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1. 发明申请

US20110259519A1 COATING METHOD FOR GAS DELIVERY SYSTEM 有权
标题翻译：气体输送系统涂层方法
公开(公告)号：US20110259519A1
公开(公告)日：2011-10-27
申请号：US12766529
申请日：2010-04-23
申请人： Ian Kenworthy , Duane Outka , Fangli Hao , Leonard Sharpless , Yijun Du
发明人： Ian Kenworthy , Duane Outka , Fangli Hao , Leonard Sharpless , Yijun Du
IPC分类号： C23F1/08 , B05D7/22
CPC分类号： F17D5/005 , B05D1/30 , B05D7/222 , F17D1/04 , H01J37/3244 , H01J37/32495 , H01J2237/3341 , H01L21/67069 , Y10T137/8593
摘要： A method of coating the inner surfaces of gas passages of a gas delivery system for a plasma process system such as a plasma etching system includes (a) flowing a fluidic precursor of a corrosion-resistant material through the gas passages and depositing a layer of the fluidic precursor to completely coat the inner surfaces of the gas passages; (b) removing excess fluidic precursor from the inner surfaces; (c) curing the deposited layer of the fluidic precursor to form a corrosion-resistant material coating.
摘要翻译：涂覆等离子体处理系统例如等离子体蚀刻系统的气体输送系统的气体通道的内表面的方法包括（a）使耐腐蚀材料的流体前体流过气体通道并沉积一层流体前体，以完全涂覆气体通道的内表面; （b）从内表面除去多余的流体前体; （c）固化流体前体的沉积层以形成耐腐蚀材料涂层。

2. 发明授权

US08852685B2 Coating method for gas delivery system 有权
标题翻译：气体输送系统涂层方法
公开(公告)号：US08852685B2
公开(公告)日：2014-10-07
申请号：US12766529
申请日：2010-04-23
申请人： Ian Kenworthy , Duane Outka , Fangli Hao , Leonard Sharpless , Yijun Du
发明人： Ian Kenworthy , Duane Outka , Fangli Hao , Leonard Sharpless , Yijun Du
IPC分类号： C23F1/08 , B05D7/22
CPC分类号： F17D5/005 , B05D1/30 , B05D7/222 , F17D1/04 , H01J37/3244 , H01J37/32495 , H01J2237/3341 , H01L21/67069 , Y10T137/8593
摘要： A method of coating the inner surfaces of gas passages of a gas delivery system for a plasma process system such as a plasma etching system includes (a) flowing a fluidic precursor of a corrosion-resistant material through the gas passages and depositing a layer of the fluidic precursor to completely coat the inner surfaces of the gas passages; (b) removing excess fluidic precursor from the inner surfaces; (c) curing the deposited layer of the fluidic precursor to form a corrosion-resistant material coating.
摘要翻译：涂覆等离子体处理系统例如等离子体蚀刻系统的气体输送系统的气体通道的内表面的方法包括（a）使耐腐蚀材料的流体前体流过气体通道并沉积一层流体前体，以完全涂覆气体通道的内表面; （b）从内表面除去多余的流体前体; （c）固化流体前体的沉积层以形成耐腐蚀材料涂层。

3. 发明申请

US20070169704A1 Apparatus for shielding process chamber port having dual zone and optical access features 审中-公开
标题翻译：用于屏蔽具有双区域和光学访问特征的处理室端口的装置
公开(公告)号：US20070169704A1
公开(公告)日：2007-07-26
申请号：US11472017
申请日：2006-06-20
申请人： Fangli Hao , Leonard Sharpless , Harmeet Singh
发明人： Fangli Hao , Leonard Sharpless , Harmeet Singh
IPC分类号： H01L21/306 , C23C16/00
CPC分类号： H01J37/32623 , H01J37/32477
摘要： A port in a window member provides first access to a process chamber interior for gas injection and second optical access for process analysis and measurement. Plasma-induced etching and deposition in a bore of a gas injector integral with the window member is reduced by a grounded shield surrounding an access region, and coatings reduce particle flaking from walls of a first clear optical aperture of the injector and from a second clear optical aperture of a gas and optical access fitting,. The shield surrounds the region, and is configured with couplers to hold the gas and optical access fitting to the window member for access to the injector. The couplers compress seals so that a gas bore in the fitting is sealed to a plenum of the injector, while allowing optical access into the chamber through the first clear optical aperture and the second clear optical aperture.
摘要翻译：窗口构件中的端口提供了用于气体注入和第二光学访问的处理室内部的第一次访问以用于过程分析和测量。等离子体诱导的蚀刻和沉积在与窗构件成一体的气体注射器的孔中，通过围绕进入区域的接地屏蔽减少，并且涂层减少了来自注射器的第一透明光学孔的壁的颗粒剥落，并且从第二透明气体和光学接入配件的光学孔径。屏蔽件围绕该区域，并且被配置有耦合器以将气体和光学接入配件保持到窗口构件以用于进入喷射器。联接器压缩密封件，使得配件中的气孔被密封到喷射器的气室，同时允许通过第一透明光学孔和第二透明光学孔进入腔室。

4. 发明授权

US08597462B2 Movable chamber liner plasma confinement screen combination for plasma processing apparatuses 有权
标题翻译：用于等离子体处理设备的可移动腔室衬垫等离子体限制屏幕组合
公开(公告)号：US08597462B2
公开(公告)日：2013-12-03
申请号：US12785232
申请日：2010-05-21
申请人： Danny Brown , Leonard Sharpless
发明人： Danny Brown , Leonard Sharpless
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01L21/3065 , B23K20/122 , H01J37/32495 , H01J37/32623 , Y10T29/49117 , Y10T29/49826 , Y10T29/49888
摘要： A movable symmetric chamber liner in a plasma reaction chamber, for protecting the plasma reaction chamber, enhancing the plasma density and uniformity, and reducing process gas consumption, comprising a cylindrical wall, a bottom wall with a plurality of openings, a raised inner rim with an embedded heater, heater contacts, and RF ground return contacts. The chamber liner is moved by actuators between an upper position at which substrates can be transferred into and out of the chamber, and a lower position at which substrate are processed in the chamber. The actuators also provide electrical connection to the heater and RF ground return contacts.
摘要翻译：等离子体反应室中的可移动的对称室衬垫，用于保护等离子体反应室，增强等离子体密度和均匀性，并减少工艺气体消耗，包括圆柱形壁，具有多个开口的底壁，嵌入式加热器，加热器触点和RF接地返回触点。腔室衬垫由致动器在衬底可以被转移到腔室中的上部位置和在腔室中被处理衬底的下部位置之间移动。致动器还提供与加热器和RF接地返回触点的电连接。

5. 发明申请

US20090152958A1 VACUUM SEALING RADIO FREQUENCY (RF) AND LOW FREQUENCY CONDUCTING ACTUATOR 有权
标题翻译：真空密封无线电频率（RF）和低频导频执行器
公开(公告)号：US20090152958A1
公开(公告)日：2009-06-18
申请号：US12333819
申请日：2008-12-12
申请人： Danny Brown , Allan Ronne , Arthur Sato , John Daugherty , Leonard Sharpless
发明人： Danny Brown , Allan Ronne , Arthur Sato , John Daugherty , Leonard Sharpless
IPC分类号： H02K41/02
CPC分类号： F15B15/14
摘要： A linear actuator comprised of an actuator body having a first portion and a second portion, each arranged along a longitudinal axis of the actuator body. A vacuum bellows is concentrically located in the first portion and is configured to seal a vacuum environment from the second portion. A linear motion shaft is concentrically located substantially within the actuator body and is configured to move in a linear direction along the longitudinal axis. An electrically conductive portion of the shaft is concentrically located substantially within the vacuum bellows and electrically insulated therefrom and is configured to receive and conduct a signal. A lift force generating portion of the shaft is concentrically located substantially within the second portion. An electrical contact pad is electrically coupled to the conductive portion of the shaft and is configured to couple the signal to another surface upon activation of the shaft.
摘要翻译：线性致动器包括具有第一部分和第二部分的致动器本体，每个部分沿致动器主体的纵向轴线布置。真空波纹管同心地位于第一部分中并且构造成从第二部分密封真空环境。直线运动轴基本上位于致动器主体内并且被构造成沿着纵向轴线沿直线方向移动。轴的导电部分基本上位于真空波纹管内并与其电绝缘，并且被配置为接收和传导信号。轴的提升力产生部分同心地位于第二部分内。电接触焊盘电耦合到轴的导电部分并且被配置为在激活轴时将信号耦合到另一表面。

6. 发明授权

US08524099B2 Methods for accessing a process chamber using a dual zone gas injector with improved optical access 有权
标题翻译：使用具有改进的光学访问的双区域气体注入器访问处理室的方法
公开(公告)号：US08524099B2
公开(公告)日：2013-09-03
申请号：US12987030
申请日：2011-01-07
申请人： Jeff A. Bogart , Leonard Sharpless , Harmeet Singh
发明人： Jeff A. Bogart , Leonard Sharpless , Harmeet Singh
IPC分类号： G01L21/30
CPC分类号： C23C16/513 , H01J37/3244
摘要： Methods for processing events occurring in a process chamber are provided. In one method, an operation includes carrying gas and receiving an optical signal from the process chamber to an analysis tool that operates in response to the optical signal having a signal-to-noise ratio (SNR) for process analysis. And, dividing the carried gas and optical signal into a plurality of separate gas and optical signals between the process chamber and the analysis tool. The dividing is configured through separate apertures so that the apertures collectively maintain the SNR of the optical signal received at the tool. Methods provide a septum in a second bore dividing the second bore into apertures configured to reduce etching of and deposition on the optical access window and to maintain the desired SNR at the diagnostic end point.
摘要翻译：提供了用于处理在处理室中发生的事件的方法。在一种方法中，操作包括携带气体并从处理室接收光信号到响应于具有用于过程分析的信噪比（SNR）的光信号而工作的分析工具。并且，在处理室和分析工具之间将承载的气体和光信号分成多个单独的气体和光信号。分隔通过单独的孔配置，使得孔一起保持在工具处接收的光信号的SNR。方法在第二孔中提供隔膜，将第二孔分成孔，所述孔被构造成减少光学接口窗口上的蚀刻和沉积并维持诊断终点处的期望SNR。

7. 发明授权

US07928366B2 Methods of and apparatus for accessing a process chamber using a dual zone gas injector with improved optical access 有权
标题翻译：使用具有改进的光学访问的双区域气体注入器来访问处理室的方法和装置
公开(公告)号：US07928366B2
公开(公告)日：2011-04-19
申请号：US11544316
申请日：2006-10-06
申请人： Jeff A. Bogart , Leonard Sharpless , Harmeet Singh
发明人： Jeff A. Bogart , Leonard Sharpless , Harmeet Singh
IPC分类号： H01J49/00
CPC分类号： C23C16/513 , H01J37/3244
摘要： An injector provides optical access into a process chamber along an axial path from a diagnostic end point outside the process chamber through an optical access window. A hollow housing body receives first and second process gases, and surrounds the axial path. A sleeve in the body is urged against the body to minimize particle generation, and defines a first gas bore injecting the first process gas into the process chamber. A second gas bore of the sleeve surrounds the axial path for injecting the second process gas into the process chamber, allowing an optical signal to have a desired signal-to-noise ratio (SNR) at the end point. Methods provide a septum in the second bore dividing the second bore into apertures configured to reduce etching of and deposition on the optical access window and to maintain the desired SNR at the diagnostic end point.
摘要翻译：注射器通过光学访问窗口从处理室外部的诊断终点沿着轴向路径向处理室提供光学访问。中空的壳体容纳第一和第二处理气体并且包围轴向路径。身体中的套筒被推靠在身体上以最小化颗粒产生，并且限定将第一工艺气体注入到处理室中的第一气孔。套筒的第二个气孔围绕轴向路径，用于将第二工艺气体注入到处理室中，从而允许光学信号在终点处具有期望的信噪比（SNR）。方法在第二孔中提供隔膜，将第二孔分成孔，其被配置为减少光学接口窗口的蚀刻和沉积，并在诊断终点处保持所需的SNR。

8. 发明申请

US20110287632A1 MOVABLE CHAMBER LINER PLASMA CONFINEMENT SCREEN COMBINATION FOR PLASMA PROCESSING APPARATUSES 有权
标题翻译：可移动的室内等离子体处理装置的屏幕组合
公开(公告)号：US20110287632A1
公开(公告)日：2011-11-24
申请号：US12785232
申请日：2010-05-21
申请人： Danny Brown , Leonard Sharpless
发明人： Danny Brown , Leonard Sharpless
IPC分类号： H01L21/3065 , B23P17/04
CPC分类号： H01L21/3065 , B23K20/122 , H01J37/32495 , H01J37/32623 , Y10T29/49117 , Y10T29/49826 , Y10T29/49888
摘要： A movable symmetric chamber liner in a plasma reaction chamber, for protecting the plasma reaction chamber, enhancing the plasma density and uniformity, and reducing process gas consumption, comprising a cylindrical wall, a bottom wall with a plurality of openings, a raised inner rim with an embedded heater, heater contacts, and RF ground return contacts. The chamber liner is moved by actuators between an upper position at which substrates can be transferred into and out of the chamber, and a lower position at which substrate are processed in the chamber. The actuators also provide electrical connection to the heater and RF ground return contacts.
摘要翻译：等离子体反应室中的可移动的对称室衬垫，用于保护等离子体反应室，增强等离子体密度和均匀性，并减少工艺气体消耗，包括圆柱形壁，具有多个开口的底壁，嵌入式加热器，加热器触点和RF接地返回触点。腔室衬垫由致动器在衬底可以被转移到腔室中的上部位置和在腔室中被处理衬底的下部位置之间移动。执行器还提供与加热器和RF接地返回触点的电连接。

9. 发明授权

US08597428B2 Vacuum sealing radio frequency (RF) and low frequency conducting actuator 有权
标题翻译：真空密封射频（RF）和低频传导致动器
公开(公告)号：US08597428B2
公开(公告)日：2013-12-03
申请号：US12333819
申请日：2008-12-12
申请人： Danny Brown , Allan Ronne , Arthur Sato , John Daugherty , Leonard Sharpless
发明人： Danny Brown , Allan Ronne , Arthur Sato , John Daugherty , Leonard Sharpless
IPC分类号： C23C16/00 , H01J7/24 , H05B31/26 , B60P1/00 , B65F1/00 , B65F3/00
CPC分类号： F15B15/14
摘要： A linear actuator comprised of an actuator body having a first portion and a second portion, each arranged along a longitudinal axis of the actuator body. A vacuum bellows is concentrically located in the first portion and is configured to seal a vacuum environment from the second portion. A linear motion shaft is concentrically located substantially within the actuator body and is configured to move in a linear direction along the longitudinal axis. An electrically conductive portion of the shaft is concentrically located substantially within the vacuum bellows and electrically insulated therefrom and is configured to receive and conduct a signal. A lift force generating portion of the shaft is concentrically located substantially within the second portion. An electrical contact pad is electrically coupled to the conductive portion of the shaft and is configured to couple the signal to another surface upon activation of the shaft.
摘要翻译：线性致动器包括具有第一部分和第二部分的致动器本体，每个部分沿致动器主体的纵向轴线布置。真空波纹管同心地位于第一部分中并且构造成从第二部分密封真空环境。直线运动轴基本上位于致动器主体内并且被构造成沿着纵向轴线沿直线方向移动。轴的导电部分基本上位于真空波纹管内并与其电绝缘，并且被配置为接收和传导信号。轴的提升力产生部分同心地位于第二部分内。电接触焊盘电耦合到轴的导电部分并且被配置为在激活轴时将信号耦合到另一表面。

10. 发明申请

US20060000551A1 Methods and apparatus for optimal temperature control in a plasma processing system 审中-公开
标题翻译：用于等离子体处理系统中最佳温度控制的方法和装置
公开(公告)号：US20060000551A1
公开(公告)日：2006-01-05
申请号：US10882464
申请日：2004-06-30
申请人： Miguel Saldana , Leonard Sharpless , John Daugherty
发明人： Miguel Saldana , Leonard Sharpless , John Daugherty
IPC分类号： C23F1/00
CPC分类号： H01L21/67248 , F28D1/06 , F28D2021/0077 , F28F2013/006 , H01J37/321 , H01J37/32522 , H01L21/67069
摘要： A temperature control device for controlling temperature of an upper chamber of a plasma processing apparatus is described. The temperature control device includes a thermally conductive body having an inner surface and an outer surface removably connected with and in thermal communication with the upper chamber of the plasma processing apparatus. The temperature control device also includes a plurality of thermal interface layers in thermal communication with the thermally conductive body wherein at least one layer is a heating element; and a cooling element connected with the banded thermally conductive body and thermally coupled with the upper chamber of the plasma processing apparatus wherein the cooling element is configured to conduct a fluidic medium. The temperature control device further includes at least one temperature sensor for sensing temperature of the upper chamber of the plasma processing apparatus; a temperature control unit for controlling the heating element and the cooling element; and a latching mechanism for securing the temperature control device to the upper chamber.
摘要翻译：描述了一种用于控制等离子体处理装置的上部室的温度的温度控制装置。温度控制装置包括导热体，其具有可拆卸地与等离子体处理装置的上腔室连接并与热连通的内表面和外表面。温度控制装置还包括与导热体热连通的多个热界面层，其中至少一层是加热元件; 以及与所述带状导热体连接并与所述等离子体处理设备的上室热耦合的冷却元件，其中所述冷却元件被配置为导入流体介质。温度控制装置还包括至少一个温度传感器，用于感测等离子体处理装置的上腔室的温度; 用于控制加热元件和冷却元件的温度控制单元; 以及用于将温度控制装置固定到上室的闭锁机构。

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