可以在观察期间允许具有高NA的光通量通过，并且可以获得使用其的显微镜。

9. 发明申请

US20080137064A1 Sample observation method, microscope, and solid immersion lens; optical contact liquid used in the method 审中-公开
标题翻译：样品观察方法，显微镜和固体浸没透镜; 在该方法中使用的光学接触液体
公开(公告)号：US20080137064A1
公开(公告)日：2008-06-12
申请号：US12003592
申请日：2007-12-28
申请人： Ikuo Arata , Shigeru Sakamoto , Hirotoshi Terada
发明人： Ikuo Arata , Shigeru Sakamoto , Hirotoshi Terada
IPC分类号： G01N1/28
CPC分类号： G02B21/33 , G01N21/8806 , G01N21/9501 , G01N2021/0342 , G02B21/0004
摘要： Optical contact liquid containing an amphipathic molecule is dripped onto a semiconductor device which is a sample as an inspection object (S104), and a solid immersion lens is set thereon (S105). The inserted position of the solid immersion lens is then adjusted (S106). The optical contact liquid is then dried (S108), and thereby the solid immersion lens is brought into optically-close contact with the semiconductor device. As a result, a sample observation method and a microscope or the like can be realized, in which the solid immersion lens can be easily aligned to a desired position on the sample, and the solid immersion lens can be securely brought into optically-close contact with the sample.
摘要翻译：将含有两亲性分子的光学接触液滴在作为检查对象的样品的半导体器件上（S104），在其上设置固体浸没透镜（S105）。然后调整固体浸没透镜的插入位置（S106）。然后干燥光学接触液体（S108），从而将固体浸没透镜与半导体器件进行光学 - 紧密接触。结果，可以实现样品观察方法和显微镜等，其中固体浸没透镜可以容易地对准样品上的期望位置，并且固体浸没透镜可以牢固地进行光学紧密接触与样品。

10. 发明授权

US07359115B2 Sample observation method, microscope, and solid immersion lens, optical contact liquid used in the method 失效
公开(公告)号：US07359115B2
公开(公告)日：2008-04-15
申请号：US10876776
申请日：2004-06-28
申请人： Ikuo Arata , Shigeru Sakamoto , Hirotoshi Terada
发明人： Ikuo Arata , Shigeru Sakamoto , Hirotoshi Terada
IPC分类号： G02B3/12
CPC分类号： G02B21/33 , G01N21/8806 , G01N21/9501 , G01N2021/0342
摘要： Optical contact liquid containing an amphipathic molecule is dripped onto a semiconductor device which is a sample as an inspection object (S104), and a solid immersion lens is set thereon (S105). The inserted position of the solid immersion lens is then adjusted (S106). The optical contact liquid is then dried (S108), and thereby the solid immersion lens is brought into optically-close contact with the semiconductor device. As a result, a sample observation method and a microscope or the like can be realized, in which the solid immersion lens can be easily aligned to a desired position on the sample, and the solid immersion lens can be securely brought into optically-close contact with the sample.

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