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1. 发明授权

US08524099B2 Methods for accessing a process chamber using a dual zone gas injector with improved optical access 有权
标题翻译：使用具有改进的光学访问的双区域气体注入器访问处理室的方法
公开(公告)号：US08524099B2
公开(公告)日：2013-09-03
申请号：US12987030
申请日：2011-01-07
申请人： Jeff A. Bogart , Leonard Sharpless , Harmeet Singh
发明人： Jeff A. Bogart , Leonard Sharpless , Harmeet Singh
IPC分类号： G01L21/30
CPC分类号： C23C16/513 , H01J37/3244
摘要： Methods for processing events occurring in a process chamber are provided. In one method, an operation includes carrying gas and receiving an optical signal from the process chamber to an analysis tool that operates in response to the optical signal having a signal-to-noise ratio (SNR) for process analysis. And, dividing the carried gas and optical signal into a plurality of separate gas and optical signals between the process chamber and the analysis tool. The dividing is configured through separate apertures so that the apertures collectively maintain the SNR of the optical signal received at the tool. Methods provide a septum in a second bore dividing the second bore into apertures configured to reduce etching of and deposition on the optical access window and to maintain the desired SNR at the diagnostic end point.
摘要翻译：提供了用于处理在处理室中发生的事件的方法。在一种方法中，操作包括携带气体并从处理室接收光信号到响应于具有用于过程分析的信噪比（SNR）的光信号而工作的分析工具。并且，在处理室和分析工具之间将承载的气体和光信号分成多个单独的气体和光信号。分隔通过单独的孔配置，使得孔一起保持在工具处接收的光信号的SNR。方法在第二孔中提供隔膜，将第二孔分成孔，所述孔被构造成减少光学接口窗口上的蚀刻和沉积并维持诊断终点处的期望SNR。

2. 发明授权

US07928366B2 Methods of and apparatus for accessing a process chamber using a dual zone gas injector with improved optical access 有权
标题翻译：使用具有改进的光学访问的双区域气体注入器来访问处理室的方法和装置
公开(公告)号：US07928366B2
公开(公告)日：2011-04-19
申请号：US11544316
申请日：2006-10-06
申请人： Jeff A. Bogart , Leonard Sharpless , Harmeet Singh
发明人： Jeff A. Bogart , Leonard Sharpless , Harmeet Singh
IPC分类号： H01J49/00
CPC分类号： C23C16/513 , H01J37/3244
摘要： An injector provides optical access into a process chamber along an axial path from a diagnostic end point outside the process chamber through an optical access window. A hollow housing body receives first and second process gases, and surrounds the axial path. A sleeve in the body is urged against the body to minimize particle generation, and defines a first gas bore injecting the first process gas into the process chamber. A second gas bore of the sleeve surrounds the axial path for injecting the second process gas into the process chamber, allowing an optical signal to have a desired signal-to-noise ratio (SNR) at the end point. Methods provide a septum in the second bore dividing the second bore into apertures configured to reduce etching of and deposition on the optical access window and to maintain the desired SNR at the diagnostic end point.
摘要翻译：注射器通过光学访问窗口从处理室外部的诊断终点沿着轴向路径向处理室提供光学访问。中空的壳体容纳第一和第二处理气体并且包围轴向路径。身体中的套筒被推靠在身体上以最小化颗粒产生，并且限定将第一工艺气体注入到处理室中的第一气孔。套筒的第二个气孔围绕轴向路径，用于将第二工艺气体注入到处理室中，从而允许光学信号在终点处具有期望的信噪比（SNR）。方法在第二孔中提供隔膜，将第二孔分成孔，其被配置为减少光学接口窗口的蚀刻和沉积，并在诊断终点处保持所需的SNR。

3. 发明申请

US20110103805A1 Methods for Accessing a Process Chamber Using a Dual Zone Gas Injector with Improved Optical Access 有权
标题翻译：使用改进的光学访问的双区域气体喷射器来访问处理室的方法
公开(公告)号：US20110103805A1
公开(公告)日：2011-05-05
申请号：US12987030
申请日：2011-01-07
申请人： Jeff A. Bogart , Leonard Sharpless , Harmeet Singh
发明人： Jeff A. Bogart , Leonard Sharpless , Harmeet Singh
IPC分类号： H04B10/00
CPC分类号： C23C16/513 , H01J37/3244
摘要： Methods for processing events occurring in a process chamber are provided. In one method, an operation includes carrying gas and receiving an optical signal from the process chamber to an analysis tool that operates in response to the optical signal having a signal-to-noise ratio (SNR) for process analysis. And, dividing the carried gas and optical signal into a plurality of separate gas and optical signals between the process chamber and the analysis tool. The dividing is configured through separate apertures so that the apertures collectively maintain the SNR of the optical signal received at the tool. Methods provide a septum in a second bore dividing the second bore into apertures configured to reduce etching of and deposition on the optical access window and to maintain the desired SNR at the diagnostic end point.
摘要翻译：提供了用于处理在处理室中发生的事件的方法。在一种方法中，操作包括携带气体并从处理室接收光信号到响应于具有用于过程分析的信噪比（SNR）的光信号而工作的分析工具。并且，在处理室和分析工具之间将承载的气体和光信号分成多个单独的气体和光信号。分隔通过单独的孔配置，使得孔一起保持在工具处接收的光信号的SNR。方法在第二孔中提供隔膜，将第二孔分成孔，所述孔被构造成减少光学接口窗口上的蚀刻和沉积并维持诊断终点处的期望SNR。

4. 发明申请

US20110056626A1 REPLACEABLE UPPER CHAMBER PARTS OF PLASMA PROCESSING APPARATUS 有权
标题翻译：等离子加工设备可更换的上部部件
公开(公告)号：US20110056626A1
公开(公告)日：2011-03-10
申请号：US12879351
申请日：2010-09-10
申请人： Daniel Arthur Brown , Jeff A. Bogart , Ian J. Kenworthy
发明人： Daniel Arthur Brown , Jeff A. Bogart , Ian J. Kenworthy
IPC分类号： H01L21/306
CPC分类号： H01J37/3244 , C23C16/45563 , C23C16/45578 , H01J37/321 , H01J37/32119 , H01J37/32449 , H01J37/32458 , H01J37/32477 , H01J37/32495 , H01J37/32513 , H01J37/32522
摘要： An upper chamber section of a plasma reaction chamber includes a ceramic window with blind bores in an upper surface for receipt of a thermal couple and a resistance temperature detector, a top chamber interface which comprises an upper surface which vacuum seals against the bottom of the window and a gas injection system comprising 8 side injectors mounted in the sidewall of the top chamber interface and a gas delivery system comprising tubing which provides symmetric gas flow to the 8 injectors from a single gas feed connection.
摘要翻译：等离子体反应室的上腔室包括在上表面中具有用于接收热偶的盲孔的陶瓷窗口和电阻温度检测器，顶室接口，其包括上表面，真空密封在窗口的底部以及气体注入系统，其包括安装在顶部腔室界面的侧壁中的8个侧注射器，以及气体输送系统，其包括从单个气体进料连接向8个喷射器提供对称气体流的管道。

5. 发明申请

US20080083883A1 Methods of and apparatus for accessing a process chamber using a dual zone gas injector with improved optical access 有权
标题翻译：使用具有改进的光学访问的双区域气体注入器来访问处理室的方法和装置
公开(公告)号：US20080083883A1
公开(公告)日：2008-04-10
申请号：US11544316
申请日：2006-10-06
申请人： Jeff A. Bogart , Leonard Sharpless , Harmeet Singh
发明人： Jeff A. Bogart , Leonard Sharpless , Harmeet Singh
IPC分类号： H01J27/24
CPC分类号： C23C16/513 , H01J37/3244
摘要： An injector provides optical access into a process chamber along an axial path from a diagnostic end point outside the process chamber through an optical access window. A hollow housing body receives first and second process gases, and surrounds the axial path. A sleeve in the body is urged against the body to minimize particle generation, and defines a first gas bore injecting the first process gas into the process chamber. A second gas bore of the sleeve surrounds the axial path for injecting the second process gas into the process chamber, allowing an optical signal to have a desired signal-to-noise ratio (SNR) at the end point. Methods provide a septum in the second bore dividing the second bore into apertures configured to reduce etching of and deposition on the optical access window and to maintain the desired SNR at the diagnostic end point.
摘要翻译：注射器通过光学访问窗口从处理室外部的诊断终点沿着轴向路径向处理室提供光学访问。中空的壳体容纳第一和第二处理气体并且包围轴向路径。身体中的套筒被推靠在身体上以最小化颗粒产生，并且限定将第一工艺气体注入到处理室中的第一气孔。套筒的第二个气孔围绕轴向路径，用于将第二工艺气体注入到处理室中，从而允许光学信号在终点处具有期望的信噪比（SNR）。方法在第二孔中提供隔膜，将第二孔分成孔，其被配置为减少光学接口窗口的蚀刻和沉积，并在诊断终点处保持所需的SNR。

6. 发明授权

US07201829B2 Mask plate design 有权
标题翻译：面膜设计
公开(公告)号：US07201829B2
公开(公告)日：2007-04-10
申请号：US09960236
申请日：2001-09-20
申请人： Bulent M. Basol , Cyprian Uzoh , Jeff A. Bogart
发明人： Bulent M. Basol , Cyprian Uzoh , Jeff A. Bogart
IPC分类号： C25F3/16 , C25F5/00 , C25D17/00
CPC分类号： H01L21/76879 , B24B37/042 , C25D5/02 , C25D5/08 , C25D5/22 , C25D7/12 , C25D17/001 , C25F7/00 , H01L21/2885
摘要： The present invention includes a mask plate design that includes at least one or a plurality of channels portions on a surface of the mask plate, into which electrolyte solution will accumulate when the mask plate surface is disposed on a surface of wafer, and out of which the electrolyte solution will freely flow. There are also at least one or a plurality of polish portions on the mask plate surface that allow for polishing of the wafer when the mask plate surface is disposed on a surface of wafer.
摘要翻译：本发明包括掩模板设计，其包括在掩模板的表面上的至少一个或多个通道部分，当掩模板表面设置在晶片的表面上时，电解质溶液将积聚在其中，并且其中电解液会自由流动。掩模板表面上还有至少一个或多个抛光部分，当掩模板表面设置在晶片的表面上时，允许抛光晶片。

7. 发明授权

US09076634B2 Replaceable upper chamber parts of plasma processing apparatus 有权
标题翻译：等离子处理装置的可更换的上室部件
公开(公告)号：US09076634B2
公开(公告)日：2015-07-07
申请号：US12879351
申请日：2010-09-10
申请人： Daniel Arthur Brown , Jeff A. Bogart , Ian J. Kenworthy
发明人： Daniel Arthur Brown , Jeff A. Bogart , Ian J. Kenworthy
IPC分类号： H01J37/32
CPC分类号： H01J37/3244 , C23C16/45563 , C23C16/45578 , H01J37/321 , H01J37/32119 , H01J37/32449 , H01J37/32458 , H01J37/32477 , H01J37/32495 , H01J37/32513 , H01J37/32522
摘要： An upper chamber section of a plasma reaction chamber includes a ceramic window with blind bores in an upper surface for receipt of a thermal couple and a resistance temperature detector, a top chamber interface which comprises an upper surface which vacuum seals against the bottom of the window and a gas injection system comprising 8 side injectors mounted in the sidewall of the top chamber interface and a gas delivery system comprising tubing which provides symmetric gas flow to the 8 injectors from a single gas feed connection.
摘要翻译：等离子体反应室的上腔室包括在上表面中具有用于接收热偶的盲孔的陶瓷窗口和电阻温度检测器，顶室接口，其包括上表面，真空密封在窗口的底部以及气体注入系统，其包括安装在顶部腔室界面的侧壁中的8个侧注射器，以及气体输送系统，其包括从单个气体进料连接向8个喷射器提供对称气体流的管道。

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