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    • 1. 发明授权
    • Microscope and sample observation method
    • 显微镜和样品观察法
    • US07576910B2
    • 2009-08-18
    • US11979592
    • 2007-11-06
    • Hirotoshi TeradaIkuo ArataMasaharu TokiwaHiroshi TanabeShigeru SakamotoYoshio Isobe
    • Hirotoshi TeradaIkuo ArataMasaharu TokiwaHiroshi TanabeShigeru SakamotoYoshio Isobe
    • G02B21/00
    • G02B21/33G01N21/9501G01N21/956G01N21/95684G02B21/0016G02B21/362
    • For a semiconductor device S as an inspected object, there are provided an image acquisition part 1, an optical system 2 including an objective lens 20, and a solid immersion lens (SIL) 3 movable between an insertion position including an optical axis from the semiconductor device S to the objective lens 20 and a standby position off the optical axis. Then observation is carried out in two control modes consisting of a first mode in which the SIL 3 is located at the standby position and in which focusing and aberration correction are carried out based on a refractive index n0 and a thickness t0 of a substrate of the semiconductor device S, and a second mode in which the SIL 3 is located at the insertion position and in which focusing and aberration correction are carried out based on the refractive index n0 and thickness t0 of the substrate, and a refractive index n1, a thickness d1, and a radius of curvature R1 of SIL 3. This provides a microscope and a sample observation method capable of readily performing observation of the sample necessary for an analysis of microstructure or the like of the semiconductor device.
    • 对于作为检查对象的半导体装置S,提供了图像获取部分1,包括物镜20的光学系统2和在包括来自半导体的光轴的插入位置之间可移动的固体浸没透镜(SIL)3 装置S到物镜20和离开光轴的待机位置。 然后在两个控制模式下进行观察,该两种控制模式由SIL 3位于待机位置的第一模式进行,并且基于第一模式的基板的折射率n0和厚度t0进行聚焦和像差校正 半导体器件S和第二模式,其中SIL 3位于插入位置,并且基于衬底的折射率n0和厚度t0执行聚焦和像差校正,并且折射率n1,厚度 d1和SIL3的曲率半径R1。这提供了能够容易地观察对半导体器件的微结构等的分析所需的样品的显微镜和样品观察方法。
    • 2. 发明申请
    • Microscope and sample observation method
    • 显微镜和样品观察法
    • US20080074739A1
    • 2008-03-27
    • US11979592
    • 2007-11-06
    • Hirotoshi TeradaIkuo ArataMasaharu TokiwaHiroshi TanabeShigeru SakamotoYoshio Isobe
    • Hirotoshi TeradaIkuo ArataMasaharu TokiwaHiroshi TanabeShigeru SakamotoYoshio Isobe
    • G02B21/00
    • G02B21/33G01N21/9501G01N21/956G01N21/95684G02B21/0016G02B21/362
    • For a semiconductor device S as an inspected object, there are provided an image acquisition part 1, an optical system 2 including an objective lens 20, and a solid immersion lens (SIL) 3 movable between an insertion position including an optical axis from the semiconductor device S to the objective lens 20 and a standby position off the optical axis. Then observation is carried out in two control modes consisting of a first mode in which the SIL 3 is located at the standby position and in which focusing and aberration correction are carried out based on a refractive index n0 and a thickness t0 of a substrate of the semiconductor device S, and a second mode in which the SIL 3 is located at the insertion position and in which focusing and aberration correction are carried out based on the refractive index n0 and thickness t0 of the substrate, and a refractive index n1, a thickness d1, and a radius of curvature R1 of SIL 3. This provides a microscope and a sample observation method capable of readily performing observation of the sample necessary for an analysis of microstructure or the like of the semiconductor device.
    • 对于作为检查对象的半导体装置S,提供了图像获取部分1,包括物镜20的光学系统2和在包括来自半导体的光轴的插入位置之间可移动的固体浸没透镜(SIL)3 装置S到物镜20和离开光轴的待机位置。 然后在两个控制模式下进行观察,该两种控制模式由SIL 3位于待机位置的第一模式组成,并且基于折射率n <0>进行聚焦和像差校正, 半导体器件S的衬底的厚度t 0 <0 和其中SIL 3位于插入位置并且基于折射率执行聚焦和像差校正的第二模式 n 和底层的厚度t 0 <0,折射率n <1,厚度d 1, 以及SIL 3的曲率半径R 1 1。 这提供了能够容易地观察对半导体器件的微细结构等的分析所需的样品的显微镜和样品观察方法。
    • 3. 发明授权
    • Microscope and sample observation method
    • 显微镜和样品观察法
    • US07312921B2
    • 2007-12-25
    • US11333550
    • 2006-01-18
    • Hirotoshi TeradaIkuo ArataMasaharu TokiwaHiroshi TanabeShigeru SakamotoYoshio Isobe
    • Hirotoshi TeradaIkuo ArataMasaharu TokiwaHiroshi TanabeShigeru SakamotoYoshio Isobe
    • G02B21/00
    • G02B21/33G01N21/9501G01N21/956G01N21/95684G02B21/0016G02B21/362
    • For a semiconductor device S as an inspected object, there are provided an image acquisition part 1, an optical system 2 including an objective lens 20, and a solid immersion lens (SIL) 3 movable between an insertion position including an optical axis from the semiconductor device S to the objective lens 20 and a standby position off the optical axis. Then observation is carried out in two control modes consisting of a first mode in which the SIL 3 is located at the standby position and in which focusing and aberration correction are carried out based on a refractive index n0 and a thickness t0 of a substrate of the semiconductor device S, and a second mode in which the SIL 3 is located at the insertion position and in which focusing and aberration correction are carried out based on the refractive index n0 and thickness t0 of the substrate, and a refractive index n1, a thickness d1, and a radius of curvature R1 of SIL 3. This provides a microscope and a sample observation method capable of readily performing observation of the sample necessary for an analysis of microstructure or the like of the semiconductor device.
    • 对于作为检查对象的半导体装置S,提供了图像获取部分1,包括物镜20的光学系统2和在包括来自半导体的光轴的插入位置之间可移动的固体浸没透镜(SIL)3 装置S到物镜20和离开光轴的待机位置。 然后在两个控制模式下进行观察,该两种控制模式由SIL 3位于待机位置的第一模式组成,并且基于折射率n <0>进行聚焦和像差校正, 半导体器件S的衬底的厚度t 0 <0 和其中SIL 3位于插入位置并且基于折射率执行聚焦和像差校正的第二模式 n 和底层的厚度t 0 <0,折射率n <1,厚度d 1, 以及SIL 3的曲率半径R 1 1。 这提供了能够容易地观察对半导体器件的微细结构等的分析所需的样品的显微镜和样品观察方法。
    • 4. 发明申请
    • Microscope and sample observation method
    • 显微镜和样品观察法
    • US20060176548A1
    • 2006-08-10
    • US11333550
    • 2006-01-18
    • Hirotoshi TeradaIkuo ArataMasaharu TokiwaHiroshi TanabeShigeru SakamotoYoshio Isobe
    • Hirotoshi TeradaIkuo ArataMasaharu TokiwaHiroshi TanabeShigeru SakamotoYoshio Isobe
    • G02B21/00
    • G02B21/33G01N21/9501G01N21/956G01N21/95684G02B21/0016G02B21/362
    • For a semiconductor device S as an inspected object, there are provided an image acquisition part 1, an optical system 2 including an objective lens 20, and a solid immersion lens (SIL) 3 movable between an insertion position including an optical axis from the semiconductor device S to the objective lens 20 and a standby position off the optical axis. Then observation is carried out in two control modes consisting of a first mode in which the SIL 3 is located at the standby position and in which focusing and aberration correction are carried out based on a refractive index n0 and a thickness t0 of a substrate of the semiconductor device S, and a second mode in which the SIL 3 is located at the insertion position and in which focusing and aberration correction are carried out based on the refractive index n0 and thickness t0 of the substrate, and a refractive index n1, a thickness d1, and a radius of curvature R1 of SIL 3. This provides a microscope and a sample observation method capable of readily performing observation of the sample necessary for an analysis of microstructure or the like of the semiconductor device.
    • 对于作为检查对象的半导体装置S,提供了图像获取部分1,包括物镜20的光学系统2和在包括来自半导体的光轴的插入位置之间可移动的固体浸没透镜(SIL)3 装置S到物镜20和离开光轴的待机位置。 然后在两个控制模式下进行观察,该两种控制模式由SIL 3位于待机位置的第一模式组成,并且基于折射率n <0>进行聚焦和像差校正, 半导体器件S的衬底的厚度t 0 <0 和其中SIL 3位于插入位置并且基于折射率执行聚焦和像差校正的第二模式 n 和底层的厚度t 0 <0,折射率n <1,厚度d 1, 以及SIL 3的曲率半径R 1 1。 这提供了能够容易地观察对半导体器件的微细结构等的分析所需的样品的显微镜和样品观察方法。
    • 5. 发明申请
    • Solid immersion lens holder
    • 固体浸没镜头支架
    • US20060182001A1
    • 2006-08-17
    • US11333554
    • 2006-01-18
    • Yoshio IsobeHiroshi TanabeIkuo Arata
    • Yoshio IsobeHiroshi TanabeIkuo Arata
    • G11B7/00G11B7/135
    • G02B7/02G02B21/02
    • A solid immersion lens holder 8A is provided with a base part 50 attached to an objective lens 21, and a lens holding part 60 provided with the base part 50, extending in a direction of optical axis L of the objective lens 21, and arranged to hold a solid immersion lens 6 at an end portion thereof. The lens holding part holds the solid immersion lens so that light emerging from the solid immersion lens to the base part side travels through a region outside the lens holding part and toward the base part, and the base part has a light passing portion 53 which transmits the light toward the objective lens. Since the lens holding part extends in the direction of the optical axis L of the objective lens, even in a case where an observation object 11 is observed as located on a bottom surface of recess 13, the lens holding part will be prevented from contacting a side wall 13a of the recess. As a result, it becomes feasible to observe the observation object up to a region closer to the vicinity of peripheral part 11a of the observation object. This provides a solid immersion lens holder allowing observation up to a region closer to a peripheral part of an observation object even in a case where the observation object is set in a recess of a sample.
    • 固体浸没透镜保持器8A设置有附接到物镜21的基部50和设置有基部50的透镜保持部60,该物镜保持部60沿着物镜21的光轴L的方向延伸,并且布置 在其端部保持固体浸没透镜6。 透镜保持部保持固体浸没透镜,使得从固体浸没透镜向基部侧露出的光穿过透镜保持部分外部的区域并朝向基部,并且基部具有透光部分53 朝向物镜的光。 由于透镜保持部在物镜的光轴L的方向上延伸,所以即使在观察对象物11位于凹部13的底面的情况下,透镜保持部也不会与 凹部的侧壁13a。 结果,观察对象直到观察对象的周边部11a附近的区域变得可行。 即使在将观察对象设置在样本的凹部中的情况下,也能够观察到靠近观察对象的周边部的区域的固体浸没透镜保持架。
    • 6. 发明授权
    • Solid immersion lens holder
    • 固体浸没镜头支架
    • US07414800B2
    • 2008-08-19
    • US11333554
    • 2006-01-18
    • Yoshio IsobeHiroshi TanabeIkuo Arata
    • Yoshio IsobeHiroshi TanabeIkuo Arata
    • G02B7/02
    • G02B7/02G02B21/02
    • A solid immersion lens holder 8A is provided with a base part 50 attached to an objective lens 21, and a lens holding part 60 provided with the base part 50, extending in a direction of optical axis L of the objective lens 21, and arranged to hold a solid immersion lens 6 at an end portion thereof. The lens holding part holds the solid immersion lens so that light emerging from the solid immersion lens to the base part side travels through a region outside the lens holding part and toward the base part, and the base part has a light passing portion 53 which transmits the light toward the objective lens. Since the lens holding part extends in the direction of the optical axis L of the objective lens, even in a case where an observation object 11 is observed as located on a bottom surface of recess 13, the lens holding part will be prevented from contacting a side wall 13a of the recess. As a result, it becomes feasible to observe the observation object up to a region closer to the vicinity of peripheral part 11a of the observation object. This provides a solid immersion lens holder allowing observation up to a region closer to a peripheral part of an observation object even in a case where the observation object is set in a recess of a sample.
    • 固体浸没透镜保持器8A设置有附接到物镜21的基部50和设置有基部50的透镜保持部60,该物镜保持部60沿着物镜21的光轴L的方向延伸,并且布置 在其端部保持固体浸没透镜6。 透镜保持部保持固体浸没透镜,使得从固体浸没透镜向基部侧露出的光穿过透镜保持部分外部的区域并朝向基部,并且基部具有透光部分53 朝向物镜的光。 由于透镜保持部在物镜的光轴L的方向上延伸,所以即使在观察对象物11位于凹部13的底面的情况下,透镜保持部也不会与 凹部的侧壁13a。 结果,观察对象直到观察对象的周边部11a附近的区域变得可行。 即使在将观察对象设置在样本的凹部中的情况下,也能够观察到靠近观察对象的周边部的区域的固体浸没透镜保持架。
    • 10. 发明授权
    • Device for mounting a terminal to an electric indicator
    • 将终端安装到电子指示灯的装置
    • US4790186A
    • 1988-12-13
    • US44283
    • 1987-04-30
    • Youji NakazakiYoshio Isobe
    • Youji NakazakiYoshio Isobe
    • G01R1/04H01R4/30G01D3/08G01D11/00G01D13/00
    • G01R1/04H01R4/305
    • A device for mounting a terminal to an electric indicator includes a meter body of the electrical indicator including electric wiring connected to the electrical terminal and a through hole, a gauge support plate of the electric indicator made of electrically insulating material and disposed on the meter body, and the gauge support plate having at least one concavity to which the electrical terminal is mounted, a screw, which is inserted from beneath the meter body via the through hole, for fastening the terminal to the gauge support plate, and a mechanism for preventing an occurrence of a deformation and deviation in said gauge support plate by the fastening of the screw. The mechanism includes a terminal holder for receiving the electrical terminal therein and supporting members for suspensionally supporting the terminal holder, or a pointed pin provided on the meter body and a notch provided in the terminal which is in engagement with the pin. Thereby, it is possible to prevent an occurrence of error of the indicator due to the deformation or deviation.
    • 一种用于将端子安装到电指示器的装置包括:电指示器的仪表主体,包括连接到电端子的电布线和通孔,由电绝缘材料制成并设置在仪表体上的电指示器的量规支撑板 ,并且所述量规支撑板具有至少一个凹部,所述电气端子安装到所述电气端子上;螺钉,其经由所述通孔从所述仪表主体的下方插入,用于将所述端子紧固到所述量规支撑板;以及用于防止 通过螺钉的紧固,所述量规支撑板中出现变形和偏差。 该机构包括用于接收电气端子的端子保持器和用于悬挂支撑端子座的支撑构件或设置在仪表本体上的尖形销和设置在端子中的与销接合的凹口。 由此,可以防止由于变形或偏差引起的指示器的误差的发生。